Optical and mechanical properties of diamond like carbon films deposited by microwave ECR plasma CVD |
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Authors: | S B Singh M Pandey N Chand A Biswas D Bhattacharya S Dash A K Tyagi R M Dey S K Kulkarni D S Patil |
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Affiliation: | (1) Laser and Plasma Technology Division, Bhabha Atomic Research Centre, Mumbai, 400 085, India;(2) High Pressure Physics Division, Bhabha Atomic Research Centre, Mumbai, 400 085, India;(3) Spectroscopy Division, Bhabha Atomic Research Centre, Mumbai, 400 085, India;(4) Materials Science Division, Indira Gandhi Centre for Atomic Research, Kalpakkam, 603 102, India;(5) Department of Physics, University of Pune, Pune, 411 007, India |
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Abstract: | Diamond like carbon (DLC) films were deposited on Si (111) substrates by microwave electron cyclotron resonance (ECR) plasma
chemical vapour deposition (CVD) process using plasma of argon and methane gases. During deposition, a d.c. self-bias was
applied to the substrates by application of 13·56 MHz rf power. DLC films deposited at three different bias voltages (−60
V, −100 V and −150 V) were characterized by FTIR, Raman spectroscopy and spectroscopic ellipsometry to study the variation
in the bonding and optical properties of the deposited coatings with process parameters. The mechanical properties such as
hardness and elastic modulus were measured by load depth sensing indentation technique. The DLC film deposited at −100 V bias
exhibit high hardness (∼ 19 GPa), high elastic modulus (∼ 160 GPa) and high refractive index (∼ 2·16–2·26) as compared to
films deposited at −60 V and −150 V substrate bias. This study clearly shows the significance of substrate bias in controlling
the optical and mechanical properties of DLC films. |
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Keywords: | Diamond like carbon chemical vapour deposition mechanical properties Raman spectroscopy |
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