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ZnO薄膜V族掺杂的研究进展
引用本文:朱仁江,孔春阳,马勇,王万录,廖克俊.ZnO薄膜V族掺杂的研究进展[J].材料导报,2006,20(1):113-115,125.
作者姓名:朱仁江  孔春阳  马勇  王万录  廖克俊
作者单位:重庆师范大学光学工程实验室,重庆,400047;重庆大学数理学院,重庆,400044
基金项目:重庆市科委资助项目,重庆市科委资助项目
摘    要:ZnO薄膜作为第三代半导体功能材料,高质量的p型掺杂是基于光电器件应用的关键.概述了ZnO薄膜V族元素氮、磷、砷(N、P、As)p型掺杂的研究进展,分析对比了3种元素的掺杂和p型转变特性,简单介绍了共掺杂技术,提出了有待进一步研究的问题.

关 键 词:氧化锌  p型掺杂  共掺杂  V族元素

Development of p-type ZnO Film Prepared by with Group-V Elements Doping
ZHU Renjiang,KONG Chunyang,MA Yong,WANG Wanlu,LIAO Kejun.Development of p-type ZnO Film Prepared by with Group-V Elements Doping[J].Materials Review,2006,20(1):113-115,125.
Authors:ZHU Renjiang  KONG Chunyang  MA Yong  WANG Wanlu  LIAO Kejun
Affiliation:1 Optic Engineering Laboratory, Chongqing Normal University,Chongqing 400047; 2 College of Math and Physics, Chongqing University, Chongqing 400044
Abstract:ZnO film is the third generation semiconductor functional material) whose high quality p-type doping is the key for developing optoelectronic devices. After summarizing in detail the research on p-type doping with group- V elements including N, P and As, this article describes the technology of codoping and presents some areas where more work is needed.
Keywords:ZnO  p-type doping  codoping  group- V elements
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