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Preparation and characterization of thin organosilicon films deposited on SPR chip |
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| Authors: | Sabine Szunerits Sami Abou Rich Marie-Angélique Languille Rabah Boukherroub |
| Affiliation: | a Laboratoire d’Electrochimie et de Physicochimie des Matériaux et des Interfaces (LEPMI), CNRS-INPG-UJF, 1130 rue de la piscine, BP 75, 38402 St. Martin d’Hères Cedex, France b Laboratoire de Génie des Procédés d’Interaction de Fluides Réactifs-Matériaux U.S.T.L., Cité Scientifique, 59655 Villeneuve d’Ascq, France c Institut de Recherche Interdisciplinaire (IRI), FRE CNRS 2963, Institut d’lectronique, de Microélectronique et de Nanotechnologie (IEMN), UMR CNRS-8520, Cité Scientifique, Avenue Poincaré, BP 60069, 59652 Villeneuve d’Ascq, France d Unité de Catalyse et de Chimie du Solide, UCCS UMR CNRS-8181, Université des Sciences et Technologies de Lille, Bât. C3, 59655 Villeneuve d’Ascq, France |
| Abstract: | The paper reports on the preparation and characterization of organosilicon thin polymer films deposited on glass slides coated with 5 nm adhesion layer of titanium and 50 nm of gold. The polymer was obtained by the decomposition of 1,1,3,3-tetramethyldisiloxane precursor (TMDSO) premixed with oxygen induced in a N2 plasma afterglow using remote plasma-enhanced chemical vapor deposition (PECVD) technique. The film thickness was controlled by laser interferometry and was 9 nm. The chemical stability of the gold substrate coated with the organosilicon polymer film (p-TMDSO) was studied in different acidic and basic solutions (pH 1-14). While the gold/polymer interface showed a high stability in acidic media, the film was almost completely removed in basic solutions. The resulting surfaces were characterized using atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), water contact angle measurements, cyclic voltammetry, and surface plasmon resonance (SPR). |
| Keywords: | RPECVD Organosilicon film Surface plasmon resonance E-SPR Chemical stability |
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