| 射频磁控溅射制备的ZnMgO薄膜结构和光学性能 |
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| 引用本文： | 黄秋柳.射频磁控溅射制备的ZnMgO薄膜结构和光学性能[J].上海电力学院学报,2010(7). |
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| 作者姓名： | 黄秋柳 |
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| 作者单位： | 重庆大学应用物理系;重庆大学光电技术及系统教育部重点实验室; |
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| 基金项目： | 国家自然科学基金资助项目(50975301); 重庆大学研究生创新基金资助项目(200801A1B0060265); 重庆大学“211工程”三期创新人才培养计划建设资助项目(S-09109); 重庆大学大型仪器设备开放基金资助 |
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| 摘 要： | 采用射频磁控溅射法,在石英衬底上制备了Zn1-xMgxO(x=0.00～0.16)薄膜。利用X射线衍射(XRD)、扫描电子显微镜(SEM)、紫外-可见分光光度计和光致发光(PL)光谱等分析了薄膜的结构、形貌和光学特性。结果表明:当x≤0.10时薄膜保持六角纤锌矿结构,而x=0.16时已出现MgO立方相;所有薄膜晶粒大小均匀,在100～150 nm之间;透光率在80%以上;薄膜带隙Eg与Mg含量呈线性关系;薄膜PL谱由较弱的紫外发光峰和较强的可见发光带组成,随Mg含量的增加紫外发光峰蓝移。
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| 关 键 词： | ZnMgO ZnO 晶体结构 光学性能 磁控溅射 |
Structure and optical properties of ZnMgO thin films prepared by RF magnetron sputtering |
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| HUANG Qiu-liu.Structure and optical properties of ZnMgO thin films prepared by RF magnetron sputtering[J].Journal of Shanghai University of Electric Power,2010(7). |
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| Authors: | HUANG Qiu-liu |
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| Affiliation: | Department of Applied Physics,Chongqing University,Chongqing 400044,China, |
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| Abstract: | A series of Zn1-xMgxO(x=0.00-0.16) films have been prepared on quartz substrates by RF magnetron sputtering.Several characterization techniques,including X-ray diffraction(XRD),scanning electron microscope(SEM),UV-Vis spectrophotometer,and photoluminescence measurement,have been used to investigate the crystal structure,surface morphology,and optical properties of the films,respectively.The results reveal that the obtained films with Mg content x up to about 0.1 are without phase separation;the films are un... |
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| Keywords: | ZnMgO ZnO crystal structure optical property magnetron sputtering |
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