| Ti离子注入对Al阳极氧化膜层阻抗性质的影响 |
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| 引用本文： | 田连朋,左禹,赵景茂,熊金平,张晓丰,赵旭辉.Ti离子注入对Al阳极氧化膜层阻抗性质的影响[J].金属学报,2005,41(8):804-808. |
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| 作者姓名： | 田连朋 左禹 赵景茂 熊金平 张晓丰 赵旭辉 |
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| 作者单位： | 北京化工大学材料科学与工程学院,北京,100029 |
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| 基金项目： | 国家自然科学基金项目59971005和国家重点基础研究发展规划项目G19990650资助 |
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| 摘 要： | 对L3纯Al进行了Ti离子注入与阳极氧化，用X射线光电子能谱仪（XPS）分析了阳极氧化膜层的表面成分，利用电化学阻抗谱（EIS）研究了阳极氧化膜的腐蚀行为，结果表明，Ti离子以TiO2的形式存在于Al阳极氧化膜层中，Ti离子的注入并不影响Al阳极氧化膜的非晶结构，Ti离子注入可以使Al阳极氧化膜在酸性和碱性的NaCl溶液中的阻抗参数R明显提高，参数C降低。
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| 关 键 词： | Al 阳极氧化 离子注入 电化学阻抗谱 |
| 文章编号： | 0412-1961（2005）08-0804-05 |
| 收稿时间： | 2004-11-07 |
| 修稿时间： | 2004-11-072005-04-08 |
EFFECT OF Ti ION IMPLANTATION ON THE IMPEDANCE PROPERTIES OF ANODIC OXIDE FILM ON ALUMINUM |
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| TIAN Lianpeng,ZUO Yu,Zhao Jingmao,XIONG Jinping,ZHANG Xiaofeng,ZHAO Xuhui.EFFECT OF Ti ION IMPLANTATION ON THE IMPEDANCE PROPERTIES OF ANODIC OXIDE FILM ON ALUMINUM[J].Acta Metallurgica Sinica,2005,41(8):804-808. |
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| Authors: | TIAN Lianpeng ZUO Yu Zhao Jingmao XIONG Jinping ZHANG Xiaofeng ZHAO Xuhui |
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| Abstract: | Commercial pure aluminum L3 was implanted by Ti ions and then anodic oxidation was carried out. Electrochemical impedance spectroscopy (EIS) and XPS were used to study the influences of Ti ion implantation on corrosion behavior of anodic oxide film in NaCl solution. XPS analysis revealed that Ti is present in the anodic film as TiO2. XRD proved that Ti ions implantation does not change the amorphous structure of the film. BIS showed that the implantation can improve the corrosion resistance of the anodic oxide films in acidic and basic solutions, and the parameters R and C in EIS increased and decreased, respectively. |
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| Keywords: | Al anodizing ion implantation EIS |
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