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离子层气相反应法制备CuInS2半导体薄膜
引用本文:钱进文,靳正国,邱继军,刘志锋.离子层气相反应法制备CuInS2半导体薄膜[J].硅酸盐学报,2006,34(8):937-940.
作者姓名:钱进文  靳正国  邱继军  刘志锋
作者单位:天津大学材料学院,先进陶瓷与加工技术教育部重点实验室,天津,300072
基金项目:天津市应用基础研究项目
摘    要:以CH3CH2OH为溶剂,CuCl和InCl3为反应物,H2S为硫源,用离子层气相反应法制备了CuInS2半导体薄膜.用X射线衍射、X射线光电子谱、扫描电镜和紫外-可见光谱等对薄膜的晶型、表面化学组成、表面形貌及光电性能进行了表征.分析了混合前驱体溶液中阳离子浓度比Cu]/In]对薄膜化学计量及性能的影响.Cu]/In]≥1.25时,可获得黄铜矿结构的CuInS2薄膜,其单相形成区外Cu]/In]为1.45~1.65.

关 键 词:铜铟硫薄膜  浸渍离子层气相反应  化学计量  copper-indium-sulfur  thin  film  ion  layer  gas  reaction  stoichiometry
文章编号:0454-5648(2006)08-0937-04
修稿时间:2005年11月25

PREPARATION OF CuInS2 THIN FILMS BY ION LAYER GAS REACTION
QIAN Jinwen,JIN Zhengguo,QIU Jijun,LIU Zhifeng.PREPARATION OF CuInS2 THIN FILMS BY ION LAYER GAS REACTION[J].Journal of The Chinese Ceramic Society,2006,34(8):937-940.
Authors:QIAN Jinwen  JIN Zhengguo  QIU Jijun  LIU Zhifeng
Abstract:The CuInS2 thin films were prepared by ion layer gas reaction using C2H5OH as a solvent, CuCl and InCl3 as reagents and H2S gas as sulfuration source. The structural, chemical, topographical development and the photoelectric properties of thin films were investigated by X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy and ultraviolet-visible spectroscopy. The effects of precursor solution on the stoichiometry of CuInS2 films were investigated. The results show that CuInS2 film with the complete chalcopyrite structure is obtained at Cu]/In] ≥ 1.25, and near stoichimetric CuInS2 without any segregation phases is obtained in the range of 1.45-1.65.
Keywords:copper-indium-sulfur thin film  ion layer gas reaction  stoichiometry
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