改善CVD金刚石薄膜涂层刀具性能的工艺研究

用热丝CVD法,以丙酮和氢气为碳源,在WC-Co硬质合金衬底上沉积金刚石薄膜,在分析了工艺条件(衬底温度、碳源浓度、反应压力)对金刚石薄膜性能的影响的基础上,提出了分步沉积法改善金刚石薄膜涂层刀具性能的新工艺.结果表明,合理控制工艺条件的新工艺对涂层薄膜质量、形貌和粗糙度、薄膜与衬底间的附着力、刀具的耐用度及切削性能有显著影响,对获取实用化的在硬质合金刀具基体上沉积高附着强度、低粗糙度金刚石薄膜的新技术具有重要的意义.

CVD Process for Improving Mechanical Properties of HFCVD Diamond-coated Thin Film Tools

The diamond thin films are deposited on WC-Co cemented carbide substrates by using the acetone and hydrogen as the gas source and the hot filament chemical vapor deposition(HFCVD). On the basis of the analysis of the influences of the CVD process parameters such as the substrate temperature, carbon source concentration and reaction pressure on mechanical properties of diamond-coated thin film tools, a new technical method of intermittent deposition is proposed to improve mechanical properties of HFCVD diamond-coated thin film tools. The results show that the new process for appropriately controlling deposition conditions can greatly affect the surface roughness, morphology, chemical quality, adhesion strength, tool life and the cutting performances of the diamond-coated thin film tool. It is of great significance for practical application of the new technology of intermittent deposition with the low surface roughness and high adhesion strength on the cemented carbides substrates.