| 沉积参数对磁控溅射CrN_x膜结构和性能的影响 |
| |
| 引用本文： | 李永良,Kim Sunkyu.沉积参数对磁控溅射CrN_x膜结构和性能的影响[J].现代仪器,2010,16(1). |
| |
| 作者姓名： | 李永良 Kim Sunkyu |
| |
| 作者单位： | 1. 北京师范大学分析测试中心,北京,100875
2. 蔚山大学材料工程学院,韩国蔚山 |
| |
| 摘 要： | 本文采用非平衡直流磁控溅射方法制备CrN_x薄膜,研究沉积参数对膜结构和性能的影响。结果表明沉积过程中增加N_2的分压,薄膜的组成由Cr_2N相转变成CrN相,膜的表面形貌也由胞状转化为正四面体。增加样品台的负偏压,沉积膜层更加致密,表面更加平坦。
|
| 关 键 词： | 直流磁控溅射 CrN_x膜 沉积参数 结构与性能 |
The influence of deposition parameters on structure and property of CrNX magnetron sputtering coatings |
| |
| Li Yongliang,Kim Sunkyu.The influence of deposition parameters on structure and property of CrNX magnetron sputtering coatings[J].Modern Instruments,2010,16(1). |
| |
| Authors: | Li Yongliang Kim Sunkyu |
| |
| Abstract: | In this paper,Chromium nitride (CrN_x) coatings were deposited with reactive D.C.magnetron sputtering method.The effect of surface morphology and hardness on N_2 partial pressure and bias voltage was investigated. The β-Cr_2N was found in the coatings when the gas flow ratio (Ar/N_2) was 0.2.The cubic CrN can be observed in the coatings with increasing the gas flow ratio (Ar/N_2) more than 0.5.The surface morphology becomes glazed with increasing the bias voltage to -200V. |
| |
| Keywords: | D C magnetron sputtering Chromium nitride (CrN_x) Deposition parameters Structure and property |
| 本文献已被 万方数据 等数据库收录！ |
|
