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氧化锌薄膜的阴极恒电流沉积和表征
引用本文:张永强,李成未.氧化锌薄膜的阴极恒电流沉积和表征[J].材料导报,2009,23(Z1).
作者姓名:张永强  李成未
作者单位:河南教育学院化学系,郑州,450014
基金项目:教育部留学回国人员科研启动基金 
摘    要:以铜片为阴极,采用恒电流法从硝酸锌溶液中电沉积出氧化锌薄膜.分别讨论了溶液浓度和温度对薄膜结构和组成的影响,结果表明,在低浓度和低温时将有金属锌析出.通过电化学交流阻抗对薄膜的结构进行了表征,分析表明氧化锌薄膜具有一种外层粗糙、内层致密的双层结构.

关 键 词:氧化锌薄膜  电沉积  电化学交流阻抗

Cathodic Galvanostatic Deposition and Characterization of Zinc Oxide Thin Films
ZHANG Yongqiang,LI Chengwei.Cathodic Galvanostatic Deposition and Characterization of Zinc Oxide Thin Films[J].Materials Review,2009,23(Z1).
Authors:ZHANG Yongqiang  LI Chengwei
Abstract:ZnO thin film is galvanostatically electrodeposited from an aqueous solution of Zn(NO3)2 on Cu substrate which is used as cathode.The results indicate that the structure and composition of the films are related with electrolyte concentration and solution temperature.Zn will deposite from Zn(NO3)2 at low electrolyte concentration or low solution temperature.The deposit film is composed of two layers which is rough outside and dense inside by analyzing EIS data.
Keywords:ZnO thin film  electrodeposition  EIS
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