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Effect of Pt loading on the photocatalytic reactivity of titanium oxide thin films prepared by ion engineering techniques
Authors:Masato Takeuchi  Kouichirou Tsujimaru  Kenji Sakamoto  Masaya Matsuoka  Hiromi Yamashita  Masakazu Anpo
Affiliation:(1) Osaka Prefecture University, 1dash1 Gakuendashcho, Sakai, Osaka, 599dash8531, Japan;(2) Department of Electronic Engineering, Osaka University, Yamadaoka 1dash1, Suita, Osaka, 565dash0871, Japan;(3) Human Environment Systems Development Center, Matsushita Electric Industrial Co., Ltd., Seikadashcho, Souraku, Kyoto, 619dash0237, Japan;(4) Ion Engineering Research Institute Corporation, Tsuda, Hirakata, Osaka, 573dash0128, Japan
Abstract:Platinum-loaded titanium oxide thin-film photocatalysts were prepared by using an ionized cluster beam (ICB) deposition method and a RF magnetron sputtering (RF-MS) deposition method as dry processes. From the results of the photocatalytic oxidation of acetaldehyde with O2 under UV light irradiation, small amounts of Pt loading (less than 10 nm film thickness) were found to dramatically enhance the photocatalytic reactivity. However, when TiO2 thin films were loaded with relatively larger amounts of Pt (more than 30 nm as the film thickness), the photocatalytic reactivity became lower than for the pure TiO2 thin films. Moreover, investigations of the ratio of Pt loaded onto the surface of the thin film catalysts by XPS measurements revealed that the small amounts of Pt loaded exist as very small clusters working to efficiently enhance the charge separation, whereas, large amounts of Pt covers the entire surface of the TiO2 thin films, resulting in a decrease of the photocatalytic reactivity.
Keywords:TITANIUM OXIDE THIN FILM  PHOTOCATALYTIC OXIDATION  PT LOADING EFFECT  ION  CLUSTER  BEAM  DEPOSITION  METHOD
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