强脉冲电子束引发气相沉积过程的研究

近年来,随着等离子体技术的迅速发展,等离子体化学气相沉积在微电子、超导、光纤通讯等新技术领域里被广泛用于材料表面改性,制备各种具有特殊性能的薄膜等.作者在这方面作了一些有意义的工作.本文将介绍一种类似于激光产生化学气相沉积的新手段,即在低压气体环境中,利用强脉冲电子束轰击靶物质,在衬底表面生成固体薄膜的实验结果,以及用AES,ESCA.电子显微镜等分析手段观察,探讨样品表面的化学组成和结构变化.

STUDIES OF VAPOR DEPOSITION EVAPORATED BY INTENSE PULSED-ELECTRON-BEAMS

Thin films are deposited on the surface of the substrate in room temperature. For film deposition, the intense pulsed electron beams with power densities about 10⁹W/cm² produced by a multi-plate chamber have been used to irradiate the target to create the dense plasma with energetic ions of target elements. The processes of deposition have been described. The physicochemical properties and the structures of the films have been characterized by using AES, ESOA, TEM etc.. For such a film deposition method, a variety of applications is expected.