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Patterning of organic layers using negative and positive working Top-CARL process |
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| Authors: | R Leuschner H Ahne U Marquardt U Nickel E Schmidt M Sebald and R Sezi |
| Affiliation: | aSiemens AG, Corporate Research and Development, Paul-Gossen-Strasse 100, 91052 Erlangen, Germany bFAU, Institute for Physical and Theoretical Chemistry, Egerlandstrasse 3, 91052 Erlangen, Germany |
| Abstract: | The Top-CARL process is a technique for patterning organic materials some tens of microns thick by top-resist silylation and pattern transfer via oxygen reactive ion etching. The influence of exposure dose, temperature and top-resist layer thickness on the silylation process is studied. A dyed version of the resist is examined. Its polarity can be changed from negative to positive working by addition of a small amount of a photo base. |
| Keywords: | Resist Lithography Dry development Silylation Dyed resist Photo base Polyimide |
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