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ZnO:Al绒面透明导电薄膜的制备及分析
引用本文:薛俊明,黄宇,熊强,马铁华,孙建,赵颖,耿新华.ZnO:Al绒面透明导电薄膜的制备及分析[J].太阳能学报,2007,28(7):701-705.
作者姓名:薛俊明  黄宇  熊强  马铁华  孙建  赵颖  耿新华
作者单位:1. 南开大学光电子薄膜器件与技术研究所&天津市重点实验室,光电信息技术科学教育部重点实验室,天津,300071
2. 南开大学光电子薄膜器件与技术研究所&天津市重点实验室,光电信息技术科学教育部重点实验室,天津,300071;仪器科学与动态测试教育部重点实验室,中北大学电子工程系,太原,030051
3. 河北省信息产业厅唐山无线电管理分局,唐山,063000
4. 仪器科学与动态测试教育部重点实验室,中北大学电子工程系,太原,030051
基金项目:天津市科技攻关项目;国家重点基础研究发展计划(973计划);天津市自然科学基金
摘    要:利用中频脉冲磁控溅射方法,采用Al掺杂(质量百分比2%)的Zn(纯度99.99%)金属材料为靶材制备平面透明导电ZnO:Al(ZAO)薄膜。利用湿法腐蚀方法,将平面ZAO薄膜在0.5%的稀盐酸中浸泡一定时间后,形成表面凹凸起伏的绒面结构。研究了平面ZAO薄膜的结构特性以及衬底温度、溅射功率和腐蚀时间对绒面ZAO薄膜表面形貌的影响,并对腐蚀前后薄膜的电阻变化进行了分析。结果表明:高温、低功率条件下制备的绒面ZAO薄膜表面形貌较好,在硅薄膜太阳电池中具有潜在的应用前景。

关 键 词:中频脉冲磁控溅射  ZnO:Al(ZAO)薄膜  绒面结构
文章编号:0254-0096(2007)07-0701-05
修稿时间:2006-06-19

PREPARATION AND ANALYSIS OF TEXTURE-ETCHED ZnO: Al THIN FILMS FOR SILICON THIN FILM SOLAR CELLS
Xue Junming,Huang Yu,Xiong Qiang,Ma Tiehua,Sun Jian,Zhao Ying,Geng Xinhua.PREPARATION AND ANALYSIS OF TEXTURE-ETCHED ZnO: Al THIN FILMS FOR SILICON THIN FILM SOLAR CELLS[J].Acta Energiae Solaris Sinica,2007,28(7):701-705.
Authors:Xue Junming  Huang Yu  Xiong Qiang  Ma Tiehua  Sun Jian  Zhao Ying  Geng Xinhua
Abstract:Using a Zn target with 2 wt%Al, ZnO:Al(ZAO) thin films were deposited on glass substrate by mid-frequency pulsed magnetron sputtering. Textured ZAO films were prepared by etching the smooth films in 0.5% diluted HCl. Structural properties of smooth films were investigated. The dependence of surface textured structure on temperature, power and etching time were investigated, and the resistances of ZAO films before and after etching in diluted HC1 were analyzed. The results indicated that high temperature and low power make better surface textured structure for ZAO thin films, which have the potential application foreground for silicon based thin film solar cells.
Keywords:mid-frequency pulsed magnetron sputtering  ZnO  Al thin films  textured structure
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