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定偏心和不定偏心平面研磨均匀性的研究
引用本文:赵文宏,周兆忠,文东辉,袁巨龙,郑家锦. 定偏心和不定偏心平面研磨均匀性的研究[J]. 金刚石与磨料磨具工程, 2006, 0(3): 46-49
作者姓名:赵文宏  周兆忠  文东辉  袁巨龙  郑家锦
作者单位:浙江工业大学精密工程研究中心,杭州,310014;浙江工业大学精密工程研究中心,杭州,310014;浙江工业大学精密工程研究中心,杭州,310014;浙江工业大学精密工程研究中心,杭州,310014;浙江工业大学精密工程研究中心,杭州,310014
基金项目:国家自然科学基金;浙江省青年科技人才专项基金;教育部重点实验室基金
摘    要:对修正环形抛光机定偏心和不定偏心平面研磨进行了运动分析,给出了研磨盘上一点相对于工件的速度矢量与轨迹方程,讨论了研磨盘上不同位置的点的相对轨迹。在Preston方程基础上,建立了材料去除函数和研磨均匀性函数。实验结果与理论分析表明通过设置选择适当的转速比组合,可使工件获得均匀研磨,有利于工件平面度的提高。

关 键 词:平面研磨  轨迹方程  均匀性
文章编号:1006-852X(2006)03-0046-04
修稿时间:2006-03-10

Research on the uniformity of certain and uncertain eccentricity plane lapping processes
Zhao Wenhong,Zhou Zhaozhong,Wen Donghui,Yuan Junlong,Zheng Jiajin. Research on the uniformity of certain and uncertain eccentricity plane lapping processes[J]. Diamond & Abrasives Engineering, 2006, 0(3): 46-49
Authors:Zhao Wenhong  Zhou Zhaozhong  Wen Donghui  Yuan Junlong  Zheng Jiajin
Abstract:Kinematic analysis for certain and uncertain eccentricity plane lapping processes with the ring polishing machine were studied and compared,pace vector and track equation about one point relative to examination piece on polishing pad were presented.Comparatively track of different positions on the polishing pad was discussed and can be regarded as nick on the examination piece face,the material remove function and the lapping uniformity function were deduced based on Preston equation.Theoretical analysis and simulation results show that the IC wafer substrate can be lapped uniformly and the flatness could be improved by setting proper velocity ratio.
Keywords:plane lapping  track equation  uniformity
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