| 离子氮化与物理气相沉积TiN复合处理研究 |
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| 引用本文： | 金犁,潘应君.离子氮化与物理气相沉积TiN复合处理研究[J].工具技术,2007,41(5):24-28. |
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| 作者姓名： | 金犁 潘应君 |
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| 作者单位： | 武汉科技大学,430081,武汉市 |
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| 摘 要： | 综述了PN+TiN复合处理的工艺、组织和性能之间的关系,重点讨论了复合处理过程中“黑色层”的形成及抑制,并探讨了氮化层对复合涂层的强化机理。
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| 关 键 词： | 等离子氮化 TiN 复合处理 |
| 修稿时间： | 2006-09 |
Research of Complex Coating of Plasma Nitriding and Physical Vapor Deposition TiN |
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| Jin Li,Pan Yingjun.Research of Complex Coating of Plasma Nitriding and Physical Vapor Deposition TiN[J].Tool Engineering(The Magazine for Cutting & Measuring Engineering),2007,41(5):24-28. |
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| Authors: | Jin Li Pan Yingjun |
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| Affiliation: | Jin Li Pan Yingjun |
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| Abstract: | The processes, structures and properties of the composite coatings of TiN and nitriding interlayer are discussed. The effects of nitriding interlayer is introduced. |
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| Keywords: | plasma nitriding TiN complex Processing |
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