| MPCVD法在镍基底上低温沉积石墨烯的研究 |
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| 引用本文： | 柳国松,;汪建华,;熊礼威.MPCVD法在镍基底上低温沉积石墨烯的研究[J].真空与低温,2014(4):224-229. |
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| 作者姓名： | 柳国松 ;汪建华 ;熊礼威 |
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| 作者单位： | [1]武汉工程大学等离子体化学与新材料重点实验室,湖北武汉430073; [2]中国科学院等离子体物理研究所,安徽合肥230031 |
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| 基金项目： | 国家自然科学基金项目：11175137/A050610 |
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| 摘 要： | 石墨烯是具有优异性能的二维碳材料。采用微波等离子体化学气相沉积法（MPCVD），以甲烷和氢气为气源，在镍基底上生长石墨烯薄膜，沉积温度在650℃附近。对制备石墨烯薄膜用金相显微镜、原子力显微镜观察其覆盖率和表面形貌，用拉曼光谱仪对沉积薄膜的层数、质量和非晶碳含量进行表征。研究结果表明氢等离子体对表面碳键有明显刻蚀，产生空隙和晶界缺陷；甲烷含量的升高提高了膜层的覆盖率，也促进非晶碳的生成；气压较低时膜层覆盖率较低，较高时膜层厚度明显增加。
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| 关 键 词： | MPCVD 石墨烯 镍基 |
LOW TEMPERATURE DEPOSITION GRAPHENE ON NICKEL SUBSTRATE USING MPCVD |
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| Affiliation: | LIU Guo-song ,WANG Jian-hua ,XIONG Li-wei ( 1. Key Laboratory of Plasma Chemistry and Advanced Materials, Wuhan Institute of Technology ,Wuhan Huibei 430073,China; 2. Institute of Plasma Physics , Chinese Academy of Sciences,Hefei Anhui 230031,China) |
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| Abstract: | Graphene is a two-dimensional carbon material with excellent properties. Taking methane and hydrogen as gas sources, the growth of graphene films is implemented on a nickel substrate by MPCVD. The fraction of coverage and surface morphology of the prepared graphene films are observed by metallographic and atomic force microscopy（AFM）, the layer numbers, quality and amorphous carbon content are analyzed by Raman spectroscopy. The results show that the ventilation of hydrogen has a significant etching effect on the carbon-carbon bond, causing voids and grain boundary de- fects; the increase of methane content can improve the coverage rate of the film, which also promotes the generation of amorphous carbon; the coverage rate is low when the atmosphere is relatively lower, and it increased significantly when the atmosphere is higher. |
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| Keywords: | MPCVD graphene nickel substrate |
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