氧气流量对反应磁控溅射铜氧化物薄膜结构和光学性质的影响

反应磁控溅射方法在玻璃基片上沉积铜氧化物薄膜,研究氧气流量对薄膜结构和光学性质的影响.用X射线衍射仪检测薄膜的结构,分光光度计测量薄膜的透射和反射光谱,采用拟合正入射透射光谱数据的方法计算薄膜的折射率、消光系数及厚度.结果表明,薄膜沉积过程中,随着氧气流量的增加,铜氧化生成物从Cu2O逐步过渡到Cu4O3,最后为CuO;当氧氩流量比为6：25时,生成单相多晶结构的Cu2O薄膜,薄膜的折射率和消光系数随波长增加而减小,带隙为2.49 eV;不同氧气流量条件下制备的Cu2O,CuO薄膜的折射率和消光系数随氧流量的增加而增加.

Effects of Oxygen Flow Rate on the Structural and Optical Properties of Copper Oxide Films Deposited by DC Reactive Magnetron Sputtering

Copper oxide films were deposited on glass substrates by DC reactive magnetron sputtering with various oxygen flows rates.The structure and optical properties of the films were studied by X-ray diffractometer,double-beam spectrophotometer,respectively.The optical constants and thicknesses of the films were obtained from the simulation of normal incidence transmittance.The results show that the copper oxide changes from Cu2O to Cu4O3 and CuO as the oxygen flow rate increases from 6 to 9 and 12 sccm.When the rate of oxygen flow rate to Ar flow rate is 6：25,the film is Cu2O and optical band gap is 2.49 eV,and the optical constants decrease with increasing wavelength.The refractive index and extinction coefficient increase with the increase of oxygen flow rate.