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Various image processing applications exploit a model of the human visual system (HVS). One element of HVS-models describes the masking-effect, which is typically parameterized by psycho-visual experiments that employ superimposed sinusoidal stimuli. Those stimuli are oversimplified with respect to real images and can capture only very elementary masking-effects. To overcome these limitations a new psycho-visual test method is proposed. It is based on natural scenery stimuli and operates in the wavelet domain. The collected psycho-visual data is finally used to evaluate the performance of various masking models under conditions as found in real image processing applications like compression. 相似文献
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SUN Yu-hong 《数字社区&智能家居》2008,(11)
在网页上发布Banner广告已经成为商家必不可少的广告手段。本文介绍了一个解决Banner广告容量小、使用周期短的方案,并从软件工程的角度详细论述了实现方法。 相似文献
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Thomas I. Goss 《技术计量学》2013,55(2):178-179
With the Box–Cox transformation, one or a few responses can greatly influence the transformation parameter estimate. To detect influential observations, several diagnostics have been suggested. We highlight the importance of multiple case deletion, especially when the masking effect is present, and derive an analytic expression for Tsai and Wu's diagnostic. 相似文献
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We introduce a very general “forward” method of data analysis that starts from a small, robustly chosen subset of the data and shows the effect of adding observations by a forward search. Powerful diagnostic procedures result: The observations are ordered by their agreement with the proposed transformation, masking is overcome, and the inferential effect of each observation is clear. We apply the resulting method to the transformation of both univariate and multivariate data. Other applications of the forward search are mentioned. 相似文献
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SiO2 and Si3N4, are usually used to mask the selected portions during etching of silicon in anisotropic etchants like KOH but polymers are expected to be very good alternative to SiO2 and Si3N4 as masking materials for MEMS applications. An adherent spin coated PMMA layer is reported to work as a mask material. It is a low temperature process, cheaper and films can be easily deposited and removed. One of the problems in its use is its adhesion to the substrate. Our previous experience in the field made us feel that sputtered PMMA will act as better mask because of its better adhesion to silicon. In the present article, a comparative study of spin coated PMMA with sputtered PMMA as an etch mask for silicon micromachining is reported. Structural and adhesive characteristics of the films are determined and compared with those available in the literature. These films deposited on silicon wafer were exposed to anisotropic etchant, KOH, to estimate the masking behavior. The maximum masking time of 32 min in 20 wt.% KOH at 80 °C was obtained for spin coated PMMA samples, which were prebaked at 90 °C. Masking time of sputter deposited PMMA films was found to be 300 min under similar conditions such as 20 wt.% KOH at 80 °C. This masking time is sufficient for fabrication of various MEMS structures, thus indicating candidature of sputtered PMMA as masking material. Various properties of the films are discussed and compared with the ones obtained through literature. 相似文献
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在激烈的市场竞争下,钢板板型的质量已经成为厚板板材的重要指标。本文对MULPIC区域头尾、边部遮挡控制功能进行了阐述,对提高厚板生产产品性能具有重要价值。 相似文献
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The identification of contaminated observations or outliers is an important part of data analysis since such observations can have a profound influence and distort the analysis. One simple graphical method, based on the box-plot, consists of constructing fences. The fences method is not only appealing in its simplicity but more importantly because it does not use the extreme potential outliers which can inflate the computing of a measure of dispersion and hence lessen the sensitivity for identifying outliers. The commonly used fences procedure may be too liberal in some situations and too conservative in others. That is, it sets one criteria for all scenarios and does not afford the data analyst the flexibility of specifying the probability or criterion for designating an observation as an outlier in a variety of circumstances. Furthermore, the most commonly used procedure is a “one size fits all” style and does not incorporate sample size. Unfortunately, a value that is extreme in a small data set might be expected in a much larger sample. In this paper, a method is proposed to include sample size in constructing fences as well as a sequential procedure to identify multiple outliers at a specified probability. 相似文献
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Several widely used tests for outlying observations are reviewed. Problems of repeated application and “masking” are described. Suggested as appropriate to over-come these problems are two new statistics: Lk which is based on the k largest (observed) values and Ek which is based on the k largest (in absolute value) residuals. Tables of approximate critical values for these statistics are given for 0.01, .025,0.05, and 0.10 levels of significance and for sample size n = 3 (1) 20 (5) 50. 相似文献