Effect of Co,Pd and Pt ultra-thin films on the Ni-silicide formation: investigating the sandwich configuration

The effect of Co, Pd and Pt ultrathin films on the kinetics of the formation of Ni-silicide by reactive diffusion is investigated. 50 nm Ni/1 nm X/ 50 nm Ni (X?=?Co, Pd, Pt) deposited on Si(100) substrates are studied using in-situ and ex-situ measurements by X-ray diffraction (XRD). The presence of Co, Pd or Pt thin films in between the Ni layers delays the formation of the metal rich phase compared to the pure Ni/Si system and thus these films act as diffusion barriers. A simultaneous silicide formation (δ-Ni₂Si and NiSi phases) different from the classic sequential formation is found during the consumption of the top Ni layer for which Ni has to diffuse through the barrier. A model for the simultaneous growth in the presence of a barrier is developed, and simulation of the kinetics measured by XRD is used to determine the permeability of the different barriers. Atom probe tomography (APT) of the Ni/Pd/Ni system shows that the Pd layer is located between the Ni top layer and δ-Ni₂Si during the silicide growth, in accordance with a silicide formation controlled by Ni diffusion through the Pd layer. The effect of the barrier on the silicide formation and properties is discussed.

     

Multihead attention mechanism guided ConvLSTM for pixel-level segmentation of ocean remote sensing images

Multimedia Tools and Applications - Semantic segmentation of ocean remote sensing images classifies each pixel in the image according to the ocean background and island type, and is an important...     

Measuring the disparity among scientific disciplines using Library of Congress Subject Headings

Scientometrics - Examining the relationships among scientific disciplines is important today, but existing methods are limited by the contents and structure of their bibliographic databases. We...     

Ferulic acid and EGCG alter the structural characteristics of ovalbumin and its application in mineral loading

This study aims to fabricate mineral-loading nanocarriers using natural materials. The interaction patterns between ovalbumin (OVA) and four water-soluble polyphenols, namely ferulic acid (FA), (-)-Epigallo-catechin 3-gallate (EGCG), gallic acid (GA) and epicatechin (EC), were investigated. Results showed that the optimised conditions for preparing stable OVA–polyphenol complexes are at the OVA–polyphenol ratio of 4:1 at pH 6, under which OVA–FA and OVA–EGCG showed the highest stability and mineral-loading capacity among four OVA–polyphenol complexes. The fluorescence results indicated that the addition of EGCG and FA induced a significant fluorescence quenching to OVA. The interaction between OVA and polyphenols involved hydrogen bonding, hydrophobic interaction and electrostatic interaction. Fourier transform infrared spectroscopy (FTIR) analysis suggested that both FA and EGCG enhanced the stability and orderliness of the structure of OVA. The transmission electron microscopy images also exhibited the spherical structure of OVA after the addition of FA and EGCG. Furthermore, scanning electron microscope–energy dispersive X-ray spectrum results suggested that OVA–FA and OVA–EGCG complexes were better mineral carriers than OVA–GA and OVA–EC. This study may serve as the theoretical support for the promising application of OVA in the fabrication of mineral-loading nanocarriers in functional food and pharmaceutic.