Plasma Discharge Initiation of Explosives in Rock Blasting Application： A Case Study

A plasma discharge initiation system for the explosive volumetric combustion charge was designed, investigated and developed for practical application. Laboratory scale experiments were carried out before conducting the large scale field tests. The resultant explosions gave rise to less noise, insignificant seismic vibrations and good specific explosive consumption for rock blasting. Importantly, the technique was found to be safe and environmentally friendly.     

Fuel combustion test in constant volume combustion chamber with built-in adaptor

Combustion tests of pre-mixture of methane and air in constant volume combustion chamber(CVCC) have been carried out by means of flame propagation photo and gas pressure measurement,the effects of CVCC body temperature,intake pressure of pre-mixture of methane and air,equivalence ratio and location of the built-in adaptor have been investigated.The whole combustion chamber can be divided into two parts,i.e.the upper combustion chamber and the lower combustion chamber,by the built-in adaptor with through hol...     

Effective parameters on diameter of carbon nanotubes by plasma enhanced chemical vapor deposition

The effective parameters on the diameter of carbon nanotubes (CNTs) by plasma enhanced chemical vapor deposition (PECVD) were presented.Among lots of influential parameters,the effects of the catalytic film thickness and the pretreatment plasma power on the growth of CNTs were investigated.The results show that the size of catalytic islands increases by increasing the thickness of catalytic layer,but the density of CNTs decreases.The pretreatment duration time of 30 s is the optimal condition for growing CNTs with about 50 nm in diameter.By increasing the pretreatment plasma power,the diameter of CNTs decreases gradually.However,the diameter of CNTs does not change drastically from 80 to 120 W.The uniformly grown CNTs with the diameter of 50 nm are obtained at the pretreatment plasma power of 100 W.     

Hybrid functional IrO_2-TiO_2 thin film resistor prepared by atomic layer deposition for thermal inkjet printheads

IrO2-TiO2 thin films were prepared by atomic layer deposition using Ir(EtCp)(COD) and titanium isopropoxide (TTIP). The resistivity of IrO2-TiO2 thin films can be easily controlled from 1 500 to 356.7 μΩ·cm by the IrO2 intermixing ratio from 0.55 to 0.78 in the IrO2-TiO2 thin films. The low temperature coefficient of resistance(TCR) values can be obtained by adopting IrO2-TiO2 composite thin films. Moreover, the change in the resistivity of IrO2-TiO2 thin films was below 10% even after O2 annealing process at 600 °C. The step stress test results show that IrO2-TiO2 films have better characteristics than conventional TaN0.8 heater resistor. Therefore, IrO2-TiO2 composite thin films can be used as a heater resistor material in thermal inkjet printhead.     

~(27)Al MAS-NMR study of inorganic polymer formation at ambient temperature

Inorganic polymers are a novel class of materials formed by the polymerization of silicon, aluminium and oxygen species to form an amorphous three-dimensional framework structure. The basis of this process is the alkaline solutions to induce a certain amount of Si and Al atoms to dissolve from a feedstock such as aluminosilicate. A study of 27Al MAS-NMR was carried out in an attempt to understand the reaction mechanism of the inorganic polymerization at ambient temperature. Scanning electron microscopy (SEM) and X-ray diffractometry (XRD) were also employed to establish the composition and microstructure of the inorganic polymerization. Specimens were prepared with different Al/Si mole ratios from the starting materials. The higher the Al content, the more sufficient the Al atoms that can combine with SiO4, and the longer the reaction time, the more the bonded Si—O—Al—O polymer structure, and then the higher the Al content, the fewer the octahedral Al with a uniform Si—O—Al—O structure in four directions, because four Al atoms are combined with SiO4, resulting in a uniform Si—O—Al—O structure in four directions. The results show that they have an amorphous microstructure.     

Microstructure and properties of alumina-silicon carbide nanocomposites fabricated by pressureless sintering and post hot-isostatic pressing

Al₂O₃/5%SiC nanocomposites were fabricated by pressureless sintering using MgO as a sintering aid and then post hot-isostatic pressed (HIP), which can subsequently break through the disadvantage of hot-pressing process. The MgO additive was able to promote the densification of the composites, but could not induce the grain growth of Al₂O₃ matrix due to the grain growth inhibition by nano-sized SiC particles. After HIP treatment, Al₂O₃/SiC nanocomposites achieved full densification and homogeneous distribution of nano-sized SiC particles. Moreover, the fracture morphology of HIP treated specimens was identical with that of the hot-pressed Al₂O₃/SiC nanocomposites showing complete transgranular fracture. Consequently, high fracture strength of 1 GPa was achieved for the Al₂O₃/5%SiC nanocomposites by pressureless sintering and post HIP process.