Enhanced photoelectric properties of PbSnSe thin films via quick oxygen ion-implantation sensitization

Journal of Materials Science - Although chalcogenide materials continue to generate considerable interest due to great potentials for various optoelectronic devices, annealing for a long time in...     

Detection of crowdedness in bus compartments based on ResNet algorithm and video images

Multimedia Tools and Applications - The crowding in bus is an important factor affecting passenger satisfaction and bus dispatching level. However, how to use video images to detect crowding...     

用于射频滤波器的LN单晶薄膜XBAR的性能研究

基于铌酸锂(LN)薄膜的横向激发体声波谐振器(XBAR)能够兼具大机电耦合系数(K²)和高谐振频率(f)特性，有望满足5G应用的频段要求。然而，常规LN薄膜单层XBAR结构的温度稳定性较差，频率温度系数(TCF)较低。该文提出一种具有SiO₂温度补偿层的SiO₂/LN双层结构XBAR，并建立了精确分析层状结构XBAR的有限元模型。理论分析表明，该双层结构XBAR上激励的主模式是一阶反对称(A1)兰姆波。通过合理优化结构参数配置，能够获得高谐振频率(f~4.75 GHz)和大机电耦合系数(K²~8%)，同时其温度稳定性也得到显著改善(TCF~-36.1×10^-6/℃)，相较于单层XBAR结构提高了近70×10^-6/℃，这为研制温补型高频、大带宽声学滤波器提供了理论基础。     

Resource management in UAV-assisted MEC: state-of-the-art and open challenges

Wireless Networks - Unmanned aerial vehicles (UAV) have been widely used in various fields because of their high mobility and portability. At the same time, due to the rapid development of...     

VO2/GaAs异质结的制备及其光电特性研究

采用直流磁控溅射和后退火氧化工艺在p型GaAs单晶衬底上成功制备了n-VO_2/pGaAs异质结,研究了不同退火温度和退火时间对VO_2/GaAs异质结性能的影响,并分析其结晶取向、化学组分、膜层质量以及光电特性。结果表明,在退火时间2 h和退火温度693 K下能得到相变性能最佳的VO_2薄膜,相变前后电阻变化约2个数量级。VO_2/GaAs异质结在308 K、318 K和328 K温度下具有较好的整流特性,对应温度下的阈值跳变电压分别为6.9 V、6.6 V和6.2 V,该结果为基于VO_2相变特性的异质结光电器件的设计与应用提供了可行性。