Frequency dependence of plasma characteristics at different pressures in cylindrical inductively coupled plasma source

The effects of driving frequency on plasma parameters and electron heating efficiency are studied in cylindrical inductively coupled plasma (ICP) source. Measurements are made in an Ar discharge for driving frequency at 13.56/2 MHz, and pressures of 0.4–1.2 Pa. In 13.56 MHz discharge, higher electron density (n_e) and higher electron temperature (T_e) are observed in comparison with 2 MHz discharge at 0.6–1.2 Pa. However, slightly highern_e andT_e are observed in 2 MHz discharge at 0.4 Pa. This observation is explained by enhanced electron heating efficiency due to the resonance between the oscillation of 2 MHz electromagnetic field and electron-neutral collision process at 0.4 Pa. It is also found that the variation ofT_e distribution is different in 13.56 and 2 MHz discharge. For ICP at 13.56 MHz, T_e shows an edge-high profile at 0.4–1.2 Pa. For 2 MHz discharge,T_e remains an edge-high distribution at 0.4–0.8 Pa. However, the distribution pattern involves into a center-high profile at 0.9–1.2 Pa. The spatial profiles ofn_e remain a center-high shape in both 13.56 and 2 MHz discharges, which indicates the nonlocal kinetics at low pressures. Better uniformity could be achieved by using 2 MHz discharge. The effects of gas pressure on plasma parameters are also examined. An increase in gas pressure necessitates the rise ofn_e in both 13.56 and 2 MHz discharges. Meanwhile, T_e drops when gas pressure increases and shows a flatter distribution at higher pressure.     

同轴枪脉冲放电等离子体特性及其轴向输运速度分析

高密度、高速度等离子体的喷射源(同轴枪装置)是强流脉冲放电装置的热点。为此,实验研究了同轴枪放电装置产生的等离子体特性,以及不同参数下等离子体轴向的输运速度。通过对等离子体的光学与电学诊断,发现由同轴枪喷出的等离子体具有一定体积,并且该等离子体的电学特性以及轴向速度的大小受电压与气压等参数的影响较大。在固定气压下,放电电流以及等离子体轴向输运速度会随着电压的增加而增大;而在固定电压下,放电电流在气压增大时几乎不变,但等离子体轴向输运速度随着气压的增大而减小。此外,实验中均出现了多次放电的现象。     

Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source

Experimental results of a direct current enhanced inductively coupled plasma (DCE-ICP) source which consists of a typical cylindrical ICP source and a plate-to-grid DC electrode are reported.With the use of this new source,the plasma characteristic parameters,namely,electron density,electron temperature and plasma uniformity,are measured by Langmuir floating double probe.It is found that DC discharge enhances the electron density and decreases the electron temperature,dramatically.Moreover,the plasma uniformity is obviously improved with the operation of DC and radio frequency (RF) hybrid discharge.Furthermore,the nonlinear enhancement effect of electron density with DC + RF hybrid discharge is confirmed.The presented observation indicates that the DCE-ICP source provides an effective method to obtain high-density uniform plasma,which is desirable for practical industrial applications.     

Effects of direct current discharge on the spatial distribution of cylindrical inductively-coupled plasma at different gas pressures

Stable operations of single direct current(DC) discharge, single radio frequency(RF) discharge and DC?+?RF hybrid discharge are achieved in a specially-designed DC enhanced inductivelycoupled plasma(DCE-ICP) source. Their plasma characteristics, such as electron density,electron temperature and the electron density spatial distribution profiles are investigated and compared experimentally at different gas pressures. It is found that under the condition of single RF discharge, the electron density distribution profiles show a ‘convex' shape and ‘saddle' shape at gas pressures of 3 m Torr and 150 m Torr respectively. This result can be attributed to the transition of electron kinetics from nonlocal to local kinetics with an increase in gas pressure.Moreover, in the operation of DC?+?RF hybrid discharge at different gas pressures, the DC discharge has different effects on plasma uniformity. The plasma uniformity can be improved by modulating DC power at a high pressure of 150 m Torr where local electron kinetics is dominant,whereas plasma uniformity deteriorates at a low pressure of 3 m Torr where nonlocal electron kinetics prevails. This phenomenon, as analyzed, is due to the obvious nonlinear enhancement effect of electron density at the chamber center, and the inherent radial distribution difference in the electron density with single RF discharge at different gas pressures.