Low-frequency noise characteristics in the MOSFETs processed in 65 nm technology

Low-frequency noise behavior in the MOSFETs processed in 65 nm technology is investigated in this paper. Low-frequency noise for NMOS transistors agrees with McWhorter''s theory (carrier number fluctuation), low-frequency noise in the sub-threshold regime agrees with McWhorter''s theory for PMOS transistors while it agree with Hooge''s theory (carrier mobility fluctuation) in the channel strong inversion regime. According to carrier number fluctuation model, the extracted trap densities near the interface between channel and gate oxide for NMOS and PMOS transistor are 3.94×10¹⁷ and 3.56×10¹⁸ cm^-3/eV respectively. According to carrier mobility fluctuation model, the extracted average Hooge''s parameters are 2.42×10^-5 and 4×10^-4. By consideration of BSIM compact model, it is shown that two noise parameters (NOIA and NOIB) can model the intrinsic channel noise. The extracted NOIA and NOIB are constants for PMOS and their values are equal to 3.94×10¹⁷ cm^-3/eV and 9.31×10^-4 V^-1. But for NMOS, NOIA is also a constant while NOIB is inversely proportional to the effective gate voltage. The extracted NOIA and NOIB for NMOS are equal to 3.56×10¹⁸ cm^-3/eV and 1.53×10^-2 V^-1. Good agreement between simulation and experimental results is achieved.     

固体电解质钽电容器介质膜晶化机理及其失效分析

从场致晶化和热致晶化的角度对固体电介质钽电容器介质膜晶化现象和机理进行了讨论,并结合CA45-H-35V-470μF固体电解质钽电容器的失效分析对介质膜晶化引起电容器失效进行了进一步的说明.采用筛选、物理分析和降额使用的方法,可有效避免介质膜晶化引起的钽电解电容器失效.