(Bi,Yb)4Ti3O12薄膜退火研究

采用溶胶-凝胶旋涂法在Pt(111)/Ti/SiO2/Si(100)基底上成功地沉积出(Bi,Yb)4Ti3O12[Bi3.4Ybo.6Ti3O12,BYT]铁电薄膜.系统地研究了退火温度对BYT铁电薄膜的晶体结构、表面形貌以及铁电性能(剩余极化强度)的影响.揭示了退火温度对BYT薄膜的晶体结构、表面形貌以及铁电性能有着明显的影响,给出了最佳退火温度为700℃左右.     

热解温度对镧、锰共掺杂铁酸铋薄膜铁电性能的影响(英文)

在不同热解温度下,采用溶胶-凝胶法在Pt/Ti/SiO2/Si衬底上制备镧、锰共掺杂铁酸铋铁电薄膜Bi0.9La0.1Fe0.95Mn0.05O3(BLFMO)。利用热失重仪(TGA)分析BLFMO原粉的质量损失,用 X 射线衍射仪(XRD)和原子力显微镜(AFM)分析 BLFMO 薄膜的晶体结构和表面形貌。在热解温度为420℃时,得到BLMFO薄膜的剩余极化值为21.2μC/cm2,矫顽场为99 kV/cm,漏电流密度为7.1×10-3 A/cm2,说明薄膜在此热解温度下具有较好的铁电性能。     

Effect of annealing temperature on ferroelectric properties of （Bi, Nd）4（Ti, V）3O12 thin films

Thin films of Nd^3＋/V^5＋-cosubstituted bismuth titanate, （Bi3.sNd0.5）（ Ti2.96V0.04）O12 （BNTV）, were fabricated on the Pt（111）/Ti/SiO2/Si（100） substrates by a chemical solution deposition technique and annealed at different temperatures of 650, 700, 750 and 800 ℃. The surface morphology and ferroelectric properties of the samples were studied in detail. The result shows that the film annealed at 800 ℃ indicates excellent ferroelectricity with a remanent polarization of 2Pr=40.9 i.tC/cm^2, a coercive field （Ec） of 114 kV/cm at an applied electrical field of 375 kV/cm. The substitution of Ti-site ion by V^5＋ ions could improve the upper limit of the optimal annealing temperature by decreasing the space charge density in BNT thin film. Additionally, the mechanism concerning the dependence of ferroelectric properties of BNTV thin films on the annealing temperature was discussed.     

Bi_(3.5)Yb_(0.5)Ti_3O_(12)铁电薄膜的制备及性能

采用溶胶-凝胶(Sol-Gel)法在Pt(111)/Ti/SiO2/Si(100)基片上淀积了Bi3.5Yb0.5Ti3O12(BYT)铁电薄膜,研究了在不同退火温度下形成的BYT薄膜的微观结构以及铁电性能方面的区别。结果发现,在610,660,710和760℃不同温度下退火的BYT薄膜的结晶度不同,退火温度越高的BYT薄膜,其结晶度越高。并且发现,BYT薄膜的剩余极化值(2Pr)在710℃以下随退火温度增高而增大,在710℃达到最大;在外加400kV/cm电场时2Pr为36.7μC/cm2,然后随退火温度上升又有所下降。     

预退火气氛对BDT铁电薄膜性能的影响

介绍了溶胶-凝胶法制备掺Dy元素的Bi4Ti3O12(Bi3.4Dy0.6Ti3O12,BDT)薄膜的工艺过程,并研究了不同预退火气氛对沉积在Pt/Ti/SiO2/Si基片上的BDT薄膜铁电性能的影响。空气中的预退火,薄膜中的H,C等有机成分分解不彻底,有部分残留在薄膜中;而O2气氛下的预退火,由于O2充足,薄膜中的有机成分可以完全分解。退火过程中BDT薄膜晶粒的生长和取向可以受到残留的有机成分的影响,进而对BDT薄膜的铁电性有较为显著的影响。在外加400kV/cm的电场时,空气中预退火的BDT薄膜的剩余极化(2Pr)值和矫顽场(Ec)分别为26.37μC/cm2和114.2kV/cm,而O2气氛下预退火的BDT薄膜的2Pr和Ec分别为36.28μC/cm2和113.6kV/cm,表明O2气氛下预退火可显著提高BDT薄膜的剩余极化值,改善其铁电性能。     

Ferroelectric properties of dysprosium-doped Bi4Ti3O12 thin films crystallized in various atmospheres

Dysprosium-doped Bi4Ti3O12 （Bi3.4Dy0.6Ti3O12, BDT） ferroelectric thin films were deposited on Pt（111）/Ti/SiO2/Si（111） substrates by chemical solution deposition （CSD） and crystallized in nitrogen, air and oxygen atmospheres, respectively. X-ray diffraction （XRD） and scanning electron microscopy （SEM） were used to identify the crystal structure, the surface and cross-section morphology of the deposited ferroelectric films. The results show that the crystallization atmosphere has significant effect on determining the crystallization and ferroelectric properties of the BDT films. The film crystallized in nitrogen at a relatively low temperature of 650 ℃, exhibits excellent crystallinity and ferroelectricity with a remanent polarization of 2Pr = 24.9 ℃/cm^2 and a coercive field of 144.5 kV/cm. While the films annealed in air and oxygen at 650 ℃ do not show good crystallinity and ferroelectricity until they are annealed at 700 ℃. The structure evolution and ferroelectric properties of BDT thin films annealed under different temperatures （600-750 ℃） were also investigated. The crystallinity of the BDT films is improved and the average grain size increases when the annealing temperature increases from 600 ℃ to 750 ℃ at an interval of 50 ℃. However, the polarization of the films is not monotonous function of the annealing temperature.     

(Bi,Yb)4Ti3O12铁电薄膜的制备

采用稀有金属镱元素对钛酸铋进行掺杂,以期获得性能较好的(Bi,Yb)4Ti3O12铁电薄膜.采用溶胶-凝胶旋涂法在p型Si(100)基底上成功地沉积出(Bi34,Yb06)Ti3O12[BYT]铁电薄膜.用X射线衍射法对其结构及其成份进行了表征,用铁电分析仪(RT66A)测试了其铁电性.并就影响BYT薄膜铁电性能的因素进行了分析.