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本文介绍了Ga-AsCl_3-H_2体系,研究了气相外延时硫的掺杂行为,讨论了硫的掺杂机理和生长了亚微米薄层。制得的亚微米外延层的质量表明,表面形貌良好,缺陷少,重复性好。典型的电学性质为:当厚度≤0.4μm和浓度为1—2×10~(17)/cm~3时,击穿电压V_B=7—10V。在单层和多层外延结构中,界面浓度基本是突变的,过渡区约0.1μm。这些外延片已用于制备变容管和远红外探测器等。 相似文献
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Submicrometer epilayers have been grown in Ga-AsCl_3-H_2 system using elemental sulfur as adopant.The mechanism of sulfur incorporation was discussed on the basis of surface adsorption.Ithas been shown that the electrical properties of single epilayers are typically n=1-2×10~(17)/cm~3,thick-ness 0.4 μm and breakdown voltage about 7—10V.The width of interface region in single andmultilayer structures is about 0.1μm.The epilayers obtained have been used to fabricate the microwave devices,such as Gunn diodes,varactors,and far infrared detectors. 相似文献
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