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Shivakumar Raman Ph.D. Assistant Professor Kaushal Panchal Graduate Research Assistant P.Simin Pulat Ph.D. Assistant Professor 《Computers & Industrial Engineering》1991,21(1-4):67-71
Tolerances are basic to the production of every part. This is because perfect parts cannot be produced with existing processes and machines. The determination of tolerances for the individual parts of a functional assembly is critical, but not trivial. Numerous approaches are suggested in past literature for (analytical) tolerance allocation. With the advent of total automation, more attempts are being made to computerize manual design tasks. Tolerance design, assignment and allocation can also be fully automated if the assembly function can be estimated by the computer.
In the present paper, an attempt is made to computerize tolerance assignment. A simple example of a two piece assembly, viz., a fit, is used to demonstrate the developed methodology. A feature extraction is first performed from both detail and assembly drawings. Then, probable assembly interfaces are determined using a rule based procedure. Consequently, tolerances are assigned to the basic dimensions of each feature and to the assembly interfaces using a tolerance database and user interaction. More complex analysis for tolerance allocation is also under study. 相似文献
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Bera L.K. Ray S.K. Mukhopadhyay M. Nayak D.K. Usami N. Shiraki Y. Maiti C.K. 《Electron Device Letters, IEEE》1998,19(8):273-275
Growth of ultrathin (<100 Å) oxynitride on strained-Si using microwave N2O and NH3 plasma is reported. X-ray photoelectron spectroscopy (XPS) results indicate a nitrogen-rich layer at the strained-Si/SiO2 interface. The electrical properties of oxynitrides have been characterized using a metal-insulator-semiconductor (MIS) structure. A moderately low value of insulator charge density (6.1×1010 cm-2) has been obtained for NH3 plasma treated N2O oxide sample. Nitrided oxide shows a larger breakdown voltage and an improved charge trapping properties under Fowler-Nordheim (F-N) constant current stress 相似文献
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In the present investigation a higher-order shear deformation theory and the conventional first-order theory are used to develop a finite element method to analyse accurately the bending and free vibration behaviour of laminated composite beams, using nine-noded isoparametric elements. The higher-order theory assumes all the displacement components, u, v and w, which contain variation up to a cubic power of z. The effects of various parameters such as fibre orientation, stacking sequence, span-to-thickness ratio and support condition on the non-dimensionalised deflections, stresses and fundamental frequencies are investigated. Cases where only the higher-order theory is likely to yield accurate results are highlighted. 相似文献
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Furnace grown gate oxynitride using nitric oxide (NO) 总被引:4,自引:0,他引:4
Okada Y. Tobin P.J. Reid K.G. Hegde R.I. Maiti B. Ajuria S.A. 《Electron Devices, IEEE Transactions on》1994,41(9):1608-1613
Gate oxynitride was grown in NO for the first time. This approach can provide a tight N accumulation near the Si/SiO2 interface. Much lower thermal budget is required for an NO process than for an N2O process to produce an oxynitride with useful properties. Submicron MOSFET's with NO oxynitride showed superior current drive characteristics and comparable hot carrier immunity to those with N2O oxynitride 相似文献
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In this paper we report the evolution of the polar cluster like behavior with the incorporation of Ti4+ ion in BaZrO3 Ceramics. Dielectric behavior of BaZrxTi(1−x)O3 (x = 1.00, 0.95, 0.90, 0.85) ceramics is studied in the temperature range from 300 to 30 K. Polar cluster like behavior becomes more prominent with the increase in content of Ti4+ ion. The dielectric relaxation is analyzed by Vogel–Fulcher relation and Arrhenius law. Frequency dependence of dielectric constant and low loss tangent of these materials can be useful for the potential applications at low temperature. 相似文献