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101.
Annealing effects of a high-quality ZnTe substrate 总被引:1,自引:0,他引:1
Kenji Yoshino Minoru Yoneta Kenzo Ohmori Hiroshi Saito Masakazu Ohishi Takayuki Yabe 《Journal of Electronic Materials》2004,33(6):579-582
The sharp photoluminescence (PL) and optical-reflection spectra in the bandedge region of the high-quality nondoped ZnTe substrate
(100) were observed at 4.2 K. Free exciton, associated with lower and upper polaritons (EXL and EXU) at 2.382 eV and 2.381 eV, respectively, were clearly observed. This meant that this substrate was high quality. The intensity
of a bound exciton peak (2.375 eV), which is caused by a Zn vacancy, of a neutral acceptor decreased with an increase of the
Zn vapor pressures. 相似文献
102.
Molecular beam epitaxy growth of high-quality HgCdTe LWIR layers on polished and repolished CdZnTe substrates 总被引:2,自引:0,他引:2
R. Singh S. Velicu J. Crocco Y. Chang J. Zhao L. A. Almeida J. Markunas A. Kaleczyc J. H. Dinan 《Journal of Electronic Materials》2005,34(6):885-890
We report here molecular beam epitaxy (MBE) mercury cadmium telluride (HgCdTe) layers grown on polished and repolished substrates
that showed state-of-the-art optical, structural, and electrical characteristics. Many polishing machines currently available
do not take into account the soft semiconductor materials, CdZnTe (CZT) being one. Therefore, a polishing jig was custom designed
and engineered to take in account certain physical parameters (pressure, substrate rotational frequency, drip rate of solution
onto the polishing pad, and polishing pad rotational velocity). The control over these parameters increased the quality, uniformity,
and the reproducibility of each polish. EPIR also investigated several bromine containing solutions used for polishing CZT.
The concentration of bromine, as well as the mechanical parameters, was varied in order to determine the optimal conditions
for polishing CZT. 相似文献
103.
Dual-band infrared detectors made on high-quality HgCdTe epilayers grown by molecular beam epitaxy on CdZnTe or CdTe/Ge substrates 总被引:2,自引:0,他引:2
P. Ballet F. Noël F. Pottier S. Plissard J. P. Zanatta J. Baylet O. Gravrand E. De Borniol S. Martin P. Castelein J. P. Chamonal A. Million G. Destefanis 《Journal of Electronic Materials》2004,33(6):667-672
In this paper, we present all the successive steps for realizing dual-band infrared detectors operating in the mid-wavelength
infrared (MWIR) band. High crystalline quality HgCdTe multilayer stacks have been grown by molecular beam epitaxy (MBE) on
CdZnTe and CdTe/Ge substrates. Material characterization in the light of high-resolution x-ray diffraction (HRXRD) results
and dislocation density measurements are exposed in detail. These characterizations show some striking differences between
structures grown on the two kinds of substrates. Device processing and readout circuit for 128×128 focal-plane array (FPA)
fabrication are described. The electro-optical characteristics of the devices show that devices grown on Ge match those grown
on CdZnTe substrates in terms of responsivity, noise measurements, and operability. 相似文献
104.
Farid Akhtar 《Surface & coatings technology》2007,201(24):9603-9609
TiB2 and TiC reinforced Fe matrix thick films (2 mm thickness) were produced through the synthesis reaction from Ti, C and FeB powders with varying porosity on the steel substrates. Powder technology was used as a processing method. The films and the substrates were sintered in a single step. TiB2, TiC and Fe were detected in the films by X-ray diffraction analysis. The fact that no other reaction product was detected revealed the thermal stability of TiB2 and TiC. The formation of secondary reaction products was inhibited during the reactive sintering. The films showed maximum strength of 163-466 MPa when sintered separately at 1350 °C. The strength of the films varied with their porosity. The films showed considerable bonding strength with the steel substrates. The delamination of the films from the steel substrates was observed at stress values from 454-781 MPa. The microstructure, fracture and delaminated surface morphologies were studied. The wear resistance against hardened high speed steel was studied in reciprocating sliding tests. The wear mechanisms were discussed by means of microscopical observation on the worn surfaces. 相似文献
105.
S. P. Gorkhali D. R. Cairns G. P. Crawford 《Journal of the Society for Information Display》2004,12(1):45-49
Abstract— Failure mechanisms for flexible conducting substrates are investigated herein in the context of rollable/flexible display applications. Cyclic loading experiments (substrates subjected to multiple cycles of tensile strain) were carried out on both ITO‐coated PET and PEDOT:PSS‐coated PET substrates. The resistance was measured after each bending cycle. The resistance increased with the number of cycles and was not reversible. Even when the tensile strain on the ITO/PET was below the virgin cracking threshold (~2%) previously reported [Appl Phys Lett 76, 1425 (2000)], slight increases in resistance were measurable after just a few cycles. 相似文献
106.
Performance equations for the fed-batch digestion of insoluble solid-state substrates were developed based on a verified interfacial kinetic model for microbial uptake of these substrates. Fed-batch anaerobic digestions of a suspension of stearic acid with a mean particle size of 2 μm were conducted to verify the derived equations. Agreement between the experimental and calculated results indicated the validity of these equations. The performance equations should be useful for describing the time courses of cell growth, substrate consumption and product accumulation in a fed-batch digestion system with insoluble solid-state organics as substrate. 相似文献
107.
Substrate issues for the growth of mercury cadmium telluride 总被引:1,自引:0,他引:1
R. Triboulet A. Tromson-Carli D. Lorans T. Nguyen Duy 《Journal of Electronic Materials》1993,22(8):827-834
Close lattice matching and lattice compatibility with mercury cadmium telluride (MCT) make CdTe and related alloys ideal substrate
materials for growth of MCT layers for the purpose of making high-performance second-generation infrared detectors. However,
the limitations in the properties of CdTe and the difficulties in its bulk growth have prompted extensive research in the
area of alternative substrates. Some basic relevant characteristics of substrates such as sapphire, GaAs, and silicon are
compared and the possibilities and problems associated with each material are analyzed in the light of the most recent results
in the field. 相似文献
108.
109.
M. Reddy J. M. Peterson S. M. Johnson T. Vang J. A. Franklin E. A. Patten W. A. Radford J. W. Bangs D. D. Lofgreen 《Journal of Electronic Materials》2009,38(8):1764-1770
This paper presents the progress in the molecular beam epitaxy (MBE) growth of HgCdTe on large-area Si and CdZnTe substrates
at Raytheon Vision Systems. We report a very high-quality HgCdTe growth, for the first time, on an 8 cm × 8 cm CdZnTe substrate.
This paper also describes the excellent HgCdTe growth repeatability on multiple 7 cm × 7 cm CdZnTe substrates. In order to
study the percentage wafer area yield and its consistency from run to run, small lots of dual-band long-wave infrared/long-wave
infrared triple-layer heterojunction (TLHJ) layers on 5 cm × 5 cm CdZnTe substrates and single-color double-layer heterojunction
(DLHJ) layers on 6-inch Si substrates were grown and tested for cutoff wavelength uniformity and micro- and macrovoid defect
density and uniformity. The results show that the entire lot of 12 DLHJ-HgCdTe layers on 6-inch Si wafers meet the testing
criterion of cutoff wavelength within the range 4.76 ± 0.1 μm at 130 K and micro- and macrovoid defect density of ≤50 cm−2 and 5 cm−2, respectively. Likewise, five out of six dual-band TLHJ-HgCdTe layers on 5 cm × 5 cm CdZnTe substrates meet the testing criterion
of cutoff wavelength within the range 6.3 ± 0.1 μm at 300 K and micro- and macrovoid defect density of ≤2000 cm−2 and 500 cm−2, respectively, on the entire wafer area. Overall we have found that scaling our HgCdTe MBE process to a 10-inch MBE system
has provided significant benefits in terms of both wafer uniformity and quality. 相似文献
110.
采用氧化物缓冲层,通过射频磁控溅射系统依次在n型Si(111)衬底上沉积Ga2O3/ZnO(Ga2O3/MgO)薄膜,然后将薄膜于950℃氨化合成GaN纳米结构,氨化时间为15min。采用X射线衍射(XRD)、傅里叶红外吸收谱(FTIR)和高分辨透射电镜(HRTEM)对样品的结构进行了分析,结果显示两种缓冲层下制备的样品均为六方纤锌矿单晶GaN纳米结构,且缓冲层的取向对纳米线的生长方向有很大影响;采用扫描电镜(SEM)对样品的形貌进行了测试,发现纳米线表面光滑,长度可达几十微米,表明采用氧化物缓冲层制备了高质量的GaN线。同时对GaN纳米线的生长机理进行了简单讨论。 相似文献