基于Web GIS的移民信息管理系统设计

基于在线地图服务,ArcGIS js for API提供的接口,以征地移民信息数据为基础,开发了基于Web GIS的移民信息管理系统.系统基于B/S架构,提供全面的地图操作、数据录入、红线内查询检索、汇总统计、综合分析等功能,实现移民实物指标调查数据的集中存储,确保数据处理的准确性,满足征地移民智能化管理的需要.     

动态网络安全模型信息安全风险分析

通过动态网络模型信息安全风险分析实验,在LazyLBR和VFI的ROC曲线进行统计和F-度量,采用10倍交叉验证方法.针对网络的脆弱性、外界的威胁和资产价值几种数据,对比四种动态网络模型信息安全风险的数字学习曲线.     

STUDY ON THE SHOCK WAVE CRYSTALLIZATION OF AMORPHOUS ALLOYS BY DSC

Shock wave and annealing crystallization of amorphous alloys FeSiB, FeMoSiB and FeCuNbSiB were studied by isothermal and non-isothermal DSC technique. It was found that the shock wave crystallization is very perfect, the fraction crystallized is very close to 100%, though the period of crystallization is very short, only about 10-4-10-6s. Their produced phases differ from the parent phase in structure and composition. The high velocity of the transformation is very difficult to explain by the diffusion theory of solid state phase transition.     

ZrB2-SiC基超高温陶瓷（UHTCs）的反应烧结及SHS粉体制备

用普通反应热压方法（RHP）和反应放电等离子体方法（R-SPS）原位反应制备了ZrB2-SiC，ZrB2-SiC—ZrC，ZrB2-SiC-ZrN，以及ZrB2-SiC-AIN4种复合材料。从密度，物相以及显微结构等方面比较了两种烧结方式之间的差别，对于升温速度较慢的普通热压方法，反应分步进行，显微结构不均匀；对于升温速度快的放电等离子体烧结，原料间的自蔓延反应被点着，反应速度快，显微结构均匀。同时以红外灯的热量为点火源，引发了Zr，Si及B4C间在空气气氛下的自蔓延反应，制备了较纯及粒径约为1μm的活性粉体。     

A study of the properties of ink-jet printed cotton fabric following low-temperature plasma treatment

This paper studies the effect of low-temperature plasma treatment on an ink-jet printed cotton fabric. Due to the specific printing and conductivity requirements for ink-jet printing, not all conventional printing chemicals, such as sodium alginate and urea, used for cotton fabric can be directly incorporated into the ink formulation. As a result, the cotton fabric requires pretreatment with the printing chemicals prior to the stage of ink-jet printing. Cotton is pretreated with the printing chemicals by means of a coating method. The aim of this paper was to study the possibility and effectiveness of applying low-temperature plasma treatment to enhance the performance of pretreatment paste containing sodium alginate so as to improve the properties of the ink-jet printed cotton fabric. Experimental results revealed that a low-temperature plasma pretreatment coupled with the ink-jet printing technique could improve the final printed properties of cotton fabric.     

高性能纤维的弯曲疲劳断裂研究

在自制弯曲疲劳装置上 ,对 3种高强对位芳纶及超高相对分子质量聚乙烯纤维 (Dyneema SK65 )进行双面弯曲疲劳试验。结果表明 ,Twaron 2 0 0 0弯曲疲劳寿命的自然对数与预加应力、弯曲角度呈线性关系 ,Dyneema SK65弯曲疲劳寿命明显长于对位芳纶 ,Twaron 2 0 0 0 ,Kevlar 12 9相近 ,都比Kevlar 2 9略长 ;高强型对位芳纶的弯曲疲劳断裂断口芯层呈现出“毛笔头”或“拔丝形”原纤化分裂形态 ,超高相对分子质量聚乙烯纤维弯曲疲劳断裂断口有明显的脆性折断形态 ,无原纤出现。     

纳米技术在涂料中的产业化应用

介绍了国内外纳米涂料的现状及其产业化进展。     

电气石对好氧反硝化菌株反硝化特性的影响

用化学全分析、扫描电镜、Bruauer-Emmett-Teller法和粒度分析仪对内蒙赤峰电气石进行测试表征,研究了电气石对好氧反硝化菌株反硝化特性的影响.结果表明:电气石能够促进好氧反硝化菌株的生长繁殖,纯培养16 h后,细菌数量增加384%.电气石还可以增强好氧反硝化菌株的反硝化能力,与未投加电气石的相比较,NO-3-N,NO-2-N,化学需氧量的浓度降低,总氮去除率提高32.8%.电气石对菌液体系的氧化还原电位具有调控作用,可以使体系的氧化还原电位降低20%,这一作用可能是电气石提高好氧反硝化菌株反硝化能力的重要因素.     

凉型风味料介绍

本文分析了主要凉味剂的立体构型 ,简单介绍了以L -薄荷脑 (又称L -薄荷醇 )和L -薄荷脑为基本骨架的酯类、醚类和缩酮类化合物的结构和味觉特征 ,它们的安全性以及在食品、口腔卫生用品、化妆品和肤用药中的应用。     

Orthogonal and fine lithographic structures attained from the next generation proton beam writing facility

A second generation proton beam writing (PBW) system has been built at the Centre for Ion Beam Applications at the National University of Singapore for fabrication of high aspect ratio 3D nano lithographic structures. System improvements and a few lithographic structures obtained with this facility are presented in this paper. Through accurate alignment of the magnetic quadrupole lenses and the electrostatic scanning system, orthogonal beam scanning has been achieved. The earlier constrain of limited beam scan area has been overcome by adopting a combination of beam and stage scanning as well as stitching. With these improvements smallest ever Ni structure of 65 nm in width has been fabricated using nickel electroplating on a proton beam written PMMA sample in the second generation PBW facility. Using this improved PBW facility, we have also demonstrated the fabrication of fine lithographic patterns with 19 nm line width and 60 nm spacing in 100 nm thick negative high resolution hydrogen silsesquioxane resist. Future possible system improvements leading to finer resolution will be discussed briefly.