The influence of grounded electrode positions on the evolution and characteristics of an atmospheric pressure argon plasma jet

An atmospheric pressure plasma jet (APPJ) in Ar with various grounded electrode arrangements is employed to investigate the effects of electrode arrangement on the characteristics of the APPJ.Electrical and optical methods are used to characterize the plasma properties.The discharge modes of the APPJ with respect to applied voltage are studied for grounded electrodepositions of 10 mm,40 mm and 80 mm,respectively,and the main discharge and plasma parameters are investigated.It is shown that an increase in the distance between the grounded electrode and high-voltage electrode results in a change in the discharge modes and discharge parameters.The discharges transit from having two discharge modes,dielectric barrier discharge (DBD) and jet,to having three,corona,DBD and jet,with increase in the distance from the grounded to the high-voltage electrodes.The maximum length of the APPJ reaches 3.8 cm at an applied voltage of 8 kV.The discharge power and transferred charges and spectral line intensities for species in the APPJ are influenced by the positions of the grounded electrode,while there is no obvious difference in the values of the electron excited temperature (EET) for the three grounded electrode positions.     

Characteristics of a kHz helium atmospheric pressure plasma jet interacting with two kinds of targets

This study investigates the influence of two types of target,skin tissue and cell culture medium,with different permittivities on a k Hz helium atmospheric pressure plasma jet (APPJ) during its application for wound healing.The basic optical–electrical characteristics,the initiation and propagation and the emission spectra of the He APPJ under different working conditions are explored.The experimental results show that,compared with a jet freely expanding in air,the diameter and intensity of the plasma plume outside the nozzle increase when it interacts with the pigskin and cell culture medium targets,and the mean velocity of the plasma bullet from the tube nozzle to a distance of 15 mm is also significantly increased.There are also multiple increases in the relative intensity of OH (A~2Σ?→?X~2Π) and O (3p~5S–3s~5S) at a position 15 mm away from nozzle when the He APPJ interacts with cell culture medium compared with the air and pigskin targets.Taking the surface charging of the low permittivity material capacitance and the strengthened electric field intensity into account,they make the various characteristics of He APPJ interacting with two different targets together.     

Characteristics of a kHz helium atmospheric pressure plasma jet interacting with two kinds of target

Abstract This study investigates the influence of two types of target, skin tissue and cell culture medium, with different permittivities on a kHz helium atmospheric pressure plasma jet (APPJ) during its application for wound healing. The basic optical–electrical characteristics, the initiation and propagation and the emission spectra of the He APPJ under different working conditions are explored. The experimental results show that, compared with a jet freely expanding in air, the diameter and intensity of the plasma plume outside the nozzle increase when it interacts with the pigskin and cell culture medium targets, and the mean velocity of the plasma bullet from the tube nozzle to a distance of 15 mm is also significantly increased. There are also multiple increases in the relative intensity of OH (A² Σ → X² Π) and O (3p⁵ S–3s⁵ S) at a position 15 mm away from nozzle when the He APPJ interacts with cell culture medium compared with the air and pigskin targets. Taking the surface charging of the low permittivity material capacitance and the strengthened electric field intensity into account, they make the various characteristics of He APPJ interacting with two different targets together.     

Deposition of SiC_xH_yO_z thin film on epoxy resin by nanosecond pulsed APPJ for improving the surface insulating performance

Non-thermal plasma surface modification for epoxy resin(EP)to improve the insulation properties has wide application prospects in gas insulated switchgear and gas insulatedtransmission line.In this paper,a pulsed Ar dual dielectrics atmospheric-pressure plasma jet(APPJ)was used for Si C_xH_yO_zthin film deposition on EP samples.The film deposition was optimized by varying the treatment time while other parameters were kept at constants(treatment distance:10 mm,precursor flow rate:0.6 l min~(-1),maximum instantaneous power:3.08 k W and single pulse energy:0.18 m J).It was found that the maximum value of flashover voltages for negative and positive voltage were improved by 18%and 13%when the deposition time was3 min,respectively.The flashover voltage reduced as treatment time increased.Moreover,all the surface conductivity,surface charge dissipation rate and surface trap level distribution reached an optimal value when thin film deposition time was 3 min.Other measurements,such as atomic force microscopy and scanning electron microscope for EP surface morphology,Fourier transform infrared spectroscopy and x-ray photoelectron spectroscopy for EP surface compositions,optical emission spectra for APPJ deposition process were carried out to better understand the deposition processes and mechanisms.The results indicated that the original organic groups(C–H,C–C,C=O,C=C)were gradually replaced by the Si containing inorganic groups(Si–O–Si and Si–OH).The reduction of C=O in ester group and C=C in p-substituted benzene of the EP samples might be responsible for shallowing the trap level and then enhancing the flashover voltage.However,when the plasma treatment time was longer than 3 min,the significant increase of the surface roughness might increase the trap level depth and then deteriorate the flashover performance.     

Cleaning of nitrogen-containing carbon contamination by atmospheric pressure plasma jet

Atmospheric pressure plasma jet (APPJ) was used to clean nitrogen-containing carbon films (C–N) fabricated by plasma-assisted chemical vapor deposition method employing the plasma surface interaction linear device at Sichuan University (SCU-PSI). The properties of the contaminated films on the surface of pristine and He-plasma pre-irradiated tungsten matrix, such as morphology, crystalline structure, element composition and chemical structure were characterized by scanning electron microscopy, grazing incidence x-ray diffraction and x-ray photoelectron spectroscopy. The experimental results revealed that the removal of C–N film with a thickness of tens of microns can be realized through APPJ cleaning regardless of the morphology of the substrates. Similar removal rates of 16.82 and 13.78 μm min−1 were obtained for C–N films deposited on a smooth pristine W surface and rough fuzz-covered W surface, respectively. This is a remarkable improvement in comparison to the traditional cleaning method. However, slight surface oxidation was found after APPJ cleaning, but the degree of oxidation was acceptable with an oxidation depth increase of only 3.15 nm. Optical emission spectroscopy analysis and mass spectrometry analysis showed that C–N contamination was mainly removed through chemical reaction with reactive oxygen species during APPJ treatment using air as the working gas. These results make APPJ cleaning a potentially effective method for the rapid removal of C–N films from the wall surfaces of fusion devices.     

Nonequilibrium Atmospheric Pressure Ar/O2 Plasma Jet: Properties and Application to Surface Cleaning

In this study an atmospheric pressure Ar/O_2 plasma jet is generated to study the effects of applied voltage and gas flux rate to the behavior of discharge and the metal surface cleaning.The increase in applied voltage leads to increases of the root mean square(rms) current,the input power and the gas temperature.Furthermore,the optical emission spectra show that the emission intensities of metastable argon and atomic oxygen increase with increasing applied voltage.However,the increase in gas flux rate leads to a reduction of the rms current,the input power and the gas temperature.Furthermore,the emission intensities of metastable argon and atomic oxygen decrease when gas flux rate increases.Contact angles are measured to estimate the cleaning performance,and the results show that the increase of applied voltage can improve the cleaning performance.Nevertheless,the increase of gas flux rate cannot improve the cleaning performance.Contact angles are compared for different input powers and gas flux rates to search for a better understanding of the major mechanism for surface cleaning by plasma jets.     

Three modes of a direct-current plasma jet operated underwater to degrade methylene blue

A direct-current air plasma jet operated underwater presents three stable modes including an intermittently-pulsed discharge, a periodically-pulsed discharge and a continuous discharge with increasing the power voltage. The three discharge modes have different appearances for the plasma plumes. Moreover, gap voltage-current characteristics indicate that the continuous discharge is in a normal glow regime. Spectral lines from reactive species(OH, N_2, N_2~+, H_α,and O) have been revealed in the emission spectrum of the plasma jet operated underwater.Spectral intensities emitted from OH radical and oxygen atom increase with increasing the power voltage or the gas flow rate, indicating that reactive species are abundant. These reactive species cause the degradation of the methylene blue dye in solution. Effects of the experimental parameters such as the power voltage, the gas flow rate and the treatment time are investigated on the degradation efficiency. Results indicate that the degradation efficiency increases with increasing the power voltage, the gas flow rate or the treatment time. Compared with degradation in the intermittently-pulsed mode or the periodically-pulsed one, it is more efficient in the continuous mode, reaching 98% after 21 min treatment.     

Application of persulfate in low-temperature atmospheric-pressure plasma jet for enhanced treatment of onychomycosis

Fungal infection of human nails,or onychomycosis,affects 10%of the world's adult population,but current therapies have various drawbacks.In this work,we employed a self-made low-temperature plasma(LTP)device,namely,an atmospheric-pressure plasma jet(APPJ)device to treat the nails infected with Trichophyton rubrum(T.rubrum)with the aid of persulfate solution.We found that persulfate solution had a promoting effect on plasma treatment of onychomycosis.With addition of sodium persulfate,the APPJ therapy could cure onychomycosis after several times of treatment.As such,this work has demonstrated a novel and effective approach which makes good use of LTP technique in the treatment of onychomycosis.     

Improving the surface flashover performance of epoxy resin by plasma treatment:a comparison of fluorination and silicon deposition under different modes

This work treats the Al2O3-ER sample surface using dielectric barrier discharge fluorination(DBD-F),DBD silicon deposition(DBD-Si),atmospheric-pressure plasma jet fluorination(APPJ-F)and APPJ silicon deposition(APPJ-Si).By comparing the surface morphology,chemical components and electrical parameters,the diverse mechanisms of different plasma modification methods used to improve flashover performance are revealed.The results show that the flashover voltage of the DBD-F samples is the largest(increased by 21.2％at most),while the APPJ-F method has the worst promotion effect.The flashover voltage of the APPJ-Si samples decreases sharply when treatment time exceeds 180 s,but the promotion effect outperforms the DBD-Si method during a short modified time.For the mechanism explanation,firstly,plasma fluorination improves the surface roughness and introduces shallow traps by etching the surface and grafting fluorine-containing groups,while plasma silicon deposition reduces the surface roughness and introduces a large number of shallow traps by coating SiOx film.Furthermore,the reaction of the DBD method is more violent,while the homogeneity of the APPJ modification is better.These characteristics influence the effects of fluorination and silicon deposition.Finally,increasing the surface roughness and introducing shallow traps accelerates surface charge dissipation and inhibits flashover,but too many shallow traps greatly increase the dissipated rate and facilitate surface flashover instead.     

Synthesis and Characterization of Nano-sized Boron Powder Prepared by Plasma Torch

Hydrogen thermal plasma jet was employed to prepare nano-sized boron powder with hydrogen reduction of BCl3. The maximum yield of nano-sized boron powders was about 50% with the operational conditions of H2/BCl3 of 4.5:1, total feed of 4.9 m3/h, and plasma power of 25 kW. The samples were analyzed by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), and inductively coupled plasma - mass spectrometry (ICP-MS), inductively coupled plasma - atomic emission spectrometry (ICP-AES), inductive combustion infrared absorption (ICIA) and Infrared thermal conductivity of oxygen and nitrogen analyzer (ITCA). The results show that the boron powders have different crystal structures with higher dispersion and purity. The average diameter is about 50 nm, and the purity is 90.29% or so. This new technology can use simple process to produce high quality boron powders, and is feasible for industrial production.     

Improving the surface insulation of epoxy resin by plasma etching

Epoxy resin (EP) tends to accumulate a large amount of charge on its surface when exposed to a high-voltage DC electric field,which leads to a reduction in its insulative performance and an increase in potential safety risks in power systems.To suppress charge accumulation,improve the flashover voltage of the EP,and reduce the risk of gas insulated switchgear (GIS)/gas insulated transmission line (GIL) failure,we used two plasma-etching methods,i.e.,atmospheric-pressure dielectric barrier discharge (DBD) and the atmospheric-pressure plasma jet(APPJ),to modify the surface of the EP.The surface morphology and electrical properties of the modified materials were explored as a function of time.The results show that after DBD treatment,the roughness of the sample increases by 103.9 nm,the conductivity increases by3.9?×?10~(–18)S,and the flashover voltage increases by 14.4%;after APPJ treatment,the roughness of the sample increases by 223.5 nm,the conductivity increases by 3.4?×?10~(–17)S,and the flashover voltage increases by 18%.This shows that both plasma-etching methods can improve the insulation properties of materials by improving the surface-charge characteristics.The two methods are compared with each other:the APPJ treatment method is better at improving the surface roughness and electrical properties of materials,and this flexible treatment method has greater potential in industrial applications.     

Measurement of Electron Density and Ion Collision Frequency with Dual Assisted Grounded Electrode DBD in Atmospheric Pressure Helium Plasma Jet

The properties of a helium atmospheric-pressure plasma jet（APPJ）are diagnosed with a dual assisted grounded electrode dielectric barrier discharge device.In the glow discharge,we captured the current waveforms at the positions of the three grounded rings.From the current waveforms,the time delay between the adjacent positions of the rings is employed to calculate the plasma bullet velocity of the helium APPJ.Moreover,the electron density is deduced from a model combining with the time delay and current intensity,which is about 10¹¹cm^-3.In addition,The ion-neutral particles collision frequency in the radial direction is calculated from the current phase difference between two rings,which is on the order of 10⁷ Hz.The results are helpful for understanding the basic properties of APPJs.     

Growth, characterization and effect of substrate bias on ZnO prepared by reactive capillaritron ion beam sputtering deposition

ZnO thin films have been deposited on Si substrates by reactive ion beam sputtering deposition utilizing a capillaritron ion source. All the as-deposited ZnO films exhibit a preferred (0 0 2) growth direction while the grain size increases as oxygen partial flow rate increases. An optimum photoluminescence result was achieved using oxygen partial flow rate of ∼40% that the ratio of integrated deep level emission to that of integrated near-band-edge emission is less than 1.5. The atomic percentage ratio of Zn:O remains at 55/45, regardless of oxygen partial flow rates. With the applied substrate bias, the atomic percentage ratio of Zn/O changes to 40/60, indicating that stoichiometric ZnO may be achieved by selecting appropriate substrate bias. With the substrate bias applied, increased amount of oxygen atoms were found located in oxygen deficient matrixes, likely due to the bombardment of secondary ions.     

Atmospheric Pressure Plasma Jet in Ar and O2/Ar Mixtures： Properties and High Performance for Surface Cleaning＊

An atmospheric pressure plasma jet generated in Ar and O2/Ar mixtures has been investigated by specially designed equipment with double power electrodes at 20~32 kHz, and their effects on the cleaning of surfaces have been studied. Properties of the jet discharge are studied by electrical diagnostics, including the waveform of discharge voltage, discharge current and the Q-V Lissajous figures. The optical emission spectroscopy is used to measure the plasma parameters, such as the excitation temperature and the gas temperature. It is found that the consumed power and the excitation temperature increase with increase of the discharge frequency. On the other hand, at the same discharge frequency, these parameters in O2/Ar mixture plasma are found to be much larger. The effect on surface cleaning is studied from the changes in the contact angle. For Ar plasma jet, the contact angle decreases with increase of the discharge frequency. For O2/Ar mixture plasma jet, the contact angle decreases with increase of discharge frequency up to 26 kHz, however, further increase of discharge frequency does not show further decrease in the contact angle. At the same discharge frequency, the contact angle after O2/Ar mixture plasma cleaning is found to be much lower compared to the case of pure Ar. From the results of quadrupole mass-spectrum analysis, we can identify more fragment molecules of CO and H2O in the emitted gases after O2/Ar plasma jet treatment compared with Ar plasma jet treatment, which are produced by the decomposition of surface organic contaminants during the cleaning process.     

Quantitative Determination of Density of Ground State Atomic Oxygen from Both TALIF and Emission Spectroscopy in Hot Air Plasma Generated by Microwave Resonant Cavity

Two experimental techniques have been used to quantify the atomic oxygen density in the case of hot air plasma generated by a microwave (MW) resonant cavity. The latter operates at a frequency of 2.45 GHz inside a cell of gas conditioning at a pressure of 600 mbar, an injected air flow of 12 L/min and an input MW power of 1 kW. The first technique is based on the standard two photon absorption laser induced fluorescence (TALIF) using xenon for calibration but applied for the first time in the present post discharge hot air plasma column having a temperature of about 4500 K near the axis of the nozzle. The second diagnostic technique is an actinometry method based on optical emission spectroscopy (OES). In this case, we compared the spectra intensities of a specific atomic oxygen line (844 nm) and the closest wavelength xenon line (823 nm). The two lines need to be collected under absolutely the same spectroscopic parameters. The xenon emission is due to the addition of a small proportion of xenon (1% Xe) of this chemically inert gas inside the air while a further small quantity of H₂ (2%) is also added in the mixture in order to collect OH(A¬X) and NH(A-X) spectra without noise. The latter molecular spectra are required to estimate gas and excitation temperatures. Optical emission spectroscopy measurements, at for instance the position z=12 mm on the axis plasma column that leads to a gas measured temperature equal to 3500 K, an excitation temperature of about 9500 K and an atomic oxygen density 2.09×1017± 0.2×10¹⁷ cm ⁻³ . This is in very good agreement with the TALIF measurement, which is equal to 2.0×10¹⁷ cm ⁻³ .     

Non-Thermal Equilibrium Atmospheric Pressure Glow-Like Discharge Plasma Jet

Non-thermal equilibrium atmospheric pressure plasma jet (APPJ) is a cold plasma source that promises various innovative applications,and the uniform APPJ is more favored.Glow discharge is one of the most effective methods to obtain the uniform discharge.Compared with the glow dielectric barrier discharge (DBD) in atmospheric pressure,pure helium APPJ shows partial characteristics of both the glow discharge and the streamer.In this paper,considering the influence of the Penning effect,the electrical and optical properties of He APPJ and Ar/NH3 APPJ were researched.A word "Glow-like APPJ" is used to characterize the uniformity of APPJ,and it was obtained that the basic characteristics of the glow-like APPJ are driven by the kHz AC high voltage.The results can provide a support for generating uniform APPJ,and lay a foundation for its applications.     

Spatial and Excitation Variations for Different Applied Voltages in an Atmospheric Neon Plasma Jet

A neon plasma jet was generated in air,driven by a 9 kHz sinusoidal power supply.The characteristics of the plasma plume and the optical spectra with plasma propagation for different applied voltages were investigated.By increasing the applied voltage,the plasma plume first increases and then retracts to become short and bulky.The shortened effect of Ne plasma plume(about 10 mm) for the further voltage increasing is more apparent than that of He(about3 mm) and Ar(about 1 mm).Emission intensity of the N_2(337 nm) increases with the applied voltage,gradually substituting the emission intensity of Ne(702 nm and 585 nm) as the noticeable radiation.At the nozzle opening,the Ne(702 nm) emission dominates,while the Ne(585 nm)emission is most noticeable around the tip of the plasma plume.The spatial distribution of the three spectral lines indicates that Ne(702 nm) emission decreases dramatically with plasma propagation while Ne(585 nm) and N_2(337 nm) emissions reach their maxima at the middle of the plasma plume.The results indicate that the Ne(702 nm) emission is much more sensitive to the average electron temperature and the density of the high-energy electrons,so it changes greatly at the tube nozzle and little at the tip region as the voltage increases.The population of high-energy electrons,the average electron temperature,the collision with air molecules and the Penning effect between Ne metastables and air molecules may explain their different variations with plasma propagating and voltage increasing.     

Atmospheric Pressure Cold Argon/Oxygen Plasma Jet Assisted by Preionization of Syringe Needle Electrode

An atmospheric pressure nonequilibrium argon/oxygen plasma jet assisted by the preionization of syringe needle electrode discharge is reported. With the syringe needle plasma as its pre-ionization source, the hybrid barrier-jet was shown to generate uniform discharge with a lower breakdown voltage and a relatively low gas temperature varying from 390 to 440 ºK, even when the vol. % oxygen in argon was up to 6%. Utilizing the actinometry method, the concentration of atomic oxygen was estimated to be about in an orders of magnitude of 1017/cm3. The argon/oxygen plasma jet was then employed to clean out heat transfer oil, with a maximum cleaning rate of 0.1 mm/s achieved.     

Study on an Atmospheric Pressure Plasma Jet and its Application in Etching Photo-Resistant Materials

An atmospheric pressure radio-frequency plasma jet that can eject cold plasma has been developed. In this paper, the configuration of this type of plasma jet is illustrated and its discharge characteristics curves are studied with a current and a voltage probe. A thermal couple is used to measure the temperature distribution along the axis of the jet stream. The temperature distribution curve is generated for the He/O2 jet stream at the discharge power of 150 W. This jet can etch the photo-resistant material at an average rate of 100 nm/min on the surface of silicon wafers at a right angle.     

On the green aurora emission of Ar atmospheric pressure plasma

The Ar atmospheric pressure plasma was found to be an excellent laboratorial source for green aurora emission. However, the characteristic and production mechanism of the green aurora emission of the Ar atmospheric pressure plasma are still not clear. In this work, an Ar plasma in a long glass tube which emits intense green aurora light is investigated. With the long glass tube, it can be concluded that the green aurora emission in the Ar plasma is not owing to the mixture of Ar plasma plume with the surrounding air. It is also found that the green aurora emission often appeared beyond the active electrode when the active electrode is placed at the downstream of the gas flow. The green emission disappears when the traces amount of O₂ or N₂ (about 0.05%–0.07%) is added to Ar. This is because the O₂ molecules deactivate the upper state O(1S), which results in the decrease of the green emission. On the other hand, when N₂ is added, Ar metastable atoms are quenched by N₂, which results in the decrease of O atoms and eventually leads to the decrease of the green emission intensity. The intensity of the green aurora emission increases when the driving voltage frequency increases from 1 to 10 kHz. More importantly, it is found that the green aurora emission is not affected when a grounded stainless steel needle is in contact with the plasma plume. Thus, the green emission is not driven electrically. All these findings are helpful for the understanding of the physics and its applications of atmospheric pressure plasma jet in space physics, laser physics and other application areas.