TaN/NbN纳米多层膜的力学性能与耐磨性

采用反应溅射在多靶溅射仪上制备了调制周期小于 73 .2nm的一系列TaN/NbN纳米多层膜和TaN ,NbN单层薄膜 ,并采用透射电子显微镜、显微硬度计和凹坑研磨仪研究了薄膜的微结构、力学性能和耐磨性。结果表明 ,具有成分周期变化的TaN/NbN纳米多层膜在其调制周期为 2 3～ 17 0nm范围内产生硬度异常升高的超硬效应 ,最高硬度达到HK 5 1 0GPa ;磨损实验表明 ,TaN/NbN纳米多层膜耐磨性远高于TaN和NbN单层膜 ,其主要原因是调制结构中大量界面的存在 ,提高了薄膜的韧性。     

TaN／NbN纳米多层膜的力学性能与耐磨性

采用反应溅射在多靶溅射仪上制备了调制周期小于73.2nm的一系列TaN/NbN纳米多层膜和TaN,NbN单层薄膜，并采用透射电子显微镜、显微硬度计和凹坑研磨仪研究了薄膜的微结构、力学性能和耐磨性。结果表明，具有成分周期变化的TaN/NbN纳米多层膜在其调制周期为2.3-17.0nm范围内产生硬度异常升高的超硬效应，最高硬度达到HK51.0GPa；磨损实验表明，TaN/NbN纳米多层膜耐磨性远高于TaN和NbN单层膜，其主要原因是调制结构中大量界面的存在，提高了薄膜的韧性。     

调制周期对TaN/VN纳米多层膜的影响

本研究选择钽和钒的氮化物作为个体层材料,利用射频磁控溅射系统制备TaN、VN及一系列的TaN/VN多层薄膜。通过XRD和纳米力学测试系统分析了该体系合成以后的晶体结构、调制周期对力学性能的影响。结果表明：多层膜的纳米硬度值普遍高于两种个体材料混合相的硬度值;当调制周期为30 nm时TaN/VN多层膜达到最大硬度31 GPa,结晶出现多元化,多层膜体系的硬度、弹性模量以及耐磨性能均达到最佳效果。     

NbN/TaN纳米多层膜的微结构及超高硬度效应

用磁控反应溅射的方法在不锈钢基片上制备了NbN／TaN纳米多层薄膜,试验采用X射线衍射仪（XRD）、透射电子显微镜（TEM）及显微硬度仪对薄膜的微结构和硬度进行分析,结果表明：在NbN／TaN多层膜中,NbN层为面心晶体结构,TaN层为六方晶体结构;NbN／TaN纳米多层膜存在超硬效应,在调制周期2．3～170nm这一放宽的范围内保持超高硬度,硬度最大值HK达51.0GPa     

HfN/HfB_2纳米多层膜结构调制及其力学性能

为了进一步了解调制周期对HfN/HfB2纳米多层膜力学性能的影响,利用多靶磁控溅射技术,在Si(100)基底上制备了一系列具有相同厚度不同调制周期的HfN/HfB2纳米多层膜。利用XRD、TEM、XP-2台阶仪、纳米压痕仪及摩擦试验机分别分析了多层膜的结构特征、力学性能和室温下摩擦性能。结果表明,室温下沉积的多层膜呈现出结晶/非晶的混合结构;随着调制周期的增大,多层膜的结晶程度先增加后降低,其硬度和弹性模量也呈现出先升高后降低的趋势;当调制周期为40nm时,多层膜的硬度和弹性模量均达到最大值,分别为(36.72±1.3)和(378.41±5.6)GPa,并且此时多层膜具有较高的膜基结合力(Lmax=67.3mN)和较低的平均摩擦系数(0.061);在调制周期为20nm时,多层膜的残余应力达到最小值为-0.82GPa;经过高温退火后,多层膜的硬度和弹性模量均无明显变化,说明其具有良好的热稳定性;多层膜的结构和力学性能随调制周期的变化归因于晶粒的细化。     

不同调制周期TiAlSiN/Mo2N多层膜的微观结构、力学和摩擦性能研究

采用射频磁控溅射制备不同调制周期的TiAlSiN/Mo2N多层膜。利用X射线衍射,扫描电镜,能量弥散X射线谱,纳米压痕仪及摩擦试验机对薄膜的成分,相结构,力学及室温摩擦性能进行分析。结果表明,不同调制周期的TiAlSiN/Mo2N多层膜为fcc与hcp混合结构,不同调制周期的TiAlSiN/Mo2N多层膜硬度均大于单层TiAlSiN和Mo2N薄膜,且TiAlSiN/Mo2N多层膜的硬度与弹性模量随调制周期的影响不大,硬度稳定在29 GPa左右,室温条件下,以Al2O3为摩擦副的TiAlSiN/Mo2N多层膜平均摩擦系数平均摩擦系数均低于单层TiAlSiN、Mo2N薄膜,且随调制周期的增大逐渐降低,其最低平均摩擦系数为0.42,对应调制周期为12 nm。     

调制周期对TiB_2/TiAlN纳米多层膜机械性能的影响

利用射频磁控溅射技术,在室温下合成了具有纳米调制周期的TiB2/TiAlN多层膜.分别采用表面轮廓仪、纳米力学测试系统、多功能材料表面性能实验仪和XRD,分析了调制周期对TiB2/TiAlN纳米多层膜机械性能的影响.结果表明大部分多层膜的纳米硬度和弹性模量值都高于两种个体材料混合相的值,在调制周期为25 nm时,多层膜体系的硬度超过了36GPa,性能达到较佳效果.     

Ar/N2气体比例对TaN/NbN纳米多层膜机械性能的影响

采用射频磁控溅射系统,以TaN和NbN作为体材料,制备了一系列TaN/NbN纳米多层膜.通过XRD,纳米力学测试系统分析了该体系合成中Ar/N2气体比例对多层膜结构与机械性能的影响.结果表明,纳米多层膜的硬度值普遍高于两种个体材料混合相的值;当FArFN2=10时TaN的(110)峰加强,TaN的晶体结构以六方结构为主,NbN的晶体结构以面心立方结构为主,此时,多层膜体系的硬度、弹性模量以及膜基结合性能均达到最佳效果(最大硬度为30 GPa),摩擦磨损实验表明,Ar/N2比为101的TaN/NbN多层膜较其他Ar/N2比的多层膜耐磨性更好,不易发生破损,适合实际应用.     

ZrC/ZrB2纳米多层膜的微观结构与机械性能的研究

选择ZrC和ZrB2为个体层材料,利用射频磁控溅射系统在室温下制备具有纳米尺寸的ZrC/ZrB2多层膜.通过X射线衍射仪、扫描电子显微镜、俄歇电子能谱、表面轮廓仪及纳米力学测试系统研究了调制周期与ZrC,ZrB2单层厚度比例(tZrCtZrB2)对多层膜生长结构和力学性能的影响.结果表明,多层膜的界面清晰,调制周期性好,大部分多层膜的纳米硬度和弹性模量值都高于两种个体材混合相的值,在调制比例tZrCtZrB2=11.7、调制周期为32 nm时,薄膜显示出很强的ZrC(111)择优趋向和较弱的ZrB2(001)及ZrB2(002)结构,同时产生硬度异常升高的超硬效应,其硬度达到42 GPa.多层膜的机械性能改善明显与其调制结构和多晶结构有着直接的联系.     

具有纳米调制结构的AlTiN/AlCrN复合涂层在干摩擦条件下的摩擦磨损性能研究

目的 研究干摩擦条件下不同AlTiN/AlCrN多层膜纳米调制结构对摩擦磨损行为的影响。方法 将处理过的合金工具钢和单晶硅片作为膜层生长的基底材料,在膜层制备之前,先对基底材料进行预处理,然后使用多靶磁控溅射纳米膜层系统沉积一系列不同调制周期和调制比的AlTiN/AlCrN纳米多层膜。通过控制涂层总厚度不变,在调制比为1︰1时,设计不同的调制周期,择优选出磨损量最小、耐磨性最好的调制周期,并以此为恒定值,进而设计不同调制比的试样。采用X射线衍射仪(XRD)、摩擦磨损试验机分析与表征纳米多层膜的微观结构和性能,研究调制周期和调制比对AlTiN/AlCrN纳米多层膜微观结构和干摩擦条件下摩擦磨损性能的影响。结果 AlTiN/AlCrN纳米多层膜主体均为面心立方结构,且在(111)、(200)和(220)晶面择优取向。调制结构对多层膜的磨损特性影响较大,当调制周期为14.4 nm时,在干摩擦条件下AlTiN/AlCrN纳米多层膜的摩擦磨损量最小;在调制周期恒定为14.4 nm情况下,当调制比为3︰1时,在干摩擦条件下AlTiN/AlCrN纳米多层膜的耐磨性能最好;AlTiN/AlCrN纳米多层膜的磨损机理主要以磨粒磨损和黏附磨损为主。结论 优化的AlTiN/AlCrN多层膜纳米调制结构技术可应用在切削刀具的表面再制造领域,从而延长刀具工作寿命,通过涂层良好的耐磨性能提升设备的加工效率。     

The microstructure and mechanical properties of TaN/TiN and TaWN/TiN superlattice films

The microstructure and the microhardness of the TaN/TiN and TaWN/TiN superlattice films have been studied with X-ray diffraction, transmission electron microscopy and microhardness tester. The results showed that both TaN/TiN and TaWN/TiN superlattice films have a cubic crystal structure with an epitaxially grown mode of polycrystallinity. Lattice constants of superlattice films are between those of the constituent materials. The superhardness effect was found in TaN/TiN and TaWN/TiN superlattice films and the maximum hardness value was 40.0 GPa at a modulation period of 9.0 nm for TaN/TiN, and 50.0 GPa at a modulation period of 5.6 nm for TaWN/TiN. It is proposed that the lattice mismatch affects the microhardness value and the peak position of maximum hardness. The inhibition of dislocation motion by alternating stress fields of interfacial coherent strains is believed responsible for hardness anomalies.     

Structure,hardness and tribological properties of nanolayered TiN/TaN multilayer coatings

TiN/TaN coatings, consisting of alternating nanoscaled TiN and TaN layers, were deposited using magnetron sputtering technology. The structure, hardness, tribological properties and wear mechanism were assessed using X-ray diffraction, microhardness, ball-on-disc testing and a 3-D surface profiler, respectively. The results showed that the TiN/TaN coatings exhibited a good modulation period and a sharp interface between TiN and TaN layers. In mutilayered TiN/TaN coatings, the TiN layers had a cubic structure, but a hexagonal structure emerged among the TaN layers besides the cubic structure as the modulation period went beyond 8.5 nm. The microhardness was affected by the modulation period and a maximum hardness value of 31.5 GPa appeared at a modulation period of 8.5 nm. The coefficient of friction was high and the wear resistance was improved for TiN/TaN coatings compared with a homogenous TiN coating, the wear mechanism exhibited predominantly ploughing, material transfer and local spallation.     

结构调制超硬Ti/TiN纳米多层膜的制备及其尺寸效应

使用多弧离子镀技术在高速钢基体上制备了调制周期为5~40 nm的Ti/TiN纳米多层膜,用扫描电子显微镜(SEM)、X射线能谱仪(EDS)、X射线衍射仪(XRD)、纳米压痕仪和划痕仪等手段表征薄膜的微观结构和性能,研究了调制周期对Ti/TiN纳米多层膜性能的影响,并讨论了在小调制周期条件下Ti/TiN纳米多层膜的超硬效应和多弧离子镀技术对纳米多层膜硬度的强化作用。结果表明,与单层TiN相比,本文制备的Ti/TiN纳米多层膜分层情况良好,薄膜均匀致密,没有明显的柱状晶结构,TiN以面心立方结构沿(111)方向择优生长。随着调制周期的减小薄膜的硬度呈现先增大后减小的趋势,并在调制周期为7.5 nm时具有最大的硬度42.9 GPa和H/E值。这表明,Ti/TiN在具有最大硬度的同时仍然具有良好的耐磨性和韧性。Ti/TiN纳米多层膜的附着力均比单层TiN薄膜的附着力高,调制周期为7.5 nm时多层膜的附着力为(58±0.9) N。     

Influence of Ar/N2 Flow Rate on Structure and Property for TaN/NbN Multilayered Coatings

TaN/NbN multilayered coatings with nanoscale bilayer periods were synthesized at different Ar/N2 flow rates by RF （radio frequency） magnetron sputtering. XRD （X-ray diffraction） and Nano Indenter System were employed to investigate the influence of Ar/N2 flow rate （FAr：FN2） on microstructure and mechanical properties of the coatings. The low-angle XRD pattern indicated a well-defined composition modulation and layer structure of the multilayered coating. All multilayered coatings almost revealed higher hardness than the rule-of-mixtures value of monolithic TaN and NbN coatings. At FAr：FN2=10, the multilayered coating possessed desirable hardness, elastic modulus, internal stress, and fracture resistance, compared with ones synthesized at other Ar/N2 flow rates. The layered structure with strong mixture of TaN （110）, （111）, （200） and Nb2N （101）textures should be related to the enhanced mechanical properties.     

Microstructure and mechanical properties of polycrystalline NbN/TaN superlattice films

The polycrystalline NbN/TaN superlattice films have been grown on the substrates of 18-8 stainless steel by reactive magnetron sputtering. The microstructure and microhardness of the superlattice films have been studied with X-ray diffraction (XRD), high resolution transmission electron microscopy (HREM) and microhardness tester. The results showed that the NbN layers are of face cubic and the TaN layers are hexagonal crystal structure in the NbN/TaN superlattice films. The lattice plane (111) of NbN are coherent with the (110) of TaN and the lattice mismatch is 3.18%. The NbN/TaN superlattice film demonstrated superhardness effects. The maximum Knoop hardness value reached 5100 kgf/mm² with a modulation period from 2.3 nm to 17.0 nm. It was proved that even if NbN layers did not take the same crystal structure as TaN layers, hardness anomalous phenomenon still can be produced as long as the coherent strains exist.     

Bactericidal and biocompatible properties of TiN/Ag multilayered films by ion beam assisted deposition

Nanoscale TiN/Ag multilayered films of thickness 500 nm were synthesized on AISI317 stainless steel by ion beam assisted deposition (IBAD) with the modulation period of 4, 5, 6, 7.5, and 12 nm. The bactericidal and biocompatible properties of TiN/Ag multilayered films were investigated through Gram negative E. coli bacteria and L929 cells (mice fibroblast) as well as human umbilical vein endothelial cells (HUVEC). The results show that the TiN/Ag multilayered films with the modulation period of 7.5 nm possess the strongest bactericidal property. The cytotoxicity grade of TiN/Ag multilayered coating with the modulation periods of 7.5 nm, 12 nm is in 0-1 scope, which indicates this film has no cytotoxicity to L929. HUVEC on TiN/Ag multilayered film grows well and shows good cellularity. Auger electronic spectroscopy reveals the relationship between the structure of TiN/Ag multilayered film and the biomedical properties.     

Increase of hardness and oxidation resistance of VN coating by nanoscale multilayered structurization with AlN

AlN/VN nanoscale multilayered coatings with various bilayer periods from 2.1 nm to 10.0 nm have been prepared by alternating deposition of AlN and VN. The maximum hardness, 45.4 GPa, was obtained for the AlN/VN nanoscale multilayered coating with bilayer period of 2.1 nm, which is an increase of 54% over the rule of mixture hardness value (29.5 GPa) of AlN and VN coatings. The mass gain of heat-treated AlN/VN nanoscale multilayered coating at temperatures from 600 °C to 700 °C in air was measured to be less than that of the VN single layered coating, which indicates that the oxidation resistance as well as hardness of the VN coating can be increased by nanoscale multilayered structurization with AlN.     

Bactericidal and biocompatible properties of TiN/Ag multilayered films by ion beam assisted deposition

Nanoscale TiN/Ag multilayered films of thickness 500 nm were synthesized on AISI317 stainless steel by ion beam assisted deposition (IBAD) with the modulation period of 4, 5, 6, 7.5, and 12 nm. The bactericidal and biocompatible properties of TiN/Ag multilayered films were investigated through Gram negative E. coli bacteria and L929 cells (mice fibroblast) as well as human umbilical vein endothelial cells (HUVEC). The results show that the TiN/Ag multilayered films with the modulation period of 7.5 nm possess the strongest bactericidal property. The cytotoxicity grade of TiN/Ag multilayered coating with the modulation periods of 7.5 nm, 12 nm is in 0–1 scope, which indicates this film has no cytotoxicity to L929. HUVEC on TiN/Ag multilayered film grows well and shows good cellularity. Auger electronic spectroscopy reveals the relationship between the structure of TiN/Ag multilayered film and the biomedical properties.     

Modulation periods and ratios induced changes of microstructure and mechanical properties of AlN/ZrB2 multilayered coatings

AlN/ZrB₂ multilayered coatings were synthesized in a magnetron sputtering system. The extensive measurements were employed to investigate the influence of different nanoscale modulation periods and modulation ratios on microstructure and mechanical properties of the coatings. Analysis of X-ray diffraction, profiler and nanoindention indicated that multilayered coatings possessed much higher hardness and elastic modulus than monolithic AlN and ZrB₂ coatings. At the substrate negative bias of −80 V, maximum hardness (34.1 GPa) and elastic modulus (469.8 GPa) were obtained in the multilayer with Λ = 30 nm and t_AlN:t_ZrB2 = 1:3. This hardest multilayer showed a marked polycrystalline structure with the strong mixture of ZrB₂ (001), ZrB₂ (100), ZrB₂ (101), AlN (100) textures.