测量透明膜层厚度的光程补偿法

一、测量装置简述该装置(图1)用于快速、非破坏性地测量透明膜层的厚度。红外灯泡1的缺紫外光线(为了避免用乳胶透明膜时感光)经抛物镜2聚光成平行光束射向标准光程补偿板B。由B′、B″两个表面反射60°后,再射向被测物A,由膜层表面A′及衬底A″反射经显微镜C进入视场。在视场中将看见两套白光彩色干涉带组,一套是标准光程补偿板引进的;另一套则是当A′-A″的光程正好被B′-B″的光程所补偿时,出现的白光零次干涉带。由于光线倾斜30°角入射,使膜层表面能反射出较强的反射光,可获得对比度     

一种新的膜厚测试技术

在“Y”型光纤一个端面上垂直放置涂有透明薄膜的基片 ,入射光在光纤—薄膜层—空气的界面处两次反射 ,由于两束反射光之间存在光程差 ,所以反射光发生干涉。不需要测量干涉条纹 ,仅通过对反射光谱的分析计算 ,可以测出薄膜的厚度以及折射率的数值。在单晶硅基片上做非晶的PSiO2 膜的甩膜实验中使用该方法测试PSiO2 膜的厚度 ,实验证明 ,该方法测量精度高、速度快 ,对薄膜无破坏作用。用卤素白光和红光的准单色光( 60 0nm～ 860nm)作为光源 ,膜厚范围为 0 5到几十微米 ,测量误差小于 4 0nm。进行了实验验证 ,给出了对噪声的处理方法     

用于超光滑表面无损检测的光学轮廓仪

所述的光学轮廓仪是利用双焦透镜产生的偏振光束经被检面反射后形成了一共路干涉体系，因此该干涉体系可对超光滑表面做非接触无损检测而无需标准参考面；同时，利用双通道电子共模抑制技术可有效地抑制系统的各类噪声；计算机控制测量，即时给出表面粗糙度参数，测量结果与计量用ＷＹＫＯ轮廓仪比对，结果吻合。仪器特别适合于均方程极值Ｒｑ为纳米及亚纳米量级的表面的测试，尤其是软质金属材料及膜层表面。其横向分辨率为１μｍ，纵向分辨率为０．１ｎｍ。     

X射线反射法和椭圆偏振法结合测量热处理溶胶-凝胶ZrO2薄膜的结构和光学参数

采用溶胶-凝胶法在硅片基底上制备ZrO2薄膜,在150℃～750℃范围内不同温度下进行热处理,研究了热处理对膜层结构和光学性能的影响。X射线反射用于膜层厚度和界面粗糙度分析,结果表明热处理温度由150℃升至750℃,膜层厚度由常温状态下的112.3nm减小到34.0nm,表面和界面粗糙度均小于2nm。以X射线反射法测得的膜层厚度为初始值,对椭圆偏振仪的测量结果进行拟合,得到不同温度的膜层折射率,结果表明热处理温度为550℃时膜层折射率达到最大值。X射线反射作为直接的膜层厚度测试手段,所得结果为准确分析椭偏光谱提供了参考。     

摩擦取向膜表面液晶薄层厚度的研究

基于液晶具有光学单轴晶体的性质 ,结合阿贝折射仪测出了方位折射率 ,利用反射椭偏消光法测量原理解决了在多层介质膜上液晶吸附层厚度测量问题。利用这种方法测量了经过摩擦取向处理的高分子取向膜表面的液晶薄层厚度。实验发现 ,经过不同摩擦强度处理后的取向膜吸附液晶薄层的厚度为 5 4nm± 3nm。     

铁氧体瓷棒真空镀膜技术

表面金属化的铁氧体瓷棒是铁氧体圆极化移相器的关键构件,表面金属化膜层的均匀性是其重要的指标.本文主要研究镀膜工艺、镀膜夹具对镀膜均匀性的影响.采用脉冲宽度经验测试法对铁氧体棒表面镀膜厚度进行测量,采用矢量网络分析仪及自制波导系统组成的测试系统对镀膜的铁氧体棒插入损耗进行测量.结果表明脉冲宽度测试法是一种较好的经验方法,适合于生产中对铁氧体棒表面膜层厚度进行测量;真空蒸发和磁控溅射镀膜的棒体其插入损耗指标没有明显的区别;磁控溅射工艺及夹具系统与真空蒸发工艺及夹具系统相比,更有利于获得较高的镀膜厚度一致性.     

一种简易的透射式多光束等厚干涉测量薄膜厚度的装置

薄膜厚度的测量,是真空镀膜技术中的一项重要内容。根据Fizeau条纹原理,做成了一种简易透射式多光束等厚干涉测定薄膜厚度的装置。它可以测量微米级的薄膜厚度,检查光学平面的质量,测量细丝的直径和光的折射率等,精度在2％左右。一、实验原理由光的干涉原理可知,任意两个相邻的明条纹或暗条纹之间的距离l由下式决定     

化学气相沉积金刚石薄膜生长的原位反射率测量

报道了化学气相沉积金刚石薄膜生长的原位反射率测量,提出了监控金刚石薄膜生长的激光反射多光束干涉的数学模型。通过原位反射率的测量,精确监控了金刚石薄膜的生长厚度,成功地制备了红外增透增,这种方法的测量装置简单、紧凑而且可靠。     

大型金属非球面反射镜的镀膜工艺

大尺寸球面厦非球面金属反射镜在一些科学实验和工程装置中有很多用途。本文叙述了用作氙灯集光器的偏离椭球镜和作成像场镜的抛物镜两种大尺寸金属非球面反射镜的真空镀膜工艺,以及氧化硅保护铝反射膜在近紫外及可见光谱区的反射特性。着重讨论了在氧气压下进行一氧化硅气相反应蒸发对提高镜面紫外反射的作用。文中还将讨论蒸气障板在改善大口径镜面涂层均匀性方面的积极作用,并且介绍了有关金属镜面上膜层牢固性能和若干工艺问题,最后罗列了一些参数和实验结果。紫外与可见光谱区的反射率是在斯屈朗多次反射系统中进行测量的。紫外区采用了小功率石英水银灯与IP28(美)光电倍增管作为辐射源与接收器。综合能量——白光的反射率是采用一般的绝对法来测定的。关于镜面的均匀性,在本项工作中主要追求反射能量的均匀,因此不作几何厚度够测量,只观察膜层干涉颜色和实际测量反射率。     

不锈钢表面黑色膜层的浸蚀去除

当前机加工不锈钢螺帽均采用锻压六棱柱的不锈钢条车制而成,锻烧面上的黑色氧化膜,一般刨削去除,费时、费料。为此,我们用化学抛光的方法去除表面黑色膜层,达到了光洁、装饰的要求。不锈钢表面的化学抛光是氧化皮中含有的金属氧化物与酸反应形成的H,一部分还原成氢气,起机械顶裂和剥落表面膜层的作用,还有部分H把高价氧化膜层还原成低价氧化膜层,迅速与酸反应而溶解,从而去除黑色膜层。     

医用诊断X射线半价层的测量

介绍了医用诊断X射线半价层测量的原理与曲线拟合法、平均值法、内插法、作图法等四种测量方法,结合实验数据分析了平均值法、内插法和拟合法的特点。医用诊断X射线束通常为“宽束”,曲线拟合法测量半价层需考虑积累因子的影响,通过调整吸收片厚度能快速计算出半价层;平均值法对于宽束X射线在较大的吸收片厚度范围内多次测量不能减小误差;内插法测量时内插间距的选择直接影响测量结果;采用平均值法和内插法时,所选吸收片厚度应使K/K0分布在1/2两侧。     

Untersuchung dünner Schichten mittels Röntgenreflektometrie

Thin film characterization by means of X‐ray reflectometry X‐ray reflectometry and diffractometry are widely used non‐destructive methods to characterize thin films in the total thickness range which is typically between 2nm and approximately 500nm. On special arrangements a resolution up to 1000nm layer thickness has been demonstrated. Layer stack morphology, surface topography, layer structure, material density, single layer or period thickness and surface and interface roughness are the typical structural parameters both of single layers and of multilayers which can be described by the measured data. The performance of the measurement setup is mainly influenced by the parameters of the incident X‐ray beam like beam divergence, monochromatism and photon energy. In the following the influence of the optical components in the beam path to angle and energy resolution of X‐ray reflectometry is discussed.     

基于光谱干涉椭偏法的薄膜厚度测量

薄膜厚度的测量在芯片制造和集成电路等领域中发挥着重要作用。椭偏法具备高测量精度的优点,利用宽谱测量方式可得到全光谱的椭偏参数,实现纳米级薄膜的厚度测量。为解决半导体领域常见的透明硅基底上薄膜厚度测量的问题并消除硅层的叠加信号,本文通过偏振分离式光谱干涉椭偏系统,搭建马赫曾德实验光路,实现了近红外波段硅基底上膜厚的测量,以100 nm厚度的二氧化硅薄膜为样品,实现了纳米级的测量精度。本文所提出的测量方法适用于透明或非透明基底的薄膜厚度测量,避免了检测过程的矫正步骤或光源更换,可应用于化学气相沉积、分子束外延等薄膜制备工艺和技术的成品的高精度检测。     

Effects of step slope on thickness measurement by optical interferometry for opaque thin films

Optical interferometry is a simple, quick and cheap method to measure the thickness of opaque thin films. The film edge, being formed as a step on the sample surface, is lighted with monochromatic light in an interference microscope, producing the interferogram that is recorded with a CCD camera. The film thickness (step height) is calculated by measuring offsets of the fringes across the step. However, the morphology of the film edge (step) significantly affects the thickness measurement, in some cases even yields false results. In this work, three kinds of methods were adopted to mask a part of the substrate surface during the deposition for fabrication of the step. The mask used was a thin silicon slice, a straight line of ink imprinted by a pen, or an Aluminum film. The step morphology recorded by a profilometer revealed large variation from one method to another. Accordingly, the accuracy of film thickness (step height) measurement by interferometry varies significantly. Results showed that large error occurs when the slope of the step is small and the step out spans the view field of the microscope. Therefore, the step should be fully visible in the view field of the microscope for reasonable measurement of thickness. A simple equation, in terms of geometrical configuration, is developed for this requirement.     

Scanning white-light interferometer for measurement of the thickness of a transparent oil film on water

The thickness of a transparent layer of oil upon the surface of water is measured as the distance between the surface of oil film and the interface of the oil with the water. Two experimental results have demonstrated that the interface can reflect a white-light beam well enough to form an interferogram, even if the light is subjected to oil-film dispersion. When a beam of white light is incident vertically onto the oil-film surface, a scanning white-light interferometer in the Michelson configuration is employed to locate two serial reflections, surface reflection and interface reflection. The thickness of the transparent oil film on water is calculated based on the separation of these two interferograms. A limitation thickness, approximately 250 microm with 1.25 microm resolution, is achieved under the condition that there is 50 nW of optical power incident onto the oil-film surface with a wavelength centered at 1310 nm.     

Differential laser trigonometry for measuring the oil film thickness on water

A differential laser trigonometry method is presented for measurement of the oil film thickness on a water surface. The thickness of an oil film can be obtained with two off-plane displacements to a benchmark plane obtained by the imaging spot displacement and the configuration parameter of the imaging system subtracted. The method has been tested in the laboratory via the examination of diesel oil and petroleum films. An experimental system setup has been developed, by which the maximum measurable thickness is 12?mm and the average measurement error is 6.05?µm. The results show that the method presented is feasible, and applicable to dynamic online measurement of oil film thickness of oil spills on the sea surface.     

Measurement of the refractive index and thickness of a transparent film from the shift of the interference pattern due to the sample rotation

A method is described for the simultaneous measurement of the refractive index and thickness of a transparent film. The method is based on the rotational shift of the interference pattern caused by the change of the light incidence angle. The refractive index is evaluated without any prior information about film thickness or about the substrate and its refractive index. In addition, the roughness of the interfaces and/or the presence of an unidentified thin layer are not important. In two experimental examples, the refractive index and thickness are measured for a GaN thin film and a cling-film.     

医用金属表面溶胶-凝胶法和离子束合成TiO2薄膜的结构、性能比较

采用溶胶－凝胶法和离子束增强沉积法在医用NiTi合金表面制备TiO2薄膜以提高其生物相容性。利用X射线衍射（XRD）、原子力显微镜（AFM）和X光电子能谱（XPS）对薄膜的结构、表面形貌及组成进行了比较研究；电化学腐蚀实验表明，两种方法制备的TiO2薄膜对金属基体均起到一种保护膜的作用，能够提高医用金属材料在模拟体液中的抗腐蚀性；对薄膜表面固定肝素抗凝血分子进行研究发现，溶胶－凝胶法制备的TiO2薄膜表面能够获得较好的肝素固定效果。     

医用金属表面溶胶-凝胶法和离子束合成TiO2薄膜的结构、性能比较

采用溶胶-凝胶法和离子束增强沉积法在医用NiTi合金表面制备TiO₂薄膜以提高其生物相容性.利用X射线衍射（XRD）、原子力显微镜（AFM）和X光电子能谱（XPS）对薄膜的结构、表面形貌及组成进行了比较研究;电化学腐蚀实验表明,两种方法制备的TiO₂薄膜对金属基体均起到一种保护膜的作用,能够提高医用金属材料在模拟体液中的抗腐蚀性;对薄膜表面固定肝素抗凝血分子进行研究发现,溶胶-凝胶法制备的TiO₂薄膜表面能够获得较好的肝素固定效果.     

Oxide thickness measurements by infrared ellipsometry

Current interest' in anodized aluminum surfaces as substrates for adhesive bonding has created a need to measure the properties of the oxide layer in a non-contacting manner. Visible light ellipsometry is a very sensitive non-contacting technique for measuring the thickness of very thin films on smooth surfaces whose optical constants are known. However, the method is limited to film thicknesses which are generally less than 2000 Å and validity is lost when there is appreciable scattering caused by the roughness of the substrate and the structure of the oxide itself. These objections become much less severe if the operating wavelength is in the infrared region. Such an infrared ellipsometer has been developed to measure the thickness of oxides produced by anodization of aluminum with production-finished surfaces. The instrument operates with a 10.6 μm beam from a low power CO₂ laser and uses a 6328 Å beam from a He-Ne laser for alignment and location of the measurement region. The oxides were formed on unclad 7075 aluminum by anodization in an ammonium pentaborate solution at constant current to termination voltages of from 25 to 275 V in 25 V increments. The measured ellipsometric quantities Δ and ψ were used to compute the corresponding metal oxide film thicknesses using a complex refractive index N = 2.39?i41.36 for the substrate. The results for a film refractive index of 1.50 were in close agreement with those measured with a scanning electron microscope. Elemental concentration profiles for each surface were made by Auger electron spectroscopy.