Sol-gel法制备ZnO:Cd薄膜及性能研究

采用Sol-gel法使用旋转涂覆技术在Si(100)基片上生长了ZnO:Cd薄膜.XRD结果表明:ZnO:Cd薄膜具有与ZnO一样的六角纤锌矿结构,随热处理温度的升高,(002)衍射峰强度逐增,FWHM减小,并沿c轴择优取向生长;透射光谱实验表明:以石英为基底,适度掺镉可降低薄膜的禁带宽度Eg,特别是在800℃、8?条件下,Eg=2.80eV,与纯ZnO的禁带宽度3.30eV相比,明显降低了光学禁带;光致发光谱(PL)实验表明:在吸收边附近均有较强的紫外发射峰,且随热处理温度升高呈规律的变化;电阻率测定表明:掺镉使薄膜导电性增强.     

掺杂对氧化钛薄膜光学性能的影响

采用电子束蒸发法制备掺杂铈的TiO2薄膜,研究掺杂铈对TiO2薄膜的折射率、透射率和禁带宽度的影响.实验发现适量掺杂CeO2会提高薄膜的折射率;并使氧化钛薄膜的禁带宽度Eg从3.27eV减小到2.51eV,从而使光本征吸收边从380nm红移到495nm,大大提高了对太阳光的利用能力.     

Ba0.9Sr0.1TiO3薄膜的椭偏光谱研究

用椭偏光谱仪首次在光子能量为2.15.2eV的范围内,测量了不同热处理温度下Ba0.9Sr0.1TiO3(BST)薄膜的椭偏光谱.建立适当的拟合模型,并用Cauchy色散模型描述BST薄膜的光学性质,用最优化法获得了所有样品的光学常数(折射率n和消光系数k)谱及禁带能Eg.比较这些结果,初步得到了BST薄膜的折射率n、消光系数k和禁带能Eg随退火温度变化的变化规律.     

MgZnO薄膜的制备及其光电特性

采用射频磁控溅射用x=0.00～0.45的MgxZn1-xO陶瓷靶在Si（100）和石英衬底上生长一系列的MgxZn1-xO薄膜。用XRD、XPS、透射谱和光电导谱对样品进行表征。结果表明用MgxZn1-xO薄膜在x≤0.325时具有单一（002）取向的六方结构,其禁带宽度Eg随x增加而增大,在薄膜表面入射光能量大于禁带宽度时有光电响应,并且在x=0.325时得到了禁带宽度为4.90eV的MgxZn1-xO薄膜。在x≥0.40时出现立方相结构,禁带宽度有所减小,说明此时已为混相薄膜。     

掺杂SnO2透明导电薄膜电学及光学性能研究

通过实验测量sol-gel工艺制备的Sb掺杂SnO2薄膜载流子浓度、迁移率、电阻率、膜厚、紫外－可见光区透射率，反射率等性质，详细研究了Sb掺杂SnO2薄膜电化学与光学性能，实验发现，薄膜具有良好的透光性和较高导电性，膜内载流子浓度高达10^20cm^-3，电阻率－10^-2Ω．cm， 透光率高达90％，SnO2膜禁带宽度Eg=3.7-3.80eV.     

聚吡咯胶囊合成方法与应用研究进展

采用基于第一性原理密度泛函理论的CASTEP程序软件包,运用LDA＋U的方法,计算了Cd1-xZnxTe的电子结构和光学性质。计算结果表明：通过LDA＋U的修正计算,得到的Cd1-xZnxTe禁带宽度与实验值接近,消除了Cd1-xZnxTe材料在电子结构计算中禁带宽度被低估的问题;赝势U的加入增加了轨道电子数目,电子的...     

Cd_(1-x)Zn_xTe材料电子结构和光学性质的第一性原理研究

采用基于第一性原理密度泛函理论的CASTEP程序软件包,运用LDA+U的方法,计算了Cd1-xZnxTe的电子结构和光学性质。计算结果表明:通过LDA+U的修正计算,得到的Cd1-xZnxTe禁带宽度与实验值接近,消除了Cd1-xZnxTe材料在电子结构计算中禁带宽度被低估的问题;赝势U的加入增加了轨道电子数目,电子的能级发生分裂,吸收谱图和折射谱图中的峰强增加,峰数减少。     

氧分压对TiO2膜结构与光学性质的影响

报道了用反应溅射法制备TiO2 膜的实验研究 .详细研究了膜的沉积、膜结构及其光学性质 ,随溅射氧分压的变化 .随氧分压由 6× 10 - 2 Pa增加到 9× 10 - 2 Pa时 ,晶体结构由金红石变到锐钛矿 ,氧分压超过 9× 10 - 2 Pa时趋向于无定形结构 .与膜结构密切相关的折射率n随氧分压的增大由 2 .4 4变到 1.96 ,禁带宽度Eg 则由大变小 ,然后再增大的变化 (3.4 1→ 3.2 6→3.4 2 ) .     

Ba0.9Sr0.1TiO3薄膜的椭偏光谱研究

用椭偏光谱仪首次在光子能量为2．1－5．2eV的范围内,测量了不同热处理温度下Ba0.9Sr0.1TiO3(BST)薄膜的椭偏光谱。建立适当的拟合模型,并用Cauchy色散模型描述BST薄膜的光学性质,用最优化法获得了所用样品的光学常数（折射率n和消光系数k）谱及禁带能Eg比较这些结果,初步得到了BST薄膜的折射率n、消光系数k和禁带能Eg随退火温度变化的变化规律。     

纳粹级氧化铟锡复合粉体生产技术

技术简介 氧化铟锡（ITO）是一种n型宽禁带半导体（Eg=3．5eV），禁带宽度值对应的波数为2．8×104cm^-1，对应的波长为365nm，处于紫外线的范围内。     

Multiple exciton generation in colloidal silicon nanocrystals

Multiple exciton generation (MEG) is a process whereby multiple electron-hole pairs, or excitons, are produced upon absorption of a single photon in semiconductor nanocrystals (NCs) and represents a promising route to increased solar conversion efficiencies in single-junction photovoltaic cells. We report for the first time MEG yields in colloidal Si NCs using ultrafast transient absorption spectroscopy. We find the threshold photon energy for MEG in 9.5 nm diameter Si NCs (effective band gap identical with Eg = 1.20 eV) to be 2.4 +/- 0.1Eg and find an exciton-production quantum yield of 2.6 +/- 0.2 excitons per absorbed photon at 3.4Eg. While MEG has been previously reported in direct-gap semiconductor NCs of PbSe, PbS, PbTe, CdSe, and InAs, this represents the first report of MEG within indirect-gap semiconductor NCs. Furthermore, MEG is found in relatively large Si NCs (diameter equal to about twice the Bohr radius) such that the confinement energy is not large enough to produce a large blue-shift of the band gap (only 80 meV), but the Coulomb interaction is sufficiently enhanced to produce efficient MEG. Our findings are of particular importance because Si dominates the photovoltaic solar cell industry, presents no problems regarding abundance and accessibility within the Earth's crust, and poses no significant environmental problems regarding toxicity.     

Carrier multiplication in InAs nanocrystal quantum dots with an onset defined by the energy conservation limit

Carrier multiplication (CM) is a process in which absorption of a single photon produces not just one but multiple electron-hole pairs (excitons). This effect is a potential enabler of next-generation, high-efficiency photovoltaic and photocatalytic systems. On the basis of energy conservation, the minimal photon energy required to activate CM is two energy gaps (2Eg). Here, we analyze CM onsets for nanocrystal quantum dots (NQDs) based upon combined requirements imposed by optical selection rules and energy conservation and conclude that materials with a significant difference between electron and hole effective masses such as III-V semiconductors should exhibit a CM threshold near the apparent 2Eg limit. Further, we discuss the possibility of achieving sub-2Eg CM thresholds through strong exciton-exciton attraction, which is feasible in NQDs. We report experimental studies of exciton dynamics (Auger recombination, intraband relaxation, radiative recombination, multiexciton generation, and biexciton shift) in InAs NQDs and show that they exhibit a CM threshold near 2Eg.     

Electrical and Optical Properties of GaSe Thin Films

The structure, electrical transport, and optical properties of GaSe films fabricated by means of radio-frequency (RF) magnetron sputtering in Ar were investigated. The as-sputtered GaSe films were amorphous, and their optical energy gap Eg are 1.9～2.6 eV. The effect of the synthesis conditions on the optical and electrical properties of the GaSe films has also been studied     

固溶体半导体Zn1-xMgxS薄膜性质研究

以ZnS、Mg粉末为原料,应用双源真空蒸镀法,在石英玻璃衬底上成功地制备了不同Mg含量x的三元固溶体半导体Zn1-xMgxS薄膜.根据薄膜的X射线能量色散谱、X射线衍射谱和紫外-可见吸收光谱,由Vegard定律得到在实验范围内不同Mg含量x的薄膜晶格常数a与x的关系可表达为a(x)＝0.53965-0.01415x(nm);薄膜的光学带隙Eg与x的关系可表达为Eg(x)=0.853x2+0.086x+3.662(eV).     

Plasmonic photosensitization of a wide band gap semiconductor: converting plasmons to charge carriers

A fruitful paradigm in the development of low-cost and efficient photovoltaics is to dope or otherwise photosensitize wide band gap semiconductors in order to improve their light harvesting ability for light with sub-band-gap photon energies.(1-8) Here, we report significant photosensitization of TiO2 due to the direct injection by quantum tunneling of hot electrons produced in the decay of localized surface-plasmon polaritons excited in gold nanoparticles (AuNPs) embedded in the semiconductor (TiO2). Surface plasmon decay produces electron-hole pairs in the gold.(9-15) We propose that a significant fraction of these electrons tunnel into the semiconductor's conduction band resulting in a significant electron current in the TiO2 even when the device is illuminated with light with photon energies well below the semiconductor's band gap. Devices fabricated with (nonpercolating) multilayers of AuNPs in a TiO2 film produced over 1000-fold increase in photoconductance when illuminated at 600 nm over what TiO2 films devoid of AuNPs produced. The overall current resulting from illumination with visible light is ～50% of the device current measured with UV (?ω>Eg band gap) illumination. The above observations suggest that plasmonic nanostructures (which can be fabricated with absorption properties that cover the full solar spectrum) can function as a viable alternative to organic photosensitizers for photovoltaic and photodetection applications.     

反应射频磁控溅射法制备HfTaO薄膜的热稳定性和光学性能

采用反应射频磁控溅射技术制备HfTaO薄膜,利用X射线衍射(XRD)分析了薄膜的微结构,通过紫外-可见光分光光度计测量了薄膜的透过谱,计算了薄膜的折射率和禁带宽度,利用原子力显微镜观察了薄膜的表面形貌。结果表明,随着Ta掺入量(10%,26%,50%)的增加,HfTaO薄膜的结晶化温度分别为800、900、950℃,Ta掺入量继续增加到72%,经过950℃退火处理的HfTaO薄膜仍然保持非晶态,具有优良的热稳定性。AFM形貌分析显示非晶HfTaO薄膜表面非常平整。在550nm处薄膜折射率n随着Ta掺入量的增大而增大,n的变化区间为1.90～2.15。同时HfTaO薄膜的光学带隙Eg随着Ta掺入量的增大而逐渐减小,Eg的变化区间为4.15～5.29eV。     

Cd掺杂量对Zn1-xCdxO合金带隙的影响

回顾了国内外Zn1-xCdxO合金带隙研究的发展历程,总结和归纳了近10年来关于Zn1-xCdxO合金中Cd原子分数x与Eg(eV)关系的数据及理论等研究成果.在此基础上,以近10年来文献中的试验数据作为分析样本,考虑多种情况对其进行回归拟合,并对不同拟合方法及Cd含量对Eg的影响进行了深入的分析讨论,建立了Cd含量x与Eg的经验关系式(x-Eg关系式).与试验值相比,使用新xEg关系式预测得到的Eg值与其符合得较好,表明所建立的关系式能比较准确地反映Zn1-x CdxO合金中Cd含量x与Eg之间的关系.     

Optical and structural properties of CuSbS2 thin films grown by thermal evaporation method

Structural, optical and electrical properties of CuSbS₂ thin films grown by thermal evaporation have been studied relating the effects of substrate heating conditions of these properties. The CuSbS₂ thin films were carried out at substrate temperatures in the temperature range 100-200 °C. The structure and composition were characterized by XRD, SEM and EDX. X-ray diffraction revealed that the films are (111) oriented upon substrate temperature 170 °C and amorphous for the substrate temperatures below 170 °C. No secondary phases are observed for all the films. The optical absorption coefficients and band gaps of the films were estimated by optical transmission and reflection measurements at room temperature. Strong absorption coefficients in the range 10⁵-10⁶ cm^− 1 at 500 nm were found. The direct gaps Eg lie between 0.91-1.89 eV range. It is observed that there is a decrease in optical band gap Eg with increasing the substrate temperature. Resistivity of 0.03-0.96 Ω cm, in dependence on substrate temperature was characterized. The all unheated films exhibit p-type conductivity. The characteristics reported here also offer perspective for CuSbS₂ as an absorber material in solar cells applications.     

The Effect of Tow Gaps on Compression after Impact Strength of Robotically Laminated Structures

When (robotic) Automated Fibre Placement (AFP) is used to manufacture aerospace components with complex three dimensional geometries, gaps between fibre tows can occur. This paper explores the interaction under compressive load of these tow gaps with impact damage. Two coupons with different distributions of tow-gaps were impacted. Results indicated that the area of delamination is smaller for an impact directly over a tow gap where the tow gap is situated close to the non-impact face. Subsequent Compression After Impact (CAI) testing demonstrated that both the formation of sublaminate buckles and subsequent growth of delaminations is inhibited by the presence of a tow gap near the nonimpact face. Non-destructive testing techniques and a computationally efficient infinite Strip model are used to analyse the damage resistance and damage tolerance of the coupons. A new validation of the Strip model is also presented.