The formation of a SiOx interfacial layer on low-k SiOCH materials fabricated in ULSI application

The characterizations of SiOCH films using oxygen plasma treatment depends linearly on the O₂/CO flow rate ratio. According to the results of Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS) analyses, it was found that the carbon composition decreases with increasing O₂/CO flow rate ratio, because more carbon in the Si–O–C and Si–CH₃ bonds on the film surface would be converted by oxygen radicals. It was believed that the oxygen plasma could oxidize the SiOCH films and form a SiO_x interfacial capping layer without much porosity. Moreover, the result of FTIR analysis revealed that there was no water absorbed on the film. A SiO₂-like capping layer formed at the SiOCH film by the O₂/CO flow rate ratio of 0.75 had nearly the same dielectric properties from the result of capacitance–voltage (C–V) measurement in our research.     

Epitaxial and polycrystalline BaFe12O19 thin films grown by chemical vapour deposition

Epitaxial and polycrystalline barium hexaferrite BaFe₁₂O₁₉ thin films were prepared by metalorganic chemical vapour deposition (MOCVD). Films were grown by a liquid MOCVD technique which aim is to control precisely the precursor vapour pressures. Two kinds of substrates were used: sapphire (001) and silicon thermally oxidized. On Si/SiO₂ films are polycrystalline and the magnetization is isotropic. On Al₂O₃ (001), structural studies reveal the films to be predominantly single phase, well crystallized without annealing procedure and with the c-axis perpendicular to the film plane; epitaxial relationships between the film and the substrate were determined. The magnetic parameters, deduced from vibrating sample magnetometer measurements, show a high dependence of the magnetization with the orientation of the field with respect to the surface of the film.     

缺陷对β-Ga2O3薄膜的结构和光学特性的影响

采用射频磁控溅射技术和后期退火在蓝宝石衬底上成功制备了β-Ga₂O₃薄膜。借助于X射线衍射(XRD)、拉曼散射光谱(Raman)、X射线光电子能谱(XPS)、以及二次离子质谱(SIMS)研究了缺陷对β-Ga₂O₃薄膜的结构和光学特性的影响。结果表明,未退火的Ga₂O₃薄膜呈现非晶态,随高温退火时间逐渐增加,非晶Ga₂O₃薄膜逐步转变为沿(-201)方向择优生长的β-Ga₂O₃薄膜。所有Ga₂O₃薄膜在近紫外到可见光区的平均透过率都高达95%,β相Ga₂O₃薄膜的光学带隙比非晶态薄膜增加~0.3 eV,且随退火时间的增加,β-Ga₂O₃薄膜的光学带隙也随之变宽。此外,发现非晶Ga₂O₃薄膜富含氧空位缺陷,高温退火处理后,β-Ga₂O₃薄膜中的氧空位浓度明显降低,但蓝宝石衬底中的Al极易扩散至Ga₂O₃薄膜层,并随退火时间的增加Al浓度明显增加,氧空位的降低和Al杂质的增加是导致β-Ga₂O₃薄膜光学带隙变宽的主要原因。     

Microstructures, densification and mechanical properties of TiC–Al2O3–Al composite by field-activated combustion synthesis

Dense TiC–Al₂O₃–Al composite was prepared with Al, C and TiO₂ powders by means of electric field-activated combustion synthesis and infiltration of the molten metal (here Al) into the synthesized TiC–Al₂O₃ ceramic. An external electric field can effectively improve the adiabatic combustion temperature of the reactive system and overcome the thermodynamic limitation of reaction with x < 10 mol. Thereby, it can induce a self-sustaining combustion synthesis process. During the formation of Al₂O₃–TiC–Al composite, Al is molten first, and reacted with TiO₂ to form Al₂O₃, followed by the formation of TiC through the reaction between the displaced Ti and C. Highly dense TiC–Al₂O₃–Al with relative density of up to 92.5% was directly fabricated with the application of a 14 mol excess Al content and a 25 V cm⁻¹ field strength, in which TiC and Al₂O₃ particles possess fine-structured sizes of 0.2–1.0 μm, with uniform distribution in metal Al. The hardness, bending strength and fracture toughness of the synthesized TiC–Al₂O₃–Al composite are 56.5 GPa, 531 MPa and 10.96 MPa m^1/2, respectively.     

Deposition of CeO2 films including areas with the different orientation and sharp border between them

Epitaxial films from one material, with sharp borders between contacting regions having different film orientation are grown on one surface of the substrate for the first time. The main reason for the deposition of thin ceria layers with mixed (001) and (111) orientations on a (1 02) sapphire substrate is determined. We suggest that this is related to the availability of surface defects which, in thin near-surface layers, deviate from stoichiometric composition. This in turn is connected with the loss of oxygen.

A technique for influencing CeO₂ film orientation is demonstrated. This involves specific preliminary processing of the substrate, and the selection of oxygen partial pressure during the deposition process.

High quality thin (30–50 nm) “protective” (001) CeO₂ epitaxial layers are prepared on (1 02) Al₂O₃. Structures comprising two epitaxial protective CeO₂ layers, orientations (001) and (111), are made on the base of (0001) and (1 02) sapphire substrates. The interface between the epitaxial layers is <1 000 nm.

Preliminary results using this method are described, and the possibility of creating a “bi-epitaxial” transition in thin YBa₂Cu₃O_7−x layers is explored.     

Characterization of intermetallic phases and oxides formed in annealed Ni/Al multilayer structures

Two different multilayer structures composed of ten alternating Ni and Al thin films were sputter deposited on Si (111) substrates. These multilayers with individual Ni and Al thin film thicknesses of about 25 nm and 38 nm and of 25 nm and 13 nm, respectively, have the average compositions of Ni_0.50Al_0.50 and Ni_0.75Al_0.25. The samples were heat treated in a differential scanning calorimeter instrument with a constant heating rate of 40 °C min ⁻¹ in Ar from room temperature to 550 °C. The compositions of as-deposited and heat-treated samples were studied with high-resolution Auger electron spectroscopy (AES) rotational depth profiling. X-ray photoelectron spectroscopy (XPS) analyses show an excess of Ni in both annealed samples. X-ray diffraction measurements of annealed multilayers show the formation of Ni₂Al₃ and NiAl₃ phases in the Ni_0.50Al_0.50 sample and the presence of Ni₃Al and Ni A1₃ phases with some excess of Ni in the Ni_0.75Al_0.75 sample. AES and XPS investigations of the reacted layers after 15 min annealing in air at 500 °C disclose considerably different surface oxide thin films: on the Ni_0.50Al_0.50 layer the oxide thin film consists of Al₂O₃ with a small amount of NiO, whereas that on the top of the Ni_0.75Al_0.25 layer is thicker and consists of NiO on top and some Al₂O₃ below.     

Growth of calcium carbonate by the atomic layer chemical vapour deposition technique

Thin films of CaCO₃ (calcite) have been grown with the atomic layer chemical vapour deposition (ALCVD) technique, using Ca(thd)₂ (Hthd=2,2,6,6-tetramethylheptan-3,5-dione), CO₂, and ozone as precursors. Pulse parameters for the ALCVD-type growth are found and self-limiting reaction conditions are established between 200 and 400 °C. Calcium carbonate films have been deposited on soda-lime glass, Si(100), -Al₂O₃(001), -Al₂O₃(012), -SiO₂(001), and MgO(100) substrates. The observed textures were: in-plane oriented films with [100](001)CaCO₃ [100](001)Al₂O₃ and [100](001)CaCO₃[110](001)Al₂O₃ on -Al₂O₃(001), amorphous films on -Al₂O₃(012) when grown at 250 °C, and columnar oriented films on soda-lime glass, Si(001), -SiO₂(001), and MgO(100) substrates with (00l) and (104) parallel to the substrate plane at 250 and 350 °C, respectively. The film topography was studied by atomic force microscopy and AC impedance characteristics were measured on as-deposited films at room temperature. The films were found to be insulating with a dielectric constant (_r) typically approximately 8. Thin films of CaO were obtained by heat treatment of the carbonate films at 670 °C in a CO₂-free atmosphere, but the thermal decomposition led to a significant increase in surface roughness.     

镍基高温合金定向凝固用陶瓷型壳粘砂反应

以合金表面粘砂比例和粗糙度为优化指标,采用多指标正交实验设计方法,通过极差分析研究了定向凝固用陶瓷型壳面层粒度配比和Cr₂O₃添加剂对铸件表面质量的影响。结果表明,铸件表面粘砂层的主要成分为Al₂O₃以及少量Cr、Ni等合金元素;调整陶瓷型壳面层的粒度级配能降低陶瓷型壳面层的孔隙率,使型壳面层形成致密的结构,从而减少在定向凝固过程中合金液向陶瓷型壳面层的渗入、减少铸件表面的物理粘砂;Cr₂O₃添加剂与型壳中的Al₂O₃反应生成的二元化合物Al₂O₃-Cr₂O₃或Al₂O₃-SiO₂-Cr₂O₃三元系产物,抑制了合金中的活性元素(Ni、Ti、Al等)与型壳中游离的SiO₂反应,从而减少铸件表面的化学粘砂、提高铸件的表面质量。     

Formation of MgAl2O4 in Al2O3-(Al-4wt.%Mg) composites

The Al₂O₃ particles are introduced into the Al-4wt.%Mg melt by the “vortex” method. After being cast, Al₂O₃-(Al-4wt.%Mg) composites are remelted at 700, 750, 800 and 850°C for different residence times to investigate the formation of MgAl₂O₄ (spinel).

The results show that MgAl₂O₄ is the unique interface of the Al₂O₃-(Al---Mg) composites held at 700–850°C. Fine MgAl₂O₄ crystals grow on the surface of the Al₂O₃ particle but, as the holding temperature and the residence time increase, some spinels will form themselves into pyramidal shape. The MgAl₂O₄ grows not only at the matrix-particle interface but also on the surface of the composite specimens. The formation reactions of interfacial MgAl₂O₄ are as follows: Mg(1) + 2Al(1) + 2O₂(g) = MgAl₂O₄(s)3Mg(1) + 4Al₂O₃(s) = 3MgAl₂O₄(s) + 2Al(1) Both of them are equally important.     

Surface characterization of GaN and AlGaN layers grown by MOVPE

Surface properties of GaN and Al_0.17Ga_0.83N materials grown by metal organic vapor phase epitaxy (MOVPE) were systematically investigated by X-ray photoelectron spectroscopy (XPS). Air-exposed samples showed highly non-stoichiometric surfaces, which included a large amount of natural oxides. Deposition of Al on the air-exposed GaN surface caused interfacial reactions, resulting in the formation of oxide layers including Al₂O₃ and Ga oxide at the interface. A natural oxide layer of AlGaN surface possessed a complicated composition distribution in depth where the Al-oxide component was dominant on the topmost layer. Such natural oxide layers were found to be removed from GaN and AlGaN surfaces after the treatment in an NH₄OH solution at 50°C for 10 min, resulting in oxide-free and well-ordered surfaces.