1.31μm InGaAsP/InGaAlAs TM偏振高速激光器的优化设计

报道了一种以InGaAsP(阱)/InGaAlAs(垒)量子阱为有源区的1.31μmTM偏振高速激光器。以1%张应变的In_(0.49)Ga_(0.51)As_(0.79)P_(0.21)作为阱层,0.5%压应变的InGaAlAs作为垒层,计算了由不同势垒带隙(1.309、1.232、1.177、1.136、1.040 eV)构成的五种多量子阱的发光特性,和由其构成的激光器的器件特性。数值模拟分析表明,采用适度小的势垒带隙,既能将载流子有效限制在有源区,又可以得到载流子在量子阱间的均匀分布,从而改善量子阱的发光特性和激光器的性能参数。该仿真对研制低阈值电流、高特征温度和大调制带宽的InGaAsP/InGaAlAs应变补偿量子阱激光器具有指导意义。     

In0.15Ga0.85As／GaAs多量子阱子能带跃迁压力效应

用光调制吸收光谱方法在不同压力条件下研究了In_(0.15)Ga_(0.85)As/GaAs应变多量子阱的子能带跃迁,发现子能带跃迁能量随压力的变化行为与构成量子阱的组成体材料带间跃迁能量的变化相似,并且子能带跃迁能量压力系数与量子阱的宽度有关。还讨论了压力可能引起的导带不连续率的变化和In_(0.15) Ga_(0.85)As应变层的临界厚度。     

InAs/InGaAs数字合金应变补偿量子阱激光器

采用气态源分子束外延在InP衬底上生长InAs/InGaAs数字合金应变补偿量子阱激光器.有源区的多量子阱结构由压应变的InAs/In_(0.53)Ga_(0.47)As数字合金三角形势阱和张应变的In_(0.43)Ga_(0.57)As势垒构成.X射线衍射测试表明赝晶生长的量子阱结构具有很高的晶格质量.在100K、130mA连续波工作模式下,激光器的峰值波长达到1.94μm,对应的阈值电流密度为2.58 kA/cm~2.随着温度升高,激光器的激射光谱出现独特的蓝移现象,这是由于激光器结构中相对较高的内部吸收和弱的光学限制引起最大增益函数斜率降低所导致的.     

In_(0.15)Ga_(0.85)As/GaAs和GaAs/Al_(0.3)Ga_(0.7)As量子阱的静压下光致发光的对照研究

在77K,0—60kbar范围内对在同一衬底上生长的In_(0.15)Ga_(0.85)As/GaAs和GaAs/Al_(0.3)Ga_(0.7)As量子阱的静压下的光致发光进行了对照研究。在GaAs/Al_(0.3)Ga_(0.7)As量子阱中同时观察到导带到轻重空穴子带的跃迁。而在In_(0.15)Ga_(0.85)As/GaAs阱中只观察到导带到重空穴子带的跃迁。与GaAs/Al_(0.3)Ga_(0.7)As的情况相反,In_(0.15)Ga_(0.85)As/GaAs 量子阱的光致发光峰的压力系数随阱宽的减小而增加。在压力大于48kbar时观察到多个与间接跃迁有关的发光峰,对此进行了简短的讨论。     

(Ga,Al)As/GaAs及GaInAsP/InP激光器中的深能级

采用深能级瞬态谱技术(DLTS),测定了用水平液相外延法生长的四层结构Ga_(0.7)Al_(0.3)A_3/GaAs,Ga_(0.26)In_(0.74)As_(0.6) P_(0.4)/InP 宽接触及质子轰击条形双异质结激光器中的深能级,对于这些深能级所引起的激光器退化问题进行了初步研究和讨论.     

具有高跨导和高峰值饱和漏电流的FET

<正> 据报导,美国桑迪亚国立实验室已研制成一种新的多应变量子阱场效应晶体管。这种晶体管是具有两个平行的10nm量子阱的GaAs/In_(0.2)Ga_(0.8)As结构,用Be从顶部和底部进行调制掺杂。晶体管的栅为1×150μm~2Ti/Au、     

新的高速长波Al_(0.48)In_(0.52)As/Ga_(0.47)In_(0.53)As多量子阱APD

一种新的长波(λ=1.3μm)超晶格雪崩光电二极管已工作。该器件结构为p~+in~+,是采用MBE生长的,在p~+和n~+Al_(0.48)In_(0.52)As透明层之间,由35个周期的Al_(0.48)In_(0.52)As(139A)/Ga_(0.47)In_(0.53)As(139A)多量子阱     

半导体、准分子激光器

本文报导作者在美国佛罗里达大学用MBE生长技术研制品格匹配的Al_x Ga_(1-x)As/GaAs单量子阱激光器,波长为820～850nm和In_x Ga_(1-x)As/GaAs应变层单量子阱激光器,波长为900～1100nm,通过理论分析和MBE生     

用低压MOCVD生长的Ga_(0 25)ln_(0.75)As_(0.5)P_(0.5)/InP异质结构超晶格和量子阱中的二维电子气

我们首次报告在 Shubnikov—de Haas实验中看到用低压 MOCVD 生长的 Ca_(0.25)In_(0.75)As_(0.5)P_(0.5)/InP 并质结,超晶格和多量阱中的二维电子气。Ga_xIn_(1-x)As_yP_(1-y)—InP 晶格匹配的合金,在异质结微波和光电器件应用方面可能是有用的材料。     

LP-MOVPE Ga_(1-x)In_xAs/InP量子阱结构材料

本文报道用低压金属有机化合物汽相外延(LP-MOVPE) 的方法生长了晶格匹配的Ga_(1-x)In_4As/InP 量子阱结构材料.X光双晶衍射和透射电子显微镜测量表明多量子阱结构的周期性和界面质量较好、光致发光和光吸收谱的测量都观测到因量子尺寸效应导致的带间跃迁向高能方向的移动.     

High quality compressively strained InP-based GaInAs(P)/GaInAsP multi-quantum well laser structures grown by metalorganic vapor phase epitaxy

The growth and characterization of strained GaInAs and GaInAsP multiquantum well (MQW) laser structures has been investigated. The use of triple axis x-ray diffraction (XRD), in addition to the conventional high resolution double crystal XRD, yields further information about the structural integrity of these complex structures. Buried heterostructure lasers with eight GaInAsP wells (+1.0% strain, 80Å thick) exhibit a record low threshold current of 3.1 mA. By using a constant As/P ratio in the wells and barriers of an MQW laser structure, we have shown that the structure can be annealed at 700°C for 1 h with only a minimal shift (-4 nm) in the photoluminescence emission wavelength. Conventional lattice-matched GaInAs/GaInAsP MQW structures exhibit a shift of-46 nm under the same conditions.     

微加工获得的F-P半导体激光器的光谱特性分析

利用微加工法可以在FP半导体激光器中引入具有反射功能的缺欠点或面来改进激光器的光谱特性。作者导出了含有多个缺欠点的微加工获得的FP半导体激光器(MMLD)的输出谱表达式,并对MMLD振荡模的边模被抑制的情况作了简要的说明。     

Ga/sub 0.8/In/sub 0.2/As/GaAs/Ga/sub 0.51/In/sub 0.49/P buried ridge structure single quantum well laser emitting at 0.98 mu m

The first fabrication is reported of a buried ridge structure Ga/sub 0.8/In/sub 0.2/As/GaAs/Ga/sub 0.51/In/sub 0.49/P laser emitting at 0.98 mu m grown by two-step low pressure metal organic chemical vapour deposition. The width of the ridge is 2 mu m. Laser output power greater than 40 mW with a threshold current of 30 mA has been measured. A typical quantum efficiency of eta =60% was obtained without any facet coating. Excellent homogeneity and uniformity have been achieved over a wafer area of 10 cm/sup 2/.<>     

Tunable twin-guide lasers with improved performance fabricated bymetal-organic vapor phase epitaxy

Tunable twin-guide (TTG) laser diodes have been fabricated using metal-organic vapor phase epitaxy (MOVPE) exclusively for all epitaxy stages. A significant performance improvement over previous experiments has been achieved with an effective current confinement in a considerably simpler laser structure. As a consequence, continuous wavelength tuning over 4.7 nm is obtained while maintaining a light output power per facet of 3 mW     

Simulation analysis of a high efficiency GaInP/Si multijunction solar cell

The solar power conversion efficiency of a gallium indium phosphide(GaInP)/silicon(Si)tandem solar cell has been investigated by means of a physical device simulator considering both mechanically stacked and monolithic structures.In particular,to interconnect the bottom and top sub-cells of the monolithic tandem,a gallium arsenide(GaAs)-based tunnel-junction,i.e.GaAs(n+)/GaAs(p+),which assures a low electrical resistance and an optically low-loss connection,has been considered.The J–V characteristics of the single junction cells,monolithic tandem,and mechanically stacked structure have been calculated extracting the main photovoltaic parameters.An analysis of the tunnel-junction behaviour has been also developed.The mechanically stacked cell achieves an efficiency of 24.27%whereas the monolithic tandem reaches an efficiency of 31.11%under AM1.5 spectral conditions.External quantum efficiency simulations have evaluated the useful wavelength range.The results and discussion could be helpful in designing high efficiency monolithic multijunction GaInP/Si solar cells involving a thin GaAs(n+)/GaAs(p+)tunnel junction.     

Vertically compact 15 GHz GaAs/AlGaAs multiple quantum well laser grown by molecular beam epitaxy

A GaAs/Al/sub x/Ga/sub 1-x/As multiple quantum well laser with an electrical modulation bandwidth exceeding 15 GHz has been fabricated. Optimised design of the waveguide, including development of high Al mole fraction (x=0.8) cladding layers, together with a coplanar electrode geometry, has resulted in a vertically compact laser structure suitable for integration.<>     

Advances in self-assembled semiconductor quantum dot lasers

In the past 20 years the semiconductor laser has become a key device in optical electronics because of its pure output spectrum and high quantum efficiency. As the capabilities of laser diodes have grown, so has the range of applications contemplated for them. A great success in semiconductor lasers has been brought by the ability to artificially structure new materials on an atomic scale by using advanced crystal growth methods such as MBE and MOVPE. The laser performance successes gained using quantum wells in optoelectronic devices can be extended by adopting quantum wire and quantum dot structures. There have been several reports of successful lasing action in semiconductor dot structures within the past few years. In this article I will briefly review the recent progress in the development of quantum dot lasers.     

Broadly tunable external cavity laser diodes with staggered thickness multiple quantum wells

Widely tunable low-threshold current laser diodes fabricated from an engineered multiple-quantum-well (MQW) gain structure consisting of three compressively strained In/sub 0.2/Ga/sub 0.8/As wells of different thicknesses are reported. Using a grating in an external cavity, a continuous-wave tuning range of 70 nm (911-981 nm) is measured for a 155-/spl mu/m semiconductor cavity length device at a current of 32 mA. This is the lowest reported bias current for a semiconductor laser with this broad a tuning range. A maximum continuous wave tuning of 80 nm (901-981 nm) has been measured at a bias current of 95 mA. At long wavelengths, a suppression of amplified spontaneous emission and preferential population of the lowest energy well were observed.     

半导体激光器中的光学灾变

介绍了用(NH4)2S和P2S5-NH4OH处理半导体激光器的表面来避免光学灾变的方法.重点介绍用氮离子注入形成窗口结构来避免光学灾变.     

NaCs激发态的预离解和碰撞去布居

激光激发光学薄的Cs-Na混合蒸汽,激光频率v调到Na共振跃迁的两翼,NaCs分子激发态预离解到Na3P1/2或3P3/2态,分支比定义为I（D1）/I（D2）,I（D1）,I（D2）分别是NaD1,D2线的强度,在Cs密度2～8×1014cm-3范围内,测量了从Na共振跃迁的蓝翼300cm-1到红翼100cm-1的分支比,得到了离解率之比和精细结构转移截面,在近翼,分支比与v有很大的关系。用对Na3PJ态共振激发的方法,也得到了精细结构转移截面,对结果进行了讨论.