用视频摄像技术测定纳米晶聚合物复合薄膜的传输损耗

研制了一种新的钛酸铅 聚醚醚酮 (PT PEK c)纳米晶聚合物复合薄膜 ,用视频摄像技术准确、实时地分析了这种复合薄膜的传输损耗。该方法包括一架高分辨率的数码相机和相应的数据处理软件 ,以及棱镜耦合系统 ,其测量范围为 0 5～ 10 0dB/cm ,用这种方法测得PT PEK c纳米晶聚合物复合薄膜在 6 33nm处的传输损耗为 3 0 9dB/cm。     

高掺铒硅基氧化钽脊形光波导

首次提出了采用Er-Ta共溅、高温退火的方法,在硅基二氧化硅表面制备高掺铒氧化钽（Er:Ta2O5）薄膜。利用棱镜耦合仪分析了铒掺杂浓度对Er:Ta2O5薄膜的折射率的影响,结果表明:Er:Ta2O5薄膜的折射率随着Er掺杂浓度的增加而略微降低,且所制备的薄膜没有明显的各向异性。在此基础上,成功制备出Er掺杂浓度分别为0、2.5、5、7.5 mol%的硅基Er:Ta2O5脊形波导,波导在1 550 nm波段可实现单模传输,通过截断法得到波导在1 600 nm波长处的传输损耗分别为0.6、1.1、2.5、5.0 dB/cm。在所制备的Er:Ta2O5薄膜中,尽管没有发现Er2O3结晶析出,但薄膜中的Er3+会影响Ta2O5晶体的结晶程度,进而增加波导的传输损耗。最终文中制备的掺杂浓度为2.5 mol%的硅基Er:Ta2O5脊形波导通过980 nm激光泵浦,在1 531 nm信号波长下达到了3.1 dB/cm的净增益。     

As2S8平面波导：退火-光照-退火循环作用下折射率的变化及光传输特性

蒸发沉积态的非晶半导体As2S8薄膜在退火-饱和光照-退火循环处理下,其折射率变化存在可逆。而对于在退火-非饱和光照-退火的连续处理,发现As2S8薄膜折射率先增加达到最大值,然后在退火作用下才出现可逆。退火处理引起S-S键态变化,导致非晶半导体As2S8薄膜结构达到一定稳定状态,伴随着薄膜厚度的减小。As2S8平面波导在130C 温度退火,然饱和光照,又经过130C 温度退火处理后,显示出约为0.27 dB/cm低的传输损耗,在波长632.8 nm导模下有良好的光传输性能。     

微细孔隙聚合物光波导技术的研究

采用纳米相位分离技术,通过四氢呋喃(THF)同时溶解两种互不相溶的聚合物材料聚甲基丙烯酸甲脂(PMMA)和聚苯乙烯(PS),并充分混合.在旋涂成膜后,用环己脘溶解薄膜中的PS,将其从薄膜中分离出来,从而得到带有特定孔隙的PMMA聚合物薄膜.从实验上研究了不同孔隙率下含有微细孔隙的PMMA薄膜波导的折射率和光传输损耗(632.8nm),并与无孔隙的PMMA薄膜波导的结果进行了比较.     

光纤在1.5μm波段零色散波长的长距离大容量传输

石英系光纤在1.5μm波长附近传输损耗最低,在1.5μm波段波长色散为零,最适于长距离大容量传输。一般,波长色散在1.3μm波段为零,可是,如果改变光纤结构(折射率分布形状和芯径等),零色散波长会移到1.5μm波段。以前,光纤的传输损耗大。最近,通常的光纤损耗都能保持在0.2dB/km,光纤在1.5μm波段为零色散波长。一些国家开始进行长距离大容量系统实验。例如:英国普莱塞公司使用平均损耗为0.21dB/km     

基于显微数字全息的生物薄膜折射率的测量

提出了一种基于显微数字全息相位重构图像的生物薄膜折射率的简便测量方法。利用角谱法对生物薄膜的显微数字全息图像进行重构,得到其复振幅分布,从中获得激光通过生物薄膜后的相位变化与薄膜厚度、薄膜中液体的折射率及薄膜折射率间的定量关系。通过等厚干涉和阿贝折射仪测得膜的厚度与液体的折射率,再从定量的相位变化中获得生物薄膜的折射率。以洋葱内表皮细胞层折射率的测量为例,进行了相应的实验验证,得到了波长为632.8nm下的折射率。理论与实验均表明,该方法是有效和切实可行的。     

氮化铝薄膜的厚度对场发射特性的影响

采用射频磁控溅射方法,在n型(100)Si基底上沉积了不同厚度(20~150 nm)纤锌矿结构的纳米AlN薄膜。在超高真空系统中测量了不同膜厚样品的场发射特性,发现阈值电场随着厚度的增加有增大的趋势。厚度为44 nm的AlN薄膜样品具有最低的阈值电场(10 V/μm),当外加电场为35 V/μm时,最高发射电流密度为284μA/cm2。AlN薄膜场发射F-N曲线表明,在外加电场作用下,电子隧穿了AlN薄膜表面势垒发射到真空。     

LBO晶体上1064 nm,532 nm二倍频增透膜的设计及误差分析

采用矢量合成法设计了LiB3O5(LBO)晶体上1064 nm,532 nm二倍频增透膜,在1064 nm处的反射率为0.0014%,532 nm处的反射率为0.0004%。根据误差分析,薄膜制备时沉积速率精度控制在 6.5%时,1064 nm处的反射率增加至0.22%,532 nm处增加至0.87%。材料折射率的变化控制在 3%时,1064 nm处的反射率达0.24%,532 nm处达0.22%。沉积速率和折射率控制的负变化不增大特定波长处的剩余反射率。与膜层折射率相比,薄膜物理厚度对剩余反射率的影响小。低折射率膜层的厚度变化对特定波长处的剩余反射率影响最明显,即为该膜系的敏感层。为改善膜基之间的附着力,选择Y2O3或SiO2作为过渡层,从过渡层的厚度匹配和膜层的折射率匹配两方面进行了相应的膜系匹配设计。     

纳米Mo膜的光学特性及最小连续膜厚研究

利用Lambda-900分光光度计，在波长为310～1250nm范围内测量了离子束溅射沉积不同厚度纳米Mo膜的反射率和透射率。选定波长为310nm，350nm，400nm，500nm，550nm，632nm，800nm，1200nm时对薄膜的反射率、透射率和吸收率随膜厚变化的关系进行了讨论。实验结果显示，纳米Mo膜的光学特性有明显的尺寸效应。提出将薄膜对光波长为550nm时的反射率和透射率随Mo膜厚度变化关系的交点对应的厚度作为特征厚度，该厚度可认为是纳米Mo膜生长从不连续膜进入连续膜的最小连续膜厚。利用原子力显微镜(AFM)观测膜厚在15．76nm时的表面形貌，此时表面形貌已呈现连续膜的特征。     

聚合物DR／PMMA薄膜的红外非线性光学特性

报道了聚合物DR/PMMA薄膜材料的红外光学特性及由薄膜材料形成法—珀腔结构的透射率随外加电压的变化规律,测定了折射率的色散n(λ)、三阶极化率χ~((3))(-ω;ω,0,0)和二次电光系数(kerr系数)R,在室温下测得波长为792.4 nm时χ~((3))=(2.0-i0.32)×10~(-11)esu,R=-(4.9-i7.9)×10~(-20)m~2/V~2。     

Sol-gel glass waveguide and grating on silicon

This paper reports on the fabrication and characterization of hybrid organic-inorganic glass sol-gel slab and channel waveguides by ultraviolet light imprinting in thin films deposited by a one-step dip-coating process. The adjustment of chemical composition of the materials provides precise selection of refractive index from 1.48 to 1.52 at the wavelength of 632.8 mn. The refractive index of the waveguides at 1.55 μm is similar to that of optical fiber, thus reducing the reflection loss between the two to less than 0.01 dB. The effect of ultraviolet light exposure and heat treatment on waveguide refractive index is studied. Fabrication parameters to produce ridge waveguides are optimized to achieve very smooth side walls. Propagation losses in these waveguides are ~0.1 dB/cm. Single mode buried waveguides, at 1.55 μm wavelength, with circular mode profile are demonstrated     

Polymer-Based Long-Range Surface Plasmon Polariton Waveguides for 10-Gbps Optical Signal Transmission Applications

We present characteristics of very thin Au strip waveguides based on long-range surface plasmon polaritons (LR-SPPs) along thin Au strips embedded in polymers. We also report a 10 Gbps optical signal transmission via LR-SPPs with the pig-tailed Au strip waveguide at a telecommunication wavelength of 1.55 mum. We limited the thickness, width, and length up to ~20 nm, ~ 10 mum, and ~5 cm, respectively, for practical applications. At 1.55 mum, loss properties of the Au strip waveguides were theoretically and experimentally evaluated with thickness, width and cladding material. The lowest propagation loss of ~1.4 dB/cm was experimentally obtained with the 14-nm-thick and 2-mum-wide Au strip. With a single-mode fiber, the lowest coupling loss of less than 0.1 dB/facet was achieved with the 14-nm-thick and 7.5-mum-wide Au strip. The lowest insertion loss was obtained 7.7 dB with the 14-nm-thick, 5-mum-wide, and 1.5-cm-long Au strip. The propagation loss was improved approximately 30% for the 17-nm-thick Au strip with lowering the refractive index of the cladding polymer by 0.01. In the 10 Gbps optical signal transmission experiment, the LR-SPP waveguide exhibits an excellent eye opening and a 2.2 dB power penalty at 10^-12 bit error rate. These all results indicate that the LR-SPP waveguide is a potential transmission line for optical interconnects to overcome inherent problems in electric interconnects.     

Fabrication and Evaluation of Nano-Scale Optical Circuits Using Sol-Gel Materials With Photo-Induced Refractive Index Variation Characteristics

Nano-scale optical circuits with core thickness of ~ 230 nm and core width of ~ 1 mum were fabricated and evaluated, using the photo-induced refractive index variation sol-gel materials, whose refractive index gradually increases by UV light exposure and baking. Propagation loss of linear waveguides was 1.86 dB/cm for TE mode and 1.89 dB/cm for TM mode at 633 nm in wavelength, indicating that there were small polarization dependences of ~ 0.03 dB/cm. Spot sizes of guided beams along core width direction and along core thickness direction were, respectively, 0.6 and 0.3 mu m for both TE mode and TM mode. Bending loss of S-bending waveguides was reduced from 0.44 to 0.24 dB for TE mode with increasing the bending curvature radius from 5 to 60 mu m. Although the bending loss for TM mode was slightly higher than that for TE mode, the difference was less than 10%. Branching loss of Y-branching waveguides was reduced from 1.33 to 0.08 dB for TE mode, and from 1.34 to 0.12 dB for TM mode with decreasing the branching angle from 80deg to 20deg. From these results, it is concluded that the photo-induced refractive index variation sol-gel materials can realize miniaturized optical circuits with sizes of several tens of microns and guided beam confinement within a cross section area less than 1.0 mum² with small polarization dependences, indicating potential applications to intra-chip optical interconnects.     

Optical transmission losses in polycrystalline silicon strip waveguides: Effects of waveguide dimensions, thermal treatment, hydrogen passivation, and wavelength

Signal propagation delays dominate over gate delays in the ever-shrinking ultra large scale integrated (ULSI) circuits. Consequently, silicon-based monolithic optoelectronic circuits (SMOE) with their light speed signal propagation can provide unique advantages for future generations of microprocessors. For such SMOE circuits, we need optical interconnects compatible with silicon technology. Strip waveguides consisting of polycrystalline silicon (polySi) clad with SiO₂ offer excellent optical confinement and ease of fabrication that are ideal for such interconnect applications. One major challenge with using this material system, however, is its insertion loss. In this paper we provide techniques for minimizing optical transmission losses in polySi strip waveguides. Our previous work using polySi strip waveguides, showed an optical transmission loss of 15 dB/cm at λ=1.55 μm, which is a communication wavelength of choice in optical fibers because it represents an absorption minimum. Similar measurements in crystalline silicon strip waveguides¹ yielded transmission losses of less than 1 dB/cm. Hitherto, in decreasing loss from 77 dB/cm to 15 dB/cm, we had minimized loss from surface scattering by improving the film surface morphology, and decreased bulk absorption with hydrogen passivation. In this paper we report a further reduction in the residual bulk loss from 15 dB/cm to 9 dB/cm. By experimenting with different waveguide core dimensions, we find that the contribution of bulk loss towards net transmission loss decreases with waveguide core thickness. Additionally, high temperature treatment provides strain relief in the polySi, decreasing transmission loss. Annealing in an oxygen ambient is not recommended because it always increases transmission loss. Hydrogen passivation improves transmission, attributable to passivation of light-absorbing dangling bond defect sites present at polySi grain boundaries. Together, these methods have resulted in the lowest measured loss value of 9 dB/cm at λ=1.55 μm. Since integrated SiGe and Ge photodetectors are more efficient at shorter wavelengths like λ=1.32 μm, transmission loss is also measured at λ=1.32 μm. Losses at the two wavelengths (1.32 μm and 1.55 μm) are similar when defects and stress in the waveguides are minimized.     

Anisotropic two-photon transitions in GaAs/AlGaAs multiple quantumwell waveguides

The two-photon absorption coefficient and induced nonlinear refractive index in both TE and TM modes of GaAs/AlGaAs multiple-quantum-well (MQW) strip-loaded channel waveguides are measured in the wavelength range from 1490 nm to 1660 nm. The two-photon absorption coefficient ranges from almost zero to 12 cm/GW, and the nonlinear refractive index is always on the order of 10^-13 cm ²/W in the wavelength window investigated. Strong nonlinear anisotropy is observed. The values of the two-photon absorption coefficient are obtained by calibrating the inverse transmission measurements. Those of the nonlinear refractive index are obtained by monitoring the signal spectrum broadening due to self-phase modulation. The wavelength dependences of the measured two-photon absorption coefficient and nonlinear refractive index are reasonably consistent with the theoretical predictions     

Porous Polymer Films with Gradient‐Refractive‐Index Structure for Broadband and Omnidirectional Antireflection Coatings

Porous polymer films that can be employed for broadband and omnidirectional antireflection coatings are successfully shown. These films form a gradient‐refractive‐index structure and are achieved by spin‐coating the solution of a polystyrene‐block‐poly(methyl methacrylate) (PS‐b‐PMMA)/PMMA blend onto an octadecyltrichlorosilane (OTS)‐modified glass substrate. Thus, a gradient distribution of PMMA domains in the vertical direction of the entire microphase‐separated film is obtained. After those PMMA domains are removed, a PS porous structure with an excellent gradient porosity ratio in the vertical direction of the film is formed. Glass substrates coated with such porous polymer film exhibit both broadband and omnidirectional antireflection properties because the refractive index increases gradually from the top to the bottom of the film. An excellent transmittance of >97% for both visible and near‐infrared (NIR) light is achieved in these gradient‐refractive‐index structures. When the incident angle is increased, the total transmittance for three different incident angles is improved dramatically. Meanwhile, the film possesses a color reproduction character in the visible light range.     

Low-Loss Polymer-Based Long-Range Surface Plasmon-Polariton Waveguide

To improve the propagation loss of polymer-based long-range surface-plasmon-polariton (LR-SPP) waveguide devices at the telecom wavelength range, low-loss LR-SPP waveguides were fabricated in an ultraviolet-curable acrylate polymer with a low refractive index and absorption loss. A propagation loss of 1.72 dB/cm at a wavelength of 1.55 mum was achieved with a 14-nm-thick and 3-mum-wide metal stripe.     

一种有机聚合物光波导的制备及性能研究

溶胶凝胶法制备了聚甲基丙烯酸甲酯(PMMA)掺杂偶氮类化合物分散红1(DR1)薄膜波导,并通过对薄膜厚度、折射率以及紫外-可见吸收谱的测量,分析了波导薄膜的性能。通过使用棱镜薄膜耦合装置激发薄膜波导的导模,观察导模激发情况。利用m线光谱学测量并计算了导模的同步角,计算了波导有效折射率,并在理论上分析了波导的一些重要参数。     

非线性吸收对聚合物PMMA/DR1光漂白的影响

研究了在1064nm处非线性吸收对有机聚合物材料PMMA/DR1光漂白的影响。实验结果表明,在较强的入射光作用下,由于双光子吸收的作用,使得PMMA/DR1发生光漂白,其折射率产生微小的变化,且随光漂白时间的增加而产生饱和。