新型稀磁半导体Cd1-xMnxIn2Te4的光学和磁学性能

采用垂直Bridgman法制备出了x＝0.1、0.22和0.4的Cd1-xMnxIn2Te4晶体.采用红外透射光谱法研究了晶体的红外光学特性.用超导量子磁强计测量了样品在温度范围5～300K和磁场强度范围0～5T内的磁化强度.在中红外波段透过率曲线变化很小.随着x的增加Cd1-xMnxIn2Te4的光学带隙移向高能端.磁化率倒数χ-1与温度T的关系曲线在高温区服从居里-万斯定律,在低温下x≥0.22时向下偏离该定律.与具有相同Mn2+浓度的Cd1-xMnxTe晶体相比Cd1-xMnxIn2Te4晶体的交换积分常数较小.     

新型稀磁半导体Cd1-xMnxIn2Te4的光学和磁学性能

采用垂直Bridgman法制备出了x＝0.1、0.22和0.4的Cd1-xMnxIn2Te4晶体.采用红外透射光谱法研究了晶体的红外光学特性.用超导量子磁强计测量了样品在温度范围5～300K和磁场强度范围0～5T内的磁化强度.在中红外波段透过率曲线变化很小.随着x的增加Cd1-xMnxIn2Te4的光学带隙移向高能端.磁化率倒数χ-1与温度T的关系曲线在高温区服从居里-万斯定律,在低温下x≥0.22时向下偏离该定律.与具有相同Mn2+浓度的Cd1-xMnxTe晶体相比Cd1-xMnxIn2Te4晶体的交换积分常数较小.     

高阻值Cd1-xZnxTe晶体的生长及其性能测试

通过适当的工艺措施,采用Bridgman法生长了直径为30mm的X射线及γ射线探测器级的Cd0.9Zn0.1Te晶锭.测试结果表明:该晶锭结晶质量良好,位错密度低,成分均匀,杂质含量低,红外透过率和电阻率都十分接近本征Cd0.9Zn0.1Te的值.并从晶体的生长特性、缺陷和杂质的角度,分析了生长高性能晶体的条件,研究了生长Cd1-xZnxTe晶体的x值与缺陷和杂质浓度之间的关系.     

Cd1-xMnxTe晶体衬底的红外透过性能

研究了生长态和退火后Cd1-xMnxTe晶片的吸收边和红外透过性能.Cd1-xMnxTe晶体采用垂直Bridgman法生长,获得面积为30 mm×40 mm的(111)面Cd1-xMnxTe单晶片;晶片在Cd气氛下退火.近红外光谱表明,吸收边的截止波长反映晶片的Mn含量范围为0.1887≤x≤0.2039,其中轴向成分波动差值约为0.0152,径向成分波动差值约为0.0013;x=0.2的Cd1-xMnxTe晶体吸收边的吸收系数变化范围为2.5～55 cm-1;退火后,晶体的吸收边位置没有变化,表明晶片中Mn含量未受到退火的影响.傅里叶变换红外透射光谱表明,晶片在红外光波数为4000～500 cm-1范围的红外透过率为45%～55%;退火后,晶片的红外透过率提高到61%以上,接近理论值65%.     

未掺杂CdZnTe与掺铟CdZnTe晶体的热处理

对于未掺杂Cd0.9Zn0.1Te晶片,采用在Cd/Zn气氛下,以In作为气相掺杂源进行热处理;而对于低阻In-Cd0.9Zn0.1Te晶片,则采用在Te气氛下进行热处理.分别研究了不同的热处理条件,包括温度、时间、pIn或pTe等对晶片电学性能、红外透过率以及Te夹杂/沉淀相的影响.结果表明,在Cd/Zn气氛下适当的掺In热处理和在Te气氛下适当的热处理均有效地提高了晶片的电阻率,分别达到2.3×1010和5.7×109Ω·cm,同时晶片的其他性能也得到明显改善.     

未掺杂CdZnTe与掺铟CdZnTe晶体的热处理

对于未掺杂Cd0.9Zn0.1Te晶片,采用在Cd/Zn气氛下,以In作为气相掺杂源进行热处理;而对于低阻In-Cd0.9Zn0.1Te晶片,则采用在Te气氛下进行热处理.分别研究了不同的热处理条件,包括温度、时间、pIn或pTe等对晶片电学性能、红外透过率以及Te夹杂/沉淀相的影响.结果表明,在Cd/Zn气氛下适当的掺In热处理和在Te气氛下适当的热处理均有效地提高了晶片的电阻率,分别达到2.3×1010和5.7×109Ω·cm,同时晶片的其他性能也得到明显改善.     

改进的垂直布里奇曼法生长CdZnTe晶体中的成分偏离现象

采用多种测试方法,对改进的垂直布里奇曼法生长Cd0.96Zn0.04Te晶体中的成分偏离标准化学计量比现象及其对晶体性能的影响进行了研究.X射线能谱成分测试表明,在晶锭的头部即初始结晶位置,(Cd+Zn)/Te比大于1;而在中部及末端,小于1.表明这种方法生长的CZT晶体仍然存在对标准化学计量比的偏离现象,开始结晶是在富Cd熔体中,生长至中后段则是在富Te条件下进行的.PL谱测试表明,富Cd的晶片内存在大量Te空位,严重富Te的晶片内Cd空位及其杂质复合体等引起的缺陷密度显著增加.晶体红外透过率测试结果表明,接近化学计量配比的CZT晶片具有高的红外透过率.     

改进的垂直布里奇曼法生长CdZnTe晶体中的成分偏离现象

采用多种测试方法,对改进的垂直布里奇曼法生长Cd0.96Zn0.04Te晶体中的成分偏离标准化学计量比现象及其对晶体性能的影响进行了研究.X射线能谱成分测试表明,在晶锭的头部即初始结晶位置,(Cd Zn)/Te比大于1;而在中部及末端,小于1.表明这种方法生长的CZT晶体仍然存在对标准化学计量比的偏离现象,开始结晶是在富Cd熔体中,生长至中后段则是在富Te条件下进行的.PL谱测试表明,富Cd的晶片内存在大量Te空位,严重富Te的晶片内Cd空位及其杂质复合体等引起的缺陷密度显著增加.晶体红外透过率测试结果表明,接近化学计量配比的CZT晶片具有高的红外透过率.     

碲硒锌镉单晶体的垂直布里奇曼法生长与性能研究

碲锌镉(CdZnTe)是目前最重要的室温半导体核辐射探测器材料。而在CdZnTe晶格中以Se替位部分Te得到碲硒锌镉(CdZnTeSe),将使得晶格中离子键的成分增加,从而提高晶体的硬度,降低Cd空位和Te夹杂物缺陷浓度,提升材料质量。为了获得适宜于核辐射探测器制备的CdZnTeSe晶体,研究了富Te条件下CdZnTeSe晶体的垂直布里奇曼法生长,成功制备出直径为21 mm、长度超过70 mm的Cd_0.9Zn_0.1Te_0.97Se_0.03单晶锭。所得Cd_0.9Zn_0.1Te_0.97Se_0.03晶体的(110)面X射线衍射摇摆半峰宽达到0.104°,而Te夹杂相的尺寸小于5μm,表明晶体具有良好结晶性。Cd_0.9Zn_0.1Te_0.97Se_0.03晶锭尾部的能带隙和红外透过率均低于晶锭的头部和中部,这可归因于Cd_0.9<...     

高阻值Cd_(1-x)Zn_xTe晶体的生长及其性能测试

通过适当的工艺措施,采用Bridgman法生长了直径为30mm的X射线及γ射线探测器级的Cd0 9Zn0 1Te晶锭.测试结果表明:该晶锭结晶质量良好,位错密度低,成分均匀,杂质含量低,红外透过率和电阻率都十分接近本征Cd0 9Zn0 1Te的值.并从晶体的生长特性、缺陷和杂质的角度,分析了生长高性能晶体的条件,研究了生长Cd1-xZnxTe晶体的x值与缺陷和杂质浓度之间的关系     

CdZnTe晶片的性能测试

测试了多个Cd0．9Zn0．1Te晶片的性能，包括红外透过率、成分分布、位错密度、Te沉淀／夹杂密度以及电阻率。研究表明，红外透过率与性能有着密切的联系：红外透过率的大小及红外透过率图谱的形状可反映晶片的成分分布、位错密度以及电阻率的情况。从晶片对红外光的吸收机理出发，对这些联系进行了详细的分析。     

CdZnTe晶片的红外透过率研究

测试了多个性能各异的Cd0.9Zn0.1Te晶片的红外透过率。研究表明,红外透过率与晶片的性能有着密切的联系,即红外透过率的大小及红外透过率图谱的形状可反映晶片的成分分布、位错密度以及杂质含量的情况。从晶片对红外光的吸收机理出发,对这些联系进行了详细的分析。     

Reduction of Inclusions in (CdZn)Te and CdTe:In Single Crystals by Post-Growth Annealing

(CdZn)Te with the composition of 3% Zn and In-doped CdTe single crystals were annealed at various annealing temperatures and under various Cd or Te pressures with the aim of eliminating Te or Cd inclusions. Te inclusions were reduced by Cd-saturated annealing at temperatures above 660°C. Only small (<1 μm) residual dark spots, located at the original position of as-grown inclusions, were observed after annealing. The size of Cd inclusions was reduced by Te-rich annealing at temperatures higher than 700°C. A specific cooling regime was used to eliminate new small Te precipitates (∼1 μm) concurrently formed on dislocations during Te-rich annealing. Poor infrared transmittance of samples with Cd inclusions was detected after Te-rich annealing; therefore, Cd-saturated re-annealing of annealed samples was used for increasing infrared transmittance to a value above 60%. Alternative models explaining the formation of star-shaped corona-surrounding inclusions are discussed.     

Evaluation of Mn Uniformity in CdMnTe Crystal Grown by the Vertical Bridgman Method

Cd_1−x Mn _x Te is a typical diluted magnetic semiconductor, as well as substrate for the epitaxial growth of Hg_1−x Cd _x Te. In this paper, the homogeneity of a Cd_1−x Mn _x Te (x = 0.2) single-crystal ingot grown by the vertical Bridgman method was studied. The crystal structure and quality of the as-grown ingot were evaluated. Near-infrared (NIR) transmission spectroscopy was adopted to develop a simple optical determination of the Mn concentration in the as-grown ingot. A correlation equation between cut-off wavelength λ _co from NIR transmission spectra and Mn concentration by inductively coupled plasma atomic emission spectrometry (ICP-AES) was established. Using this equation, we investigated the Mn concentration distribution in both the axial and radial directions of the ingot. It was found that the segregation coefficient of Mn in the axial direction of the ingot was 0.95, which is close to unity. The Mn concentration variation in the wafers from the middle part of the ingot was 0.001 mole fraction. All these results proved that homogeneous Cd_0.8Mn_0.2Te crystals can be grown from the vertical Bridgman method.     

Elimination of Inclusions in (CdZn)Te Substrates by Post-grown Annealing

Post-grown annealing of (211) (CdZn)Te substrates has been used for elimination of Te and Cd inclusions with the objective of improving the yield of inclusion-free substrates for MBE growth of (HgCd)Te. Different annealing temperatures and Cd/Te overpressures were used to find the optimum annealing conditions. Te inclusions were significantly reduced by Cd-rich annealing at temperatures higher than 660°C, together with increasing the infrared transmittance at 10 μm to above 60%. Good crystalline quality was preserved after the annealing. Te-rich annealing at 700°C was found to be the optimum method for elimination of most of the Cd inclusions; infrared transmittance at 10 μm was suppressed by the annealing, however. Final Cd-rich annealing is recommended for infrared transmittance improvement.     

Band gap tailoring and yellow band emission of Cd0.9−xMnxZn0.1S (x=0 to 0.05) nanoparticles: Influence of Mn concentration

Cd_0.9-xMn_xZn_0.1S nanoparticles with x=0 to 0.05 were prepared by a simple chemical co-precipitation method at room temperature. Crystal structure and optical properties of the synthesized nanoparticles have been analyzed by X-ray diffraction (XRD) and UV–visible spectrophotometer. XRD confirmed the phase singularity of the synthesized material, which also confirmed the formation of Cd–Mn–Zn–S solid solution rather than secondary phase formation. Energy dispersive X-ray spectra showed the presence of Cd, Zn, Mn and S in the synthesized samples. The observed higher absorbance and lower transmittance of Mn-doped Cd_0.9Zn_0.1S than Cd_0.9Zn_0.1S is due to the size effect and also the defect states induced by Mn. The decrease in energy gap at Mn=0.01 is due the ‘sp–d’ exchange interactions between band electrons in CdS and the localized ‘d’ electrons of the Mn²⁺ ions. The increase in energy gap after Mn=0.01 can be explained by the excessive carriers generated by the impurity atoms. Fourier transform infrared spectroscopy (FTIR) illustrated the vibration modes of Cd–Zn–Mn–S between the wave number 530 cm⁻¹ and 780 cm⁻¹. Mn=0.01 doped sample exhibits a relatively high PL intensity and covers most of the visible region than the other samples; so desirable for LED application. The intensity ratio of the green band (GB) to Mn-related yellow band (YB) is decreased after Mn=0.01 which may be due the size effect or reduction of surface defect at higher doping concentrations.     

Hg1-xMnxTe晶体的垂直Bridgman法生长系统温度场分析

利用ANSYS有限元软件,以实际炉膛内的温度分布为边界条件,分析了包括生长中的Hg0.9Mn0.1Te晶体和晶体生长炉在内的生长系统的温度场.结果表明,晶体、熔体、高压Hg蒸气和石英的存在,使炉膛内的温度分布趋于平缓.在气液(气固)界面、液固界面、石英坩埚顶部和底部,轴向温度出现转折.随着晶体的生长,固液界面的轴向温度梯度逐渐减小.当石英坩埚完全处于高温区或低温区时,所在位置的温度分布更均匀,但远离坩埚区域的温度场受到的影响很小.     

Thermomigration of Te precipitates and improvement of (Cd,Zn)Te substrate characteristics for the fabrication of LWIR (Hg,Cd)Te photodiodes

(Cd,Zn)Te wafers containing Te precipitates have been annealed under well defined thermodynamic conditions at temperatures below and above the melting of Te. Results of the examination of the wafers with infrared microscopy before and after the anneals indicate a substantial reduction of the Te precipitates in wafers annealed at temperatures in excess of the melting point of Te compared with those annealed at temperatures below the melting point of Te. These results confirm the thermomigration of liquid Te precipitates to be the principally operative mechanism during annealing in the elimination of these precipitates in (Cd,Zn)Te wafers. The occurrence of Te precipitates in (Hg,Cd)Te epitaxial layers grown on (Cd,Zn)Te substrates containing Te precipitates is also explained on the basis of thermomigration of these precipitates during LPE growth from the substrates to the epilayers. Absence of occurrence of Te precipitates in (Hg,Cd)Te epilayers grown on annealed (Cd,Zn)Te substrates with negligible Te precipitates is also confirmed. Usefulness of annealing (Cd,Zn)Te substrates—to eliminate Te precipitates—prior to epilayer growth is confirmed via demonstration of improved long wavelength infrared (Hg,Cd)Te device array performance uniformity in epitaxial layers grown on (Cd,Zn)Te substrates with negligible Te precipitates after annealing.     

根据红外透过率推断CdZnTe晶片的性能

采用傅里叶变换红外光谱仪测试了性能各异的多个CdZnTe晶片的红外透过率．研究表明，红外透过率的大小可以定性反映CdZnTe晶片的性能：红外透过率越高的晶片，其成分偏离越小，位错密度越低，电阻率越高．根据红外透过率大小随着波数的变化，红外透过率图谱可以分为4种，每一种图谱对应着具有不同性能的CdZnTe晶片，从晶片对红外光的吸收机理出发，对实验结果进行了初步分析。     

Effect of fluctuations on electron and phonon processes and thermodynamic parameters of Ag2Te and Ag2Se in the region of phase transition

Temperature dependences of electrical conductivity σ, thermoelectric power α, results of differential thermal analysis ΔT _y , thermal conductivity χ, temperature conductivity κ, and heat capacity C _p were studied in Ag₂Te and Ag₂Se semiconductors in the region of the phase transition. Two extrema are observed in the temperature dependence χ(T): a maximum in the region of the α′ → β′ transition and a minimum in the region of the β′ → β transition; these extrema are caused by the similar dependence C _p (T). It is shown that the α → α′ and β′ → β transitions are displacement transitions, while the α′ → β′ transition is of reconstruction type. It is established that the disorder parameter η in silver chalcogenides is highly smeared in the region of the phase transition; therefore, disordering of phases at the point of the phase transition is incomplete: 73, 62, and 48% in Ag₂Te, Ag₂Se, and Ag₂S, respectively. The minimum volumes V _ph for new phases are calculated; it is shown that the value of V _ph in displacement transitions is larger than in the reconstruction-type transitions.