共查询到19条相似文献,搜索用时 140 毫秒
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设计了一种简化的铝栅MOS半导体器件制作工艺流程,用6张掩模版成功制作出了基于表面电场效应原理的生物检测硅芯片传感器,采用SiO2-Si3N4复合栅介质层及耗尽型器件结构,以增强器件的识别与检测灵敏度。该传感器与常规铝栅MOS晶体管相比,去除了介质层表面的栅极导电层,代之以自组装技术制作生物薄膜并辅以栅参考电极作为控制栅极。用所制作的硅芯片传感器检测了相关生物蛋白质的电流响应,给出了该电流响应与器件沟道长度和沟道电阻及生物蛋白浓度等参数的关系,得到了较为满意的检测数据,达到了预期的基于表面电场效应的硅传感器制作和生物检测的目的。 相似文献
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利用对四联苯p -4P 以及五氧化二钒V2O5同时修饰导电沟道及源/漏电极,大幅
提高了基于酞菁铜CuPc场效应晶体管的性能。本文通过在绝缘层SiO2和有源层CuPc
之间插入p-4p缓冲薄层,同时在源/漏电极Al与有机半导体之间引入电极修饰层V2O5,
使得CuPc场效应晶体管的饱和迁移率和电流开/关比分别提高到5×10-2cm2 / V s和
104。p -4P能够诱导p型CuPc形成高度取向的连续薄膜,使得载流子能够在有源层中
更好地传输;而V2O5能够调节载流子的注入势垒,并可有效地降低沟道接触电阻(Rc)。
此方法能够在降低器件制备成本的前提下,大幅提高器件的性能。 相似文献
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以酞菁铜为有源层,二氧化硅为绝缘层,钛/金作为电极,制作了沟道宽长比为6 000/10的有机薄膜晶体管。通过比较在不同时期器件在空气环境中的电学特性,分析了环境对器件电学性能的影响。结果表明,在其他条件不变的情况下,当器件置于空气中时,其载流子的浓度和体电导率逐渐增大,迁移率几乎不受影响;相同栅极电压下器件达到饱和状态所需的源漏电压增大,线性区向饱和区推进;阈值电压减小,在栅极电压为0时,界面处逐渐形成导电沟道,器件从增强型向耗尽型转变。 相似文献
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本研究探索了一种电泳选域组装碳纳米管发射器到正栅极结构的衬底中作为三极管结构的场发射显示阴极的工艺.在这个工艺中,悬浊液中的碳纳米管在施加于栅极电极和阴极电极的电压的作用下移向并淀积到三极管结构的衬底中.同时,这个栅极电极的正电压能够排斥悬浊的碳纳米管,使栅极电极不吸附碳纳米管.实验结果表明,碳纳米管选域组装到栅极孔洞中去,并且每一个孔洞中碳纳米管具有相同的组装密度.该工艺成本低、可实现大面积阴极的制备,是一种在制备三极管型碳纳米管场发射显示阴极中可供选择的工艺. 相似文献
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电泳工艺制备阵列场发射阴极及其性能的研究 总被引:1,自引:1,他引:0
碳纳米管是理想的场发射冷阴极材料,阴极的图形阵列化是实现碳纳米管场发射显示器动态全彩视频显示的核心.三极管结构能够更好地进行矩阵寻址显示图像,且与常规的驱动电路相兼容,降低整体平板显示器件的制作成本.从实验出发,探索利用简单的电泳工艺制备图形化碳基薄膜阴极,采用与阴极成同一水平面的栅极的三极管结构,并对电泳的实验参数进行优化以提高阴极电压电流特性和发射的均匀性等问题,为场发射器件的制造提供优良的工艺基础.研究机械球磨和稀释悬浊液浓度对碳纳米管沉积均匀性的影响.实验结果表明稀薄的悬浊液的条件下可以在玻璃的银浆导电层上沉积较薄而均匀的碳纳米管膜,与丝网印刷工艺制备的阴极相比,均匀性更好,厚度更容易控制,具有更好的发射均匀性.测试图形化的阵列碳纳米阴极的三极管结构的场发射特性,发现当阳极电压保持在600 V,栅极电压接近500 V时,阳极电流能达到2.6 mA/cm2.荧光粉发光均匀,相比二极管结构具有更低的阈值电压,在亮度、均匀性和稳定性方面都有显著的优势. 相似文献
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本文设计了一种具有新型鳍状栅极结构的LDMOS功率开关器件(FG-LDMOS),该器件在导电沟道处纵向刻蚀一组浅沟槽,再经热氧化后填充作为场板的多晶硅。鳍状栅极结构在不改变器件尺寸情况下,增大了沟道的有效宽度,增强了场板效应。通过Silvaco TCAD仿真验证,结果表明FG-LDMOS较传统LDMOS具有更好的电学特性,如击穿电压提高了25%达到100 V,比导通电阻Ron.sp降低了25%至2.68 mΩ?cm2,品质因数FOM提高了94.5%到3.58 MW/cm2。此外该FG-LDMOS拥有优异的高频开关特性,其栅漏电容CGD降到了0.46×10-16 F/μm,跨导gm升至0.26 mS。 相似文献
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We report on low voltage vertical organic field effect transistors using crosslinked poly(vinyl alcohol) (cr-PVA) as gate insulator and copper phthalocyanine (CuPc) as channel semiconductor. Al is used as gate and drain electrode. Sn thin films deposited under proper conditions are used as intermediate grid electrode (source), since the Sn film morphology simultaneously shows pinholes and lateral intergrain connectivity, allowing in-plane charge transport. Our Al/cr-PVA/Sn/CuPc/Al VOFET operates at low voltages, presents specific transconductance of ∼0.45 S m−2 and a linear source-drain current on gate voltage dependence. 相似文献
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Y. Bai X. Liu L. Chen Khizar-ul-Haq M.A. Khan W.Q. Zhu X.Y. Jiang Z.L. Zhang 《Microelectronics Journal》2007,38(12):1185-1190
An organic thin-film transistor (OTFTs) having OTS/SiO2 bilayer gate insulator and MoO3/Al electrode configuration between gate insulator and source–drain (S–D) electrodes has been investigated. Thermally grown SiO2 layer is used as the OTFT gate dielectric and copper phthalocyanine (CuPc) for an active layer. We have found that using silane coupling agents, octadecyltrichlorosilane (OTS) on SiO2, surface energy of SiO2 gate dielectric is reduced; consequently, the device performance has been improved significantly. This OTS/SiO2 bilayer gate insulator configuration increases the field-effect mobility, reduces the threshold voltage and improves the on/off ratios simultaneously. The device with MoO3/Al electrode has similar source–drain current (IDS) compared to the device with Au electrode at same gate voltage. Our results indicate that using double-layer of insulator and modified electrode is an effective way to improve OTFT performance. 相似文献
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Static induction transistors (SITs) based on copper phthalocyanine (CuPc) were prepared and the dependence of static and transient characteristics on the edge features of the patterned Al gate electrode was studied. Devices having Al gate electrodes deposited with and without a gap between a shadow mask and the substrate were prepared. Devices prepared in the presence of the gap produces a thin transparent edge for the Al gate electrode which enhances the modulation of the drain current by the gate voltage. However, a repetitive slow transient of the drain current was observed for the devices using gap. This transient is considered to be due to the charge carrier trapping at Al dots in the active channel region. 相似文献
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This paper reports the experimental results for the humidity dependent properties of an organic field effect transistor.The organic field effect transistor was fabricated on thoroughly cleaned glass substrate,in which the junction between the metal gate and the organic channel plays the role of gate dielectric.Thin films of organic semiconductor copper phthalocynanine (CuPc) and semitransparent Al were deposited in sequence by vacuum thermal evaporation on the glass substrate with preliminarily deposited Ag source and drain electrodes.The output and transfer characteristics of the fabricated device were performed.The effect of humidity on the drain current,drain current-drain voltage relationship,and threshold voltage was investigated.It was observed that humidity has a strong effect on the characteristics of the organic field effect transistor. 相似文献
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I. Murtaz Kh S. Karimov Zubair Ahm I. Qazi M. Mahroof-Tahir T. A. Khan T. Amin 《半导体学报》2010,31(5):054001-5
This paper reports the experimental results for humidity dependent properties of organic field effect transistor. The organic field effect transistor was fabricated on thoroughly cleaned glass substrate, in which the junction between metal gate and organic channel plays the role of gate dielectric. The thin films of organic semiconductor copper phthalocynanine (CuPc) and semitransparent Al were deposited in sequence by vacuum thermal evaporation on the glass substrate with preliminary deposited Ag source and drain electrodes. Output and transfer characteristics of the fabricated device were performed. The effect of humidity on the drain current, drain current-drain voltage relationship, and threshold voltage have been investigated. It was observed that humidity has strong effect on the characteristics of organic field effect transistor (OFET). 相似文献
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《Organic Electronics》2008,9(5):816-820
We report on the electrical behaviour of metal–insulator–semiconductor (MIS) structures fabricated on silicon substrates and using organic thin films as the dielectric layers. These insulating thin films were produced by different methods, including spin-coating (polymethylmethacrylate), thermal evaporation (pentacene) and Langmuir–Blodgett deposition (cadmium arachidate). Gold nanoparticles, deposited at room temperature by chemical self-assembly, were used as charge storage elements. In all cases, the MIS devices containing the nanoparticles exhibited hysteresis in their capacitance versus voltage characteristics, with a memory window depending on the range of the voltage sweep. This hysteresis was attributed to the charging and discharging of the nanoparticles from the gate electrode. A maximum memory window of 2.5 V was achieved by scanning the applied voltage of an Al/pentacene/Au nanoparticle/SiO2/p-Si structure between 9 and −9 V. 相似文献
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Chunhong Li Feng Pan Xiujin Wang Lijuan Wang He Wang Haibo Wang Donghang Yan 《Organic Electronics》2009,10(5):948-953
Organic thin-film transistors (OTFTs) using high dielectric constant material tantalum pentoxide (Ta2O5) and benzocyclobutenone (BCBO) derivatives as double-layer insulator were fabricated. Three metals with different work function, including Al (4.3 eV), Cr (4.5 eV) and Au (5.1 eV), were employed as gate electrodes to study the correlation between work function of gate metals and hysteresis characteristics of OTFTs. The devices with low work function metal Al or Cr as gate electrode exhibited high hysteresis (about 2.5 V threshold voltage shift). However, low hysteresis (about 0.7 V threshold voltage shift) OTFTs were attained based on high work function metal Au as gate electrode. The hysteresis characteristics were studied by the repetitive gate voltage sweep of OTFTs, and capacitance–voltage (C–V) and trap loss-voltage (Gp/ω?V) measurements of metal–insulator–semiconductor (MIS) devices. It is proved that the hysteresis characteristics of OTFTs are relative to the electron injection from gate metal to Ta2O5 insulator. The electron barrier height between gate metal and Ta2O5 is enhanced by using Au as gate electrode, and then the electron injection from gate metal to Ta2O5 is reduced. Finally, low hysteresis OTFTs were fabricated using Au as gate electrode. 相似文献