8-羟基喹啉锂材料及器件特性的研究

阐述了蓝光材料Liq的合成及其提纯方法,并用Liq作为发光材料制备了蓝色有机发光器件,研究了CuPe对该器件特性的影响.结果表明,CuPe的加入降低了空穴载流子的注入势垒,有利于提高空穴注入能力,因而提高了器件的亮度和发光效率.在电压为16 V时,没有缓冲层的器件效率为0.363 cd/A,有缓冲层的器件效率为0.731 cd/A.     

利用MoO3为电极修饰层的F16CuPc/ CuPc异质结的双极性有机场效应晶体管

在本文中,我们利用钛青铜(CuPc)和氟化钛青铜(F16CuPc)作为空穴传输层和电子传输层的制备了具有异质结结构的有机场效应晶体管(OFETs)。与单层的F16CuPc晶体管相比,异质结结构的晶体管的电子迁移率从3.1×10-3cm2/Vs提高至8.7×10-3cm2/vs,然而,空穴的传输行为却没有被观测到。为了提高空穴的注入能力,我们利用MoO3对源-漏电极进行了修饰,有效地改善了空穴注入。并进一步证实了MoO3的引入使得器件的接触电阻变小,平衡了电子和空穴的注入,从而最终实现了器件的双极性传输。     

发光性能稳定的磷光与荧光复合型白光OLED

使用荧光染料TBPe和Ir(ppy)_2acac 、R-4B两种光染料,采用蓝/红绿双发光层的结构,并结合TPBi对空穴的有效限制作用 ,制备了结构为ITO/MoO₃(X nm)/ADN:(2%)TBPe(30 nm)/CBP:Ir(ppy)_2acac(14%):R-4B(2%)(5nm)/TPBi(10 nm)/Alq₃(30nm)/LiF(1nm )/Al(100nm)的磷光与荧光复合的白光OLED,其中,MoO₃的厚 分别为0、15、20、30和40nm,通过改变MoO₃的厚度调控载流子的注入能力,使用空穴阻挡层提高光效; 通过测量其电压、电流、亮度、色坐标和电致发光(EL)光谱等参数,研究不同厚度的MoO ₃对器件发光性能的影响。结果表明,在MoO₃厚为20nm的情况下,器件的效率滚降 最为平缓。在电压分别 为8、9、10、11、12和13V时,器件的色坐标分别为 (0.31,0.33)、(0.30,0.33)、(0.29,0.33)、(0.29,0.33)、(0.29,0.33)和(0.29, 0.33),具有较高的稳定性,原因为采用 蓝/红绿双发光层结构更有利于蓝光的 出射,且使用ADN主体材料掺杂蓝色荧光染料TBPe作为蓝光发光层降低三重态-三重态 湮灭几率。 研究还发现,在电压为11V、器件的亮度为9744cd/m²和电流密度为11.50mA/cm²时,最大器件的电流效率为 7.0cd/A。     

基于rubrene掺杂剂的高亮度白色有机电致发光器件

采用CBP主体材料中掺杂rubrene,制备了结构为ITO/2T-NATA(25 nm)/NPBX(20 nm)/CBP: 1%rubrene(10 nm)/NPBX(5 nm)/DPVBi(30 nm)/TPBi(20 nm)/Alq(10 nm)/LiF(1 nm)/Al的白光器件,此结构将器件的发光区控制在了DPVBi层和rubrene掺杂层.利用rubrene染料本身的载流子俘获空穴特性与CBP母体转移来的能量发射荧光特性,以及插入的5 nm NPBX的电子阻挡特性获得了高亮度的白光器件.此器件在驱动电压为16 V时最大亮度达到25 110 cd/m2,对应的色坐标为(0.30,0.34),在驱动电压为10 V时最大电流效率为5.32 cd/A,外量子效率为1.65%.而且,驱动电压在10～16 V时,即达到最大亮度和最大效率时,其色坐标都在白光等能点(0.33,0.33)附近.     

空穴缓冲层CuPc对有机电致发光器件特性的影响

采用旋涂和真空蒸发沉积工艺制备了结构分别为ITO/PVK:TPD/Alq3/Al和ITO/PVK:TPD/LiBq4/Alq3/Al的绿色和蓝色有机电致发光器件(OLED),并研究了空穴缓冲层CuPc对OLED特性的影响.结果发现:对于绿色OLED,CuPc的加入提高了器件的电流和亮度,改善了器件的性能;而对于蓝色OLED,CuPc的加入则加剧了载流子的不平衡注入,导致器件性能恶化.这表明空穴缓冲层CuPc对不同结构OLED的特性具有不同的影响,并通过器件的能级结构对此进行了解释.     

界面过渡层对黄光OLED发光性能的影响研究

研究了黄光OLED发光层间加入界面过渡层对OLED发 光性能的影响。实验制备新型黄光OLED的发光层结构为 CBP:R-4B/CBP:Girl:R-4B/CBP:GIrl,对比OLED的发光层结构为CBP:10%R-4B/CBP:10%GIrl、CBP: 10%GIrl/CBP:10%GIrl10%R-4B/CBP:10%R-4B和CBP:10%GIrl/CBP:10%R-4B。结果表明,在对比器 件的发光层界面间加入过渡层可显著提高器件的发光亮度和发光效率,新型器件在13V电压 下、电流密度为40.29mA/cm²时,发光亮度和发光效率分别达到 了11120cd/m²与27.59cd/A,较未加入过渡层的器件分别提 高了265%56.18%。分析认为,过渡层的 加入消除了由不同发光层间严格的界面效应而造成的界面缺 陷,增加了载流子传输速率与激子的复合效率,从而提升了器件的发光性能。     

基于PEDOT:PSS掺杂MoO3修饰有机电致发光器件性能的研究

有机电致发光器件因具有质量轻、亮度高、柔性 、宽视角和响应速度快等优点已经成 为下一代平板显示和照明领域的潜在主流技术。本文证实了MoO₃掺杂于PEDOT:PSS作为空 穴注入 层时,可以改善器件性能。与未掺杂器件相比,掺杂器件的亮度和效率显著提高,启亮电压 降低0.5 V。AFM,透光性和单空穴器件实验表明,当在ITO和空穴传 输层之间插入PEDOT:PSS :MoO₃后,由于修饰了ITO表面膜形貌,增加了绿光区透光性以及降低了空穴注入层电阻 从而提高了器件的性能。     

Nb2O5空穴注入层的引入对OLEDs性能的影响

在有机发光二极管典型的层状结构中,引入磁控溅射制备Nb2O5超薄膜作空穴注入层,制备了结构为ITO/Nb2O5/TPD/Alq3/A1的器件.Nb2O5层的引入,降低了空穴注入势垒,增强了空穴注入,同时有效阻挡了ITo中ln向有机层的扩散,减少了发光猝灭中心的形成,提高了器件的亮度和效率.研究了不同厚度Nb2 O5层对器件光电性能的影响,发现:当引入Nb2O5层厚度为2 nm时,亮度提高了近2倍,效率由3.5 cd/A增加到了7.8 cd/A,较好地改善了器件的性能,并且性能优于含有CuPc常规注入层的器件.     

以ZnO为空穴缓冲层的高效率有机电致发光器件

研制了在传统双层有机电致发光器件(OLED) ITO/NPB/AlQ/Al的阳极与空穴传输层间加入ZnO缓冲层的新型器件.研究了加入缓冲层后对OLED性能的影响,并比较了新型与传统OLED的性能,结果表明,新型器件比传统器件的耐压能力有了显著提高;当电压达到7 V时,发光效率提高了35%.分析认为,ZnO缓冲层的加入,改善了界面, 减少了漏电流,并且阻碍了空穴的注入,有利于改善空穴和电子的注入平衡,提高复合效率.     

CuPc作蓝色OLED的缓冲层对器件性能影响的研究

本文对以LiBq，作为发光层，PVK：TPD作为空穴输运层，结构为：ITO／PVK：TPD／LiBq4／Alq3／Al的蓝色有机电致发光器件，在相同工艺条件下引入和不引入CuPc缓冲层，进行了实验研究。结果表明：由于CuPc缓冲层的引入，使蓝色OLED的电流随电压的增大较未加CuPc的OLED相对缓慢；且启亮电压上升，发光亮度和效率下降。这主要是因为CuPc加入后，空穴注入势垒降低，使PVK：TPD／LiBq4界面空穴积累数量增大，产生的反向漂移电场阻碍了空穴多数载流子的注入；并进而致使发光层注入空穴数量减小，内建电场加强，激子形成几率变小，解离几率增大。     

GaInP/GaAs collector-up tunneling-collector heterojunction bipolar transistors (C-up TC-HBTs): optimization of fabrication process and epitaxial layer structure for high-efficiency high-power amplifiers

This paper describes a novel heterojunction bipolar transistor (HBT) structure, the collector-up tunneling-collector HBT (C-up TC-HBT), that minimizes the offset voltage V/sub CE,sat/ and the knee voltage V/sub k/. In this device, a thin GaInP layer is used as a tunnel barrier at the base-collector (BC) junction to suppress hole injection into the collector, which results in small V/sub CE,sat/. Collector-up configuration is used because of the observed asymmetry of the band discontinuity between GaInP and GaAs depending on growth direction. To minimize V/sub k/, we optimized the epitaxial layer structure as well as the conditions of ion implantation into the extrinsic emitter and post-implantation annealing. The best results were obtained when a 5-nm-thick 5/spl times/10/sup 17/-cm/sup -3/-doped GaInP tunnel barrier with a 20-nm-thick undoped GaAs spacer was used at the BC junction, and when 2/spl times/10/sup 12/-cm/sup -2/ 50-keV B implantation was employed followed by 10-min annealing at 390/spl deg/C. Fabricated 40/spl times/40-/spl mu/m/sup 2/ C-up TC-HBTs showed almost zero V/sub CE,sat/ (<10 mV) and a very small V/sub k/ of 0.29 V at a collector current density of 4 kA/cm/sub 2/, which are much lower than those of a typical GaInP/GaAs HBT. The results indicate that the C-up TC-HBT's are attractive candidates for high-efficiency high power amplifiers.     

High stability and low driving voltage green organic light emitting diode with molybdenum oxide as buffer layer

Green organic light emitting diodes (OLEDs) with copper phthalocyanine (CuPc), 4,4′,4″-tris[3-methylphenyl(phenyl)amino]triphenymine (m-MTDATA) and molybdenum oxide (MoO_x) as buffer layers have been investigated. The MoO_x based device shows superior performance with low driving voltage, high power efficiency and much longer lifetime than those with other buffer layers. At the luminance of 100 cd/m², the driving voltage is 3.8 V, which is 0.5 V and 2.2 V lower than that of the devices using CuPc (Cell-CuPc) and m-MTDATA (Cell-m-MTDATA) as buffer layer, respectively. Its power efficiency is 13.6 Lm/W, which is 38% and 30% higher than that of Cell-CuPc and Cell-m-MTDATA, respectively. The projected half-life under the initial luminance of 100 cd/m² is 42,400 h, which is more than 3.8 times longer than that of Cell-m-MTDATA and 24 times that of Cell-CuPc. The superior performance of Cell-MoO_x is attributed to its high hole injection ability and the stable interface between MoO_x and organic material. The work function of MoO_x measured by contact potential difference method and the J–V curves of “hole-only” devices indicate that a small barrier between MoO_x/N,N′-di(naphthalene-1-y1)-N,N′-dipheyl-benzidine (NPB) leads to a strong hole injection, resulting in the low driving voltage and the high stability.     

基于CuPc…C60的混合层异质结光伏器件性能研究

制备了基于CuPc…C60混合层异质结有机光伏器件,将其与CuPc-C60双层结构光伏器件进行对比研究。结果表明混合层结构器件性能得到改善,其开路电压、短路电流密度、填充因子和光电转换效率都有提高,分别从CuPc-C60双层结构器件的0.39V、1.92mA/cm2、0.36%、0.48依次提高到CuPc…C60混合层结构器件的0.48V、2.21mA/cm2、0.54%、0.51。根据整数电荷转移模型来分析光伏器件D/A界面及有机材料-ITO衬底界面特性,认为混合层异质结有机光伏器件给体材料HOMO与受体材料LUMO的能级差增加使得器件开路电压提高。混合层异质结有机光伏器件D/A界面面积增加和给体材料HOMO与受体材料LUMO的能级差增加都提高了激子的分离效率,所以器件的短路电流密度增加。     

CuPc buffer layer role in OLED performance: a study of the interfacial band energies

We present a UV photoemission (UPS) and topographic study of the indium–tin-oxide (ITO) anode used in organic light emitting diodes (OLEDs). The performance of these devices has been shown to be improved by introducing a thin layer of copper phthalocyanine (CuPc) between the anode and the hole-transport layer (HTL). While the device current at constant driving voltage increases with increasing CuPc thickness, the efficiency is optimized at 12–18 nm. In this article we address the issue of the charge (hole) injection process at the anode interface and demonstrate the importance of directly measuring the vacuum levels in quantitative study of the energy levels of OLED interfaces. As a result of this insight, many calculations relating to the relative energies of the bands at OLED interfaces may have to be revised and corrected. The interface morphologies were also studied using AFM to determine any changes with film growth.     

Highly Efficient Hole Injection Using Polymeric Anode Materials for Small‐Molecule Organic Light‐Emitting Diodes

A novel, highly efficient hole injection material based on a conducting polymer polythienothiophene (PTT) doped with poly(perfluoroethylene‐perfluoroethersulfonic acid) (PFFSA) in organic light‐emitting diodes (OLEDs) is demonstrated. Both current–voltage and dark‐injection‐current transient data of hole‐only devices demonstrate high hole‐injection efficiency employing PTT:PFFSA polymers with different organic charge‐transporting materials used in fluorescent and phosphorescent organic light‐emitting diodes. It is further demonstrated that PTT:PFFSA polymer formulations applied as the hole injection layer (HIL) in OLEDs reduce operating voltages and increase brightness significantly. Hole injection from PTT:PFFSA is found to be much more efficient than from typical small molecule HILs such as copper phthalocyanine (CuPc) or polymer HILs such as polyethylene dioxythiophene: polystyrene sulfonate (PEDOT‐PSS). OLED devices employing PTT:PFFSA polymer also demonstrate significantly longer lifetime and more stable operating voltages compared to devices using CuPc.     

用ZnS薄膜作为空穴缓冲层的高效率有机发光二极管

用磁控溅射方法制备的ZnS薄膜作为有机发光器件(OLEDs)的空穴缓冲层,使典型结构的 OLEDs(ITO/TPD/Alq/LiF/Al) 的发光性能得到改善.ZnS 缓冲层厚度对器件性能影响的实验结果表明,当ZnS缓冲层厚度为 5 nm 时,器件的亮度增加了2倍多;当ZnS缓冲层厚度为5、10 nm时,器件的发光电流效率增加40%.研究结果表明 ZnS 薄膜是一种好的缓冲层材料,它能够提高器件的发光效率,改善器件的稳定性.     

MoO3作空穴注入层的绿光有机电致发光器件制备及其性能研究

用真空热蒸镀的方法制备了绿光有机电致发光器件,并对其工艺流程进行了详细的描述。器件结构为ITO/MoO3(xnm)/N,N′-diphenyl-N,N′-bis(1-naphthyl)-(1,18-biphenyl)-4,4-diamine(NPB)(40nm)/tris(8-hydroxyquinoline)aluminum(Alq3)(60nm)/LiF(1nm)/Al(150nm),其中x=0,5nm。实验中,对ITO基片进行氧等离子体表面处理,能够有效减小ITO表面的接触角。通过对器件的光电性能测试,研究了MoO3作空穴注入层对有机电致发光器件性能的影响。实验结果表明,空穴注入层MoO3的最高占据分子轨道(HOMO)能级较好的与ITO功函数匹配,降低了空穴注入势垒,提高了器件的发光亮度和效率。当外加电压小于10V时,器件的电流密度随外加电压的增加而增加,但变化不明显;当外加电压大于10V时,器件的电流密度明显增强,发光色度几乎不随驱动电压的改变而改变,色坐标稳定在(0.36,0.55)附近。     

一种隐埋缓冲掺杂层高压SBD器件新结构

提出了一种新型隐埋缓冲掺杂层(IBBD)高压SBD器件,对其工作特性进行了理论分析和模拟仿真验证。与常规高压SBD相比,该IBBD-SBD在衬底上方引入隐埋缓冲掺杂层,将反向击穿点从常规结构的PN结保护环区域转移到肖特基势垒区域,提升了反向静电释放(ESD)能力和抗反向浪涌能力,提高了器件的可靠性。与现有表面缓冲掺杂层(ISBD)高压SBD相比,该IBBD-SBD重新优化了漂移区的纵向电场分布形状,在保持反向击穿点发生在肖特基势垒区域的前提下,进一步降低反向漏电流、减小正向导通压降,从而降低了器件功耗。仿真结果表明,新器件的击穿电压为118 V。反向偏置电压为60 V时,与ISBD-SBD相比,该IBBD-SBD的漏电流降低了52.2%,正向导通电压更低。     

Interfacial dipole in organic p–n junction to realize write-once–read-many-times memory

A new approach is exploited to realize nonvolatile organic write-once–read-many-times (WORM) memory based on copper phthalocyanine (CuPc)/hexadecafluoro-copper-phthalocyanine (F₁₆CuPc) p–n junction. The as-fabricated device is found to be at its ON state and can be programmed irreversibly to the OFF state by applying a negative bias. The WORM device exhibits a high ON/OFF current ratio of up to 2.6 × 10⁴. An interfacial dipole layer is testified to be formed and destructed at the p–n junction interface for the ON and OFF states, respectively. The ON state at positive voltage region is attributed to the efficient hole and electron injection from the respective electrodes and then recombination at the CuPc/F₁₆CuPc interface, and the transition of the device to the OFF state results from the destruction of the interfacial dipole layer and formation of an insulating layer which restricts charge carrier recombination at the interface.