Investigation of the transport properties of InSb single-crystal films obtained by directional crystallization

Both n-type and p-type InSb films (with a wide range of carrier concentration) were obtained by the directional crystallization method from the melt on large areas of mica, quartz and sapphire substrates. The p-type films were doped with germanium. It is shown that, depending on the crystallization conditions, one can obtain films of different structure: dendritic films, films containing macrodefects and homogeneous single-crystal films. The optimal growth conditions of single-crystal films having transport properties close to those of bulk material are given. The investigation of some transport properties in single-crystal p-type InSb films was carried out in the temperature range 77–600 K.A hole mobility in the range from 180 cm² V^-1 s^-1 to 5×10³ cm² V^-1 s^-1 in films with a concentration p=1.2×10¹⁶?5×10¹⁸cm^-3 of uncompensated acceptors was observed.An investigation of the concentration and temperature dependence of the hole mobility was carried out. Experimental results are in good agreement with the theory if a combined impurity, acoustic and optical mode scattering is taken into account.The phonon drag effect in p-type InSb films was observed. The temperature dependence of the thermoelectric power shows fair agreement with Herring's theory.     

Preparation and properties of epitaxial films of indium-doped lead tin telluride

Several hundred epitaxial films of indium-doped lead tin telluride were grown on BaF₂ substrates using a hot-wall method and a source material containing 0.5 at.%In. Films were grown from source materials containing SnTe at concentrations of 0, 22, 24.8 and 27.7 mol.%. The growth procedure, source material preparation and substrate preparation are described. The films were characterized by van der Pauw measurements of the mobility and carrier concentration at room temperature and 77 K. As finally developed, the growth procedures gave a high yield of films with mobilities at 77 K in the range of 3.5–4.5 m² V^-1s^-1.     

Electronic transport near the surface of indium antimonide films

Surface layer carrier concentrations and mobilities of n-type InSb films were separated from those of the bulk of the film through the magnetic field dependence of the Hall coefficient coupled with conventional galvanomagnetic measurements. This technique yields a surface electron density for the top plus bottom of the film of (3?5) × 10¹³ cm^?2 and a surface layer mobility of 1500–2000 cm² V^?1 s^?1, both largely independent of temperature. The surface density is found to decrease when the free surface is anodized.     

Temperature dependence of transport properties of evaporated indium tin oxide films

Indium tin oxide films with high conductivity and transparency were successfully prepared by evaporating an alloy of indium and tin covered with In₂O₃ powder. At room temperature the films have high carrier mobilities of about 60 cm² V^-1 s^-1. Conductivities as high as 5 × 10³ Ω^-1 cm^-1 and transmittance values of greater than 90% in the visible region of light were obtained. The carrier mobility was found to be inversely proportional to temperature in the high temperature range and independent of temperature in the low temperature range. The temperature dependence of the carrier conductivity indicated that the carrier excitation energy was less than 8.6 × 10^-6 eV. Mössbauer spectroscopy showed that the tin in all the high quality films was tetravalent.     

Bottom‐Up Grown 2D InSb Nanostructures

Low‐dimensional high‐quality InSb materials are promising candidates for next‐generation quantum devices due to the high carrier mobility, low effective mass, and large g‐factor of the heavy element compound InSb. Various quantum phenomena are demonstrated in InSb 2D electron gases and nanowires. A combination of the best features of these two systems (pristine nanoscale and flexible design) is desirable to realize, e.g., the multiterminal topological Josephson device. Here, controlled growth of 2D nanostructures, nanoflakes, on an InSb platform is demonstrated. An assembly of nanoflakes with various dimensions and morphologies, thinner than the Bohr radius of InSb, are fabricated. Importantly, the growth of either nanowires or nanoflakes can be enforced experimentally by setting growth and substrate design parameters properly. Hall bar measurements on the nanostructures yield mobilities up to ≈20 000 cm² V^?1 s^?1 and detect quantum Hall plateaus. This allows to see the system as a viable nanoscale 2D platform for future quantum devices.     

Structural,electrical and optical properties of r.f.-magnetron-sputtered SnO2:Sb film

The effects of gas composition, pressure and substrate temperature on the properties of relatively thick (0.2–0.8 μm) SnO₂ films deposited onto fused quartz substrates by r.f. magnetron sputtering are reported. The lowest resistivity of about 2 × 10^?3ωcm was attained for high rate deposition conditions of about $\text{1000}\text{A}\text{?}\text{min}{}^{\mathrm{?1}}$ on substrates at a temperature of 400°C in an atmosphere of 10% O₂. This value corresponds to a carrier density of 3 × 10²⁰cm^?3 and a mobility of 10 cm²V^?1s^?1. The crystal structure was found to be sensitive to all the above parameters. Low resistivity films showed a highly preferred orientation of (101) parallel to the substrate.     

Growth of polycrystalline Cd3As2 films on room temperature substrates by a pulsed-laser evaporation technique

Cd₃As₂ films were prepared by a pulsed-laser evaporation technique. The deposition onto fused quartz substrates was carried out in a vacuum chamber under a background pressure of about 0.6 × 10^?4 Pa. Energy-dispersive X-ray analysis, scanning electron microscopy, transmission electron microscopy and Hall measurements were used to characterize the films. The properties of the film as a function of their thickness and of the deposition parameters are discussed. It is shown that polycrystalline layers of Cd₃As₂ grow on substrates held at temperatures as low as 295 K. The room temperature electron concentrations and mobilities for such layers were (3.5–5.3) × 10¹⁸ cm^?3 and (0.6–1.06) × 10³ cm² V^?1 s^?1 respectively.     

Hot wall epitaxy of II–VI compounds: CdS and CdTe

CdS and CdTe films were grown by hot wall epitaxy on single-crystal CdTe, BaF₂ and SrF₂ substrates. The films grow epitaxially and do not show any misorientations under usual X-ray investigations. N-type films were grown by coevaporation of indium. Typical electron concentrations of up to 2 × 10¹⁷ cm^-3 in CdTe and 3 × 10¹⁸ cm^-3 in CdS were obtained. P-type CdTe layers were also obtained using antimony as a dopant, with hole concentrations up to 10¹⁸–10¹⁹ cm^-3. Room temperature values of the electron mobility up to 600 cm² V^-1 s^-1 for CdTe and 230 cm² V^-1 s^-1 for CdS were obtained. Minority carrier diffusion lengths larger than 1 μm were measured in n-CdTe layers grown on p-CdTe substrates. Deep level transient spectroscopy was used to characterize carrier traps in the CdTe films. The concentration of the traps was a function of the growth conditions and could be drastically reduced with annealing of the samples.     

Properties of polycrystalline silicon grown on insulating substrates by electron beam gun evaporation

Growth of polycrystalline silicon on insulating substrates such as glass, silicon dioxide and fused quartz was studied using an electron beam gun evaporation technique. Growth characteristics were studied as a function of substrate temperature. The results of scanning electron microscopy, secondary ion mass spectrometry and X-ray diffraction studies on various films are presented. Hall mobility, resistivity and carrier concentration measurements are also presented. Growth of polycrystalline films (as determined by X-ray diffraction studies) on glass substrates at as low a temperature as 525 °C were observed. Below this substrate temperature, films became amorphous. The grain size increased with the increase in the substrate temperature. The highest value of the Hall mobility measured was about 10 cm² V⁻¹ s⁻¹. Both n-type and p-type films were obtained.     

Effect of thin intermediate-layer of InAs quantum dots on the physical properties of InSb films grown on (001) GaAs

In this study the formation of a semiconducting InSb layer, preceded by the growth of an intermediate layer of InAs quantum dots, is attempted on (001) GaAs substrate. From the analysis of atomic-force-microscopy and transmission-electron-microscopy images together with Raman spectra of the InSb films, it is found that there exists a particular layer-thickness of ~ 0.5 μm above which the structural and transport qualities of the film are considerably enhanced. The resultant 2.60-μm-thick InSb layer, grown at the substrate temperature of 400 °C and under the Sb flux of 1.5 × 10^− 6 Torr, shows the electron mobility as high as 67,890 cm²/Vs.     

Nanocrystalline copper selenide thin films by chemical spray pyrolysis

Thin films of copper selenide were deposited onto amorphous glass substrates at various substrate temperatures by computerized spray pyrolysis technique. The as deposited copper selenide thin films were used to study a wide range of characteristics including structural, surface morphological, optical and electrical, Hall Effect and thermo-electrical properties. X-ray diffraction study reveals that the films are polycrystalline in nature with hexagonal (mineral klockmannite) crystal structure irrespective of the substrate temperature. The crystalline size is found to be in the range of 23–28 nm. The SEM study reveals that the grains are uniform with uneven spherically shaped and spread over the entire surface of the substrates. EDAX analysis confirmed the nearly stoichiometric deposition of the film at 350 °C. The direct band gap values are found to be in the range 2.29–2.36 eV depending on the substrate temperature. The Hall Effect study reveals that the films exhibit p-type conductivity. The values of carrier concentration and mobility for the film are found to be 5.02 × 10¹⁷ cm^?3 and 5.19 × 10^?3 cm² V^?1 s^?1; respectively for film deposited at 350 °C.     

Stress reduction and electric properties of InSb thin films grown by metalorganic vapor phase epitaxy on sapphire substrates with an InAs buffer layer

InSb thin films were grown by metalorganic vapor phase epitaxy using an InAs buffer layer on sapphire (0001) substrates. The stresses and strains in InSb were controlled by the thickness of the InAs buffer layer, and it was found that with decreasing compressive stress in InSb, the crystalline quality and the electrical properties improved. The thermoelectric properties of InSb were assessed and it was found that the power factor of InSb with a thickness of 5 μm reached as high as 5.8 × 10⁻³ W/mK² at 600 K.     

Optimization of thermoelectric properties on Bi2Te3 thin films deposited by thermal co-evaporation

The optimization of the thermal co-evaporation deposition process for n-type bismuth telluride (Bi₂Te₃) thin films deposited onto polyimide substrates and intended for thermoelectric applications is reported. The influence of deposition parameters (evaporation rate and substrate temperature) on film composition and thermoelectric properties was studied for optimal thermoelectric performance. Energy-dispersive X-ray spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy and Raman spectroscopy confirmed the formation of Bi₂Te₃ thin films. Seebeck coefficient (up to 250 μV K^− 1), in-plane electrical resistivity (≈10 μΩ m), carrier concentration (3×10¹⁹-20×10¹⁹ cm^− 3) and Hall mobility (80-170 cm² V⁻¹ s^− 1) were measured at room temperature for selected Bi₂Te₃ samples.     

Recrystallization of InSb thin films obtained by cathode sputtering

Thin polycrystalline n-type InSb films were prepared by cathode sputtering. The Hall mobility of the films was about $\text{300 cm}{}^2\text{V}\text{s}$. When the films were recrystallized by melting in an argon atmosphere at normal pressure, an influence of the sputtering conditions on the properties of the recrystallized films was found. Room temperature mobilities of $\text{4000 cm}{}^2\text{V}\text{s}$ were achieved after recrystallization.     

Effect of process parameters on the growth and properties of impurity-doped zinc oxide transparent conducting thin films by RF magnetron sputtering

Zinc oxide transparent conducting thin films co-doped with aluminum and ruthenium were grown on polyethylene terephthalate substrates at room temperature using RF magnetron sputtering. The crystal growth and physical properties of the films were investigated with respect to the variation of discharge power density from 1.5 to 6.1 W/cm² and sputtering pressure from 0.13 to 2.0 Pa. X-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM) showed that the films grown with 3.6 W/cm² power density and sputtering pressure of 0.4 Pa had the best crystallinity and larger pyramid-like grains. The optimized electrical resistivity had a lowest measured value of about 9 × 10⁻⁴ Ω cm. The low carrier mobilities of the films (3-8.9 cm² V⁻¹ s⁻¹) have been discussed in terms of what is believed to be the dominant effect of ionized impurity scattering, but in addition chemisorption of oxygen on the film surface and effect of grain boundaries are also thought to be significant. The transmittances of the films in the visible range are greater than 80%, while the optical band gaps are in the order of 3.337-3.382 eV.     

Control of carrier concentration of p-type transparent conducting CuScO2(0001) epitaxial films

Excess oxygen and 1-at% Mg co-doped CuScO₂[3R](0001) epitaxial films were prepared on a-plane sapphire substrates by combining two-step deposition and post-annealing techniques. The optical and electrical transport properties of the co-doped epitaxial films were compared with those of the CuScO₂[3R](0001) epitaxial films. No significant increase in optical absorption was observed in the co-doped epitaxial films, and the energy gap for direct allowed transition was estimated at 3.7 eV. The carrier concentration of CuScO₂[3R](0001) epitaxial films was controlled from ~ 10¹⁶ cm^- 3 to ~ 10¹⁸ cm^- 3 at room temperature by adjusting the excess oxygen and Mg co-doping. The electrical conductivity, carrier concentration, and Hall mobility of the most conductive film were 3.6 × 10^- 2 Scm^- 1, 8.5 × 10¹⁷ cm^- 3 and 2.6 × 10^- 1 cm²V^- 1 s^- 1 at room temperature, respectively. The temperature dependence of the electrical transport properties of the film exhibited semiconducting characteristics, and the activation energy estimated from the temperature dependence of the carrier concentration was 0.50 eV.     

Crystallography of epitaxially grown molybdenum on sapphire

Molybdenum thin films were deposited onto (0001), ($\text{1012}$) and (10$\text{12}$) sapphire substrates by electron-beam evaporation in ultrahigh vacuum. The surface morphology and crystallographic orientation of these films were characterized by electron microscope replication and reflection electron diffraction. The effect of the crystallographic plane of the sapphire substrates as well as that of the deposition rate on the crystallographic orientation of the deposited molybdenum films were examined in the temperature range 25°-1000°C. The epitaxial temperature range was 600°-900°C for basal plane substrates and 300°-1000°C for ($\text{1}$012) and (10$\text{1}$2) substrates. The orientation of the deposited film was strongly dependent on that of the sapphire substrate.     

Transparent amorphous conductive Cd-In-Sb-O thin films for flexible devices

Transparent conductive amorphous Cd-In-Sb-O thin films were deposited on a flexible polyethylene naphthalate film by rf magnetron sputtering at room temperature. The large Hall mobility of ∼26 cm² V⁻¹ s⁻¹ was observed on the films with carrier density >10²⁰ cm⁻³. The carrier density varied from the order of 10²⁰ to 10¹⁷ cm⁻³ with increasing the oxygen partial pressure. The Hall mobility reached up to ∼17 cm² V⁻¹ s⁻¹, even at carrier density of ∼10¹⁷ cm⁻³. Flexible transparent filed-effect transistor was also fabricated using the Cd-In-Sb-O thin films as a channel layer and the device performance was investigated. The device exhibited a field-effect mobility of ∼0.45 cm² V⁻¹ s⁻¹ and an on-off ratio of ∼10² at room temperature.     

Electrical transport parameters of heavily-doped zinc oxide and zinc magnesium oxide single and multilayer films heteroepitaxially grown on oxide single crystals

Heavily doped epitaxial ZnO:Al and Zn_1−xMg_xO:Al films were grown by radio frequency magnetron sputtering onto single crystalline substrates (sapphire, MgO, silicon) and characterized by structural and electrical measurements. It is the aim of this investigation to better understand the carrier transport and the doping mechanisms in heavily doped transparent conducting oxide (TCO) films. It was found that the crystallographic film quality determines only partly the mobilities and the carrier concentrations: ZnO:Al films on a-plane (110) sapphire and on MgO (100) exhibit the highest mobilities. The oxygen partial pressure during the deposition from ceramic targets is more important influencing especially the carrier concentration N of the films. Though the films grew epitaxially grain boundaries are still existent, which reduce the mobility due to electrical grain boundary barriers for N < 3 · 10²⁰ cm^− 3. From annealing experiments the role of point defects and dislocations for the carrier transport could be estimated. For carrier concentrations above 3 · 10²⁰ cm^− 3 ionized impurity scattering limits the mobility, which is in agreement with our earlier review [K. Ellmer, J. Phys. D: Appl. Phys. 34 (2001) 3097].     

Properties of GaN grown on sapphire substrates

Epitaxial growth of GaN on sapphire substrates using an open-tube growth furnace has been carried out to study the effects of substrate orientation and transfer gas upon the properties of the layers. It has been found that for the (0001) substrates, surface appearance was virtually independent of carrier gas and of doping levels. For the (1 ¯102) substrates surface faceting was greatly reduced when He was used as a transfer gas as opposed to H₂. Faceting was also reduced when the GaN was doped with Zn and the best surfaces for the (1 ¯102) substrates were obtained in a Zn-doped run using He as the transfer gas. The best sample in terms of electrical properties for the (1¯102) substrate had a mobility greater than 400 cm² V^–1 sec^–1 and a carrier concentration of about 2 × 10¹⁷ cm^–3. This sample was undoped and used He as the transfer gas. The best (0001) sample was also grown undoped with He as the transfer gas and had a mobility of 300cm²V^–1 sec^–1 and a carrier concentration of 1 × 10¹⁸ cm^–3.