Low temperature molten salt synthesis of YAG: Ce spherical powder and its thermally stable luminescent properties after post-annealing treatment

Spherical YAG: Ce particles were successfully synthesized at 350 °C by the molten-salt method. The effect of temperature and amount of salt on the crystallization and particle size of YAG: Ce were investigated thoroughly. The results demonstrated that the powders prepared at 350 °C in salt to reactant ratio 2:1 were pure YAG: Ce phase with 200–300 nm in particle size. The as-synthesized phosphors were later post annealed at 1200 °C in O₂, air and N₂, respectively. The results showed that the emission intensity of YAG: Ce sensitively depended on the post-treated atmosphere and the phosphor annealed in N₂ showed the highest emission intensities and a good thermal stability.     

Effect of 100 MeV O7+ ion beam irradiation on radio frequency reactive magnetron sputtered ZnO thin films

Zinc oxide (ZnO) thin films were deposited on sapphire substrates at room temperature by radio frequency (RF) magnetron sputtering. These films were irradiated with 100 MeV O⁷⁺ ions of the fluencies 5×10¹³ ions/cm² at room temperature (RT) and at liquid nitrogen temperature (LNT). Profilometer studies showed that the roughness of pristine and LNT irradiated ZnO thin films were higher than that of the RT irradiated ZnO thin film. The glancing angle X-ray diffraction analysis reveals a reduced intensity and increased full width at half maximum (FWHM) of the (002) diffraction peak in the case of LNT irradiated film indicating disorder. However, the intensity and FWHM of the (002) diffraction peak in the case of RT irradiated ZnO thin films are comparable to those of the pristine film. UV–visible transmission spectra show that the percentage of transmission and band gap energy are different for RT and LNT irradiated films. While the pristine ZnO thin film exhibits two emissions—a broad emission at 403 nm and a sharp emission at 472 nm in its photoluminescence spectrum; the emission at 472 nm was absent for the irradiated films. The atomic concentrations of zinc and oxygen during the irradiation process were obtained using auger electron spectroscopy.     

Properties of In2O3 films obtained by thermal oxidation of sprayed In2S3

In₂S₃ thin films were grown by the chemical spray pyrolysis (CSP) method using indium chloride and thiourea as precursors at a molar ratio of S:In=2.5. The deposition was carried out at 350 °C on quartz substrates. The film thickness is about 1 µm. The films were then annealed for 2 h at 550, 600, 650 and 700 °C in oxygen flow. This process allows the transformation of nanocrystal In₂O₃ from In₂S₃ and the reaction is complete at 600 °C. X-ray diffraction spectra show that In₂O₃ films are polycrystalline with a cubic phase and preferentially oriented towards (222). The film grain size increases from 19 to 25 nm and RMS values increase from 9 to 30 nm. In₂O₃ films exhibit transparency over 70–85% in the visible and infrared regions due to the thickness and crystalline properties of the films. The optical band gap is found to vary in the range 3.87–3.95 eV for direct transitions. Hall effect measurements at room temperature show that resistivity is decreased from 117 to 27 Ω cm. A carrier concentration of 1×10¹⁶ cm^?3 and mobility of about 117 cm² V^?1 s^?1 are obtained at 700 °C.     

Enhanced pure red electroluminescence intensity of Eu(o-BBA)3(phen) by red dye co-doping and inorganic semiconductor as charge carrier function layer

There is an emission peak at 494 nm in the electroluminescence (EL) of PVK [poly(n-vinylcarbazole)]: Eu(o-BBA)₃(phen) besides PVK exciton emission and Eu³⁺ characteristic emissions. Both the peaking at 494 nm emission and PVK emission influenced the color purity of red emission from Eu(o-BBA)₃(phen). In order to restrain these emissions and obtain high intensity red emission, 4-(dicyanomethylene)-2-t-butyl-6-(1,1,7,7,-tetramethyljulolidy-9-enyl)-4Hpyran (DCJTB) and Eu(o-BBA)₃(phen) were co-doped in PVK solution and used as the active emission layer. The EL intensity of co-doped devices reached to 420 cd/m² at 20 V driving voltage. The chromaticity coordinates of EL was invariable (x = 0.55, y = 0.36) with the increase of driving voltage. For further improvement of EL intensity, organic–inorganic hybrid devices (ITO/active emission layer/ZnS/Al) were fabricated. The EL intensity was increased by a factor of 2.5 [(420 cd/m²)/(168 cd/m²)] when the Eu complex was doped with an efficient dye DCJTB, and by a factor of ≈4 [(650 cd/m²)/(168 cd/m²)] when in addition ZnS layer was deposited on such an emitting layer prior to evaporation of the Al cathode.     

High thermal annealing effect on structural and optical properties of ZnO–SiO2 nanocomposite

The effect of annealing temperature on photoluminescence (PL) of ZnO–SiO₂ nanocomposite was investigated. The ZnO–SiO₂ nanocomposite was annealed at different temperatures from 600 °C to 1000 °C with a step of 100 °C. High Resolution Transmission Electron Microscope (HR-TEM) pictures showed ZnO nanoparticles of 5 nm are capped with amorphous SiO₂ matrix. Field Emission Scanning Electron Microscope (FE-SEM) pictures showed that samples exhibit spherical morphology up to 800 °C and dumbbell morphology above 800 °C. The absorption spectrum of ZnO–SiO₂ nanocomposite suffers a blue-shift from 369 nm to 365 nm with increase of temperature from 800 °C to 1000 °C. The PL spectrum of ZnO–SiO₂ nanocomposite exhibited an UV emission positioned at 396 nm. The UV emission intensity increased as the temperature increased from 600 °C to 700 °C and then decreased for samples annealed at and above 800^°C. The XRD results showed that formation of willemite phase starts at 800 °C and pure willemite phase formed at 1000 °C. The decrease of the intensity of 396 nm emission peak at 900 °C and 1000 °C is due to the collapse of the ZnO hexagonal structure. This is due to the dominant diffusion of Zn into SiO₂ at these temperatures. At 1000 °C, an emission peak at 388 nm is observed in addition to UV emission of ZnO at 396 nm and is believed to be originated from the willemite.     

Thickness-dependent optoelectronic properties of CuCr0.93Mg0.07O2 thin films deposited by reactive magnetron sputtering

CuCr_0.93Mg_0.07O₂ thin films were successfully deposited by DC reactive magnetron sputtering at 1123 K from metallic targets. The influence of film thickness on the structural and optoelectronic properties of the films was investigated. X-ray diffraction (XRD) results revealed that all the films had a delafossite structure with no other phases. The optical and electrical properties were investigated by UV–VIS spectrophotometer and Hall measurement, respectively. It was found that the optoelectronic properties exhibited a thickness-dependent behavior. The optical band gap and the average transmittance of the films showed a monotonous decrease with respect to the increase in thickness. The average transmittance in the visible region decreased from 67% to 47% as the thickness increased from ~70 nm to ~280 nm. Simultaneously, the conductivity of the films fell from 1.40 S∙cm⁻¹ to 0.27 S∙cm⁻¹. According to Haacke's figure of merit (FOM), a film with a maximum FOM value of about 1.72×10⁻⁷ Ω⁻¹ can be achieved when the thickness is about 70 nm (σ≈ 1.40 S·cm⁻¹ and T_av. ≈67%).     

2-Mercaptobenzothiazolate complexes of rare earth metals and their electroluminescent properties

We have demonstrated the electroluminescent (EL) properties of 2-mercaptobenzothiazolate complexes of rare earth metals [Ln(mbt)₃, Ln = Y, Sm, Eu, Gd, Tb, Dy, Tm] using simple non-doped two-layer organic light emitting diode with the configuration of indium tin oxide/N,N′-bis(3-methylphenyl)-N,N′-diphenylbenzidine/Ln(mbt)₃/Yb. It was found that 2-mercaptobenzothiazolate complexes have highly efficient intra-energy transfer from the singlet to the triplet state of the ligand, and then to the excited state of the central lanthanide ions. Thus Y(mbt)₃ and Gd(mbt)₃ exhibit the broad ligand-centered emission with maximum near 600 nm and Dy(mbt)₃, Tb(mbt)₃ and Tm(mbt)₃ complexes exhibit pure sharp emission bands from the intra f–f transitions of lanthanide ions Tb³⁺: ⁵D₄ → ⁷F₆ (492 nm), ⁵D₄ → ⁷F₅ (547 nm), ⁵D₄ → ⁷F₄ (589 nm), ⁵D₄ → ⁷F₃ (624 nm); Dy³⁺: ⁴F_9/2 → ⁶H_13/2 (575 nm) and Tm³⁺: ³H₄–³H₆ (795 нм).     

Influence of Sn content on properties of ZnO:SnO2 thin films deposited by ultrasonic spray pyrolysis

The present work is devoted to the preparation of zinc oxide (ZnO): tin oxide (SnO₂) thin films by ultrasonic spray technique. A set of films are deposited using a solution formed with zinc acetate and tin chloride salts mixture with varied weight ratio R=[Sn/(Zn+Sn)]. The ratio R is varied from 0 to 100% in order to investigate the influence of Sn concentration on the physical properties of ZnO:SnO₂ films. The X rays diffraction (XRD) analysis indicated that films are composed of ZnO and SnO₂ distinct phases without any alloys or spinnel phase formations. The average grain size of crystallites varies with the ratio R from 17 to 20 nm for SnO₂ and from 24 to 40 nm for ZnO. The obtained films are highly transparent with a transmission coefficient equal to 80%. An increase in Sn concentration increases both the effective band gap energy from 3.2 to 4.01 eV and the photoluminescence intensity peak assigned defects to SnO₂. The films electrical characterization indicated that films are resistive. Their resistivities vary between 1.2×10² and 3.3×10⁴ (Ω cm). The higher resistivity is measured in film deposited with a ratio R equal to 50%.     

Effect of substrate temperature on structural,morphological, optical and electrical properties of MnIn2S4 thin films prepared by nebulizer spray pyrolysis technique

Manganese indium sulphide (MnIn₂S₄) thin films were deposited using an aqueous solution of MnCl₂, InCl₃ and (NH₂)₂CS in the molar ratio 1:2:4 by simple chemical spray pyrolysis technique. The thin film substrates were annealed in the temperature range between 250 and 350 °C to study their various physical properties. The structural properties as studied by X-ray diffraction showed that MnIn₂S₄ thin films have cubic spinel structure. The formation of cube and needle shaped grains was clearly observed from FE-SEM analysis. The energy dispersive spectrum (EDS) predicts the presence of Mn, In and S in the synthesized thin film. From the optical studies, it is analyzed that the maximum absorption co-efficient is in the order between 10⁴ and 10⁵ cm⁻¹ and the maximum transmittance (75%) was noted in the visible and infrared regions. It is noted that, the band gap energy decreases (from 3.20 to 2.77 eV) with an increase of substrate temperature (from 250 to 350 °C). The observations from photoluminescence studies confirm the emission of blue, green, yellow and red bands which corresponds to the wavelength range 370–680 nm. Moreover, from the electrical studies, it is observed that, as the substrate temperature increases the conductivity also increases in the range 0.29–0.41×10⁻⁴ Ω⁻¹ m⁻¹. This confirms the highly semiconducting nature of the film. The thickness of the films was also measured and the values ranged between 537 nm (250 °C) to 483 nm (350 °C). This indicates that, as the substrate temperature increases, the thickness of the film decreases. From the present study, it is reported that the MnIn₂S₄ thin films are polycrystalline in nature and can be used as a suitable ternary semiconductor material for photovoltaic applications.     

The correlation of γ-irradiation,particle size and their effects on physical properties of AgInSe2 nanostructure thin films

In this work the effect of γ-irradiation on the optical and electrical properties of near stoichiometric AgInSe₂ nanostructure thin films have been characterized. The XRD pattern of ingot AgInSe₂ powder prepared by solid state reaction showed tetragonal polycrystalline single-phase structure. The thin films of thickness 75 nm were prepared by inert gas condensation (IGC) technique at using constant Ar flow and substrate temperature of 300 K.Thin films were exposed to annealing process at 473 K for 2 h in vacuum of 10⁻² Torr. The amorphous and tetragonal nanocrystalline structures were detected for as-deposited and annealed films respectively by grazing incident in-plane X-ray diffraction (GIIXD) technique. The structure and average particle size of annealed irradiated films by different γ-doses from 0 to 4 Mrad were determined using high resolution transmission electron microscope (HRTEM). Optical transmission, reflection and absorption spectra were studied for both annealed unirradiated and irradiated films. Two optical transitions for each annealed unirradiated and film exposed to γ-irradiation doses from 0 to 4 Mrad were observed. The evaluated E_g1 due to 1^st transition have decreased from 1.52 to 1.44 eV and E_g2 due to 2^nd transition have decreased from 2.83 to 2.30 eV as the particle size increased from 7.3 to 9.5 nm by raising the irradiation dose up to 1 Mrad. The behavior of d.c. electrical conductivity with temperature that measured under vacuum was examined for all films under investigation. The evaluated activation energies due to irradiation doses are ranging from 0.58 to 0.68 eV.     

The effect of temperature on the growth and properties of green light-emitting In0.5Ga0.5N films prepared by reactive sputtering with single cermet target

We have grown In_0.5Ga_0.5N films on SiO₂/Si (100) substrate at 100–400 °C for 90 min by rf reactive sputtering with single cermet target. The target was made by hot pressing the mixture of metallic indium, gallium and ceramic gallium nitride powder. X-ray diffraction (XRD) measurements indicated that In_0.5Ga_0.5N films had wurtzite structure and showed the preferential (1 0 -1 0) diffraction. Both SEM and AFM showed that In_0.5Ga_0.5N films were smooth and had small roughness of 0.6 nm. Optical properties were measured by photoluminescence (PL) spectra from room temperature to low temperature of 20 K. The 2.28 eV green emission was achieved at room temperature for all our InGaN films. The electrical properties of In_0.5Ga_0.5N films on a SiO₂/Si (100) substrate were measured by the Hall measurement at room temperature. InGaN films showed the electron concentration of 1.51×10²⁰–1.90×10²⁰ cm⁻³ and mobility of 5.94–10.5 cm² V⁻¹ s⁻¹. Alloying of InN and GaN was confirmed for the sputtered InGaN.     

Substrate temperature effect on structural,optical and electrical properties of vacuum evaporated SnO2 thin films

Tin oxide (SnO₂) thin films were deposited on glass substrates by thermal evaporation at different substrate temperatures. Increasing substrate temperature (T_s) from 250 to 450 °C reduced resistivity of SnO₂ thin films from 18×10⁻⁴ to 4×10⁻⁴▒ Ω ▒cm. Further increase of temperature up to 550 °C had no effect on the resistivity. For films prepared at 450 °C, high transparency (91.5%) over the visible wavelength region of spectrum was obtained. Refractive index and porosity of the layers were also calculated. A direct band gap at different substrate temperatures is in the range of 3.55−3.77 eV. X-ray diffraction (XRD) results suggested that all films were amorphous in structure at lower substrate temperatures, while crystalline SnO₂ films were obtained at higher temperatures. Scanning electron microscopy images showed that the grain size and crystallinity of films depend on the substrate temperature. SnO₂ films prepared at 550 °C have a very smooth surface with an RMS roughness of 0.38 nm.     

Effects of ammonia concentration on property of Cd1−xZnxS films by chemical bath deposition

Cd_1−xZn_xS thin films were grown on soda–lime glass substrates by chemical-bath deposition (CBD) at 80 °C with stirring. All the samples were annealed at 200 °C for 60 min in the air. The crystal structure, surface morphology, thickness and optical properties of the films were studied with transmission electron microscopy (TEM), X-ray diffraction (XRD), scanning electron microscopy (SEM), step height measurement instrument and spectrophotometer respectively. The results revealed that Cd_1−xZn_xS thin films had cubic crystal structure and the intensity of the diffraction peak increased gradually as ammonia concentration rose and the grain size varied from 5.1 to 8.3 nm. All of Cd_1−xZn_xS thin films had a granular surface with some smaller pores and the average granule sizes increased from 92 to 163 nm with an increase in ammonia concentration. The Cd_1−xZn_xS thin films had the highest transmittance with ammonia concentration of 0.5 M L⁻¹, whose thickness was 50 nm and band gap was 2.62 eV.     

Deposition and characterization of pure and Cd doped SnO2 thin films by the nebulizer spray pyrolysis (NSP) technique

Pure and cadmium doped tin oxide thin films were deposited on glass substrates from aqueous solution of cadmium acetate, tin (IV) chloride and sodium hydroxide by the nebulizer spray pyrolysis (NSP) technique. X-ray diffraction reveals that all films have tetragonal crystalline structure with preferential orientation along (200) plane. On application of the Scherrer formula, it is found that the maximum size of grains is 67 nm. Scanning electron microscopy shows that the grains are of rod and spherical in shape. Energy dispersive X-ray analysis reveals the average ratio of the atomic percentage of pure and Cd doped SnO₂ films. The electrical resistivity is found to be 10² Ω cm at higher temperature (170 °C) and 10³ Ω cm at lower temperature (30 °C). Optical band gap energy was determined from transmittance and absorbance data obtained from UV–vis spectra. Optical studies reveal that the band gap energy decreases from 3.90 eV to 3.52 eV due to the addition of Cd as dopant with different concentrations.     

Effect of cobalt substitution on the optical properties of bismuth ferrite thin films

Effect of cobalt substitution on the band gap and absorption coefficient of the BiFeO₃ thin films formed on quartz substrate by low cost spin coating method have been investigated. BiFe_1−xCo_xO₃ (x=0, 0.03, 0.06 and 0.10) thin films are polycrystalline and it retains the rhombohedral distorted perovskite structure up to 10 mole % of Co substitution. Smooth and compact surface morphology with uniform size particles are observed in SEM micrographs. Narrowing and broadening of band gap is observed as a function of Co content. Two strong emission peaks at ~2.51 eV and ~2.38 eV are recorded for all films with noticeable change in intensity. Results obtained from the optical absorption and photoluminescence spectroscopy experiments have shown that there exists an inverse correlation between the variation in the band gap and the concentration of oxygen vacancies. Band gap decreased by ~100 meV and absorption coefficient increased by 28% at the wavelength of 375 nm in 6 mole % Co substituted thin film and these observations are necessary requirements to improve the efficiency of photovoltaic devices.     

Characterization of cadmium sulfide/titania heterostructure films by utilizing microstructure and optical characteristics

Engineering and controlling the bandgap of semiconducting metal oxide (TiO₂) to enhance photoactivity under visible light is challenging. Impact of the changing CdS thickness (50–150 nm) on the structure and optical properties of the CdS/TiO₂ heterostructure films (HSFs) which fabricated by pulsed laser deposition (PLD) was observed. XRD, FE-SEM, AFM, UV–vis and PL spectroscopy measurements were utilized to characterize structural and optical behaviors of the films. XRD measurement shows gradual increments of the lattice constants of the films with the increase of CdS thickness. The mean values of the calculated lattice constants and cell volume (V) were a=b=0.3785 nm, c=0.9475 nm and V=13.58 nm³ respectively. The average of crystallite sizes estimated for TiO₂ and CdS/TiO₂ at various CdS thickness is 12.20, 13.49, 24.24 and 43.10 nm. FESEM images prove the high quality nanocrystalline nature of the films without cracks and dislocation. The root means square roughness of the films was increased with the increase of CdS thickness as showed by AFM images. UV–vis measurement reveals an improvement in the optical absorbance of HSFs in the range of 380–550 nm due to presence of CdS. Interestingly, the PL intensity was enhanced by a factor of nineteen compare to pure TiO₂ attributed to the charge carrier recombination in the band gap. The current results suggest that possibility to improve the optical and structural properties of the TiO₂ films and also it possible to fabricate high quality CdS/TiO₂ HSFs by variation of the CdS thickness.     

Effects of annealing on nanocrystalline Bi2S3 thin films prepared by chemical bath deposition

Nanocrystalline Bi₂S₃ thin films are deposited on tin chloride treated glass substrate from the solution containing bismuth nitrate, triethanolamine (TEA) and thioacetamide (TAM) at a bath temperature 318 K. The prepared films are subsequently annealed at different temperatures for studying the effect of thermal treatment on the structural, surface morphology, optical and electrical properties of the films. The X-ray diffraction studies affirmed that the deposited films are orthorhombic structures with average crystallites size of 14 nm to 28 nm. The scanning electron microscopy (SEM) images revealed that the films comprise of grains of spherical shape of unequal size. It is also observed that the small particles aggregate together to form a larger cluster. The average grain sizes determined from the TEM images are smaller than the crystallites size obtained from the XRD studies. The optical band gap of the films has been estimated to be 2.24–2.05 eV for the as-prepared and annealed films, respectively. The electrical conductivity of the as prepared Bi₂S₃ films at room temperature is found to be in the order of 10⁻³ Ω⁻¹ m⁻¹.     

Improved manufacturability of ZrO2 MIM capacitors by process stabilizing HfO2 addition

A broad compositional range of the dielectric material Zr_1?xHf_xO₂ was evaluated with respect to its applicability in DRAM storage capacitors. The paper reports on phase composition, crystallization behavior, and electrical properties of the mixed system in planar metal-insulator-metal (MIM) capacitors. Admixture of HfO₂ into ZrO₂ proved to stabilize the deposition process at high temperatures without degrading the dielectric properties of the film. Compared to pure ZrO₂ the 30–40% HfO₂ containing films showed improved scalability (capacitance equivalent thickness 0.73 nm at 8 * 10^?9 A/cm²) as well as improved reliability.     

Photoluminescent and photocatalytic properties of bismuth doped strontium aluminates blended with titanium dioxide

Bismuth co-doped long persistent phosphor (LPP) powders were obtained by a combustion synthesis technique followed by a post-annealing under carbon atmosphere. Bismuth content was varied from 1.0 to 15.0 mol%. X-ray diffraction analysis revealed that the powders show mainly a mixture of three phases: the SrAl₂O_4, the SrAl₁₄O₂₅ and the Sr₂Al₆O₁₁ crystalline phases. Photocatalyst composites were obtained by wet mixing of TiO₂ anatase and LPP powders followed by annealing in air at 450 °C. Photoluminescence measured spectra under 380 nm excitation show a tunable emission from green (510 nm) to greenish-blue (463 nm) in which peak wavelength localization is related to the Bi content. Photoluminescence intensity decreases as Bi content increases. Degradation of methylene blue solutions, irradiated by UV light (254 nm), was monitored by the decrease of its 650 nm absorption peak in regular periods. The best photocatalytic activity is observed when in the composite blend a 2.0 mol% of Bi content was used, and complete methylene degradation is reached after 210 min. These photocatalyst composite powders are potential candidates to clean-up wastewater applications, and might be potential candidates for photocatalytic hydrogen generation in aqueous solutions.     

Nanostructured CuO/PANI composite as supercapacitor electrode material

An in-situ polymerization method has been employed to prepare CuO/PANI nanocomposite. The prepared samples have been characterized by X-ray diffraction (XRD), FTIR spectroscopy, field emission scanning electron microscopy (FESEM), and BET analysis. Application of the prepared samples has been evaluated as supercapacitor material in 1 M Na₂SO₄ solution using cyclic voltammetry (CV) in different potential scan rates, ranging from 5 to 100 mV s⁻¹, and electrochemical impedance spectroscopy (EIS). The specific capacitance of CuO/PANI has been calculated to be as high as 185 F g⁻¹, much higher than that obtained for pure CuO nanoparticles (76 F g⁻¹). Moreover, the composite material has shown better rate capability (75% capacitance retention) in various scan rates in comparison with the pure oxide (30% retention). EIS results show that the composite material benefits from much lower charge transfer resistance, compared to CuO nanoparticles. Moreover, much better cyclic performance has been achieved for the composite material.