Insulation characteristics of triple mixtures of c-C4F8/N2/CO2 under lightning impulse voltage

This paper has researched the insulation characteristics of 10%c-C₄F₈/N₂/CO₂ mixtures under lightning impulse voltage by experiment. It is shown that the positive and negative lightning impulse breakdown voltages of 10%c-C₄F₈/N₂/CO₂ gas mixtures rise linearly as the electrode gap distance and gas pressure increase and under the same conditions, the positive lightning impulse breakdown voltage of the gas mixtures is always higher than the negative lightning impulse breakdown voltage. As the gas mixtures have a little higher liquefied temperature than SF₆ and the comprehensive GWP is about 5% of SF₆ , and the positive and negative lightning impulse breakdown voltages can both reach 60% of SF₆ , 10%c-C₄F₈/N₂/CO₂ gas mixtures can be applied as insulation gas in electrical equipment such as C-GIS, GIT, GIL and so on.     

Study of spatial and temporal evolution of Ar and F atoms in SF6/Ar microsecond pulsed discharge by optical emission spectroscopy

The study of sulfur hexafluoride (SF₆) discharge is vital for its application in gas-insulated equipment. Direct current partial discharge (PD) may cause SF₆ decomposition, and the decomposed products of SF₆, such as F atoms, play a dominant role in the breakdown of insulation systems. In this study, the PD caused by metal protrusion defects is simulated by a needle-plate electrode using pulsed high voltage in SF₆/Ar mixtures. The spatial and temporal characteristics of SF6/Ar plasma are analyzed by measuring the emission spectra of F and Ar atoms, which are important for understanding the characteristics of PD. The spatial resolved results show that both F and Ar atom spectral intensities increase first from the plate anode to the needle and then decrease under the conditions of a background pressure of 400 Pa, peak voltage of −1000 V, frequency of 2 kHz, pulse width of 60 μs, and electrode gap of 5–9 mm. However, the distribution characteristics of F and Ar are significantly different. The temporal distribution results show that the spectral intensity of Ar decreases first and then increases slowly, while the spectral intensity of F increases slowly for the duration of the pulsed discharge at the electrode gap of 5 mm and the pulse width of 40–80 μs.     

Investigation on pulsed discharge mode in SF6-C2H6 mixtures

The non-chain chemical HF(DF)laser is one of the most powerful electrically-driven lasers operating in mid-infrared,in which SF6-C2H6 mixtures are often used as lasering media.Due to the electronegativity of SF6,the discharge in SF6-C2H6 presents a complicated discharge mode.To achieve reproducible pulsed laser output,pulsed discharge in SF6-C2H6 mixtures is investigated for discharge mode using plane electrodes assisted by array pre-ionization spark pins in cathode surface.Firstly,two modes can be distinguished.One mode is called the selfsustained volume discharge(SSVD),which is characterized by spatial uniformity in the discharge gap and pulse to pulse repeatability.On the contrary,another mode includes random arc passages in the discharge gap and therefore cannot conduct lasering.By varying discharge conditions(gap voltage,gas pressure,etc)two discharge modes are observed.Secondly,the holding scope of the SSVD mode is analyzed for the optimal mixture ratio of 20:1,and the boundary tend of the holding scope of SSVD indicates there exists maximum gas pressure and maximum charging voltage for SSVD.Finally,the peak current of SSVD relates positively to charging voltage,while negatively to gas pressure,from which it is drawn that synchronous electron avalanches initiated by the sliding array overlap spatially into SSVD and thus SSVD is essentially an α ionization avalanche.     

Dynamic dielectric recovery performance of serial vacuum and SF6 gaps in HVDC interruption and its regulation method

Vacuum gaps have rapid dynamic dielectric recovery speed while SF₆ gaps have high insulation strength. The series-connected vacuum and SF₆ gaps are used as the main switch (MS), which combines their advantages. The work aims to verify the feasibility of serial vacuum and SF₆ gaps in mechanical HVDC interruption. The test circuit of the dynamic dielectric recovery performance (DDRP) is set up. The DDRP is tested under free recovery condition by the high voltage pulse source. The DDRP of the vacuum circuit breaker (VCB) and SF₆ gas circuit breaker (GCB) in DC interruption with active current injection is analyzed and compared. The test results indicate that the dielectric recovery duration of the VCB is below 30 μs while that of the GCB is above 100 μs. In order to achieve the cooperation between the VCB and GCB, a novel hybrid HVDC circuit breaker (CB) based on series-connected vacuum and SF₆ gaps is proposed. The ‘voltage-zero’ duration is created by introducing the follow current loop and there more recovery time for the dielectric recovery of the MS. The voltage distribution is controlled by the voltage dividing method so that the VCB undertakes the initial transient recovery voltage (TRV) and the later TRV is took by the GCB. The theoretical synergy characteristic of the novel HVDC CB is obtained. The paper supplies a new method to improve the custom mechanical HVDC CB, which is useful to achieve the HVDC CB with less serial breaks.     

The Electronegativity Analysis of c-C4F8 as a Potential Insulation Substitute of SF6

The density distributions related to gas electronegativity for c-C₄F₈ gas, including negative ion, electron number and electron energy densities in the discharge process, are derived theoretically in both plane-to-plane and point-to-plane electrode geometries. These calculations have been performed through the Boltzmann equation in the condition of a steady-state Townsend (SST) experiment and a fluid model in the condition of both uniform and non-uniform electric fields. The electronegativity coefficients a = n−/ne of c-C₄F₈ and SF₆ are compared to further describe the electron affinity of c-C₄F₈. The result shows that c-C₄F₈ represents an obvious electron-attachment performance in the discharge process. However, c-C₄F₈ still has much weaker gas electronegativity than SF₆, whose electronegativity coe?cient is lower than that of SF₆ by at least three orders of magnitude.     

Surface charge accumulation behavior and its influence on surface flashover performance of Al2O3-filled epoxy resin insulators under DC voltages

Surface charge accumulation on insulator surface can have great influence on surface flashover performance. An experimental system is established to investigate surface charge accumulation and decay characteristics ofAl₂O₃-filled epoxy resin insulators in 0.1 MPa SF₆ under DC voltages. Surface potential is recorded by a Kelvin vibrating probe connected to an electrostatic voltmeter. By pre-depositing charges on insulator surface, the influence of surface charges on surface flashover performance is studied. The results reveal that surface charge distribution appearance is the combined effect of electrode injection, back discharge and gas ionization. Surface charge distribution has obvious polarity effect. It is concentrated near the HV electrode under positive voltages and dispersed under negative voltages. The difference in positive and negative surface flashover voltage is attributed to the difference in surface charge distribution under DC voltages of different polarities. Surface charge decay contains two stages, which satisfies the law of double exponential function. At first stage, surface charge decays fast, which corresponds to charges escaping from shallower traps. While it decays slowly at the second stage, which corresponds to charge escaping from deeper traps. Surface charge decay process is dominated by surface conductivity mechanism. The pre-deposited charges on insulation surface have great influence on surface flashover performance. The deposited positive charges can increase positive flashover voltage but decrease negative flashover voltage.     

The effect of gas additives on reactive species and bacterial inactivation by a helium plasma jet

In this paper,the influences of gas doping(O_2,N_2,Air)on the concentrations of reactive species and bactericidal effects induced by a He plasma jet are studied.Firstly,results show that gas doping causes an increase in voltage and a decrease in current compared with the pure He discharge under the same discharge power,which might be attributed to the different chemical characteristics of O_2 and N_2 and verified by the changes in the gaseous reactive species shown in the optical emission spectroscopy(OES) and Fourier transform infrared(FTIR)spectroscopy.Secondly,the concentrations of aqueous reactive oxygen species(ROS) and reactive nitrogen species(RNS) are tightly related to the addition of O_2 and N_2 into the working gas.The concentrations of aqueous NO_2~- and NO_3~- significantly increase while the concentrations of aqueous ROS decrease with the admixture of N_2.The addition of O_2 has little effect on the concentrations of NO_2~- and NO_3~- and pH values; however,the addition of O_2 increases the concentration of O_2~- and deceases the concentrations of H_2O_2 and OH.Finally,the results of bactericidal experiments demonstrate that the inactivation efficiency of the four types of plasma jets is He?+?O_2??He+AirHeHe+N_2,which is in accordance with the changing trend of the concentration of aqueous O_2~-.Simultaneously to the better understanding of the formation and removal mechanisms of reactive species in the plasma–liquid interaction,these results also prove the effectiveness of regulating the concentrations of aqueous reactive species and the bacteria inactivation effects by gas doping.     

离心分离大质量数差混合物的实验研究方法

为探究混合物离心分离性能，提出了使用易于分离的气体介质进行实验研究的方法，选取全氟甲基环己烷（C₇F₁₄）/六氟化硫（SF₆）、C₇F₁₄/氙气（Xe）、一氟三氯甲烷（CCl₃F）/乙烯（C₂H₄）气体混合物作为离心分离介质，开展了分离实验。利用分馏装置分别得到了精、贫料中的各组分气体含量，结合质谱分析结果，得到了各组分气体的基本全分离系数与混合物的全净化系数。结果表明：此方法可方便分离轻重气体混合物，针对二元混合物离心分离，能给出全净化系数和各自组分的基本全分离系数，可用于混合物离心分离性能的实验研究。     

Discharge characteristics and reactive species production of unipolar and bipolar nanosecond pulsed gas–liquid discharge generated in atmospheric N_2

In this paper,unipolar pulse (including positive pulse and negative pulse) and bipolar pulse voltage are employed to generate diffuse gas–liquid discharge in atmospheric N_2with a rumpetshaped quartz tube.The current–voltage waveforms,optical emission spectra of excited state active species,FTIR spectra of exhaust gas components,plasma gas temperature,and aqueous H_2O_2,NO_2~-,andNO_3~-production are compared in three pulse modes,meanwhile,the effects of pulse peak voltage and gas flow rate on the production of reactive species are studied.The results show that two obvious discharges occur in each voltage pulse in unipolar pulse driven discharge,differently,in bipolar pulse driven discharge,only one main discharge appears in a single voltage pulse time.The intensities of active species (OH(A),and O(3p)) in all three pulsed discharge increase with the rise of pulse peak voltage and have the highest value at 200 ml min~(-1)of gas flow rate.The absorbance intensities of NO_2and N_2O increase with the increase of pulse peak voltage and decrease with the increase of gas flow rate.Under the same discharge conditions,the bipolar pulse driven discharge shows lower breakdown voltage,and higher intensities of excited species (N_2(C),OH(A),and O(3p)),nitrogen oxides (NO_2,NO,and N_2O),and higher production of aqueous H_2O_2,NO_2~-,andNO_3~-compared with both unipolar positive and negative discharges.     

SF6示踪剂远程泄漏监测系统设计及性能

非放射性气体示踪技术是一种常用的泄漏检测技术,SF₆是常用的气体示踪剂。对一些特殊检测场所,如贮存放射性和有毒有害气体的容器的泄漏监测,建立示踪剂在线采样和分析系统十分必要。本文阐述了SF₆示踪剂多监测点在线监测系统的设计思路和主要功能模块流程。该系统的样品消耗量小,可通过压力控制减小样品消耗。实验证实,系统运行对色谱基线无影响,同一样品通过不同监测通道在不同时刻的分析结果的相对标准偏差小于1%,不同监测通道样品无交叉污染,采样点的温度、压力监测结果与就地仪表监测精度相当。     

Volume added surface barrier discharge plasma excited by bipolar nanosecond pulse power in atmospheric air: optical emission spectra influenced by gap distance

In this paper, volume barrier discharge with different gap distances is added on the discharge border of high-voltage electrode of annular surface barrier discharge for generating volume added surface barrier discharge (V-SBD) excited by bipolar nanosecond high-voltage pulse power in atmospheric air. The excited V-SBDs consist of surface barrier discharge (d=0 mm) and volume added surface barrier discharges (d=2 mm and 3 mm). The optical emission spectra are recorded for calculating emission intensities of N₂ (C ³Ⅱ_u →B³Π_g ) and N₂⁺ (B ²Σ_u⁺ → X ²Σ_g⁺ ), and simulating rotational and vibrational temperatures. The influences of gap distance of V-SBD on emission intensity and plasma temperature are also investigated and analyzed. The results show that d=0 mm structure can excite the largest emission intensity of N ₂ (C ³ Π_u →B ³Π_g ), while the existence of volume barrier discharge can delay the occurrence of the peak value of the emission intensity ratio of N₂⁺ (B ²Σ_u⁺ → X ²Σ_g⁺ )/N ₂(C³Π_u →B³Π_g ) during the rising period of the applied voltage pulse and weaken it during the end period. The increasing factor of emission intensity is effected by the pulse repetition rate. The d=3 mm structure has the highest threshold voltage while it can maintain more emission intensity of N₂(C³ Π _u →B ³Π_g ) than that of d=2 mm structure. The structure of d=2 mm can maintain more increasing factor than that of the d=3 mm structure with varying pulse repetition rate. Besides, the rotational temperatures of three V-SBD structures are slightly affected when the gap distance and pulse repetition rate vary. The vibrational temperatures have decaying tendencies of all three structures with the increasing pulse repetition rate.     

Reactive ion etching of PECVD silicon nitride in SF6 plasma

The reactive ion etching of PECVD silicon nitride thin films has been investigated using SF₆ plasma. Effects of variations of process parameters such as pressure (50–350 mTorr), RF power (50–250 W), gas flow rate (3–130 sccm) and additions of O₂ and He (0–50%) in SF₆, on the PECVD silicon nitride etch rate and selectivity to the AZ 1350J photoresist were examined. An etch rate of 1 μm/min has been obtained under the condition of 150 mTorr, 100 W and 60 sccm. Experimental results also indicated a maximum etch rate at approximately 30% O₂ while addition of He showed only dilution effect. A nitride/photoresist selectivity ranging from 1 to 3:1 has been obtained.     

Characteristics of a nitrogen-jet system in KUR-ISOL

The basic characteristics of a N₂-jet system coupled with a surface-ionization type ion source have been investigated at KUR-ISOL. The yields of transported activities and ionized ions have been measured under various conditions for both the He- and N₂-jets. The effects of N₂ gas upon the ionization and skimmer efficiency have been investigated. It was found that N₂ gas has almost no effect upon the ionization efficiency, but causes poorer skimmer efficiency than He gas owing to the large opening angle of aerosol particles at the outlet of a capillary. A mixture of He and N₂ gases was also tested.     

Calculation and characteristic analysis on synergistic effect of CF3I gas mixtures

CF_3I is a potential SF_6 alternative gas.In order to study the insulation properties and synergistic effects of CF_3I/N_2 and CF_3I/CO_2 gas mixtures,two-term approximate Boltzmann equations were used to obtain the ionization coefficient α,attachment coefficient η and the critical equivalent electrical field strength(E/N)_(cr).The results show that the(E/N)_(cr)of CF_3I gas at 300 K is 1.2 times that of SF_6 gas,and CF_3I/N_2 and CF_3I/CO_2 gas mixtures both have synergistic effect occurred.The synergistic effect coefficient of CF_3I/CO_2 gas mixture was higher than that of CF_3I/N_2 gas mixture.But the(E/N)_(cr)of CF_3I/N_2 is higher than that of CF_3I/CO_2 under the same conditions.When the content of CF_3I exceeds 20%,the (E/N)_(cr) of CF_3I/N_2 and CF_3I/CO_2 gas mixture increase linearly with the increasing of CF_3I gas content.The breakdown voltage of CF_3I/N_2 gas mixture is also higher than that of CF_3I/CO_2 gas mixture in slightly non-uniform electrical field under power frequency voltage,but the synergistic effect coefficients of the two gas mixtures are basically the same.     

Reduced chemistries with the Quantemol database (QDB)

Typical feed gas mixtures used in technological and other plasmas may give rise to reaction networks involving several hundred reactions. Such chemistries are often too large to be used in full reactor simulations and it is therefore desirable to construct reduced chemistry networks which mimic as closely as possible the behavior of the full chemistry but employ far fewer individual reactions and species. Constructed chemistries are available from the Quantemol database (QDB) and two approaches to constructing reduced chemistry from these chemistries based on (a) physical intuition and (b) sensitivity analysis of dominant reaction pathways, are explored. In doing this it is necessary to consider different pressure and power regimes. Reduced chemistry sets are presented for CF₄ /O₂/N₂/H₂, for which 396 reactions and 52 species are reduced to 71 reactions and 26 species, and for pure O₂, for which 45 reactions and 10 species are reduced to 34 reactions.     

The current pulses characteristics of the negative corona discharge in SF6/CF4 mixtures

This paper presents the results of numerical investigation of the current pulses characteristics in SF₆/CF₄ mixtures for the negative point-plane corona discharge. The pressure and the temperature of gas mixtures are 0.4 MPa and 300 K, respectively. The CF₄ content varies from20% to 80%. The 2D axisymmetric geometry with point-plane electrodes is investigated, and the three drift-diffusion equations are solved to predict the characteristics of the negative corona...     

复杂地形对污染物扩散影响的CALPUFF模型研究北大核心CSCD

本文应用WRF/CALPUFF模型模拟了湖南省桃花江内陆核电站厂址野外示踪试验,研究受复杂地形影响下的SF烟羽扩散规律,并与现场试验进行对比分析。结果表明:受到地形的影响,风向会发生改变,污染物扩散轨迹随之改变,地形是影响SF扩散轨迹的重要因素。同时,应用统计学参数分析模拟结果的合理性,其中FAC与FAC值分别为30.1%与57.7%,说明模拟扩散因子与现场试验扩散因子之间吻合较好。总之,研究表明CALPUFF模型能较好地模拟复杂地形条件下的污染物扩散。     

On the green aurora emission of Ar atmospheric pressure plasma

The Ar atmospheric pressure plasma was found to be an excellent laboratorial source for green aurora emission. However, the characteristic and production mechanism of the green aurora emission of the Ar atmospheric pressure plasma are still not clear. In this work, an Ar plasma in a long glass tube which emits intense green aurora light is investigated. With the long glass tube, it can be concluded that the green aurora emission in the Ar plasma is not owing to the mixture of Ar plasma plume with the surrounding air. It is also found that the green aurora emission often appeared beyond the active electrode when the active electrode is placed at the downstream of the gas flow. The green emission disappears when the traces amount of O₂ or N₂ (about 0.05%–0.07%) is added to Ar. This is because the O₂ molecules deactivate the upper state O(1S), which results in the decrease of the green emission. On the other hand, when N₂ is added, Ar metastable atoms are quenched by N₂, which results in the decrease of O atoms and eventually leads to the decrease of the green emission intensity. The intensity of the green aurora emission increases when the driving voltage frequency increases from 1 to 10 kHz. More importantly, it is found that the green aurora emission is not affected when a grounded stainless steel needle is in contact with the plasma plume. Thus, the green emission is not driven electrically. All these findings are helpful for the understanding of the physics and its applications of atmospheric pressure plasma jet in space physics, laser physics and other application areas.     

Effect of N_2 and O_2 on OH radical production in an atmospheric helium microwave plasma jet

UV-pulsed laser cavity ringdown spectroscopy of the hydroxyl radical OH(A–X)(0–0)band in the wavelength range of 306–310 nm was employed to determine absolute number densities of OH in the atmospheric helium plasma jets generated by a 2.45 GHz microwave plasma source.The effect of the addition of molecular gases N_2 and O_2 to He plasma jets on OH generation was studied.Optical emission spectroscopy was simultaneously employed to monitor reactive plasma species.Stark broadening of the hydrogen Balmer emission line(H_β)was used to estimate the electron density nein the jets.For both He/N_2 and He/O_2 jets, newas estimated to be on the order of 10~(15)cm~(-3).The effects of plasma power and gas flow rate were also studied.With increase in N_2 and O_2 flow rates, netended to decrease.Gas temperature in the He/O_2 plasma jets was elevated compared to the temperatures in the pure He and He/N_2 plasma jets.The highest OH densities in the He/N_2 and He/O_2 plasma jets were determined to be 1.0?×10~(16)molecules/cm~3 at x?=?4 mm(from the jet orifice)and 1.8?×?10~(16)molecules/cm~3 at x=3 mm, respectively.Electron impact dissociation of water and water ion dissociative recombination were the dominant reaction pathways, respectively, for OH formation within the jet column and in the downstream and far downstream regions.The presence of strong emissions of the N_2~+ bands in both He/N_2 and He/O_2 plasma jets, as against the absence of the N_2~+ emissions in the Ar plasma jets, suggests that the Penning ionization process is a key reaction channel leading to the formation of N_2~+ in these He plasma jets.     

ESR法研究Pt催化N2H4分解机制

采用电子自旋共振谱（ESR）法，研究了酸性条件下•NH₂的转化，HClO₄体系下反应时间对溶液中自由基产生的影响、pH值对N₂H₄断键的影响以及HNO₃中N是否对溶液中的•NH₂有贡献，确定了Pt催化N₂H₄分解的反应机理。结果表明：在酸性条件下•NH₂被DMPO捕捉时反应式为•NH⁺₃+HO-H+DMPO=NH⁺₄+DMPO(•OH)，硝酸在Pt催化N₂H₄体系中不会发生断键产生•NH₂，所产生的•NH₂是由N₂H₄断键形成的；在HClO₄体系中，随着Pt催化N₂H₄反应时间的延长，N₂H₄中N-N断键的趋势逐渐减小，N-H断键的趋势逐渐增大；随pH值的增大，N₂H₄中N-N断键的速率先快速减小，pH>3后缓慢增大；Pt催化N₂H₄分解反应中N-N断键和N-H断键两种方式共存，但N-N断键占优；反应体系中N₂H₄与H^＋浓度之比决定了N-N断键生成•NH₂的速率，而•NH₂与H^＋的浓度又决定了•NH₂转化成产物的速率，这两方面共同决定了N₂H₄分解的速率。