散裂中子靶能量沉积研究

利用SHIELD程序研究了中高能质子入射在长0．6m、直径0．2m的圆柱形铅靶上的第入射质子产生的能量沉积。同时计算了靶材料分别为Be、C、Al、Cu、Pb和贫化铀的每个射质子产生的能量沉积沿轴向分布。计算结果与实验数据符合很好。分别对束流为10mA、能量为1．5Ge质子点入射、散焦入射散理解靶能量沉积引起的靶内功率密度分布进行了研究。     

线功率密度保护理论模型研究

作为先进压水堆核电站关键技术研究项目之一,参照西屋电气公司和法马通公司的相关技术,研制了线功率密度保护的物理模型.通过限制线功率密度,可以限制燃料芯块的温度.在保证安全运行的基础上,能更准确地描述堆芯的运行状况,提供更大的灵活性.本文叙述了线功率密度保护的基本原理和物理模型.     

基于功率密度谱的压水堆核电厂中子噪声特性研究

分析了压水堆核电厂中子噪声功率密度谱的计算方法,利用该方法以核电厂堆内构件振动监测系统长期的监测数据为基础,计算了中子噪声的功率密度谱,分别分析了百万千万级核电厂、不同功率核电厂和不同燃料周期核电厂中子噪声功率密度谱特性。结果表明,通过分析压水堆核电厂的中子噪声功率密度谱特性,能有效的认识压水堆核电厂堆内构件的振动行为,为压水堆核电厂堆内构件状态分析提供了基础。      

小射野条件下60Coγ射线及6-MV X射线在非均匀介质中的剂量特性研究

用蒙特卡罗应用程序EGSnrc模拟计算了60Coγ射线、6-MV的点源光子束在有限宽非均匀模体中,不同射野条件下中心轴上的剂量分布情况,利用剂量扰动因子(Dose perturbation factor,DPF)定量研究了剂量增强或减弱效应的强度.DPF即不均匀介质模体中某点的剂量与均匀水模体中同一空间位置点处的剂量值之比.模拟结果表明,剂量扰动效应的强弱程度取决于多种因素,如射线的能量、射野的尺寸和入射介质的尺寸.另外,无论是在骨等效介质中,还是在肺等效介质中,剂量增强或减弱效应随射野尺寸的变化并不是线性的.     

聚变电站中工程能量增益与质量功率密度对发电成本的影响

从经济弹性角度详细分析了聚变电站中工程能量增益与堆体质量功率密度对发电成本的影响。由发电成本对工程能量增益与堆体质量功率密度的函数关系,导出了发电成本对工程能量增益与堆体质量功率密度的“弹性系数”,并由此进行发电成本对工程能量增益与堆体质量功率密度的敏感性分析。分析表明,工程能量增益或堆体质量功率密度越大,发电成本对它们的敏感性越差。     

岭澳核电站延伸运行工况下的功率能力分析

本文主要分析了岭澳核电站延伸运行工况下的功率能力。利用中子学计算程序对岭澳核电站延伸运行I类工况和II类工况下可能的堆芯功率分布进行了模拟,论证了I、II类工况下反映堆芯安全性的线功率密度裕度和偏离泡核沸腾比(DNBR)裕度。与自然循环相比,延伸运行工况下的功率能力具有更大的裕度。     

高温气冷堆燃料元件固有循环安全特性的研究

介绍了高温气冷堆TRISO型的包覆燃料颗粒及球形燃料元件的结构特点及其安全原理.高温气冷堆具有低功率密度特点和负温度反应性特点,其与球形燃料元件有安全循环关系,实现了高温气冷堆固有循环安全特性.     

超短激光与薄膜靶作用加速产生质子初步研究

物理学家利用高能粒子加速器进行了多方面的研究，但高能粒子加速器庞大且耗资巨大。随着超短超强激光的发展，现在的激光的功率密度可达到10^22W／cm^2。许多实验室利用不同功率密度的激光与固体靶、薄膜靶及气体等相互作用，进行加速产生高能粒子的研究。其中，利用超短超强激光与薄膜薄相互作用加速产生质子是一重要的研究课题，利用超热电子加速产生超热电子，     

电子束在多层材料中的背散射效应

研究基于简单解析表达式的电子背散射系数与入射电子能量、介质厚度和能损的关系及其对电子束辐射加工的影响，考虑到入射电子在多层介质之间反复的穿透和背散射，编制了ＥＤ４１０程序，计算了不同补底材料和不同入射电子能量下能量沉积的深度分布和剂量因子，利用补底要 背散射抬高接近补底界面处的剂量，较大地改善了辐射加工的均匀性。     

带周期性分布纵向涡发生器的矩形狭窄通道内传热流动的数值模拟

在换热表面上周期性地安装粗糙元,可以使流动区域产生漩涡从而增强换热.本文采用数值分析的方法,以水作为工作介质,以带有纵向涡发生器狭窄矩形通道为研究对象,研究不同排列方式纵向涡发生器的传热性能,分析不同的纵向涡发生器入射角度β、不同流向、不同纵向涡间距对换热和流动特性的影响.结果表明,纵向涡发生器能够强化换热,当入射角度β=50°时,换热效果最佳.     

电子回旋共振等离子体源的特性

简要描述了一台频率为２．４５ＧＨｚ的电子回旋共振（ＥＣＲ）等离子体源的特性测试,结果表明,放电室内的等离子体密度和电子温度与静态磁场、微波输入功率和真空度等参数均有着密切关系。当磁场达到共振条件８７．５ｍＴ时,等离子体很易产生,但等离子体密度的最大值却出现在９３ｍＴ处。ＥＣＲ源在真空度为０．１－１Ｐａ间均能运行。由石英、Ａｌ２Ｏ３陶瓷和ＢＮ构成的微波输入窗有良好的阻抗匹配,在微波功率为２００－７０     

固体径迹探测器测量反应堆功率研究

在零功率反应堆上利用固体径迹探测器直接测量燃料元件内的裂变率，可得到反应堆的功率。同时测量反应堆某位置的热中子通量密度，继而可得到单位功率的热中子通量密度。因此，通过测量该点的任何热中子通量密度即可得到反应堆的运行功率。该方法可以减少与能谱测量有关的修正工作。由于辐照所需的中子通量密度低、时间短，因此与活化法等相比具有明显的优点。     

改进铷原子频标中微波功率频移的试验研究

微波功率频移是影响铷原子频标中长期稳定度的重要因素之一。本文对形成铷原子频标中微波功率频移的机理进行分析研究,对铷原子频标的C场场强、光强和微波场强的均匀性进行优化改进,以减小铷原子频标的微波功率频移敏感性。通过试验测试,进一步验证了形成铷原子频标微波功率频移的机理;总结了铷原子频标微波功率频移的主要特点;并得出在铷原子频标信噪比最大处,铷原子频标的微波功率频移系数优于3.5×10^-12dB^-1。     

Measurement of Ion Parameters by Ion Sensitive Probe in ECR Plasma

Ion parameters in electron cyclotron resonance (ECR) microwave plasma were measured by ion sensitive probe and were compared with the electron parameters obtained by double Langmuir probe. The effects of gas pressure and microwave power on the ion temperature and density were analyzed. The spatial distribution of the ion parameters was also investigated by the ion sensitive probes with a tunable radial depth installed on different probe windows along the chamber axis. Results showed that the ion density measured by the ion sensitive probe was in good agreement with the electron density measured by the double Langmuir probe. The influence of gas pressure on the ion parameters was stronger than that of microwave power. With the increase in working pressure, the ion temperature decreased monotonously with a decreasing rate larger than that at higher pressure. The ion density first increased to a peak (42.3?1010cm-3) at 1 Pa and then decreased. The ion temperature and density increased little with the increase in the microwave power from 400 W to 800 W. The plasma far away from the resonant point is found to be radially uniform.     

Axial uniformity diagnosis of coaxial surface wave linear plasma by optical emission spectroscopy

The coaxial surface wave linear plasma with preeminent axial uniformity is developed with the 2.45 GHz microwave generator. By optical emission spectroscopy, parameters of the argon linear plasma with a length over 600 mm are diagnosed under gas pressure of 30 and 50 Pa and different microwave powers. The spectral lines of argon and Hβ (486.1 nm) atoms in excited state are observed for estimating electron excitation temperature and electron density. Spectrum bands in 305–310 nm of diatomic OH (${{\rm{A}}}^{2}{{\rm{\Sigma }}}^{+}-{{\rm{X}}}^{2}{{\rm{\Pi }}}_{{\rm{i}}}$) radicals are used to determine the molecule rotational temperature. Finally, the axial uniformity of electron density and electron excitation temperature are analyzed emphatically under various conditions. The results prove the distinct optimization of compensation from dual powers input, which can narrow the uniform coefficient of electron density and electron excitation temperature by around 40% and 22% respectively. With the microwave power increasing, the axial uniformity of both electron density and electron excitation temperature performs better. Nevertheless, the fluctuation of electron density along the axial direction appeared with higher gas pressure. The axial uniformity of coaxial surface wave linear plasma could be controlled by pressure and power for a better utilization in material processing.     

Analysis of High-Power Microwave Propagation in a Magnetized Plasma Filled Waveguide

Plasma filling can dramatically improve the performance of high power microwave devices.The characteristics of high-power microwave propagation along plasma filled waveguides in an axial magnetic field are analyzed in this paper,and the ponderomotive force effect of high power microwave is taken into consideration.Theoretical analysis and preliminary numerical calculations are performed.The analyses show that the ponderomotive effect would change the plasma density,distribution of microwave field intensity,and dispersion of wave propagation.The higher the microwave power,the stronger the ponderomotive effect.In different magnetic fields,the ponderomotive effect is different.     

An investigation on improving the homogeneity of plasma generated by linear microwave plasma source with a length of 1550 mm

To develop a larger in-line plasma enhanced chemical vapor deposition(PECVD) device, the length of the linear microwave plasma source needs to be increased to 1550 mm. This paper proposes a solution to the problem of plasma inhomogeneity caused by increasing device length.Based on the COMSOL Multiphysics, a multi-physics field coupling model for in-line PECVD device is developed and validated. The effects of microwave power, chamber pressure, and magnetic flux density on the plasma distribution are investigated, respectively, and their corresponding optimized values are obtained. This paper also presents a new strategy to optimize the wafer position to achieve the balance between deposition rate and film quality. Numerical results have indicated that increasing microwave power and magnetic flux density or decreasing chamber pressure all play positive roles in improving plasma homogeneity, and among them, the microwave power is the most decisive influencing factor. It is found that the plasma homogeneity is optimal under the condition of microwave power at 2000 W, chamber pressure at15 Pa, and magnetic field strength at 45 mT. The relative deviation is within-3.7% to 3.9%,which fully satisfies the process requirements of the equipment. The best position for the wafer is88 mm from the copper antenna. The results are very valuable for improving the quality of the in-line PECVD device.     

压水堆电站放射性废物的治理

本文就压水堆电站放射性废物的由来和特点,数量和比放,各类废物的处理方法以及治理后对环境的影响进行了评述和讨论,并探讨了需要进行的研究工作。     

The effect of substrate holder size on the electric field and discharge plasma on diamond-film formation at high deposition rates during MPCVD

The effect of the substrate holder feature dimensions on plasma density(ne), power density(Qmw) and gas temperature(T) of a discharge marginal plasma(a plasma caused by marginal discharge) and homogeneous plasma were investigated for the microwave plasma chemical vapor deposition process. Our simulations show that decreasing the dimensions of the substrate holder in a radical direction and increasing its dimension in the direction of the axis helps to produce marginally inhomogeneous plasma. When the marginal discharge appears, the maximum plasma density and power density appear at the edge of the substrate. The gas temperature increases until a marginally inhomogeneous plasma develops. The marginally inhomogeneous plasma can be avoided using a movable substrate holder that can tune the plasma density, power density and gas temperature. It can also ensure that the power density and electron density are as high as possible with uniform distribution of plasma. Moreover, both inhomogeneous and homogeneous diamond films were prepared using a new substrate holder with a diameter of 30 mm. The observation of inhomogeneous diamond films indicates that the marginal discharge can limit the deposition rate in the central part of the diamond film. The successfully produced homogeneous diamond films show that by using a substrate holder it is possible to deposit diamond film at 7.2 μm h~(–1)at 2.5 kW microwave power.     

核电站流出物监测仪的校准

阐明核电站流出物监测仪的校准方法和初级校准与次级准的转换关系，并就这种方法的合理性和可靠性以及传递误差进行了简单的讨论。