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1.
研究了CeO2作为高K(高介电常数)栅介质薄膜的制备工艺,深入分析了衬底温度、淀积速率、氧分压等工艺条件和利用N离子轰击氮化Si衬底表面工艺对CeO2薄膜的生长及其与Si界面结构特征的影响,利用脉冲激光淀积方法在Si(100)衬底生长了具有(100)和(111)取向的CeO2外延薄膜;研究了N离子轰击氮化Si衬底表面处理工艺对Pt/CeO2/Si结构电学性质的影响.研究结果显示,利用N离子轰击氮化Si表面/界面工艺不仅影响CeO2薄膜的生长结构,还可以改善CeO2与Si界面的电学性质. 相似文献
2.
CeO_2高K栅介质薄膜的制备工艺及其电学性质 总被引:2,自引:2,他引:0
研究了 Ce O2 作为高 K (高介电常数 )栅介质薄膜的制备工艺 ,深入分析了衬底温度、淀积速率、氧分压等工艺条件和利用 N离子轰击氮化 Si衬底表面工艺对 Ce O2 薄膜的生长及其与 Si界面结构特征的影响 ,利用脉冲激光淀积方法在 Si(10 0 )衬底生长了具有 (10 0 )和 (111)取向的 Ce O2 外延薄膜 ;研究了 N离子轰击氮化 Si衬底表面处理工艺对 Pt/ Ce O2 / Si结构电学性质的影响 .研究结果显示 ,利用 N离子轰击氮化 Si表面 /界面工艺不仅影响 Ce O2 薄膜的生长结构 ,还可以改善 Ce O2 与 Si界面的电学性质 相似文献
3.
用高纯度Zn和Se做原材料研究了在GaAs(100)和ZnSe(110)衬底上外延生长ZnSe薄膜.实验是在723和873K下进行的,用光致发光测量、二次离子值谱仪(SIMS)、椭圆对称分析和光学显微镜观察对生长的薄膜进行了测量分析,在Zn和Se的输运比接近1的条件下获得了最佳外延生长膜.对异质外延膜的SIMS分析表明主要受主型杂质最Li和Na.同时,发现在相同生长条件下,与在GaAs衬底上生长的薄膜相比,在高纯ZnSe衬底上外延生长薄膜的PL特性有所改进。值得注意的是衬底纯度对ZnSe衬底上生长薄膜的纯度有很大影响。 相似文献
4.
脉冲激光烧蚀沉积ZnSe薄膜的研究 总被引:4,自引:2,他引:2
用 2 48nm的KrF准分子脉冲激光烧蚀ZnSe靶材沉积ZnSe薄膜。靶采用多晶ZnSe片 ,衬底采用抛光GaAs(10 0 )。衬底预处理采用化学刻蚀和高温处理。原子力显微镜 (AFM )观察显示在GaAs(10 0 )沉积的ZnSe薄膜的平均粗糙度为 3~ 4nm。X射线衍射 (XRD)结果表明ZnSe薄膜 (4 0 0 )峰的半高宽 (FWHM)为 0 4°~ 0 5°。对激光烧蚀团束的四极质谱分析表明烧蚀团束主要由Zn ,Se和 2Se组成 ,并由此推断ZnSe薄膜的二维生长模式。 相似文献
5.
CeO2高K栅介质薄膜的制备工艺及其电学性质 总被引:2,自引:0,他引:2
研究了CeO2作为高K(高介电常数)栅介质薄膜的制备工艺,深入分析了衬底温度,淀积速率,氧化压等工艺条件和利用N离子轰击氧化Si衬底表面工艺对CeO2薄膜的生长及其与Si界面结构特征的影响,利用脉冲激光淀积方法在Si(100)衬底生成了具有(100)和(111)取向的CeO2外延薄膜,研究了N离子轰击氮化Si衬底表面处理工艺对Pt/CeO2/Si结构电学性质的影响,研究结果显示,利用N离子轰击氮化Si表面/界面工艺不仅影响CeO2薄膜的生长结构,还可以改善CeO2与Si界面的电学性质。 相似文献
6.
硅基PbSe/BaF_2/CaF_2薄膜及其光电特性 总被引:1,自引:0,他引:1
采用分子束外延方法在 Si(111)衬底上生长了 Pb Se/ Ba F2 / Ca F2 薄膜 ,扫描电镜和 X-光衍射分析显示 ,通过生长 Ba F2 / Ca F2 缓冲层的方法 ,在 Si(111)衬底上外延的 Pb Se薄膜晶体质量高 ,Pb Se表面光亮 ,无开裂现象发生 ,X-光衍射峰峰宽窄 (15 3arcs) .外延生长的 Pb Se薄膜被应用于制作光电二极管 ,首次采用热蒸发金属铝膜在 Pb Se表面形成 Al- Pb Se肖特基结光电二极管 ,获得了比 Pb- Pb Se肖特基结更为稳定和理想的电流 -电压特性曲线 相似文献
7.
在经NH3等离子体氮化的Si(100)衬底上。用等离子体增强化学气相淀积(PECVD)的方法生长了ZnO缓冲层,经X射线衍射(XRD)测量,得到了单一取向的ZnO(0002)膜。在此ZnO缓冲层上利用低压金属有机化学气相淀积(LP-MOCVD)方法生长了较高质量的ZnCdSe/ZnSe量子阱。通过不同阱宽的ZnCdSe/ZnSe量子阱生长和测量,得到了多级共振拉曼峰。从发光谱中可见,在1520nm附近有很强的发光,而在未覆盖ZnO的Si衬底上直接生长的ZnCdSe/ZnSe量子阱结构,其光致发光(PL)谱未见发光。可见,在氮化的Si衬底上覆盖ZnO膜生长的ZnCdSe/ZnSe量子阱质量较好。是一种在Si衬底上生长Ⅱ-Ⅵ族化合物半导体材料的有效方法。 相似文献
8.
采用分子束外延(MBE)法在Si(001)衬底上生长Er2O3高k薄膜材料。X射线衍射结果表明,用这一方法得到的硅基Er2O3薄膜是(440)取向的单晶,电学测试预示在Si和Er2O3薄膜的界面有一层很薄的界面层。为了研究Si/Er2O3异质结的界面,通过原位反射式高能电子衍射(RHEED)和俄歇能谱(AES)的方法对Er2O3薄膜在Si衬底上的初始生长情况进行研究。发现在清洁的Si衬底和有SiO2的Si衬底上生长Er2O3薄膜,原位RHEED图谱和AES都有不同的结果,预示着这两种不同的衬底上生长Er2O3薄膜的初始阶段有不同的化学反应。这一现象可能阐释了界面的演变和控制机理。 相似文献
9.
GaN在Si(001)上的ECR等离子体增强MOCVD直接生长研究 总被引:3,自引:0,他引:3
研究了用电子回旋共振(ECR)等离子体增强金属有机物化学气相沉积(PEMOCVD)技术在Si(001)衬底上,低温(620~720℃)下GaN薄膜的直接外延生长及晶相结构.高分辨透射电镜(HRTEM)和X射线衍射(XRD)结果表明:在Si(001)衬底上外延出了高度c轴取向纤锌矿结构的GaN膜,但在GaN/Si(001)界面处自然形成了一层非晶层,其两个表面平坦而陡峭,厚度均匀(≈2nm).分析认为,在初始成核阶段N与Si之间反应所产生的这层SixNy非晶层使GaN的β相没有形成.XRD和原子力显微镜(AFM)结果表明,衬底表面的原位氢等离子体清洗,GaN初始成核及后续生长条件对GaN膜的晶体质量非常重要. 相似文献
10.
研究了用电子回旋共振(ECR)等离子体增强金属有机物化学气相沉积(PEMOCVD)技术在Si(001)衬底上,低温(620~720℃)下GaN薄膜的直接外延生长及晶相结构.高分辨透射电镜(HRTEM)和X射线衍射(XRD)结果表明:在Si(001)衬底上外延出了高度c轴取向纤锌矿结构的GaN膜,但在GaN/Si(001)界面处自然形成了一层非晶层,其两个表面平坦而陡峭,厚度均匀(≈2nm).分析认为,在初始成核阶段N与Si之间反应所产生的这层SixNy非晶层使GaN的β相没有形成.XRD和原子力显微镜(AFM)结果表明,衬底表面的原位氢等离子体清洗,GaN初始成核及后续生长条件对GaN膜的晶体质量非常重要. 相似文献
11.
Y. P. Chen G. Brill E. M. Campo T. Hierl J. C. M. Hwang N. K. Dhar 《Journal of Electronic Materials》2004,33(6):498-502
We report on the first successful growth of the quaternary alloy Cd1−yZnySexTe1−x(211) on 3-in. Si(211) substrates using molecular beam epitaxy (MBE). The growth of CdZnSeTe was performed using a compound
CdTe effusion source, a compound ZnTe source, and an elemental Se effusion source. The alloy compositions (x and y) of the
Cd1−yZnySexTe1−x quaternary compound were controlled through the Se/CdTe and ZnTe/CdTe flux ratios, respectively. Our results indicated that
the surface morphology of CdZnSeTe improves as the Zn concentration decreases, which fits well with our previous observation
that the surface morphology of CdZnTe/Si is poorer than that of CdSeTe/Si. Although the x-ray full-width at half-maximums
(FWHMs) of CdZnSeTe/Si with 4% of Zn + Se remain relatively constant regardless of the individual Zn and Se concentrations,
etched-pit density (EPD) measurements exhibit a higher dislocation count on CdZnSeTe/Si layers with about 2% Zn and Se incorporated.
The enhancement of threading dislocations in these alloys might be due to an alloy disorder effect between ZnSe and CdTe phases.
Our results indicate that the CdZnSeTe/Si quaternary material with low Zn or low Se concentration (less than 1.5%) while maintaining
4% total Zn + Se concentration can be used as lattice-matching composite substrates for long-wavelength infrared (LWIR) HgCdTe
as an alternative for CdZnTe/Si or CdSeTe/Si. 相似文献
12.
《Materials Science in Semiconductor Processing》2000,3(3):201-205
We have investigated the structural properties of ZnSe epilayers that were grown by molecular beam epitaxy on (001) GaAs substrate with different tilt angles. Two-dimensional growth mode increased with increasing tilt of (001) GaAs toward [010] direction. This was confirmed by atomic force microscopy (AFM) analysis and double crystal X-ray diffraction. We have obtained ZnSe of high crystalline quality layers on (001) GaAs off oriented toward [010] direction. Light emitting devices that were fabricated by ZnSe wafers grown on 4° off toward [010] GaAs substrate have longer lifetimes than the ones that were grown on nominal (001) GaAs substrate, which provide an evidence that crystalline quality improvement effects may become apparent by using (001) vicinal substrate surfaces. 相似文献
13.
K. Jagannadham J. Narayan R. Chowdhury Z. Tsvetanka P. Tiwari 《Journal of Electronic Materials》1994,23(9):861-874
We have successfully deposited epitaxial titanium nitride films on (001) silicon and (001) gallium arsenide substrates and
multilayer Si/TiN/Si(001) epitaxial heterostructures using pulsed laser (KrF: λ = 248 nm, τ = 25 ns) physical vapor deposition.
The deposition of TiN was carried out at a substrate temperature of 600°C on Si(001) and 400°C on GaAs(00l). The interfaces
were sharp without any indication of interfacial reaction. The epitaxial relationships were found to be <001> TiN ‖<001> Si
on the silicon substrate, <001> Si ‖<001> TiN |<001> Si on the heterostructure, and [1-10] TiN‖[110] GaAs and [001] TiN ‖[110]
GaAs on the GaAs substrate. The growth in these large-mismatch systems is modeled and the various energy terms contributing
to the growth of these films are determined. The domain matching epitaxy provides a mechanism of epitaxial growth in systems
with large lattice mismatch.The epitaxial growth is characterized by domain epitaxial orientation relationships with m lattice
constants of epilayer matching with n of the substrate and with a small residual domain mismatch present in the epilayer.
This residual mismatch is responsible for a coherent strain energy. The magnitude of compression of Ti-N bond in the first
atomic layer, contributing to the chemical free energy of the interface during the initial stages of growth, is found to be
a very important factor in determining the orientation relationship. This result was used to explain the differences in the
orientaion relationships between TiN/Si and TiN/GaAs systems. The various energy terms associated with the domain epitaxial
growth are evaluated to illustrate that the domain epitaxial growth is energetically favorable compared to the lattice mismatched
epitaxial growth. The results of this analysis illustrate that the observed variations in the epitaxial growth are consistent
with the minimum energy configurations associated with the domain epitaxial growth. 相似文献
14.
I. V. Sedova S. V. Sorokin A. A. Toropov V. A. Kaigorodov S. V. Ivanov P. S. Kop’ev E. V. Lutsenko V. N. Pavlovskii V. Z. Zubelevich A. L. Gurskii G. P. Yablonskii Y. Dikme H. Kalisch A. Szymakowski R. H. Jansen B. Schineller M. Heuken 《Semiconductors》2004,38(9):1099-1104
Photoluminescence and lasing at a wavelength of λ=510–530 nm (green spectral region) in Cd(Zn)Se/ZnMgSSe structures with a different design of the active region are studied in a wide range of temperatures and nitrogen laser pump intensities. A minimal lasing threshold of 10 kW/cm2, a maximal external quantum efficiency of 12%, and a maximal output power of 20 W were obtained for the structure with the active region composed of three ZnSe quantum wells with fractional-monolayer CdSe inserts. The lasers exhibited a high temperature stability of the lasing threshold (characteristic temperature T 0=330 K up to 100°C). For the first time, an integrated converter composed of a green Cd(Zn)Se/ZnMgSSe laser optically pumped by a blue InGaN/GaN laser that is grown on a Si (111) substrate and incorporates multiple quantum wells is suggested and studied. 相似文献
15.
The influence of the surface microroughness on the critical thickness for the two-dimensional growth of strained SiGe structures on Si(001) and Ge(001) substrates is investigated. A decrease in the critical thickness for the two-dimensional growth of Ge films with increasing number of lattice periods or a decrease in the thickness of Si spacer layers is found for Ge/Si lattices grown on Si(001) substrates. This change is related to an increase in the surface roughness with the accumulation of elastic energy in compressed structures. A comparative study of the growth of SiGe structures on Si(001) and Ge(001) substrates shows that the critical thickness for the two-dimensional growth of tensile-strained layers is much larger than for compressed layers in a wide range of SiGe-layer compositions at an identical (in magnitude) lattice mismatch between the film and substrate. 相似文献
16.
Y. Fan J. Han L. He J. Saraie R. L. Gunshor M. Hagerott A. V. Nurmikko 《Journal of Electronic Materials》1994,23(3):245-249
Temperature-dependent Hall effect measurements are reported on a series of nitrogen doped ZnSe and ZnTe epilayers using a
van der Pauw configuration. A Zn(Se,Te) pseudo-graded band gap layer was used to form ohmic contacts to p-type ZnSe. The activation
energy of nitrogen in ZnSe at the infinite dilution limit was extrapolated to be 114 meV. For a ZnTe film having a room temperature
free hole concentration of p = 4.1 x 1016 cm−3, the activation energy of the nitrogen acceptors was found to be 46 meV. 相似文献
17.
V. I. Kozlovskiy V. S. Krivobok P. I. Kuznetsov S. N. Nikolaev E. E. Onistchenko A. A. Pruchkina A. G. Temiryazev 《Semiconductors》2016,50(5):688-693
Strained epitaxial ZnSe layers are grown on GaAs substrates by the method of vapor-phase epitaxy from metal-organic compounds. It is found that Se nanoislands with a density of 108 to 109 cm–2 are formed at the surface of such layers. It is established that an increase in the size of Se islands and a decrease in their density take place after completion of growth. Annealing in a H2 atmosphere at a temperature higher than 260°C leads to the disappearance of Se islands and to a decrease in the surface roughness. It is shown that annealing does not lead to deterioration of the structural perfection of the epitaxial ZnSe films; rather, annealing gives rise to a decrease in the intensity of impurity–defect luminescence and to an increase in the intensity of intrinsic radiation near the bottom of the exciton band. 相似文献
18.
The impact of impurity incorporation on the development of the surface morphology of GaAs epilayers, grown by metalorganic
vapor phase epitaxy (MOVPE), has been systematically investigated. A variety of different doping elements, including Mg, Zn,
C, Si, O, and Se, were used to study the interaction between the impurity atoms and GaAs surface. Impurity atoms with smaller
atomic weight, belonging to group II and VI, have a larger influence on the surface morphology than the other dopants. Different
chemical sources for carbon doping were also used to explore the effect of surface growth chemistry on the formation of surface
features. The epilayer surface morphology was affected by the combination of several physical and chemical factors. Factorsinfluencing
the impact of an impurity on the growth front evolution are presented based on the interaction between the impurity atoms
and the surface step structures. 相似文献
19.
M. Strassburg R. Heitz V. Türck S. Rodt U. W. Pohl A. Hoffmann D. Bimberg I. L. Krestnikov V. A. Shchukin N. N. Ledentsov Zh. I. Alferov D. Litvinov A. Rosenauer D. Gerthsen 《Journal of Electronic Materials》1999,28(5):506-514
We report on structural and optical investigations of submonolayer-CdSe/ZnSe superlattices with varying thicknesses of the ZnSe spacer layers. High-resolution electron microscopy images demonstrate the formation of two-dimensional nanoscale CdSe islands for submonolayer-CdSe depositions. The vertical island arrangement is anti-correlated for spacer layer thicknesses exceeding 30Å, while predominantly vertically correlated growth occurs for thinner spacers. The different vertical ordering of the CdSe islands results in two clearly distinguishable lines in photoluminescence and optical reflectance spectra, which are attributed to excitons localized in quantum dots (QDs) formed by vertically coupled and uncoupled (Cd,Zn)Se islands, respectively. δ-like emission of single QDs is demonstrated and the different carrier localization in uncoupled and coupled QDs is reflected in the polarization of the edge emission. Stimulated emission and resonant waveguiding effects are observed for both states. At the highest excitation densities, we observe saturation of the stimulated emission in edge geometry attributed to saturation of localized states. 相似文献
20.
ZnO and ZnSe are proposed as n-type layers in ZnTe heterojunction diodes to overcome problems associated with the n-type doping of ZnTe. The structural properties and electrical characteristics of ZnO/ZnTe and ZnO/ZnSe/ZnTe heterojunctions
grown by molecular beam epitaxy on (001) GaAs substrates are presented. ZnO shows a strong preference for c-plane (0001) orientation resulting in a nonepitaxial relationship and high density of rotational domains for growth on ZnTe
(001). ZnSe/ZnTe structures demonstrate a (001) epitaxial relationship with high density of {111} stacking faults originating
at the heterojunction interface. ZnO/ZnSe/ZnTe heterojunction diodes show excellent diode rectification and clear photovoltaic
response with open-circuit voltage of V
OC = 0.8 V. 相似文献