Electron mobility in the inversion layers of fully depleted SOI films

The dependences of the electron mobility μ_eff in the inversion layers of fully depleted double–gate silicon-on-insulator (SOI) metal–oxide–semiconductor (MOS) transistors on the density N _e of induced charge carriers and temperature T are investigated at different states of the SOI film (inversion–accumulation) from the side of one of the gates. It is shown that at a high density of induced charge carriers of N _e > 6 × 10¹² cm^–2 the μeff(T) dependences allow the components of mobility μ_eff that are related to scattering at surface phonons and from the film/insulator surface roughness to be distinguished. The μ_eff(N _e ) dependences can be approximated by the power functions μ_eff(N _e) ∝ N _e ^?n . The exponents n in the dependences and the dominant mechanisms of scattering of electrons induced near the interface between the SOI film and buried oxide are determined for different N _e ranges and film states from the surface side.     

Electrical characteristics of Au/<Emphasis Type="Italic">n</Emphasis>-GaAs structures with thin and thick SiO<Subscript>2</Subscript> dielectric layer

The aim of this study, to explain effects of the SiO₂ insulator layer thickness on the electrical properties of Au/n-GaAs Shottky barrier diodes (SBDs). Thin (60 Å) and thick (250 Å) SiO₂ insulator layers were deposited on n-type GaAs substrates using the plasma enganced chemical vapour deposition technique. The current-voltage (I–V) and capacitance-voltage (C-V) characteristics have been carried out at room temperature. The main electrical parameters, such as ideality factor (n), zero-bias barrier height (? _Bo ), series resistance (R _s ), leakage current, and interface states (N _ss ) for Au/SiO₂/n-GaAs SBDs have been investigated. Surface morphologies of the SiO₂ dielectric layer was analyzed using atomic force microscopy. The results show that SiO₂ insulator layer thickness very affects the main electrical parameters. Au/n-GaAs SBDs with thick SiO₂ insulator layer have low leakage current level, small ideality factor, and low interface states. Thus, Au/n-GaAs SBDs with thick SiO₂ insulator layer shows better diode characteristics than other.     

Efficient Multicast Association to Improve the Throughput in IEEE 802.11 WLAN

This paper deals with the problem of optimal association of stations (S T A s) to access points (A P s) for mulicast services in IEEE 802.11 WLAN. In a multicast session, all the subscribed S T A s receive the multicast data packet at the same data rate (R _{m i n} ) from their respective serving A P s. A higher value of R _{m i n} improves the multicast throughput by completing the ongoing multicast session in lesser time. This also improves the unicast throughput as the cycle duration is shared by the unicast and multicast sessions. To provide multicast services to the S T A s, we need to select a minimum cardinality subset of A P s as the system message overhead depends on this cardinality. However, such a minimum cardinality subset of A P s may not be possible to activate simultaneously due to the limited number of available orthogonal frequency channels. In this paper, we develop a combined greedy algorithm that selects a subset of A P s with minimum cardinality for which a conflict-free frequency assignment exists and finds an association between the S T A s and the selected A P s that maximizes the R _{m i n} value. Through simulation we have shown that the proposed algorithm selects significantly less number of A P s for different R _{m i n} values in comparison to the well-known metrics for multicast association like RSSI, minimum hop-distance, normalized-cost and in-range STA number.     

Optoelectrical Behavior of Ferroelectric Lithium Rubidium Sulfate Crystals

Single crystals of lithium rubidium sulfate with good transparency have been grown from aqueous solution by a slow evaporation technique. Single-crystal x-ray diffraction results revealed that, at room temperature, the crystal belongs to the monoclinic system in space group P2₁/n. From the transmittance and reflectance spectra, various optoelectrical constants such as the refractive index, extinction coefficient, optical bandgap for direct transition, optical conductivity, electronic polarizability, high-frequency dielectric constant, and optical electronegativity were calculated for the investigated lithium rubidium sulfate crystal. A correlation between the various optical parameters was also observed. The refractive index was fit to a three-term Cauchy dispersion relationship. The single-oscillator Wemple–DiDomenico model was applied to discuss the dispersion of the refractive index. The optical transmittance study revealed transparency of the crystal in the entire visible region with wide optical bandgap. The electronic polarizability values calculated from the Clausius–Mossotti equation and from bandgap analysis were found to be in good agreement.     

Dielectric waveguide for middle and far infrared radiation

The possibility of using the normal skin effect in dielectric waveguides for long-wavelength radiation is analyzed. A design of a waveguide integrated with a heterolaser is suggested, in which an undoped layer of GaAs is clad between heavily-doped n- and p-Al _x Ga_{1 ? x} As alloy layers, reflecting radiation because of the normal skin effect. It is shown that an efficient waveguide can be formed using n-Al _x Ga_{1 ? x} As layers with x < 0.45 and the electron concentration N > 5 × 10¹⁸ cm^?3 and p-Al _x Ga_{1 ? x} As layers of any composition with the hole concentration P ≥ 3 × 1019 cm^?3.     

Mechanism of the Generation of Donor–Acceptor Pairs in Heavily Doped <Emphasis Type="Italic">n</Emphasis>-ZrNiSn with the Ga Acceptor Impurity

The nature of the mechanism of the simultaneous generation of donor–acceptor pairs under heavy doping of n-ZrNiSn intermetallic semiconductor with the Ga acceptor impurity is established. Such spatial arrangement in the crystal lattice of ZrNiSn_1–xGa _x is found when the rate of movement of the Fermi level εF found from calculations of the density distribution of electron states coincides with that experimentally established from dependences lnρ(1/T). It is shown that when the Ga impurity atom (4s²4p¹) occupies the 4b sites of Sn atoms (5s²5p²), structural defects of both acceptor nature and donor nature in the form of vacancies in the 4b site are simultaneously generated. The results are discussed in the scope of the Shklovskii–Efros model of a heavily doped and compensated semiconductor.     

Impact of deployment size on the asymptotic capacity for wireless ad hoc networks under Gaussian channel model

We study the throughput capacity and transport capacity for both random and arbitrary wireless networks under Gaussian Channel model when all wireless nodes have the same constant transmission power P and the transmission rate is determined by Signal to Interference plus Noise Ratio (SINR). We consider networks with n wireless nodes \(\{v_1,v_2,\ldots,v_n\}\) (randomly or arbitrarily) distributed in a square region B _a with a side-length a. We randomly choose n _s node as the source nodes of n _s multicast sessions. For each source node v _i , we randomly select k points and the closest k nodes to these points as destination nodes of this multicast session. We derive achievable lower bounds and some upper bounds on both throughput capacity and transport capacity for both unicast sessions and multicast sessions. We found that the asymptotic capacity depends on the size a of the deployment region, and it often has three regimes.     

Germanium laser with a hybrid surface plasmon mode

The possibility of creating an n⁺⁺-Ge laser with a hybrid surface plasmon TM mode is theoretically studied. The distribution of electromagnetic fields and the absorbance in the mode under study, the optical confinement factor, the gain, and the threshold current density in the laser under consideration are calculated. It is shown that the threshold current density at optimal layer thicknesses of an n⁺⁺-Ge laser with a hybrid surface plasmon TM mode can be 2–3 times lower than the experimentally observed threshold current density in an n⁺⁺-Ge laser with a conventional dielectric waveguide.     

Role of Si-doped Al<Subscript>0.3</Subscript>Ga<Subscript>0.7</Subscript>As layers in the high-frequency conductivity of GaAs/Al<Subscript>0.3</Subscript>Ga<Subscript>0.7</Subscript>As heterostructures under conditions of the quantum hall effect

The complex high-frequency conductivity of GaAs/Al_0.3Ga_0.7As heterostructures that are δ-doped and modulation-doped with silicon was investigated by acoustic methods under conditions of the integer quantum Hall effect. Both the real (σ₁) and imaginary (σ₂) parts of the complex conductivity σ(ω, H)=σ_i?iσ₂ were determined from the dependences of the absorption and velocity of surface acoustic waves on magnetic field. It is shown that, in the heterostructures with electron density n_s=(1.3–7)×10¹¹ cm^?2 and mobility μ=(1–2)×10⁵ cm²/(V s), the high-frequency conductivity near the centers of the Hall plateau is due to electron hopping between localized states. It is established that, with filling numbers 2 and 4, the conductivity of the Al_0.3Ga_0.7As:Si layer efficiently shunts the high-frequency hopping conductivity of the two-dimensional interface layer. A method of separating the contributions of the interface and Al_0.3Ga_0.7As:Si layers to the hopping conductivity σ(ω, H) is developed. The localization length of electrons in the interface layer is determined on the basis of the nearest neighbor hopping model. It is shown that, near the centers of the Hall plateau, both σ(ω, H) and n_s depend on the cooling rate of a GaAs/Al_0.3Ga_0.7As sample. As a result, the sample “remembers” the cooling conditions. Infrared light and static strain also change both σ(ω, H) and n_s. We attribute this behavior to the presence of two-electron defects (so-called DX^? centers) in the Al_0.3Ga_0.7As:Si layer.     

Structural and Electrical Properties of Ag/<Emphasis Type="Italic">n</Emphasis>-TiO<Subscript>2</Subscript>/<Emphasis Type="Italic">p</Emphasis>-Si/Al Heterostructure Fabricated by Pulsed Laser Deposition Technique

We have investigated the structural and electrical characteristics of the Ag/n-TiO₂/p-Si/Al heterostructure. Thin films of pure TiO₂ were deposited on p-type silicon (100) by optimized pulsed laser ablation with a KrF-excimer laser in an oxygen-controlled environment. X-ray diffraction analysis showed the formation of crystalline TiO₂ film having a tetragonal texture with a strong (210) plane as the preferred direction. High purity aluminium and silver metals were deposited to obtain ohmic contacts on p-Si and n-TiO₂, respectively. The current–voltage (I–V) characteristics of the fabricated heterostructure were studied by using thermionic emission diffusion mechanism over the temperature range of 80–300 K. Parameters such as barrier height and ideality factor were derived from the measured I–V data of the heterostructure. The detailed analysis of I–V measurements revealed good rectifying behavior in the inhomogeneous Ag/n-TiO₂/p-Si(100)/Al heterostructure. The variations of barrier height and ideality factor with temperature and the non-linearity of the activation energy plot confirmed that barrier heights at the interface follow Gaussian distributions. The value of Richardson’s constant was found to be 6.73 × 10⁵ Am^?2 K^?2, which is of the order of the theoretical value 3.2 × 10⁵ Am^?2 K^?2. The capacitance–voltage (C–V) measurements of the heterostructure were investigated as a function of temperature. The frequency dependence (Mott–Schottky plot) of the C–V characteristics was also studied. These measurements indicate the occurrence of a built-in barrier and impurity concentration in TiO₂ film. The optical studies were also performed using a UV–Vis spectrophotometer. The optical band gap energy of TiO₂ films was found to be 3.60 eV.     

Throughput and delay analysis for hybrid radio-frequency and free-space-optical (RF/FSO) networks

In this paper the per-node throughput and end-to-end delay of randomly deployed (i.e. ad-hoc) hybrid radio frequency - free space optics (RF/FSO) networks are studied. The hybrid RF/FSO network consists of an RF ad hoc network of n nodes, f(n) of them, termed ‘super nodes’, are equipped with an additional FSO transceiver with transmission range s(n). Every RF and FSO transceiver is able to transmit at a maximum data rate of W ₁ and W ₂ bits/sec, respectively. An upper bound on the per node throughput capacity is derived. In order to prove that this upper bound is achievable, a hybrid routing scheme is designed whereby the data traffic is divided into two classes and assigned different forwarding strategies. The capacity improvement with the support of FSO nodes is evaluated and compared against the corresponding results for pure RF wireless networks. Under optimal throughput scaling, the scaling of average end-to-end delay is derived. A significant gain in throughput capacity and a notable reduction in delay will be achieved if \(f(n) = \Upomega\left(\frac{1}{s(n)}\sqrt{\frac{n}{\log n}}\cdot \frac{W_1}{W_2} \right)\). Furthermore, it is found that for fixed W ₁, f(n) and n where f(n) < n, there is no capacity incentive to increase the FSO data rate beyond a critical value. In addition, both throughput and delay can achieve linear scaling by properly adjusting the FSO transmission range and the number of FSO nodes.     

A Quasi-Classical Model of the Hubbard Gap in Lightly Compensated Semiconductors

A quasi-classical method for calculating the narrowing of the Hubbard gap between the A⁰ and A⁺ acceptor bands in a hole semiconductor or the D⁰ and D^– donor bands in an electron semiconductor is suggested. This narrowing gives rise to the phenomenon of a semiconductor transition from the insulator to metal state with an increase in doping level. The major (doping) impurity can be in one of three charge states (–1, 0, or +1), while the compensating impurity can be in states (+1) or (–1). The impurity distribution over the crystal is assumed to be random and the width of Hubbard bands (levels), to be much smaller than the gap between them. It is shown that narrowing of the Hubbard gap is due to the formation of electrically neutral acceptor (donor) states of the quasicontinuous band of allowed energies for holes (electrons) from excited states. This quasicontinuous band merges with the top of the valence band (v band) for acceptors or with the bottom of the conduction band (c band) for donors. In other words, the top of the v band for a p-type semiconductor or the bottom of the c band for an n-type semiconductor is shifted into the band gap. The value of this shift is determined by the maximum radius of the Bohr orbit of the excited state of an electrically neutral major impurity atom, which is no larger than half the average distance between nearest impurity atoms. As a result of the increasing dopant concentration, the both Hubbard energy levels become shallower and the gap between them narrows. Analytical formulas are derived to describe the thermally activated hopping transition of holes (electrons) between Hubbard bands. The calculated gap narrowing with increasing doping level, which manifests itself in a reduction in the activation energy ε₂ is consistent with available experimental data for lightly compensated p-Si crystals doped with boron and n-Ge crystals doped with antimony.     

On Measurements of the Electrons and Holes Impact-Ionization Coefficients in 4<Emphasis Type="Italic">H</Emphasis>–SiC

All published results of measurements (at 300 K) of the impact ionization coefficients for electrons α_n and holes α_p in 4H–SiC are analyzed. It is shown that the most plausible approximations of dependences of α_{n, p} on electric-field strength E have the usual form α_{n, p} = a_{n, p} exp(–E_{n, p}/E) at fitting-parameter values of a_n = 38.6 × 106 cm^–1, E_n = 25.6 MV/cm, a_p = 5.31 × 106 cm^–1, and E_p = 13.1 MV/cm. These dependences α_{n, p}(E) are used to calculate the highest field strength E_b and thickness w_b of the space-charge region at the breakdown voltage U_b. A number of new formulas for calculating α_{n, p}(E) are obtained from the results of measuring the avalanche-multiplication coefficients and the excess-noise factors under the single-sided illumination of photodiodes with stepped doping.     

High-efficiency LEDs based on <Emphasis Type="Italic">n</Emphasis>-GaSb/<Emphasis Type="Italic">p</Emphasis>-GaSb/<Emphasis Type="Italic">n</Emphasis>-GaInAsSb/<Emphasis Type="Italic">P</Emphasis>-AlGaAsSb type-II thyristor heterostructures

A new type of light-emitting diodes (LEDs), a high-efficiency device based on an n-GaSb/p-GaSb/n-GaInAsSb/P-AlGaAsSb thyristor heterostructure, with the maximum emission intensity at wavelength λ = 1.95 μm, has been suggested and its electrical and luminescent characteristics have been studied. It is shown that the effective radiative recombination in the thyristor structure in the n-type GaInAsSb active region is provided by double-sided injection of holes from the neighboring p-type regions. The maximum internal quantum efficiency of 77% was achieved in the structure under study in the pulsed mode. The average optical power was as high as 2.5 mW, and the peak power in the pulsed mode was 71 mW, which exceeded by a factor of 2.9 the power obtained with a standard n-GaSb/n-GaInAsSb/P-AlGaAsSb LED operating in the same spectral range. The approach suggested will make it possible to improve LED parameters in the entire mid-IR spectral range (2–5 μm).     

Effective electron mass in heavily doped GaAs in the ordering of impurity complexes

Spectra of edge photoluminescence (PL) at 300 K have been studied in a set of Czochralski-grown Te-doped GaAs single crystals with a free carrier density of n₀=10¹⁷–10¹⁹ cm^?3. The carrier density dependences of the chemical potential and band gap narrowing are obtained by analyzing the PL spectral line profiles. The dependence of the effective mass of electrons at the bottom of the conduction band on their density, m ₀ ^* (n₀), is calculated. It is shown that the nonmonotonic m ₀ ^* (n₀) dependence correlates with data on electron scattering in the material under study and results from the ordering of impurity complexes.     

<Emphasis Type="Italic">p</Emphasis><Superscript>+</Superscript>-Si-<Emphasis Type="Italic">n</Emphasis>-CdF<Subscript>2</Subscript> heterojunctions

Boron diffusion and the vapor-phase deposition of silicon layers are used to prepare ultrashallow p⁺-n junctions and p⁺-Si-n-CdF₂ heterostructures on an n-CdF₂ crystal surface. Forward portions of the I–V characteristics of the p⁺-n junctions and p⁺-Si-n-CdF₂ heterojunctions reveal the CdF₂ band gap (7.8 eV), as well as allow the identification of the valence-band structure of cadmium fluoride crystals. Under conditions in which forward bias is applied to the p⁺-Si-n-CdF₂ heterojunctions, electroluminescence spectra are measured for the first time in the visible spectral region.     

Computationally Efficient Motion Estimation Algorithm for HEVC

In this paper, we present a novel computationally efficient motion estimation (ME) algorithm for high-efficiency video coding (HEVC). The proposed algorithm searches in the hexagonal pattern with a fixed number of search points at each grid. It utilizes the correlation between contiguous pixels within the frame. In order to reduce the computational complexity, the proposed algorithm utilizes pixel truncation, adaptive search range, sub-sampling and avoids some of the asymmetrical prediction unit techniques. Simulation results are obtained by using the reference software HM (e n c o d e r_l o w d e l a y_P_m a i n and e n c o d e r_r a n d o m a c c e s s_m a i n profile) and shows 55.49% improvement on search points with approximately the same PSNR and around 1% increment in bit rate as compared to the Test Zonal Search (TZS) ME algorithm. By utilizing the proposed algorithm, the BD-PSNR loss for the video sequences like B a s k e t b a l l P a s s_416 × 240@50 and J o h n n y_1280 × 720@60 is 0.0804 dB and 0.0392 dB respectively as compared to the HM reference software with the e n c o d e r_l o w d e l a y_P_m a i n profile.     

Experimental studies of the effects of atomic ordering in epitaxial Ga<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>In<Subscript>1 – <Emphasis Type="Italic">x</Emphasis></Subscript>P alloys on their optical properties

The properties of epitaxial Ga _x In_{1 – x} P alloys with an ordered arrangement of atoms in the crystal lattice are studied by a number of spectroscopic methods. The alloys are grown by metal-organic chemical vapor deposition onto single-crystal GaAs(100) substrates. It is shown that, under conditions of the coherent growth of an ordered Ga _x In_{1 – x} P alloy on a GaAs(100) substrate, atomic ordering results in radical modifications of the optical properties of the semiconductor compared to the properties of disordered alloys. Among these modifications are a decrease in the band gap and an increase in the luminescence intensity. From the data of dispersion analysis of the infrared dispersion spectra and from ultraviolet spectroscopy data obtained in the transmittance–reflection mode of measurements, the basic optical characteristics, specifically, the dispersion of the refractive index and the high-frequency permittivity of Ga _x In_{1 – x} P alloys with ordering are determined. All of the experimental data are in good agreement with the developed theoretical concepts.     

Characterization of Double-Junction GaAsP Two-Color LED Structure

The structural, optical, electrical and electrical–optical properties of a double-junction GaAsP light-emitting diode (LED) structure grown on a GaP (100) substrate by using a molecular beam epitaxy technique were investigated. The p–n junction layers of GaAs_1?xP_x and GaAs_1?yP_y, which form the double-junction LED structure, were grown with two different P/As ratios. High-resolution x-ray diffraction (HRXRD), photoluminescence (PL), and current–voltage (I–V) measurements were used to investigate the structural, optical and electrical properties of the sample. Alloy composition values (x, y) and some crystal structure parameters were determined using HRXRD measurements. The phosphorus compositions of the first and second junctions were found to be 63.120% and 82.040%, respectively. Using PL emission peak positions at room temperature, the band gap energies (E_g) of the first and second junctions were found to be 1.867 eV and 2.098 eV, respectively. In addition, the alloy compositions were calculated by Vegard’s law using PL measurements. The turn-on voltage (V_on) and series resistance (R_s) of the device were obtained from the I–V measurements to be 4.548 V and 119 Ω, respectively. It was observed that the LED device emitted in the red (664.020 nm) and yellow (591.325 nm) color regions.     

Effect of thallium doping on the mobility of electrons in Bi<Subscript>2</Subscript>Se<Subscript>3</Subscript> and holes in Sb<Subscript>2</Subscript>Te<Subscript>3</Subscript>

The Shubnikov–de Haas effect and the Hall effect in n-Bi_2–xTl_xSe₃ (x = 0, 0.01, 0.02, 0.04) and p-Sb_2–xTl_xTe₃ (x = 0, 0.005, 0.015, 0.05) single crystals are studied. The carrier mobilities and their changes upon Tl doping are calculated by the Fourier spectra of oscillations. It is found shown that Tl doping decreases the electron concentration in n-Bi_2–xTl_xSe₃ and increases the electron mobility. In p-Sb_2–xTl_xTe₃, both the hole concentration and mobility decrease upon Tl doping. The change in the crystal defect concentration, which leads to these effects, is discussed.