Heavily carbon-doped p-type (In)GaAs grown by gas-source molecular beam epitaxy using diiodomethane

Heavily carbon-doped p-type In_xGa_1−xAs (0≤x<0.49) was successfully grown by gas-source molecular beam epitaxy using diiodomethane (CH₂I₂), triethylindium (TEIn), triethylgallium (TEGa) and AsH₃. Hole concentrations as high as 2.1×10²⁰ cm⁻³ were achieved in GaAs at an electrical activation efficiency of 100%. For In_xGa_1−xAs, both the hole and the atomic carbon concentrations gradually decreased as the InAs mole fraction, x, increased from 0.41 to 0.49. Hole concentrations of 5.1×10¹⁸ and 1.5×10¹⁹ cm⁻³ for x = 0.49 and x = 0.41, respectively, were obtained by a preliminary experiment. After post-growth annealing (500°C, 5 min under As₄ pressure), the hole concentration increased to 6.2×10¹⁸ cm⁻³ for x = 0.49, probably due to the activation of hydrogen-passivated carbon accepters.     

SIMS study of the concentration of dopants in LPCVD silicon thin films

Measurements of solid phase dopant concentration (S) of LPCVD Si thin films as a function of substrate temperature (T_s = 500−640 ° C) and gas phase doping ratio (R = 1 × 10⁻⁵ −4 × 10⁻²) by SIMS indicate different behaviors of P and B in the films. A linear relation S = b(T)R is observed for B-doped film with b(T) varying from 4 to 50 depending on T_s. Boron-doped microcrystalline film has a higher doping efficiency than that of P-doped ones.     

Microstructure and growth rate of chemical vapour deposited TiN films in a vertical cold wall reactor

TiN films were grown on SUS304 substrates heated by an induction furnace in a vertical cold wall reactor. Scanning electron microscopy, transmission electron microscopy and X-ray diffraction were used to characterize the microstructures of films obtained at different deposition conditions (temperature, gas flow rate and gas composition). Film structures obtained in the present vertical reactor had the following features compared with those in the tubular reactor: (1) Abnormally grown “star-shaped” crystals were observed on the surfaces of films deposited in the following ranges of total gas flow rate (Q_T), temperature (T) and partial pressures (P): 9.0×10⁻⁶ ≤ Q_T ≤ 1.6×10⁻⁵ m³ s⁻¹, 1223 ≤ T ≤ 1273 K, 0.92 ≤ P_TiCl4 ≤ 6.18 kPa, P_H2 = P_N2. The matrix grains were responsible for (211) preferred orientation. (2) Surface morphologies did not vary so much with P_TiCl4. On the other hand, a drastic change was brought about by adding HCl to the source gas, i.e., plate-shaped crystals dominated and the large “star-shaped” crystals were no longer present. (3) The apparent activation energy for deposition reaction was 230 kJ/mol (1173 ≤ T ≤ 1273 K) and 76.5 kJ/mol (1273 ≤ T ≤ 1373 K) at P_TiCl4 = 2.43 kPa and P_H2 = P_N2 = 49.45 kPa.     

Nuclear magnetic resonance studies of alkaline earth phosphosilicate and aluminoborosilicate glasses

The ¹¹B, ²⁷Al, ²⁹Si and ³¹P magic angle spinning (MAS) NMR spectra of MO–P₂O₅, MO–SiO₂–P₂O₅ and MO(M^′₂O)–SiO₂–Al₂O₃–B₂O₃ (M=Mg, Ca, Sr and Ba, M^′=Na) glasses were examined. In binary MO–P₂O₅ (M=Ca and Mg) glasses, the distributions of the phosphate sites, P(Q_n), can be expressed by a theoretical prediction that P₂O₅ reacts quantitatively with MO. In the ternary 0.30MO–0.05SiO₂–0.65P₂O₅ glasses, the 6-coordinated silicon sites were detected, whose population increases in the order of MgOxCaO–0.05SiO₂–(0.95−x)P₂O₅ glasses, its population increases with an increase in f (=([P₂O₅]−[MO]−[B₂O₃]−[Na₂O])/[SiO₂]) and has maximum at f=9. The signal due to the 5-coordinated silicon atoms is also observed when x is smaller than 0.45. When three network-forming oxides such as SiO₂, Al₂O₃ and B₂O₃ coexist, Al₂O₃ reacts preferably with MO. The populations of 4-coordinated boron atoms, N₄, are expressed well with r/(1−r), where r=([Na₂O]−[Al₂O₃])/([Na₂O]−[Al₂O₃]+[B₂O₃]). The correlation of the Raman signal at 1210 and 1350 cm⁻¹ with the NMR signal of Si(Q₆) at −215 ppm is also seen.     

Monte Carlo simulations of Meyer-Neldel effect on carrier time-of-flight in a-Si:H

We present Monte Carlo simulations of multiple-trapping transport with Meyer-Neldel effect in a-Si:H assuming exponential band tails. The transit time t_T, and the dispersion parameters, ₁ and ₂, before and after the transit time, are extracted from the simulated currents. The simulations show that including the Meyer-Neldel effect improves the agreement of ₁ and ₂ with experimental data, both at low and high temperatures and fits the time-of-flight drift mobility measurements. Best fits to the data yield T₀ = 263 K, T_{MN = 464 K}, v₀₀ = 5 × 10⁹ s⁻¹ and μ₀ = 4 cm² V⁻¹ s⁻¹ for electrons and T₀ = 409 K, T_{MN = 809 K}, v₀₀ = 6.5 × 10¹⁰ s⁻¹ and μ₀ = 0.5 cm² V⁻¹ for holes.     

Ion-implanted treatment of (Ba,Sr)TiO3 films for DRAM applications

The effects of ion implantation on the properties of spin-on sol–gel Ba_0.7Sr_0.3TiO₃ (BST) thin films were studied by implanted Ar⁺, N⁺, and F⁺ doses. The F⁺-implanted BST samples present leakage current density <10⁻⁶ A/cm² at 2.5 V and dielectric constant 450. The leakage current of F⁺-implanted BST samples was reduced about one order of magnitude as compared with that of samples with implanted Ar⁺, N⁺ or without implantation. The thickness shrinkage from 135 to 115 nm was observed in F⁺-implanted BST films (before annealing treatment) and a respective increase in the refractive index from 1.84 to 2.05 was measured. After annealing the implanted samples, the changes of thickness and refractive index depend on the concentration of implanted dose. Based on an infrared transmission study of the samples we suggest that the ion-implanted samples with smaller dose (5×10¹⁴ cm⁻²) have fewer −OH contaminants than the non-implanted or implanted samples with the larger doses (1×10¹⁵ cm⁻²). Based on the results presented, we conclude that suitable ion implantation densifies the spin-on sol–gel BST films and reduces the −OH contaminants in the films.     

Growth and spectral properties of Nd:LaVO4 crystal

This paper reports the growth and spectral properties of 3.5 at% Nd³⁺:LaVO₄ crystal with diameter of 20×15 mm² which has been grown by the Czochralski method. The spectral parameters were calculated based on Judd–Ofelt theory. The intensity parameters Ω_λ are: Ω₂=2.102×10⁻²⁰ cm², Ω₄=3.871×10⁻²⁰ cm², Ω₆=3.235×10⁻²⁰ cm². The radiative lifetime τ_r is 209 μs and calculated fluorescence branch ratios are: β₁(0.88μm)=45.2, β₂(1.06μm)=46.7, β₃(1.34μm)=8.1. The measured fluorescence lifetime τ_f is 137 μm and the quantum efficiency η is 65.6%. The absorption band at 808 nm wavelength has an FWHM of 20 nm. The absorption and emission cross sections are 3×10⁻²⁰ and 6.13×10⁻²⁰ cm², respectively.     

Optical third-harmonic generation from some high-index glasses

Optical third-harmonic generation from some high-index glasses was investigated. The highest χ⁽³⁾ was obtained from As₂S₃ glass 2.2 × 10⁻¹² esu/ This value was 100 times higher than that of pure SiO₂ glass and comparable with that of the polymer with monomer-doping, which are known as organic materials with quite high χ⁽³⁾. From the relationship between χ⁽³⁾ and composition, sulfide glasses were found to have higher χ⁽³⁾ than oxide or semiconductor-doped oxide glasses with similar refractive indices.     

SiC epitaxial layer growth in a novel multi-wafer vapor-phase epitaxial (VPE) reactor

Experimental results are presented for SiC epitaxial layer growths employing a unique planetary SiC-VPE reactor. The high-throughput, multi-wafer (7×2″) reactor, was designed for atmospheric and reduced pressure operation at temperatures up to and exceeding 1600°C. Specular epitaxial layers have been grown in the reactor at growth rates ranging from 3–5 μm/h. The thickest layer grown to date is 42 μm thick. The layers exhibit minimum unintentional n-type doping of 1×10¹⁵ cm⁻³, and room temperature mobilities of 1000 cm²/V s. Intentional n-type doping from 5×10¹⁵ cm⁻³ to >1×10¹⁹ cm⁻³ has been achieved. Intrawafer layer thickness and doping uniformities (standard deviation/mean at 1×10¹⁶ cm⁻³) are typically 4 and 7%, respectively, on 35 mm diameter substrates. Moderately doped, 4×10¹⁷ cm⁻³, layers, exhibit 3% doping uniformity. Recently, 3% thickness and 10% doping uniformity (at 1×10¹⁶ cm⁻³) has been demonstrated on 50 mm substrates. Within a run, wafer-to-wafer thickness deviation averages 9%. Doping variation, initially ranging as much as a factor of two from the highest to the lowest doped wafer, has been reduced to 13% at 1×10¹⁶ cm⁻³, by reducing susceptor temperature nonuniformity and eliminating exposed susceptor graphite. Ongoing developments intended to further improve layer uniformity and run-to-run reproducibility, are also presented.     

Boron-doped a-SiOx:H films prepared by photo-CVD technique

The optoelectronic and structural properties of p-type a-SiO_x:H films have been studied. The deposition parameters e.g. chamber pressure and diborane to silane ratio are optimized to get a film with dark conductivity (σ_d) 7.9×10⁻⁶ S cm⁻¹ and photoconductivity 9.3×10⁻⁶ S cm⁻¹ for an optical gap (E₀₄) of 1.94 eV. The decrease of optical gap accompanied by the increase of conductivity is due to less oxygen incorporation in the film, which is substantiated by the decrease of the intensity of SiO absorption spectra. The properties are very much effected by the chamber pressure and diborane to silane ratio.     

Effects of ion implantation on intermediate range order: IR spectra of silica

The reflectance spectra of ion implanted SiO₂ glasses has been measured from 5000 cm⁻¹ to 400 cm⁻¹. The silica was implanted with Ti, Cr, Mn, Fe, Cu and Bi to nominal doses ranging from 1×10¹⁵ ions/cm² to 1.2×10¹⁷ ions/cm² at an energy of 160 keV and currents of approximately 2.6 μA/cm². Changes in the intensity of the 1232 cm⁻¹ and 1015 cm⁻¹ vibrational modes are attributed to changes in the intermediate range order (IRO) and to changes in the concentration of non-bridging oxygen (NBO) defects in the implanted layer. These changes are ion and dose dependent. The differing effects on IRO and NBO are attributed to the chemical interaction of the implanted ions with the substrate.     

Growth and properties of (Pb0.90La0.10)TiO3 thick films prepared by RF magnetron sputtering with a PbO buffer layer

The (Pb_0.90La_0.10)TiO₃ [PLT] thick films (3.0 μm) with a PbO buffer layer were deposited on the Pt(1 1 1)/Ti/SiO₂/Si(1 0 0) substrates by RF magnetron sputtering method. The PLT thick films comprise five periodicities, the layer thicknesses of (Pb_0.90La_0.10)TiO₃ and PbO in one periodicity are fixed. The PbO buffer layer improves the phase purity and electrical properties of the PLT thick films. The microstructure and electrical properties of the PLT thick films with a PbO buffer layer were studied. The PLT thick films with a PbO buffer layer possess good electrical properties with the remnant polarization (P_r=2.40 μC cm⁻²), coercive field (E_c=18.2 kV cm⁻¹), dielectric constant (ε_r=139) and dielectric loss (tan δ=0.0206) at 1 kHz, and pyroelectric coefficient (9.20×10⁻⁹ C cm⁻² K⁻¹). The result shows the PLT thick film with a PbO buffer layer is a good candidate for pyroelectric detector.     

Li conductivity in lithium niobate: silica glasses

Glasses of composition 65 mol% LiNbO₃:: 35 mol% SiO₂ have been shown to be Li⁺ ion conductors with a conductivity at 200°C > 1 × 10⁻⁵ (η cm)⁻¹ and an activation energy of 0.54 eV. The addition of approximately 0.1 mol% Fe₂O₃ leads to an enhancement of conductivity to ≈10⁻³ (η cm)⁻¹ at 200°C and an activation energy of 0.67 eV. The effect of Fe is shown to be in the control of microstructure in the glass, with Fe₂O₃ concentrations < 1 mol% acting as a grain growth inhibitors and larger concentrations acting as a nucleating agents. A model for this process based on the expected stoichiometry of the melt and the effect of Fe²⁺ and Fe³⁺ in charge compensation is in excellent agreement with experimental data from electron spin resonance.     

A study of Raman spectroscopy and low-temperature specific heat in gel-synthesized amorphous silica

A comparative study of low-temperature specific heat (1.5–25 K), C_p, and low-frequency Raman scattering (<150 cm⁻¹) has been performed in amorphous silica samples synthesized by sol–gel method (xerogels) and thermally densified in a range of densities, from ρ=1250 kgm⁻³ to ρ=2100 kgm⁻³, close to the density of the melt quenched vitreous silica (v-SiO₂). The present analysis concerns the application of the low-energy vibrational dynamics as an appropriate tool for monitoring the progressive thermal densification of silica gels. By comparison with v-SiO₂, the Raman and thermal properties of xerogels with increasing thermal treatment temperature revealed the following important results: (i) the existence of a critical treatment temperature at about 870°C, where a homogeneous viscous sintering produces full densification of the samples. This effect is detected by the observations of the Boson peak in Raman spectra at about 45 cm⁻¹ and of a peak in C_p(T)/T³, very close to those observed in v-SiO₂; (ii) in silica xerogels treated at temperatures less than about 800°C, the low-frequency Raman scattering is greater, with a continuous decreasing unstructured shape, and the Boson peak is not detected in the spectra.     

Optical properties of hydrogenated amorphous silicon films doped with fluorinated gases

Doped amorphous silicon films were prepared by plasma-enhanced chemical vapour deposition of silane and hydrogen mixtures, using phosphorus pentafluoride (PF₅) and boron trifluoride (BF₃) as dopant precursors. The films were studied by UV-vis spectroscopy and their photo and dark conductivity were measured, the latter as a function of temperature. The optical gap of the n-type samples, doped with PF₅, diminished as the concentration of this gas in the plasma was increased. However, the optical gap of p-type samples, doped with BF₃, did not show any appreciable optical gap decrease as the concentration of BF₃ was varied from 0.04% to 4.7%. The dark conductivity of the p-type films at these extremes of the doping range were 7.6 × 10⁻¹⁰ and 3.5 × 10⁻¹ Ω⁻¹ cm⁻¹, respectively.     

Oscillator strength of the infrared absorption band near 1080 cm in SiO2 films

It has been well known that the absorption maximum of the peak near 1080 cm⁻¹ in amorphous SiO₂ films shifts continuously with variation of thickness and properties such as stress. This is a first report on the oscillator strength of the absorption against frequency at the absorption maximum. SiO₂ films on silicon wafers were prepared by thermal growth in either dry O₂ or an O₂/H₂ mixture or liquid-phase deposition in HF saturated with silica gel. The oscillator strength continuously decreased from 1×10⁻⁴ down to 1×10⁻⁵ with the frequency shift from 1099 to 1063 cm⁻¹.     

Comparative analysis of characteristics of Si, Mg, and undoped GaN

We have grown undoped, Si- and Mg-doped GaN epilayers using metalorganic chemical vapor deposition. The grown samples have electron Hall mobilities (carrier concentrations) of 798 cm²/V s (7×10¹⁶ cm⁻³) for undoped GaN and 287 cm²/V s (2.2×10¹⁸ cm⁻³) for Si-doped GaN. Mg-doped GaN shows a high hole concentration of 8×10¹⁷ cm⁻³ and a low resistivity of 0.8 Ω cm. When compared with undoped GaN, Si and Mg dopings increase the threading dislocation density in GaN films by one order and two orders, respectively. Besides, it was observed that the Mg doping causes an additional biaxial compressive stress of 0.095 GPa compared with both undoped and Si-doped GaN layers, which is due to the incorporation of large amount of Mg atoms (4–5×10¹⁹ cm⁻³).     

Photoassisted growth and nitrogen doping of ZnSe

ZnSe was grown on GaAs(100) substrates by photoassisted MOVPE using the precursors dimethylzinc-triethylamine (DMZn-TEN) and ditertiarybutylselenide (DtBSe). The optimal growth temperature was T_g = 300°C. Above 300°C no enhancement of growth rate was observed under illumination. Furthermore, nitrogen doping experiments were performed using phenylhydrazine, allylamine and tert-butylamine as nitrogen precursors. Nitrogen concentrations up to 10¹⁹ cm⁻³ (SIMS) were achieved with input flow ratios as low as [PhHz]/[Se] = 4 × 10⁻⁴. All as-grown samples were highly compensated. Successful nitrogen incorporation was also observed with allylamine. However, the use of tert-butylamine together with the adduct compound DMZn-TEN showed no incorporation of nitrogen.     

B NMR investigations in xV2O5–B2O3 and xV2O5–B2O3–PbO glasses

11B (I=3/2) MAS NMR in the binary glass system xV₂O₅–B₂O₃ (x=0.053, 0.43) and the ternary glass system xV₂O₅–B₂O₃–PbO (0.1x1.5) has been investigated at room temperature. In the xV₂O₅–B₂O₃ glasses, one NMR line due to BO₃ unit was observed. Meanwhile in the xV₂O₅–B₂O₃–PbO, two NMR lines which arise from BO₃ and BO₄ units were detected, where the appearance of BO₄ units is produced by the presence of PbO. From the computer-simulation of the ¹¹B NMR central transition line (m=−1/2↔1/2), the quadrupole parameters (e²qQ/h and η) for BO₃ units in xV₂O₅–B₂O₃, and those for BO₃ and BO₄ units in xV₂O₅–B₂O₃–PbO were obtained as a function of x. As the V₂O₅ content increases in xV₂O₅–B₂O₃–PbO, the e²qQ/h and η values of the BO₃⁻ associated resonance are found to slightly decrease and increase, respectively. Meanwhile, the e²qQ/h and η values of BO₄⁻ associated resonance in xV₂O₅–B₂O₃–PbO are found to slightly increase and decrease, respectively. By comparing the intensities of the total transitions (m=−3/2↔−1/2,m=−1/2↔1/2, and 1/2↔3/2) for the ¹¹B NMR line of BO₃ and BO₄ units contained in xV₂O₅–B₂O₃–PbO with those of respective standard samples of 0.053V₂O₅–B₂O₃ and NaBH₄, the quantitative fractions of BO₃ and BO₄ in xV₂O₅–B₂O₃–PbO were obtained as a function of x.     

Growth and spectral properties of Nd-doped Sr3Y(BO3)3 crystal

A new crystal of Nd³⁺:Sr₃Y(BO₃)₃ with dimension up to 25×35 mm² was grown by Czochralski method. Absorption and emission spectra of Nd³⁺: Sr₃Y(BO₃)₃ were investigated . The absorption band at 807 nm has a FWHM of 18 nm. The absorption and emission cross sections are 2.17×10⁻²⁰ cm² at 807 nm and 1.88×10⁻¹⁹ cm² at 1060 nm, respectively. The luminescence lifetime τ_f is 73 μs at room temperature