The effect of external stress on the properties of AlGaAs/GaAs single quantum well laser diodes

The change of spectrum of the AlGaAs/GaAs single quantum well laser diode is measured under the application of uniform uniaxial in-plane tensile and compressive stress. In the range of the tensile stress we apply (up to 597 MPa), the wavelength increases linearly at a rate of 5.3 nm GPa⁻¹. The energy band gap decreases with the tensile stress with the slope of −10 meV GPa⁻¹, which is close to the theoretical change of the heavy hole band edge with respect to the conduction band edge. There is a shorter wavelength peak existing on the spectrum as the tensile stress increases, suggesting a transition from the conduction band to a higher energy valence band. For the compressive stress (up to −516 MPa), the wavelength decreases with the stress, but it shows an abrupt reduction from −162 to −200 MPa. The threshold current also varies as a result of the change of the energy band structure.     

Model based precise analysis of the injection currents in Al/ZrO2/Al2O3/ZrO2/SiO2/Si structures for use in charge trapping non-volatile memory devices

Metal/insulator/Silicon (MIS) capacitors containing multilayered ZrO₂/Al₂O₃/ZrO₂/SiO₂ dielectric were investigated in order to evaluate the possibility of their application in charge trapping non-volatile memory devices. The ZrO₂/Al₂O₃/ZrO₂ stacks were deposited by reactive rf magnetron sputtering on 2.4 nm thick SiO₂ thermally grown on p-type Si substrate. C–V characteristics at room temperature and I–V characteristics recorded at temperatures ranging from 297 K to 393 K were analyzed by a comprehensive model previously developed. It has been found that Poole-Frenkel conduction in ZrO₂ layers occurs via traps energetically located at 0.86 eV and 1.39 eV below the bottom of the conduction band. These levels are identified as the first two oxygen vacancies related levels in ZrO₂, closest to its conduction band edge, whose theoretical values reported in literature are: 0.80 eV, for fourfold, and 1.23 eV, for threefold coordinated oxygen vacancies.     

Preparation and physical properties of the layered niobate Cu0.5Nb3O8: Application to photocatalytic hydrogen evolution

The new layered niobate Cu_0.5Nb₃O₈ is synthesized by soft chemistry in aqueous electrolyte via Cu²⁺→H⁺ exchange between copper nitrate and HNb₃O₈·H₂O. The characterization of the exchanged product is made by means of thermal gravimetry, chemical analysis, X-ray diffraction and IR spectroscopy. Thermal analysis shows a conversion to anhydrous compound above 500 °C. The oxide displays a semiconductor like behavior; the thermal variation of the conductivity shows that d electrons are strongly localized and the conduction is thermally activated with activation energy of 0.13 eV. The temperature dependence of the thermopower is indicative of an extrinsic conductivity; the electrons are dominant carriers in conformity with an anodic photocurrent. Indeed, the Mott–Schottky plot confirms n-type conduction from which a flat band potential of −0.82 V_SCE, an electronic density of 8.72×10¹⁹ m⁻³ and a depletion width of 4.4 nm are determined. The upper valence band, located at ~5.8 eV below vacuum is made up predominantly of Cu²⁺: 3d with a small admixture of O²⁻: 2p orbitals whereas the conduction band consists of empty Nb⁵⁺: 5s level. The energy band diagram shows the feasibility of the oxide for the photocatalytic hydrogen production upon visible light (29 mW cm⁻²) with a rate evolution of 0.31 mL g⁻¹ min⁻¹.     

The electronic structure of Ni-phthalocyanine/metal interfaces studied by X-ray and ultraviolet photoelectron spectroscopy

Nickel phthalocyanine (NiPc) thin films were grown stepwise on polycrystalline gold and silver substrates and the formed interfaces were characterized by X-ray and ultraviolet photoelectron spectroscopies (XPS, UPS). The variation of the XPS core level binding energy with NiPc film thickness yields information about band bending and interface dipoles. The valence band structure of the NiPc thin films was determined by UPS and exhibits four main features at binding energies 1.50 eV, 3.80 eV, 6.60 eV and 8.85 eV, respectively. The NiPc highest occupied molecular orbital (HOMO) cut-off was measured at ∼1.00 eV from the analyzer Fermi level and from the measured work function change of the growing NiPc film a final work function value for NiPc was estimated at 3.90 ± 0.10 eV. The main C1s peak of the NiPc film (∼5.0 nm) consists of two components at 284.8 eV (C–C bonds), 286.2 eV (C–N bonds) reflecting photoemission from multiple carbon sites within the molecule and a satellite at 287.9 eV, whereas the Ni2p and N1s peaks appear at ∼855.9 eV and ∼399.3 eV, respectively and are due to Ni–N bonds. The energy level diagrams of the NiPc/Au and NiPc/Ag interfaces were determined from a combination of the XPS and UPS results, yielding a hole injection barrier of 0.90 ± 0.10 eV for both substrates.     

Compositional dependence of work function and Fermi level position of the HfNx/SiO2 system

In situ Kelvin Probe (KP) measurements performed on HfN_x showed an increase of the vacuum work function as a function of N content from a value of 3.9 eV (silicon conduction band edge) for pure Hf to a value of 5 eV (silicon valence band edge) for x ～ 2. In contrast, capacitance–voltage (C–V) measurements showed that the effective work function increased only until x < 1 and saturated around a value of 4.6 eV (silicon midgap). This behavior is attributed to Fermi level pinning, which is probably due to oxidation of the HfN_x during the reactive sputtering deposition step.     

Defect characterization of Tl4GaIn3Se2S6 layered single crystals by photoluminescence

Photoluminescence (PL) spectra of Tl₄GaIn₃Se₂S₆ layered crystals grown by the Bridgman method have been studied in the energy region of 2.02–2.35 eV and in the temperature range of 16–45 K. A broad PL band centered at 2.20 eV was observed at T=16 K. Variations of emission band has been studied as a function of excitation laser intensity in the 0.1 to 149.9 mW cm⁻² range. Radiative transitions from shallow donor level located at 10 meV below the bottom of conduction band to moderately deep acceptor level located at 180 meV above the top of the valence band were suggested to be responsible for the observed PL band. An energy level diagram showing transitions in the band gap of the crystal was plotted taking into account the results of present work and previously reported paper on thermally stimulated current measurements carried out below room temperature. Analysis of the transmission and reflection measurements performed in the wavelength range of 400–1030 nm at room temperature revealed the presence of indirect transitions with 2.22 eV band gap energy.     

Deep level electronic structure of ZnSe/GaAs heterostructures

We performed 1—2 keVcathodoluminescence measurements and He-Ne and HeCd excited photoluminescence studies of ZnSe/GaAs( 100) heterostructures grown by molecular beam epitaxy. Our goal was to investigate the deep level electronic structure and its connection with the heterojunction band offsets. We observed novel deep level emission features at 0.8, 0.98, 1.14, and 1.3 eV which are characteristic of the ZnSe overlayer and independent in energy of overlayer thickness. The corresponding deep levels lie far below those of the near-bandedge features commonly used to characterize the ZnSe crystal quality. The relative intensity and spatial distribution of the deep level emission was found to be strongly affected by the Zn/Se atomic flux ratio employed during ZnSe growth. The same flux ratio has been shown to influence both the quality of the ZnSe overlayer and the band offset in ZnSe/GaAs heterojunctions. In heterostructures fabricated in Se-rich growth conditions, that minimize the valence band offset and the concentration of Se vacancies, the dominant deep level emission is at 1.3 eV. For heterostructures fabricated in Zn-rich growth conditions, emission by multiple levels at 0.88,0.98, and 1.14 eV dominates. The spectral energies and intensities of deep level transitions reported here provide a characteristic indicator of ZnSe epilayer stoichiometry and near-interface defect densities.     

Similarities of lag phenomena and current collapse in field-plate AlGaN/GaN HEMTs with different types of buffer layers

We make a two-dimensional transient analysis of field-plate AlGaN/GaN high electron mobility transistors (HEMTs) with a Fe-doped semi-insulating buffer layer, which is modeled that as deep levels, only a deep acceptor located above the midgap is included (E_C − E_DA = 0.5 eV, E_C: energy level at the bottom of conduction band, E_DA: deep acceptor's energy level). And the results are compared with a case having an undoped semi-insulating buffer layer in which a deep donor above the midgap (E_C − E_DD = 0.5 eV. E_DD: the deep donor's energy level) is considered to compensate a deep acceptor below the midgap (E_DA − E_V = 0.6 eV, E_V: energy level at the top of valence band). It is shown that the drain-current responses when the drain voltage is lowered abruptly are reproduced quite similarly between the two cases with different types of buffer layers, although the time region where the slow current transients occur is a little different. The lags and current collapse are reduced by introducing a field plate. This reduction in lags and current collapse occurs because the deep acceptor's electron trapping is reduced under the gate region in the buffer layer. The dependence of drain lag, gate lag and current collapse on the field-plate length and the SiN layer thickness is also studied, indicating that the rates of drain lag, gate lag and current collapse are quantitatively quite similar between the two cases with different types of buffer layers when the deep-acceptor densities are the same.     

Silicon/organic hybrid heterojunction infrared photodetector operating in the telecom regime

The authors report on the fabrication of a silicon/organic heterojunction based IR photodetector. It is demonstrated that an Al/p-Si/perylene-derivative/Al heterostructure exhibits a photovoltaic effect up to 2.7 μm (0.46 eV), a value significantly lower than the bandgap of either material. Although the devices are not optimized, at room temperature a rise time of 300 ns, a responsivity of ≈0.2 mA/W with a specific detectivity of D¹ ≈ 7 × 10⁷ Jones at 1.55 μm is found. The achieved responsivity is two orders of magnitude higher compared to our previous efforts [1], [2]. It will be outlined that the photocurrent originates from an absorption mechanism involving excitation of an electron from the Si valence band into the extended LUMO state in the perylene-derivative, with possible participation of intermediate localized surface state in the organic material.The non-invasive deposition of the organic interlayer onto the Si results in compatibility with the CMOS process, making the presented approach a potential alternative to all inorganic device concepts.     

GaAs thermal treatment with fullerenes

Fullerenes C₆₀ were introduced into the GaAs crystal through the dislocation network by means of thermal diffusion. Energy level at 0.34–0.42 eV above the valence band was identified, which could be related to C₆₀. Interaction between C₆₀ vibration modes and GaAs Debye phonons was evidenced by the measurements of electric parameters. After the thermal treatment, electron mobility had diminished significantly as compared to pure GaAs crystals. This phenomenon was related to the changes in the EL2 level.     

Cathodoluminescence spectroscopy of deep defect levels at the ZnSe/GaAs interface with a composition-control interface layer

In this work we investigate ZnSe/GaAs heterostructures with an additional 2 nm controlled interfacial layer (CIL) of Se- or Zn-rich composition to modify the band offset. The samples are analyzed as a function of annealing temperature by cathodoluminescence spectroscopy. The as-prepared samples show defect luminescence at ∼ 0.9 eV. With staged annealing at increasing temperatures, both the Zn-rich as well as the Se-rich interfacial layer exhibits luminescence at ∼ 1.9 eV, indicative of defect formation with an onset temperature of ∼400°C. Excitation-dependent spectroscopy provides evidence for defect formation near the interface, which extends into the ZnSe epilayer at higher temperatures. Compared to earlier work, where the threshold temperature for defect formation in bulk samples fabricated under Se-rich growth conditions occurs at temperatures as low as 325°C, the resistance to defect formation has now been improved to that of stoichiometric ZnSe. These results demonstrate that epitaxially grown CILs provide a means to alter ZnSe/GaAs band offsets without degrading the heterojunction’s resistance to defect formation at elevated temperatures.     

The nature of the aluminum–aluminum oxide interface: A nanoscale picture of the interfacial structure and energy-level alignment

We propose a new structural model for the Al(1 1 1)/Al₂O₃(0 0 0 1) interface based on density functional theory calculations. The ultrathin interface structure is shown to consist of two Al layers, one that is oxide-like and the other metal-like. Our model interface reproduces the barrier height to the oxide conduction band edge and predicts the oxide overlayer to lower the metal work function by 0.49 eV.     

Versatile hole injection of VO2: Energy level alignment at N,N′-di(1-naphthyl)-N,N′-diphenyl-(1,1′-biphenyl)-4,4′-diamine/VO2/fluorine-doped tin oxide

Energy level alignments at the interface of N,N′-di(1-naphthyl)-N,N′-diphenyl-(1,1′-biphenyl)-4,4′-diamine (NPB)/VO₂/fluorine-doped tin oxide (FTO) were studied by photoemission spectroscopy. The overall hole injection barrier between FTO and NPB was reduced from 1.38 to 0.59 eV with the insertion of a VO₂ hole injection layer. This could allow direct hole injection from FTO to NPB through a shallow valence band of VO₂. Surprisingly, VO₂ can also act as a charge generation layer due to its small band gap of 0.80 eV. That is, its conduction band is quite close to the Fermi level, and thus electrons can be extracted from the highest occupied molecular orbital (HOMO) of NPB, which is equivalent to hole injection into the NPB HOMO.     

Electronic and chemical properties of ZnO in inverted organic photovoltaic devices

Photo-conversion efficiency of inverted polymer solar cells incorporating pulsed laser deposited ZnO electron transport layer have been found to significantly increase from 0.8% to up to 3.3% as the film thickness increased from 4 nm to 100 nm. While the ZnO film thickness was found to have little influence on the morphology of the resultant ZnO films, the band structure of ZnO was found to evolve only for films of thickness 25 nm or more and this was accompanied by a significant reduction of 0.4 eV in the workfunction. The films became more oxygen deficient with increased thickness, as found from X-ray photoelectron spectroscopy (XPS) and valence band XPS (VBXPS). We attribute the strong dependence of device performance to the zinc to oxygen stoichiometry within the ZnO layers, leading to improvement in the band structure of ZnO with increased thickness.     

Photoconduction in the archetype organic hole transporting material TPD

Electric field, light wavelength and excitation intensity characteristics of photoconduction have been measured in a diamine derivative (TPD) serving as a common hole-transporting material in organic light emitting diodes. Single layer TPD structures, Quartz/ITO/TPD/Al and Quartz/Al/TPD/Al, have been excited trough a quartz substrate. At wavelengths longer than ≈370 nm and at low excitation levels, the photocurrent is due to singlet exciton-induced injection of electrons at the cathodes. Good agreement with experiment is provided by solving the diffusion equation for the excitons and applying the 1D-Onsager model of geminate recombination of electrons with their image countercharge in the electrode. A bulk generated (hole) photocurrent is shown to dominate with excitation energies (hν) well in excess of 3.2 eV, i.e. λ ⩽ 350 nm, and in the whole spectral range applied for moderate and high excitation intensities.     

A high Schottky barrier between Ni and S-passivated n-type Si(1 0 0) surface

By minimizing surface states with sulfur passivation, a record-high Schottky barrier is achieved with nickel on n-type Si(1 0 0) surface. Capacitance–voltage measurements yield a flat-band barrier height of 0.97 eV. Activation-energy and current–voltage measurements indicate ～0.2-eV lower barriers for the Ni/Si(1 0 0) junction. These results accompany a previously-reported record-high Schottky barrier of 1.1 eV between aluminum and S-passivated p-type Si(1 0 0) surface. The operation of these metal/Si(1 0 0) junctions changes from majority-carrier conduction, i.e., a Schottky junction, to minority-carrier conduction, i.e., a p–n junction, with the increase in barrier height from 0.97 eV to 1.1 eV. Temperature-dependent current–voltage measurements reveal that the Ni/S-passivated n-type Si(1 0 0) junction is stable up to 110 °C.     

Electronic properties of the interface between the organic semiconductor α-sexithiophene and polycrystalline palladium

The interface properties of α-sexithiophene (α-6T) and polycrystalline, atomically clean and contaminated palladium have been studied by combined core level X-ray photoemission spectroscopy and valence band ultraviolet photoemission spectroscopy. Our data indicate for the atomically clean palladium substrate a chemical reaction between the α-sexithiophene molecules and the substrate during the formation of a monolayer of flat lying α-6T molecules. We find an interface dipole of −1.2 eV and an injection barrier for holes of about 0.7 eV. In the case of ex-situ treated, contaminated palladium as metal electrode material we find a reduced interface dipole −0.4 eV and hole injection barrier 0.5 eV. By the comparison to the results of α-sexithiophene on gold we demonstrate the importance of the strength of chemical reactions at the interface.     

Effect of thermal annealing on structural and optical properties of titanyl phthalocyanine thin films

Thin films of titanyl phthalocyanine (TiOPc) have been deposited on both fused quartz and glass substrates by the thermal evaporation technique. The structural and optical properties of the as-deposited and annealed films have been reported. The structural features of the as-deposited and annealed films have been studied by X-ray diffraction (XRD), field-emission scanning electron microscopy (FESEM), and Fourier-transform infrared (FT-IR) technique. The optical constants (refractive index, n, and absorption index, k) of the films have been presented for the first time in the wavelength range 200–2500 nm by using spectrophotometric measurements at nearly normal incidence. The band gaps of the as-deposited film at 1.48 eV and 2.5 eV corresponding to Q-band and B or Soret band were red-shifted to 1.15 eV and 2.19 eV, respectively, when the film annealed at 433 K.     

Direct MBE growth of GaN on GaAs substrates for integrated short wavelength emitters

The growth and material properties of GaN heteroepitaxial layers on vicinal (1 0 0) and exact (1 1 1)B substrates have been investigated, using molecular beam epitaxy (MBE) with N₂ RF-plasma source. We examined the approach to grow GaN directly on the oxide desorbed GaAs, without the incidence of an As beam during oxide desorption or the following stages of growth. Perfect smooth surfaces were obtained on (1 1 1)B GaAs but excellent luminescence properties were observed on vicinal (1 0 0) GaAs. Four growth temperatures (T_G) were compared for the (1 0 0) orientation and a monotonic increase of photoluminescence intensity with increasing T_G, in the range of 570–680°C, was observed. The best surface morphology of less than 10 nm rms roughness was also determined, by atomic force microscopy, for the maximum (680°C) temperature. The layers exhibited up to 10¹⁷ cm⁻³ electron concentration and it could be compensated by Mg impurities. Metallizations of Pt and Pd gave ohmic contacts on GaN/GaAs (1 0 0) but a Schottky diode contact was achieved by Ir metallization. The obtained material properties are probably sufficient for realizing efficient GaN light emitters on (1 0 0) GaAs substrates.     

Analysis of defect related optical transitions in biased AlGaN/GaN heterostructures

The optical transitions in AlGaN/GaN heterostructures that are grown by metalorganic chemical vapor deposition (MOCVD) have been investigated in detail by using Hall and room temperature (RT) photoluminescence (PL) measurements. The Hall measurements show that there is two-dimensional electron gas (2DEG) conduction at the AlGaN/GaN heterointerface. PL measurements show that in addition to the characteristic near-band edge (BE) transition, there are blue (BL) and yellow luminescence (YL) bands, free-exciton transition (FE), and a neighboring emission band (NEB). To analyze these transitions in detail, the PL measurements were taken under bias where the applied electric field changed from 0 to 50 V/cm. Due to the applied electric field, band bending occurs and NEB separates into two different peaks as an ultraviolet luminescence (UVL) and Y₄ band. Among these bands, only the yellow band is unaffected with the applied electric field. The luminescence intensity change of these bands with an electric field is investigated in detail. As a result, the most probable candidate of the intensity decrease with an increasing electric field is the reduction in the radiative lifetime.