Charge transport properties and microstructure of polythiophene/polyfluorene blends

We present a combined charge transport and X-ray diffraction study of blends based on regioregular poly(3-hexylthiophene) (P3HT) and the polyfluorene co-polymer poly((9,9-dioctylfluorene)-2,7-diyl-alt-[4,7-bis(3-hexylthien-5-yl)-2,1,3-benzothiadiazole]-2′,2′′-diyl) (F8TBT) that are used in efficient all-polymer solar cells. Hole mobility is observed to increase by nearly two orders of magnitude from less than 10^?7 cm² V^?1 s^?1 for as spin-coated blends to 6 × 10^?6 cm² V^?1 s^?1 for blends annealed at 453 K at a field of 2.7 × 10⁵ V/cm, but still significantly below the time-of-flight mobility of unblended P3HT of 1.7 × 10^?4 cm² V^?1 s^?1. The hole mobility of the blends also show a strong negative electric-field dependence, compared with a relatively flat electric-field dependence of unblended P3HT, suggestive of increased spatial disorder in the blends. X-ray diffraction measurements reveal that P3HT/F8TBT blends show a phase separation of the two components with a crystalline part attributed to P3HT and an amorphous part attributed to F8TBT. In as-spun and mildly annealed blends, the measured d-values and relative intensities of the 100, 200 and 300 P3HT peaks are noticeably different to unblended P3HT indicating an incorporation of F8TBT in P3HT crystallites that distorts the crystal structure. At higher anneal temperatures the blend d-values approach that of unblended P3HT suggesting a well separated blend with pure P3HT crystallites. P3HT crystallite size in the blend is also observed to increase with annealing from 3.3 to 6.1 nm, however similar changes in crystallite size are observed in unblended P3HT films with annealing. The lower mobility of P3HT/F8TBT blends is attributed not only to increased P3HT structural disorder in the blend, but also due to the blend morphology (increased spatial disorder). Changes in hole mobility with annealing are interpreted in terms of the need to form percolation networks of P3HT crystallites within an F8TBT matrix, with a possible contribution due to the intercalation of F8TBT in P3HT crystallites acting as defects in the as-prepared state.     

Effects of defect,carrier concentration and annealing process on the photoluminescence of silicon pn diodes

Silicon pn diodes were fabricated by ion implantation of B and P ions with different doses and subsequent annealing processes. Room temperature photoluminescence (PL) were investigated and the factors affecting the PL intensity were analyzed. Results show that both kinds of pn diodes have PL peak centered at about 1140 nm. Dislocation loops resulted from ion implantation and annealing process may enhance the light emission of silicon pn diode due to its band quantum confinement effect to carriers. The luminescence intensity depends on the carrier concentrations in the implantation region. It should be controlled at the range of 1–6×10¹⁶ cm⁻³. Moreover, the PL intensities of pn diodes with furnace annealing (FA) are higher than those with rapid thermal annealing, and the annealing temperature range for FA is 900–1100 °C.     

Dependence of annealing on stability of transparent amorphous InGaZnO thin film transistor

Bottom-gate transparent IGZO–TFT had been successfully fabricated at relatively low temperature (200 °C). The devices annealing for 4 h at 200 °C exhibit good electrical properties with saturation mobility of 8.2 cm²V^?1s^?1, subthreshold swing of 1.0 V/dec and on/off current ratio of 5×10⁶. The results revealed that the stability of TFT devices can be improved remarkably by post-annealing treatment. After applying positive gate bias stress of 20 V for 5000 s, the device annealing for 1 h shows a larger positive V_th shift of 4.7 V. However, the device annealing for 4 h exhibits a much smaller V_th shift of 0.04 V and more stable.     

Experimental study for high effective mobility with directly deposited HfO2/La2O3 MOSFET

We experimentally examine the effective mobility in nMOSFETs with La₂O₃ gate dielectrics without SiO_x-based interfacial layer. The reduced mobility is mainly caused by fixed charges in High-k gate dielectrics and the contribution of the interface state density is approximately 30% at N_s = 5 × 10¹¹ cm^?2 in the low 10¹¹ cm^?2 eV^?1 order. It is considered that one of the effective methods for improving mobility is to utilize La-silicate layer formed by high temperature annealing. However, there essentially exists trade-off relationship between high temperature annealing and small EOT.     

Effects of RTA temperatures on conductivity and micro-structures of boron-doped silicon nanocrystals in Si-rich oxide thin films

In this work, the B-doped Si rich oxide (SRO) thin films were deposited and then annealed using rapid thermal annealing (RTA) to form SiO₂-matrix silicon nanocrystals (Si NCs). The effects of the RTA temperatures on the structural properties, conduction mechanisms and electrical properties of B-doped SRO thin films (BSF) were investigated systematically using Hall measurements, Fourier transform infrared spectroscopy and Raman spectroscopy. Results showed that the crystalline fraction of annealed BSF increased from 41.3% to 62.8%, the conductivity was increased from 4.48×10⁻³ S/cm to 0.16 s/cm, the carrier concentration was increased from 8.74×10¹⁷ cm⁻³ to 4.9×10¹⁸ cm⁻³ and the carrier mobility was increased from 0.032 cm² V⁻¹ s⁻¹ to 0.2 cm² V⁻¹ s⁻¹ when the RTA temperatures increased from 1050 °C to 1150 °C. In addition, the fluctuation induced tunneling (FIT) theory was applicable to the conduction mechanisms of SiO₂-matrix boron-doped Si-NC thin films.     

Germanium on sapphire by wafer bonding

This paper describes the creation of a germanium on sapphire platform, via wafer bonding technology, for system-on-a-chip applications. Similar thermal coefficients of expansion between germanium (5.8 × 10^?6 K^?1) and sapphire (5 × 10^?6 K^?1) make the bonding of germanium to sapphire a reality. Germanium directly bonded to sapphire results in microvoid generation during post bond annealing. Inclusion of an interface layer such as silicon dioxide layer by plasma enhanced chemical vapour deposition, prior to bonding, results in a microvoid free bond interface after annealing. Grinding and polishing of the subsequent germanium layer has been achieved leaving a thick germanium on sapphire (GeOS) substrate. Submicron GeOS layers have also been achieved with hydrogen/helium co-implantation and layer transfer. Circular geometry transistors exhibiting a field effect mobility of 890 cm²/V s have been fabricated onto the thick germanium on sapphire layer.     

Fabrication of single crystal field-effect transistors with phenacene-type molecules and their excellent transistor characteristics

Single crystal field-effect transistors (FETs) using [6]phenacene and [7]phenacene show p-channel FET characteristics. Field-effect mobilities, μs, as high as 5.6 × 10^?1 cm² V^?1 s^?1 in a [6]phenacene single crystal FET with an SiO₂ gate dielectric and 2.3 cm² V^?1 s^?1 in a [7]phenacene single crystal FET were recorded. In these FETs, 7,7,8,8-tetracyanoquinodimethane (TCNQ) was inserted between the Au source/drain electrodes and the single crystal to reduce hole-injection barrier heights. The μ reached 3.2 cm² V^?1 s^?1 in the [7]phenacene single crystal FET with a Ta₂O₅ gate dielectric, and a low absolute threshold voltage |V_TH| (6.3 V) was observed. Insertion of 2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane (F₄TCNQ) in the interface produced very a high μ value (4.7–6.7 cm² V^?1 s^?1) in the [7]phenacene single crystal FET, indicating that F₄TCNQ was better for interface modification than TCNQ. A single crystal electric double-layer FET provided μ as high as 3.8 × 10^?1 cm² V^?1 s^?1 and |V_TH| as low as 2.3 V. These results indicate that [6]phenacene and [7]phenacene are promising materials for future practical FET devices, and in addition we suggest that such devices might also provide a research tool to investigate a material’s potential as a superconductor and a possible new way to produce the superconducting state.     

Solution-processed organic field-effect transistors composed of poly(4-styrene sulfonate) wrapped multiwalled carbon nanotube source/drain electrodes

Multiwalled carbon nanotubes (MWNTs) were solubilized in water by wrapping them noncovalently with poly(4-styrene sulfonate) (PSS). The PSS-wrapped MWNTs exhibited a high conductivity (2.0 × 10² S/cm) when compared to other solution-processed electrodes. Ultraviolet photoelectron spectroscopy results show the PSS-wrapped nanotubes have a work function of 4.83 eV, which is 0.36 eV higher than that of untreated MWNTs. We fabricated triisopropylsilylethynyl pentacene field-effect transistors (FETs) using the PSS-wrapped MWNTs as source/drain electrodes and found that the field-effect mobility of the thus obtained devices was 0.043 cm² V^?1 s^?2. This mobility is four times higher than that of similar FETs containing gold electrodes (0.011 cm² V^?1 s^?2).     

Improved pilot-aided optical carrier phase recovery using average processing for pilot phase estimation

We propose and numerically investigate an improved pilot-aided (PA) optical carrier phase recovery (CPR) method using average processing for pilot phase estimation in order to suppress the amplified spontaneous emission (ASE) noise in PA coherent transmission systems. Extensive simulations for 28 Gbuad QPSK systems are implemented. The performance of proposed PA-CPR with averaging is comprehensively investigated and compared with PA-CPR without averaging and Viterbi & Viterbi phase estimation (VVPE). Results show that, PA-CPR with averaging can significantly improve the performance of PA-CPR without averaging, and the best averaging length in the average operation is determined by trading off between ASE noise and laser phase noise (PN). By comparing the optical-signal-to-noise-ratio (OSNR) penalties at bit error rate (BER) of 1 × 10^?3 using PA-CPR without averaging, PA-CPR with averaging and VVPE, the advantage of PA-CPR with averaging is further confirmed. Quantitatively, the tolerable linewidth-symbol-duration products (Δf · T) at 1-dB OSNR penalty by using PA-CPR without averaging, VVPE, and PA-CPR with averaging are 6 × 10^?5, 1.2 × 10^?4, and 5 × 10^?4, respectively.     

Photoluminescence of phosphorous doped Ge on Si (100)

Photoluminescence (PL) of selectively grown phosphorus (P) doped germanium (Ge) is investigated. 350–600 nm thick P-doped Ge is grown on 100 nm thick P-doped Ge buffer layer, which is annealed at 800 °C before the main part of Ge deposition. In the case of Ge deposited at 325 °C, approximately two times higher PL intensity is observed by P doping of ~3.2×10¹⁹ cm⁻³. Further increase of PL intensity by a factor of 1.5 is observed by increasing the growth temperature from 325 °C to 400 °C due to improved crystal quality. Varying PH₃ partial pressure at 400 °C, red shift of the PL occurred with increasing P concentration due to higher bandgap narrowing. With increasing P concentration up to ~1.4×10¹⁹ cm⁻³ at 400 °C the PL peak intensity increases by filling electrons into the L valley and decreases due to enhanced point defect concentration and degraded crystallinity. By post-annealing at 500–800 °C, the PL intensity is further increased by a factor of 2.5 because of increased active P concentration and improved crystal quality. Reduced direct bandgap energy by introducing tensile strain is also observed.     

A cross-linked poly(methyl methacrylate) gate dielectric by ion-beam irradiation for organic thin-film transistors

The electrical characteristics of pentacene organic thin-film transistors (OTFTs) using cross-linked poly(methyl methacrylate) (PMMA) as the gate dielectric are reported. Ultra-thin films of cross-linked PMMA could be obtained by spin-coating and subsequent irradiation using a 1.515 MeV ⁴He⁺ ion beam. The resulting film, with a thickness of 33 nm, possessed a low leakage current density of about 10^?6 A cm^?2 for fields up to 2 MV cm^?1. OTFTs incorporating the cross-linked dielectric operated at relatively low voltages, <10 V, and exhibited a mobility of 1.1 cm² V^?1 s^?1, a threshold voltage of ?1 V, a sub-threshold slope of 220 mV per decade and an on/off current ratio of 1.0 × 10⁶.     

Evaporated iron disulfide thin films with sulfurated annealing treatments

FeS₂ thin films were grown on a glass substrate using a physical vapor deposition technique at room temperature. Subsequently, the thin films were annealed in two different atmospheres: vacuum and vacuum-sulfur. In the vacuum-sulfur atmosphere a graphite box was used as sulfur container and the films were sulfurated successfully at 200–350 ºC. It was found that annealing in a vacuum-sulfur atmosphere was indispensable in order to obtain polycrystalline FeS₂ thin films. The polycrystalline nature and pure phase were determined by XRD and Raman techniques and the electrical properties by the Hall effect. Using the sulfurating technique, the n-type semiconductor was prepared at 200–350 °C and a p-type at 500 °C. The carrier concentrations were between 1.19×10²⁰ and 2.1×10²⁰ cm⁻³. The mobility was 9.96–5.25 cm² V⁻¹ s⁻¹ and the resistivity was 6.31×10⁻² to 1.089×10⁻² Ω cm. The results obtained from EDS showed that the films prepared in the vacuum-sulfur atmosphere were close to stoichiometric and that the indirect band gap varied between 1.03 and 0.945 eV.     

High-performance n-type organic field-effect transistors fabricated by ink-jet printing using a C60 derivative

We report on the performance of ink-jet-printed n-type organic thin-film transistors (OTFTs) based on a C₆₀ derivative, namely, C₆₀-fused N-methyl-2-(3-hexylthiophen-2-yl)pyrrolidine (C₆₀TH-Hx). The new devices exhibit excellent n-channel performance, with a highest mobility of 2.8 × 10^?2 cm² V^?1 s^?1, an I_On/I_Off ratio of about 1 × 10⁶, and a threshold voltage of 7 V. The C₆₀TH-Hx films show large crystalline domains that result from the influence of an evaporation-induced flow, thus leading to high electron mobility in the ink-jet-printed devices.     

Photoreactive π-conjugated star-shaped molecules for the organic field-effect transistor

A number of semiconducting organic molecules capable of wet processing exhibit high carrier mobility and current modulation. In this work, we synthesized photopatternable π-conjugated star-shaped molecules and characterized their physical properties. The solubility of the synthesized molecules is very good for solution processing. The synthesized organic semiconducting multi-branched molecules are capable of photopatterning by virtue of photopolymerization of the reactive pentadienyl end groups. The transistor devices using these molecules provided a field-effect mobility of 1.3(±0.2) × 10^?3–3.7(±0.5) × 10^?3 cm² V^?1 s^?1 as well as a high current on/off ratio (I_on/off > 10³) and a low threshold voltage. In the case of the photoreactive star-shaped conjugated molecule HP2P, it was found that field-effect mobility was maintained even after the photocrosslinking process. This result can be used in the design of photopatternable semiconductor molecules for thin-film transistor electronic applications.     

Multihydroxylated aryl amine as a novel alcohol-processable hole-transport molecular glass exhibiting remarkable resistance to weakly polar solvents

Multihydroxylation of a small-molecule aryl amine leads to a contrasting solubility in polar and weakly polar solvents. The resulting compound shows an intrinsic amorphous morphology with a high T_g of 190 °C and is capable of affording uniform smooth and transparent films, spin-cast from 2-propanol. The fitting of the space-charge-limited current characteristics reveals a hole mobility of ～4.6 × 10^?6 cm² V^?1 s^?1 at low-voltages. Incorporating this new compound as a hole-transport layer into conventional bottom-anode organic light-emitting diodes that consisted of a solution-processed emitter provides promising performance.     

Investigation of TiO2 on AlGaAs prepared by liquid phase deposition and its application

The study explored titanium dioxide (TiO₂) on aluminum gallium arsenide (AlGaAs) prepared by liquid phase deposition (LPD) at 40 °C. The leakage current density was about 8.4 × 10^?6 A/cm² at 1 MV/cm. The interface trap density (D_it) and the flat-band voltage shift (ΔV_FB) were 2.3 × 10¹² cm^?2 eV^?1 and 1.2 V, respectively. After rapid thermal annealing (RTA) in the ambient N₂ at 350 °C for 1 min, the leakage current density, D_it, and ΔV_FB were improved to 2.4 × 10^?6 A/cm² at 1 MV/cm, 7.3 × 10¹¹ cm^?2 eV^?1, and 1.0 V, respectively. Finally, the study demonstrates the application to the AlGaAs/InGaAs metal–oxide–semiconductor pseudomorphic high-electron-mobility transistor (MOS-PHEMT). The results indicate the potential of the proposed device with a LPD-TiO₂ gate oxide for power application.     

Solution processable quinoxaline based molecular materials for organic field effect transistors

Three new solution processable quinoxaline based donor–acceptor–donor (D–A–D) type molecules have been synthesized for application in field effect transistors. These molecules were characterized by UV–visible spectroscopy, thermal gravimetric analysis, differential scanning calorimetry and cyclic voltammetry. DFT calculation gives deeper insight into the electronic structure of these molecules. The crystallinity and morphology features of thin film were investigated using X-ray diffraction. These molecules show liquid crystalline phase confirmed by DSC and optical polarizing microscopy. Investigation of their field effect transistor performance indicated that these molecules exhibited p-type mobility up to 9.7 × 10^?4 cm² V^?1 s^?1 and on/off ratio of 10⁴.     

2 MeV ion irradiation effects on AlGaN/GaN HFET devices

AlGaN/GaN heterostructure field effect transistors (HFETs) were irradiated with 2 MeV protons, carbon, oxygen, iron and krypton ions with fluences ranging from 1 × 10⁹ cm^?2 to 1 × 10¹³ cm^?2. DC, pulsed I–V characteristics, loadpull and S-parameters of the AlGaN HFET devices were measured before and after irradiation. In parallel, a thick GaN reference layer was also irradiated with the same ions and was characterized by X-ray diffraction, photoluminescence, Hall measurements before and after irradiation. Small changes in the device performance were observed after irradiation with carbon and oxygen at a fluence of 5 × 10¹⁰ cm^?2. Remarkable changes in device characteristics were seen at a fluence of 1 × 10¹² cm^?2 for carbon, oxygen, iron and krypton irradiation. Similarly, remarkable changes were also observed in the GaN layer for irradiations with fluence of 1 × 10¹² cm^?2. The results found on devices and on the GaN layer were compared and correlated.     

Dry growth of n-octylphosphonic acid monolayer for low-voltage organic thin-film transistors

Dry method for monolayer deposition of n-octylphosphonic acid (C₈PA) on the surface of aluminium oxide (AlO_x) is presented. Vacuum thermal evaporation is employed to deposit initial thickness corresponding to several C₈PA monolayers, followed by a thermal desorption of the physisorbed C₈PA molecules. AlO_x functionalized with such C₈PA monolayer exhibits leakage current density of ～10^?7 A/cm² at 3 V, electric breakdown field of ～6 MV/cm, and a root-mean-square surface roughness of 0.36 nm. The performance of low-voltage pentacene thin-film transistors that implement this dry AlO_x/C₈PA gate dielectric depends on C₈PA desorption time. When the desorption time rises from 25 to 210 min, the field-effect mobility increases from ～0.02 to ～0.04 cm²/V s, threshold voltage rises from ～?1.2 to ～?1.4 V, sub-threshold slope decreases from ～120 to ～80 mV/decade, off-current decreases from ～5 × 10^?12 to ～1 × 10^?12 A, on/off current ratio rises from ～3.8 × 10⁴ to ～2.5 × 10⁵, and the transistor hysteresis decreases from 61 to 26 mV. These results collectively support a two stage model of the desorption process where the removal of the physisorbed C₈PA molecules is followed by the annealing of the defect sites in the remaining C₈PA monolayer.     

Dependence of the optoelectronic properties of selenium-hyperdoped silicon on the annealing temperature

Selenium-hyperdoped silicon was prepared by ion implantation at 100 eV to a dose of 6×10¹⁵ Se/cm², followed by furnace annealing at 500–900 °C for 30 min. A phase transition from amorphous to crystalline was observed for the sample annealed at 600 °C. Carrier density in the Se doping layer gradually increases with the annealing temperature and a high carrier/donor ratio of 7.5% was obtained at 900 °C. The effects of annealing temperature on the rectifying behavior and external quantum efficiency of n⁺p junctions formed on Se-hyperdoped silicon were also investigated. We found that 700 °C was the optimal annealing temperature for improving the crystallinity, below-bandgap absorption, junction rectification and external quantum efficiency of Se-doped samples.