镀铜金刚石树脂砂轮的研究

通过选择合适的化学镀铜工艺在金刚石表面镀覆一层金属铜，该方法可以调节镀层厚度，可一次镀也可多次镀。通过ＸＲＤ、ＳＥＭ、ＥＰＭＡ等分析手段对镀铜金刚石进行了分析，结果表明：一次镀镀层形貌松散，多次镀镀层形貌紧密，镀层铜呈晶态，并含有少量的氧和铁等杂质。磨削结果表明：镀铜金刚石砂轮其耐磨性明显优于普通金刚石砂轮，多次镀铜铜含量较高的金刚石更适合于制造树脂砂轮     

化学方法实现GaAs表面Cu的沉积

用一种简单的化学方法在ＬＥＣ ＧａＡｓ晶体表面实现了Ｃｕ的沉积，沉积的Ｃｕ层均匀性、牢固性良好，厚度达到无限源扩散的要求。本文介绍了化学镀铜液的配制及镀铜工艺，并对化学镀铜的机理进行了讨论。     

Fabrication and characterization of copper-diamond particles

The electroless copper deposition on both pure and Cr-coated diamond particles was studied to produce copper/diamond composites for electronic packaging materials. The particles were characterized and the mechanism of product formation was investigated through scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), X-ray diffraction (XRD), and X-ray photoelectron spectra (XPS). The particle coating thickness was measured using optical micrographs. The diamond particles got uniform coating thickness of copper crystals layers. This method provided an excellent base for the fabrication of metal-based composites using cheap equipments, and was less time consuming, nature friendly and economical compared with other methods of diamond surface metallization.     

基片预处理对CVD金刚石薄膜形核的影响

微波辅助等离子体化学气相沉积法是目前低压气相合成金刚石薄膜方法中应用最普遍、工艺最成熟的方法,形核是CVD金刚石沉积的第一步．利用微波辅助等离子体化学气相沉积装置,研究了硅基片预处理方式对金刚石薄膜形核密度的影响．在工作气压为5-8kPa,微波功率为2500—5000W,甲烷流量为4-8cm^3／min,氢气流量为200em3／min,沉积温度为500℃-850℃的条件下,在单晶Si基片上沉积金刚石薄膜．通过扫描电子显微镜形貌观察表明,基片预处理能够显著提高金刚石形核密度,同时用拉曼光谱表征了金刚石薄膜的质量,     

Synthesis of boron-doped diamond/porous Ti composite materials — Effect of carbon concentration

Highly boron-doped diamond films were deposited on porous titanium substrates by hot filament chemical vapor deposition technique.The morphology variation of highly boron-doped diamond films grown on porous titanium substrates was investigated,and the effects of carbon concentration on nucleation density and diamond growth were also studied.The continuous change of surface morphology and structure of diamond film were characterized by scanning electron microscopy.The structures of diamond film and interlayer were analyzed by X-ray diffraction.The quality of boron-doped diamond film was confirmed by visible Raman spectroscopy.The experimental results reveal that surface morphology and quality of boron-doped diamond films are various due to the change of carbon concentration.The thickness of intermediate layer decreases with the carbon concentration increasing.     

THE EFFECT OF DIAMOND FILM NUCLEATION AND GROWTH IN DIFFERENT SUBSTRATE PRETREATMENT METHODS

The diamond film on single crystal silicon substrate in three kinds of substrate is deposited by pretreatment method using microwave plasma, the diamond film is analyzed using SEM and Raman, the reasons why substrate pretreatment affects nucleation and growth are probed. The results show that substrate pretreatment directly affects nucleation and growth of diamond film, homogeneous nucleation and growth can be formed only in suitable pretreatment method.     

镀铬轧辊表面的精饰

本文介绍了一种在镀铬轧辊表面加工出斜向花纹的简便方法.此法利用一与轧辊交错轴接触的金刚石滚轮,当滚轮被轧辊带动旋转时,其上的金刚石磨粒就在相对滑动速度的作用下,在轧辊表面刻划出所需的斜向花纹.本文对金刚石滚轮的设计及加工的工艺参数也作了介绍.     

CVD条件对金刚石薄膜／钼基体界面层的影响

用微波等离子体化学气相沉积法（MPCVD）在Mo基片上沉积金刚石薄膜时,界面层钼的碳化程度与初始沉积条件有关,利用XRD,SEM,EDS,对界面层进行的研究表明：在化学气相沉积的开始阶段,较低的甲烷浓度有利于碳向基体内的扩散从而让表面的Mo充分碳化,形成富含Mo2C的界面层,甲烷浓度过高时有利于金刚石的形核而不利于碳向基体内的扩散,在金刚石薄膜的生长过程中,碳向基体内的扩散很少,界面层的组成结构保持不变。     

Effects of Substrate Local Strain on Microstructure of Electrodeposited Aluminum Film

1 IntroductionElectrodeposition,has been widely usedin electron-ics, automobile and airliner industry, and has been anobject of intense research over the past years . Comparedwith other methods for preparing coatings ,the electro-deposition has several advantages , such as least cost ,controllability, avoidance of thermal stress and higherproduction, which can produce functional coatings withresistance to corrosion and wear and low coefficient offriction in engineering field[1 ,2]. Moreover ,t…     

The Nucleation Process in the Preparation of Graphene Films by Pulsed Laser Deposition

The nucleation process of graphene films prepared by pulsed laser deposition has been investigated in detail. It is found that graphene nucleates at the steps on the substrate surface firstly, from aggregation of nuclei into particles. High pulsed laser energy offers large incident energy for carbon particles deposited on the surface of the substrate, which is beneficial to the nucleation of graphene. A lot of steps are formed on the copper substrate due to the high temperature, so that the high incident energetic carbon species are able to form a stable nucleus at the steps. As the incident particles increases, the graphene nuclei are combined to grow together. Further, it is found that graphene tends to form few layer graphene particles instead of large graphene sheets.     

钛铁矿的机械活化及其浸出动力学

对攀枝花钛铁矿的机械活化及其浸出动力学进行了研究。结果表明：活化矿的浸出速率控制步骤随浸出的进行而发生变化，在浸出前期为液膜扩散和表面化学反应混合控制，而在浸出后期则为表面化学反应控制。这说明钛铁矿的机械活化过程是由颗粒外层向内层逐步推进的，存在一个未活化的芯层，而且在活性层中活性由表至里下降。对活化层进行了估算，其厚度约为40nm。     

不同工艺参数对金刚石薄膜齿轮制备的影响

金刚石薄膜是最具潜力的微机械结构功能材料之一,但其极高的硬度和化学稳定性使其难以被加工成型。本文采用反应离子刻蚀方法对金刚石薄膜进行了微齿轮结构的制作研究,制作出了厚度为5gin,模数为0．003的金刚石薄膜齿轮。实验结果表明,镍钛合金薄膜和光刻胶层作为金刚石薄膜刻蚀掩模,可以获得表面平滑、轮廓清晰、侧壁陡直的金刚石薄膜图形;O2及与Ar的混合气体对佥刚石薄膜图形化的刻蚀主要工艺参数如射频功率、工作气压、气体流量及反应气体成分等均对刻蚀速率和刻蚀界面形貌产生不同程度的影响。刻蚀中,当工作气压12Pa及气体流量50sccm稳定时,射频功率与刻蚀速率呈线性变化,但射频功率过高（大于135W）则掩模刻蚀生成物沉积在金刚石薄膜表面而发黑;对于给定的工艺条件下,金刚石薄膜的刻蚀速率并不强烈依赖于混合气体中氧气的含量。     

金刚石的盐浴镀钨

在金刚石工具制造技术中，为了提高金刚石与基体的结合性能，对金刚石表面进行了高温盐浴镀钨处理；用Ｘ射线衍射分析方法测定了镀层表面结构并作了冲击磨料磨损试验。结果表明：高温盐浴方法不仅使金刚石获得了金属化表面结构，而且不破坏金刚石品质；镀覆后金刚石与金属基体之间的结合良好。盐浴镀钨处理可有效地发挥金刚石优异的抗磨作用。     

电化学镀铝基体局域应力对镀层形貌影响研究

通过电化学方法在带有局域应力的铜表面电镀形成一层铝膜.实验表明沉积在铜表面的铝颗粒形状与局域应力缓释有直接的联系。局域应力越大，形成颗粒越大，形状呈针状。随着局域应力的降低，颗粒度明显降低，颗粒形状逐渐向球形过渡。结果表明基体的局域应力可以改变沉积颗粒的形状，促进沉积颗粒的形核与增长.     

采用Cu／Ti过渡层沉积金刚石薄膜刀具的界面结构

研究了硬质合金基底上Cu／Ti作过渡层化学气相沉积(CVD)金刚石薄膜的界面特性。利用激光Ra—man谱分析了过渡层不同生长阶段金刚石薄膜的质量的影响。采用SEM、EDS对金刚石薄膜硬质合金刀具横截面的结构进行了研究。结果表明：基体中的Co被Cu／Ti作过渡层有效的抑制住；Cu向基体内的扩散改善了基体的性能，提高了界面层金刚石薄膜的质量；Ti的引入促进了金刚石的形核，减少了界面处晶粒间的空隙，提高了金刚石薄膜与基体表面的实际接触面积。     

Fe41Co7Cr15Mo14C15B6Y2合金涂层的激光制备及显微组织研究

利用激光熔覆和激光重熔的方法在低碳钢表面制备了原位生成颗粒增强铁基涂层.用X线衍射(XRD)、扫描电镜(SEM)对其相结构和微观组织进行了研究,重点分析了重熔层的组织形态和形成机制.结果表明:制备的涂层无气孔和裂纹,整个涂层的厚度为0.6~0.7 mm,重熔层厚度为50~80 μm;熔覆层主要是方向比较紊乱的树枝晶组织,重熔层内形成了细小的等轴晶组织;重熔层最高显微硬度达到了1056 HV.     

纳米针状金刚石膜的制备

利用高功率微波等离子体化学气相沉积方法在硅衬底上沉积了多晶金刚石薄膜,然后利用电子束蒸发方法在金刚石薄膜表面上沉积了5 nm厚的Pt薄膜.利用Pt的自组织化效应,再通过氢等离子体照射、氧等离子体刻蚀、王水处理等手段,使金刚石薄膜表面形成了纳米针.利用拉曼光谱和扫描电子显微镜(SEM)表征金刚石薄膜的结构,拉曼光谱显示在1 315 cm^-1处出现纳米金刚石特征峰,SEM显示纳米针均匀地直立在金刚石薄膜表面,每平方厘米大约含有10⁸个纳米针,纳米针的平均高度约为1 μm.     

吸附法制备CuO/SiO2纳米复合材料

为了研究和控制CuO粒子的生长，提出了一种利用吸附相纳米反应器制备纳米粒子的新方法.在SiO2表面的吸附层反应器中得到CuO纳米粒子，由络合滴定法测定了Cu离子的吸附速度，利用XRD、TEM、EDX和溶剂置换的方法研究了反应和吸附过程的特性.结果表明，Cu离子的吸附在1 h内达到平衡，60%的Cu离子被吸附到SiO2表面.随着温度的升高，吸附层体积会减小且络合吸附作用得到加强.由于吸附层度的限制，CuO晶粒粒径会减小.反庆在吸附层内发生，随水量的增加，SiO2表面环境发生突变，Cu量迅速达到最大值并不再改变.     

类激光熔覆Stellite合金沉积层的组织及磨损性能

为了进一步提高316不锈钢的表面性能,采用类激光熔覆技术在316不锈钢表面制备了Stellite合金沉积层.利用扫描电子显微镜、能谱仪、X射线衍射仪、显微硬度计与销盘磨损试验机,研究了Stellite合金沉积层的微观组织、化学成分、显微硬度及摩擦磨损性能.结果表明,Stellite合金沉积层主要由γ-Co和M_(23)C_6相组成.沉积层组织依附于316不锈钢基体的界面呈外延生长,由界面至表面依次呈平面晶、柱状晶和胞状树枝晶形态,且越靠近表面组织越细小.Stellite合金沉积层的最高硬度可达650 HV.在摩擦磨损过程中摩擦系数随着法向载荷的增大而减小,磨损机制主要为黏着磨损、磨粒磨损和氧化磨损.     

辅助气体对分阶段制备金刚石膜的影响

采用形核 甲烷/氢气生长-辅助气体/甲烷/氢气生长的新工艺,在镜面抛光的单晶硅片上制备了金刚石膜,并用扫描电子显微镜和激光拉曼光谱等测试方法对薄膜的表面形貌和质量性能进行了表征;研究了添加辅助气体对已有金刚石晶型生长的影响.结果表明:以甲烷/氢气为气源时,金刚石膜生长率一般为1.8 μm/h,当分别加入氧气、二氧化碳、氮气时,其生长率都有所提高,其中加入二氧化碳时,其生长率是甲烷/氢气为气源的3倍多,但是加入氩气时,其生长率下降;通过新工艺,在加入氮气或氩气时,第一生长阶段为微米,而第二生长阶段为纳米尺寸,最后制备出具有微/纳米双层复合金刚石膜.