Surface analysis of nitride layers formed on Fe‐based alloys through plasma nitride process

Nitriding phenomena that occur on the surfaces of pure Fe and Fe? Cr alloy (16 wt% Cr) samples were investigated. An Ar + N₂ mixture‐gas glow‐discharge plasma was used so that surface nitriding could occur on a clean surface etched by Ar⁺ ion sputtering. In addition, the metal substrates were kept at a low temperature to suppress the diffusion of nitrogen. These plasma‐nitriding conditions enabled us to characterize the surface reaction between nitrogen radicals and the metal substrates. The emission characteristics of the band heads of the nitrogen molecule ion (N₂⁺) and nitrogen molecule from the glow‐discharge plasma suggest that the active nitrogen molecule is probably the major nitriding reactant. AES and angle‐resolved XPS were used to characterize the thickness of the nitride layer and the concentration of elements and chemical species in the nitride layer. The thickness of the nitride layer did not depend on the metal substrate type. An oxide layer with a thickness of a few nanometers was formed on the top of the nitride layer during the nitriding process. The oxide layer consisted of several species of N_x‐Fe_y‐O, NO⁺, and NO₂^?. In the Fe? Cr alloy sample, these oxide species could be reduced because chromium is preferentially nitrided. Copyright © 2009 John Wiley & Sons, Ltd.     

X-Ray Analysis of Multi-Films for Electrochromic Device Application

Multilayer films based on tungsten oxide (WO₃), ITO (indium tin oxide) and CdS were deposited mainly by reactive dc magnetron sputtering onto glass substrates for electrochromic application. The thin films were analyzed by means of XPS (X-ray photoelectron spectroscopy), GIXD (grazing incidence X-ray diffraction) and XRD (X-ray diffraction). XRD and XPS results confirmed that the films were WO₃, CdS and ITO, respectively. The surface and interface of the CdS/ITO bi-layered film was studied by GIXD in different incidence angles. Detailed results about the amorphous characterization of the films during room temperature growth and post annealing are given.     

Investigation of glow-discharge-induced morphology modifications on silicon wafers and chromium conversion coatings by AFM and rugosimetry

The effect of radiofrequency glow-discharge sputtering on the sample surface in terms of modifications in the surface morphology were investigated in this work by using atomic force microscopy (AFM) and rugosimetry measurements. The influence of GD operating parameters (e.g. rf power, discharge pressure and sputtering time) on surface roughening was investigated using two different types of samples: mirror-polished and homogeneous silicon wafers and chromate conversion coatings (CCCs). Surface morphology changes produced by GD sputtering into the sample surface were carefully investigated by AFM and rugosimetry, both at the original sample surface and at the bottom of GD craters using different GD experimental conditions, such as the sputtering time (from 1 s to 20 min), rf forward power (20–60 W for the Si wafer and 10–60 W for the CCC), and discharge pressure (400–1,000 Pa for the Si wafer and 500–1000 Pa for the CCC). In the present study, GD-induced morphology modifications were observed after rf-GD-OES analysis, both for the silicon wafers and the CCC. Additionally, the changes observed in surface roughness after GD sputtering were found to be sample-dependent, changing the proportion, shape and roughness of the micro-sized patterns and holes with the sample matrix and the GD conditions.     

New approaches to the preparation of highly efficient chromium-containing oxide catalysts for the water gas shift reaction

It was found experimentally that the solutions of Cr³⁺ nitrate and the nitrates of other metals that are the constituents of Cr-containing catalysts can be prepared by dissolving a corresponding metal (for example, cast iron and electrolytic copper) in a solution of chromic anhydride and nitric acid to reach the quantitative reduction of Cr⁶⁺ without the formation of nitrogen oxides. Analogously, the oxidation of Fe²⁺ cations to Fe³⁺ coupled with the reduction of hexavalent chromium can be performed. The precipitation of Fe³⁺, Cr³⁺, and Cu²⁺ ions at a ratio of Fe: Cr = 9 and a concentration of Cu²⁺ to 20 at % can result in the formation of a partially hydrated oxide with the hydrohematite structure—a dispersed and highly defective oxide structure with a high specific surface area more than 300 m²/g and a higher thermal stability, as compared with the goethite phase (α-FeOOH). The dehydration of hydrohematite occurred at a noticeable rate at temperatures higher than 400°C. Hydrohematite promoted with copper cations exhibited high activity below 400°C; this can decrease the starting temperature of the adiabatic high-temperature WGSR to 300°C or below.     

Investigation of surface and thermogravimetric characteristics of carbon-coated iron nanopowder

Demand for high-density press and sinter components is increasing day by day. Of the different ways to improve the sinter density, the addition of nanopowder to the conventional micrometer-sized metal powder is an effective solution. The present investigation is aimed at studying the surface chemistry of iron nanopowder coated with graphitic carbon, which is intended to be mixed with the conventional iron powder. For this purpose, iron nanopowder in the size range of 30 nm to submicron (less than 1 micron) was investigated using thermogravimetry at different temperatures: 400°C, 600°C, 800°C, 1000°C, and 1350°C. The X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and high-resolution scanning electron microscopy (HR-SEM) were used for characterizing the powder as well as samples sintered at different temperatures. The presence of iron, oxygen, carbon, chromium, and zinc were observed on the surface of the nanopowder. Iron was present in oxide state, although a small metallic iron peak at 707 eV was also observed in the XPS spectra obtained from the surface indicating the oxide scale to be maximum of about 5 nm in thickness. For the sample treated at 600°C, presence of manganese was observed on the surface. Thermogravimetry results showed a two-step mass loss with a total mass loss of 4 wt.% when heated to 1350°C where the first step corresponds to the surface oxide reduction.     

In Vitro Selection of Chromium‐Dependent DNAzymes for Sensing Chromium(III) and Chromium(VI)

Chromium is a very important analyte for environmental monitoring, and developing biosensors for chromium is a long‐standing analytical challenge. In this work, in vitro selection of RNA‐cleaving DNAzymes was carried out in the presence of Cr³⁺. The most active DNAzyme turned out to be the previously reported lanthanide‐dependent Ce13d DNAzyme. Although the Ce13d activity was about 150‐fold lower with Cr³⁺ than that with lanthanides, the activity of lanthanides and other competing metals was masked by using a phosphate buffer; this left Cr³⁺ as the only metal that could activate Ce13d. With 100 μm Cr³⁺, the cleavage rate is 1.6 h^?1 at pH 6. By using a molecular beacon design, Cr³⁺ was measured with a detection limit of 70 nm , which was significantly lower than the United States Environmental Protection Agency (EPA) limit (11 μm ). Cr⁴⁺ was measured after reduction by NaBH₄ to Cr³⁺, and it could be sensed with a similar detection limit of 140 nm Cr⁴⁺; this value was lower than the EPA limit of 300 nm . This sensor was tested for chromium speciation analysis in a real sample, and the results supported its application for environmental monitoring. At the same time, it has enhanced our understanding of the interactions between chromium and DNA.     

Radio frequency glow discharge optical emission spectroscopy: a new weapon in the depth profiling arsenal

While the array of analytical methods routinely applied for depth profile analysis was fairly static over the decades of the 1980s and 1990s, there appears to be an emerging technique that has a number of very positive and complementary attributes, and warrants serious consideration by the thin film community. Radio frequency glow discharge optical emission spectroscopy (rf-GD-OES) is a technique that provides depth-resolved elemental composition information on a wide variety of sample types. In a manner very much like most depth profiling methods, the rf-GD plasma utilizes an ion sputtering step to ablate sample material in a layer-by-layer fashion. Different from the more commonly applied methods, the device operates at elevated pressures [2-10 Torr Ar (266-1,330 Pa)] and has the inherent capability of sputtering electrically insulating materials directly, without any auxiliary means of charge compensation. In addition, sputtering rates on the order of 1 micro m/min provide rapid analysis, with depth resolving powers that are comparable to high-vacuum sputtering methods. Three examples of the use of the rf-GD-OES method are presented as examples of its analytical potential: (1) boron-implanted silicon wafer, (2) a barrier-type alumina film, and (3) a porous-type alumina film. It is believed that the method holds a great deal of promise as part of the arsenal of weapons in the thin films laboratory.     

Multi-instrument characterization of HiPIMS and DC magnetron sputtered tungsten and copper films

In this work, copper and tungsten were sputtered onto silicon wafers by direct current magnetron sputtering (DCMS) and high-power impulse magnetron sputtering (HiPIMS). The resulting films were characterized by energy dispersive X-ray spectroscopy (EDX), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), atomic force microscopy (AFM), spectroscopic ellipsometry (SE), and X-ray diffraction (XRD). By EDX and XPS, all the sputtered films showed only the expected metal peaks. By XPS, the surfaces sputtered by DCMS were richer in oxygen than those produced by HiPIMS. By AFM, the surfaces were quite smooth. The root mean square (RMS) roughness values are as follows: 0.83 nm (W, HiPIMS), 1.10 nm (W, DCMS), 0.85 nm (Cu, HiPIMS), and 1.78 nm (Cu, DCMS). By SEM, the HiPIMS films exhibited smaller grain sizes, which was confirmed by XRD. The crystallite sizes estimated by XRD are as follows: 4 nm (W, body-centered cubic, HiPIMS), 13 nm (W, body-centered cubic, DCMS), 7 nm (W, cubic, HiPIMS), 14 nm (W, cubic, DCMS), 25 nm (Cu, HiPIMS), and 35 nm (Cu, DCMS). By SE, the HiPIMS surfaces showed higher refractive indices, which suggested that they were denser and less oxidized than the DCMS surfaces.     

Tetraammineplatinum(II) and Tetraamminepalladium(II) Chromates as Precursors of Metal Oxide Catalysts

[M(NH₃)₄]A (M=Pt, Pd; A=CrO₄, Cr₂O₇) and [Pt(NH₃)₄(NO₂)(Cr₂O₇)]NO₃ complex salts were synthesized and characterized by a number of physicochemical methods of analysis (IR, single-crystal and powder XRD, and simultaneous thermogravimetry and differential scanning calorimetry with evolved gas analysis mass spectrometry). Thermolysis of the salts obtained in a hydrogen atmosphere proceeds with the partial reduction of chromium to a metallic state and the formation of M_xCr_1−x (M=Pt, Pd) metal solid solution with a chromium content of up to 22 at % and chromium(III) oxide. The thermal decomposition of salts in an inert and oxidizing atmosphere passes through the formation stage of the MCrO₂ phase with the delafossite structure followed by its subsequent decomposition into chromium(III) oxide and noble metal. Nanosized Pt−Cr₂O₃ and Pd−Cr₂O₃ composites obtained by the thermolysis of precursor salts in air at 500 °C and being held at this temperature for 1 h showed a high catalytic activity in the CO total oxidation (TOX) and preferential oxidation in the excess of hydrogen (PROX) processes compared with that of monometallic Pt and Pd powders.     

X-ray absorption fine structure study of amorphous metal oxide thin films prepared by photochemical metalorganic deposition

The oxidation state and local geometry of the metal centers in amorphous thin films of Fe₂O₃ (Fe³⁺ oxidation state), CoFe₂O₄ (Co²⁺/Fe³⁺ oxidation states), and Cr₂O₃ (Cr³⁺ oxidation state) are determined using K edge X-ray absorption near-edge structure (XANES) spectroscopy and extended X-ray absorption fine structure (EXAFS) spectroscopy. The metal oxide thin films were prepared by the solid-state photochemical decomposition of the relevant metal 2-ethylhexanoates, spin cast as thin films. No peaks are observed in the X-ray diffraction patterns, indicating the metal oxides are X-ray amorphous. The oxidation state of the metals is determined from the edge position of the K absorption edges, and in the case of iron-containing samples, an analysis of the pre-edge peaks. In all cases, the EXAFS analysis indicates the first coordination shell consists of oxygen atoms in an octahedral geometry, with a second shell consisting of metals. No higher shells are observed beyond 3.5 Å for all samples, indicating the metal oxides are truly amorphous, consistent with X-ray diffraction results.     

Preparation and Study of New Metal-Containing Polymer Compositions Based on an Alicyclic Polyimide

New film-forming metal-containing polymer compositions based on an alicyclic polyimide and on arylalicyclic copolyimides synthesized from tricyclodecene-, oxydiphenyl-, and benzophenonetetracarboxylic dianhydrides and oxydianiline in the presence of cobalt, nickel, iron, and copper salts in amide solvents were prepared, and their main properties were studied. Optimum synthesis conditions and compositions of metalcontaining composites with improved thermal, electrical, and other characteristics were found. The possibility of using the modified alicyclic polyimide films for fabricating integrated circuits by magnetron sputtering was examined. The samples prepared by sputtering of metals onto SPI-1 polyimide films with a chromium sublayer are characterized by high adhesion of the metal to the film surface.     

<Emphasis Type="Italic">In situ</Emphasis> XPS study of InAs oxidation in glow-discharge plasma

This is the first in situ XPS study of the InAs oxidation kinetics in glow-discharge plasma in the atmosphere of O₂ and CO₂ gases and in a mixture of O₂ and NF₃ gases. Chemical composition of the oxide films produced by cathodic and anodic polarization of samples was examined. Main regularities and features of the oxide film formation on the InAs surface in the normal and dark glow discharge modes were revealed. Normal glow discharge in oxygen-containing plasma was shown to form bilayer oxide films on the InAs surface. The bottom layer with thickness of some nanometers, which consists of arsenic and indium oxides, forms at the initial oxidation steps, its thickness remaining virtually unchanged. The upper layer consists of Al₂O₃ produced by sputtering of cathode material; it serves as a barrier to oxygen diffusion, its thickness building up linearly with the treatment time in glow-discharge plasma. Chemical composition of the growing proper InAs oxide film and the stoichiometry of subsurface region of a semiconductor substrate strongly depend on the oxidation process parameters. The obtained regularities are discussed.     

Evolution of surface chemistry during sintering of water-atomized iron and low-alloyed steel powder

Water-atomized iron and steel powder is commonly used as the base material for powder metallurgy (PM) of ferrous components. The powder surface chemistry is characterized by a thin surface oxide layer and more thermodynamically stable oxide particulates whose extent, distribution, and composition change during the sintering cycle due to a complex set of oxidation–reduction reactions. In this study, the surface chemistry of iron and steel powder was investigated by combined surface and thermal analysis. The progressive reduction of oxides was studied using model sintering cycles in hydrogen atmospheres in a thermogravimetric (TG) setup, with experiments ended at intermediate steps (500–1300°C) of the heating stage. The surface chemistry of the samples was then investigated by means of X-ray photoelectron spectroscopy (XPS) to reveal changes that occurred during heating. The results show that reduction of the surface oxide layer occurs at relatively lower temperature for the steel powder, attributed to an influence of chromium, which is supported by a strong increase in Cr content immediately after oxide layer reduction. The reduction of the stable oxide particulates was shifted to higher temperatures, reflecting their higher thermodynamic stability. A complementary vacuum annealing treatment at 800°C was performed in a furnace directly connected to the XPS instrument allowing for sample transfer in vacuum. The results showed that Fe oxides were completely reduced, with segregation and growth of Cr and Mn oxides on the particle surfaces. This underlines the sequential reduction of oxides during sintering that reflects the thermodynamic stability and availability of oxide-forming elements.     

Interaction of Cyanoacrylate with Metal Oxide Surfaces (Cu,Al)

Cyanoacrylates are an extremely reactive class of adhesives. Despite their commercial use as instant adhesives, the adhesion mechanism, especially to technically relevant oxidized metal surfaces, has not yet been sufficiently investigated. In the present work, ultra-thin ethyl cyanoacrylate films are deposited on copper oxide and aluminum oxide by spin coating and cured there. Various surface sensitive spectroscopy methods are used to identify possible interactions. X-Ray photoelectron spectroscopy (XPS) indicates, among other information, hydrogen bonding of the carbonyl group to the oxidized surfaces. Metastable induced electron spectroscopy (MIES) measurements support the theory of this preferential molecular orientation. In addition, XPS shows the presence of an ionic carboxylate (COO⁻) species at the interface. Infrared reflection adsorption spectroscopy (IRRAS) measurements confirm this ionic interaction and furthermore allow to investigate the influence of water on the reaction. A possible interaction mechanism of cyanoacrylates with metal oxides could be proposed. The formation of a carboxylate species probably occurs by hydrolysis of the ethyl group via the intermediate of a carboxyl (COOH) species.     

A more general method for ranking the enrichment of alloying elements in passivation films

The corrosion of alloys is often characterized by an enrichment of one or other of the alloying elements within the surface oxide or even within the underlying metallic phase. For some three decades the measurement of such surface enrichment has been one of the most important contributions made by XPS to corrosion science. X‐ray photoelectron spectroscopy permits the composition of the oxide film to be distinguished from that of the metallic surface underlying the oxide so that both can be determined independently. In the mid‐1970s these measurements were crucial in showing that the selective enrichment of chromium in the electrochemical passivation of stainless steel occurred by selective dissolution of iron, and not by selective oxidation of chromium. Measurements of this type are important also in active corrosion, where there is no stable oxide film, as in studies of dealloying phenomena. The literature now contains numerous cases, many published by one of us (K.A.) based on studies of novel alloys produced in the Institute for Materials Research at Sendai. Typically, measurements are made for a series of binary compositions A_xB_y ranging from A‐rich to B‐rich alloys, in media that reflect the intended use of the alloy. The results are normally produced in the form of plots of cation composition Aⁿ⁺/(Aⁿ⁺ + B^m+) against bulk composition A/(A + B) or, in the case of dealloying, as A_surface/(A_surface + B_surface) against the bulk composition. Although graphical representation is useful in giving the full picture of the alloy's behaviour, it is not so useful in cataloguing or indexing performance. In this paper we suggest a means to give a rank or performance index as a single number that will characterize the behaviour of the alloy over a wide range of composition for a given medium or exposure condition. The rank number does not imply that any particular mechanism of enrichment is in operation; in various cases of corrosion it might occur by selective precipitation (FeOOH on steels, CuO on cupronickels), by selective dissolution (dezincification of brass) or by preferential incorporation of ions in a passivating oxide or oxyhydroxide (Cr³⁺ on stainless steels). Although the rank has no mechanistic implications, it is useful within a known class of mechanistic behaviour for indicating the magnitude of the effect and thus for enabling an XPS measurement to be indicative of wanted, or unwanted, behaviour. For example, the rank number could be useful in indicating, perhaps from a single alloy composition, whether a degree of passivation is likely to be achieved for that mix of metallic elements. Copyright © 2004 John Wiley & Sons, Ltd.     

Effect of atomization on surface oxide composition in 316L stainless steel powders for additive manufacturing

The initial oxide state of powder is essential to the robust additive manufacturing of metal components using powder bed fusion processes. However, the variation of the powder surface oxide composition as a function of the atomizing medium is not clear. This work summarizes a detailed surface characterization of three 316L powders, produced using water atomization (WA), vacuum melting inert gas atomization (VIGA), and nitrogen atomization (GA). X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy analyses were combined to characterize the surface state of the powders. The results showed that the surface oxides consisted of a thin (~4 nm) iron oxide (Fe₂O₃) layer with particulate oxide phases rich in Cr, Mn, and Si, with a varying composition. XPS analysis combined with depth-profiling showed that the VIGA powder had the lowest surface coverage of particulate compounds, followed by the GA powder, whereas the WA powder had the largest fraction of particulate surface oxides. The composition of the oxides was evaluated based on the XPS analysis of the oxide standards. Effects of Ar sputtering on the peak positions of the oxide standards were evaluated with the aim of providing an accurate analysis of the oxide characteristics at different etch depths.     

Mechanism of Polymerization of α-Olefins on Oxide Catalysts

The polymerization of ethylene on a chromic oxide catalyst with and without a solvent has been studied. It was found that the active catalyst surface is formed exclusively as a result of its interaction with ethylene. This interaction is accompanied by the formation of products which poison the surface of the catalyst when they are sorbed on it in the absence of a solvent. A catalyst which contains no Cr⁺⁶ atoms as a result of reduction by alcohol is inactive. On the other hand, a catalyst which contains only Cr⁺⁶ atoms becomes active only after it has been partially reduced. The most probable product of this reduction is trivalent chromium atoms. The results obtained have given grounds for the assumption that the active complex contains Cr⁺⁶ and Cr⁺³ atoms. A possible mechanism of the reaction is discussed. Owing to the oxidative action of CrO₃ on the ethylene molecules, part of the Cr⁺⁶ is reduced to Cr⁺³, and the trivalent chromium becomes alkylated. The monomer molecule is added at the Cr⁺³—C bond thus formed. A strong Lewis acid, CrO₃, lowers the electron density on the Cr⁺³ atom. This increases the strength of the Cr⁺³—C bond and the ability of the Cr⁺³ atom to coordinate with the monomer molecule. The monomer molecule enters the chain at the moment when the strength of the Cr^?3—C bond is weakened due to coordination of this molecule with the Cr⁺³ atom.     

Direct growth of aligned multiwalled carbon nanotubes on treated stainless steel substrates

Growth of aligned carbon nanotubes (CNTs) on electrically conductive substrates is promising for many applications; however, the lack of complete understanding of the substrate effects on CNT growth poses a lot of technical challenges. Here, we report the direct growth of aligned multiwalled nanotubes (MWNTs) on chemically treated stainless steel (Type 304) using a chemical vapor deposition (CVD) process. A detailed X-ray photoelectron spectroscopy (XPS) analysis has been carried out for the various treated samples in order to better understand the correlation between the surface properties of the substrates and the MWNT growth. The XPS studies revealed that the CNTs prefer to grow on the enriched surface of iron oxides obtained by the chemical treatment rather than on the passive chromium oxide films present on the surface of the as-received stainless steel substrates. The density and alignment of the MWNTs could therefore be controlled by tuning the ratio of the iron oxides to chromium oxides through the chemical treatment on the stainless steel surfaces. On the basis of this method, selective growth of CNT patterns on stainless steel has also been demonstrated.