Hg_(1-x)Cd_xTe梯度带隙薄膜材料生长及红外透射光谱研究

利用气相外延法生长了Hg1-xCdxTe梯度带隙薄膜材料,通过小光点红外透射光谱测试,研究了材料的横向组分波动.利用多层模型和膜系传递矩阵对该薄膜材料的红外透射光谱和气相外延薄膜材料的纵向组分分布进行计算,计算结果与实验吻合,材料纵向组分分布与通过能谱测量的样品截面组分变化趋势一致.用光伏器件的制作工艺,选取气相外延生长的Au掺杂中波材料,制备了10元线列器件,测试结果表明器件性能较好,95K黑体D*λP可达4.20×1011(cm·Hz1/2·W-1).     

p-H_(1-x)Cd_xTe材料中轻空穴的性质研究

通过变磁场霍尔测量方法 ,采用由迁移率谱和多载流子拟合过程相结合的混合电导法 ,在 1 2 - 30 0K范围内 ,获得了两块分子束外延 (MBE)生长的p Hg1-xCdxTe(x =0 2 2 4)样品中的轻、重空穴以及体电子、表面电子的浓度和迁移率 .此外 ,在实验中 ,还直接观察到了轻空穴对电导张量分量的贡献 .实验值不仅具有明确的物理意义 ,而且有助于红外探测器模型的建立 .     

截止波长12 μm的p型-InAs0.04Sb0.96材料的熔体外延生长

为了获得p-型的长波长InAsSb材料并研究掺杂剂Ge对材料特性的影响,用熔体外延法生长了掺Ge的波长为12 μm的p型-InAsSb 外延层.用傅里叶红外光谱仪、Van der Pauw 法和电子探针微分析研究了材料的透射光谱、电学性质以及组分的分布.结果表明,两性杂质Ge在熔体外延生长的InAs0.04Sb0.96材料中起受主杂质作用.当外延层的组分相同时,材料的截止波长不随掺Ge浓度的变化而变化,但是随着外延层中掺Ge量的增加,外延层的透射率下降.掺杂原子Ge在外延层的表面及生长方向的分布都是相当均匀的.77 K下测得,载流子浓度为9.18×1016 cm-3的掺Ge的p型-InAs0.04Sb0.96样品,其空穴迁移率达到1 120 cm2·Vs-1.     

截止波长12 μm的p型-InAs0.04Sb0.96材料的熔体外延生长

为了获得p-型的长波长InAsSb材料并研究掺杂剂Ge对材料特性的影响,用熔体外延法生长了掺Ge的波长为12 μm的p型-InAsSb 外延层.用傅里叶红外光谱仪、Van der Pauw 法和电子探针微分析研究了材料的透射光谱、电学性质以及组分的分布.结果表明,两性杂质Ge在熔体外延生长的InAs0.04Sb0.96材料中起受主杂质作用.当外延层的组分相同时,材料的截止波长不随掺Ge浓度的变化而变化,但是随着外延层中掺Ge量的增加,外延层的透射率下降.掺杂原子Ge在外延层的表面及生长方向的分布都是相当均匀的.77 K下测得,载流子浓度为9.18×1016 cm－3的掺Ge的p型-InAs0.04Sb0.96样品,其空穴迁移率达到1 120 cm2·Vs－1.     

Hg_(1-x)Cd_xTe材料变温特性的实验研究

对碲镉汞(Hg1-xCdxTe)材料的电学特性进行了变温实验研究.通过变温(80~300 K)霍尔效应测量,研究了Hg1-xCdxTe材料的霍尔系数RH、电导率σ和霍尔迁移率μH的温度依赖关系.结果表明,Hg1-xCdxTe晶体在低温下为p型导电,而在室温下为n型导电.     

射频等离子体辅助MBE生长GaN及Mg掺杂的光致发光

采用射频等离子体辅助分子束外延(RF plasma-assisted MBE)系统生长非故意掺杂GaN和p型GaN,并且通过室温和低温光致发光(PL)谱测试研究了材料的发光特性及与杂质态的关系,对于GaN外延层出现的黄带发光进行分析。结果表明,富Ga条件下生长的GaN材料特性要优于富N生长的材料;非故意掺杂的富Ga样品中出现的黄带发光(YL)与GaN中生成能最低的氮空位(V_N)缺陷有关;不同的Mg掺杂浓度对样品的PL特性有较大的影响;结合Hall效应测量结果,认为在Mg重掺杂的样品中出现的黄带发光,与GaN的自补偿效应以及重掺杂导致的晶体质量下降有关。     

光伏型碲镉汞红外探测单元响应特性分析

对激光辐照PV型的Hg1-xCdxTe单元探测器的响应特性进行了研究,建立了材料内部光生电动势变化的数学分析模型。计算了不同光源辐照3类组分不同的Hg1-xCdxTe探测单元的输出特性,并对温度波动影响进行了分析。结果表明:在光敏面积恒定时,x值越大探测器的完全饱和电压越大,即探测器的响应度Hg0.627Cd0.373TeHg0.698Cd0.302TeHg0.819Cd0.181Te;x值越小,探测器受温度波动的影响越小。     

温度对p-InN薄膜光电导灵敏度的影响

研究了p型InN的光电导效应。利用分子束外延技术(MBE)法生长出高质量的InN薄膜,在此基础上利用Mg掺杂获得了p-InN。原位反射高能电子衍射(RHEED)表明样品在生长过程中保持二维生长模式,原子力显微镜(AFM)测试结果显示台阶流的生长模式。实验发现,p型InN的光电导灵敏度随温度的升高而降低。其主要原因是当温度升高时,光生载流子浓度降低和样品背景浓度升高共同造成的。     

高组分稀磁半导体Cd1-xMnxTe/CdTe超晶格的荧光谱研究

报道用分子束外延(MBE)技术生长的x=0.4,0.8的高组分稀磁半导体Cd1-xMnxTe/CdTe超晶格低温和室温荧光谱研究结果.基态激子跃迁能级荧光谱实验结果显示高组分超晶格中具有高量子效率和高质量光发射.对激子能级随温度的变化进行了详细研究,给出激子跃迁能量的温度系数.激子能级线型的展宽随温度变化关系可用激子-纵向光学声子耦合模型解释.与光调制反射谱实验结果进行了比较.     

截止波长12μm的p型-InAs_(0.04)Sb_(0.96)材料的熔体外延生长

为了获得P型的长波长InAsSb材料并研究掺杂剂Ge对材料特性的影响,用熔体外延法生长了掺Ge的波长为12μm的P型-InAsSb外延层．用傅里叶红外光谱仪、VanderPauw法和电子探针微分析研究了材料的透射光谱、电学性质以及组分的分布．结果表明,两性杂质Ge在熔体外延生长的InAs0.01Sb0.96材料中起受主杂质作用．当外延层的组分相同时,材料的截止波长不随掺Ge浓度的变化而变化,但是随着外延层中掺Ge量的增加,外延层的透射率下降．掺杂原子Ge在外延层的表面及生长方向的分布都是相当均匀的．77K下测得,载流子浓度为9．18×10^16cm^-3的掺Ge的P型-InAS0.01Sb0.96样品,其空穴迁移率达到1120cm^2·Vs^-1.     

In situ characterization of MBE grown GaAs and Al x Ga1−x As films using RHEED,SIMS, and AES techniques

A combination of the surface diagnostic techniques Auger electron spectroscopy (AES), reflection high energy electron diffraction (RHEED), and secondary ion mass spectroscopy (SIMS) was used in order to get more detailed information on basic processes which lead to the formation of high quality monocrystalline GaAs and Al _x Ga_1−x As films by molecular beam epitaxy (MBE) under ultra-high vacuum conditions. The formation and changes of reconstructed surface structures on (100) GaAs as a function of growth parameters were observedduring growth by RHEED. AES was used to determine the relative ratio of Ga/As on the surface for different reconstructed structures, to investigate the impurity contamination on substrate surfaces and grown films, and to study the surface segregation of Sn in MBE GaAs during doping. Finally, intentional and unintentional impurities incorporated during the growth of GaAs and Al _x Ga_1−x As by MBE were detected by the SIMS technique immediately after growth within the reaction chamber.     

Pressure influence on the Stark effect of impurity states in a strained wurtzite GaN/AlxGa1-xN heterojunction

A variational method is adopted to investigate the properties of shallow impurity states near the interface in a free strained wurtzite GaN/AlxGa1-xN heterojunction under hydrostatic pressure and external electric field by using a simplified coherent potential approximation. Considering the biaxial strain due to lattice mismatch or epitaxial growth and the uniaxial strains effects, we investigated the Stark energy shift led by an external electric field for impurity states as functions of pressure as well as the impurity position, Al component and areal electron density. The numerical result shows that the binding energy near linearly increases with pressure from 0 to 10 GPa. It is also found that the binding energy as a function of the electric field perpendicular to the interface shows an un-linear red shift or a blue shift for different impurity positions. The effect of increasing x on blue shift is more significant than that on the red shift for the impurity in the channel near the interface. The pressure influence on the Stark shift is more obvious with increase of electric field and the distance between an impurity and the interface. The increase of pressure decreases the blue shift but increases the red shift.     

MnxSi1-x磁性薄膜的结构研究

利用X射线衍射(XRD)和X射线吸收近边结构(XANES)方法研究了在Si(100)衬底上及600℃温度条件下用分子束外延(MBE)共蒸发方法生长的Mn_xSi_1-x磁性薄膜的结构.由XRD结果表明,只有在高Mn含量(8％和17％)样品中存在着Mn₄Si₇化合物物相.而XANES结果则显示,对于Mn浓度在0.7%到17%之间的Mn_xSi_1-x样品,其Mn原子的XANES谱表现出了一致的谱线特征.基于多重散射的XANES理论计算进一步表明,只有根据Mn₄Si₇模型计算出的理论XANES谱才能够很好的重构出Mn_xSi_1-x样品的实验XANES谱.这些研究结果说明在Mn_xSi_1-x样品中,Mn原子主要是以镶嵌式的Mn₄Si₇化合物纳米晶颗粒存在于Si薄膜介质中,几乎不存在间隙位和替代位的Mn原子. 关键词： xSi_1-x磁性薄膜')" href="#">Mn_xSi_1-x磁性薄膜 分子束外延 XRD XANES     

B在Hg0.75Cd0.25Te中掺杂效应的第一性原理研究

基于密度泛函理论的第一性原理方法,通过形成能和束缚能的计算研究了B在Hg_0.75Cd_0.25Te 中的掺杂效应.结果表明B在Hg_0.75Cd_0.25Te中存在着两种主要形态:第一种是在完整的 Hg_0.75Cd_0.25Te材料中B稳定存在于六角间隙位置而非替位.此时,B形成容易激活的三级施主使材料表现为n型.另一种是在有Hg空位存在的Hg_0.75Cd_0.25Te中B更容易与Hg空位结合形成缺陷复合体,其束缚能达到了0.96 eV.这种复合体在Hg_0.75Cd_0.25Te材料中形成单施主也使材料表现为n型.考虑到辐照损伤形成的Hg空位受主,这种B与Hg空位的复合体是制约B离子在MCT中注入激活的一个重要因素.     

Thermal stability of Mg2Si epitaxial film formed on Si（111） substrate by solid phase reaction

A single crystalline Mg2 Si film was formed by solid phase reaction(SPR) of a Si(111) substrate with an Mg overlayer capped with an oxide layer(s),which was enhanced by post annealing from room temperature to 100 ℃in a molecular beam epitaxy(MBE) system.The thermal stability of the Mg2 Si film was then systematically investigated by post annealing in an oxygen-radical ambient at 300℃,450℃ and 650 ℃,respectively.The Mg2 Si film stayed stable until the annealing temperature reached 450 ℃ then it transformed into amorphous MgO x attributed to the decomposition of Mg2 Si and the oxidization of dissociated Mg.     

压力下应变异质结中施主杂质态的Stark效应

对应变GaN/Al_xGa_1-xN异质结系统,考虑理想界面突变势垒,引入简化相干势近似,采用变分法讨论了流体静压力下外界电场对束缚于界面附近的浅杂质态结合能的影响.对GaN为衬底的闪锌矿应变异质结,分别计算了(001)和(111)取向时杂质态的结合能随压力、杂质位置、电场强度以及组分的变化关系.结果表明,杂质态结合能随流体静压力呈近线性变化.电场对杂质态的Stark效应则随杂质位置不同而呈现谱线蓝、红移动.此外,还讨论了在不同压力情况下,Al组分对杂质结合能的影响.当杂质处于GaN材料中且距界面较远时,Al组分的增加使电子的二维特性增强,从而使结合能增大,且压力加剧增幅的增加;当杂质处于Al_xGa_1-xN材料中,Al组分的增加削弱了杂质与电子间的库仑相互作用,故而结合能降低. 关键词： xGa_1-xN异质结')" href="#">GaN/Al_xGa_1-xN异质结 杂质态 压力 Stark效应     

Pb1－xMnxSe薄膜的光学特性

采用分子束外延的方法在BaF₂(111)衬底上制备出了高质量的Pb_1-xMn_xSe(0≤x≤0.0681)薄膜.X射线衍射结果表明，Pb₁-xMn_xSe薄膜为立方相NaCl型结构，没有观察到MnSe相分离现象，薄膜的取向为平行于衬底(111)晶面.晶格常数随着Mn含量的增加逐渐减小，Mn含量由Vegard公式得到.通 关键词： 1-xMn_xSe外延薄膜')" href="#">Pb_1-xMn_xSe外延薄膜 透射光谱 带隙 折射率     

Effects of Fe2+ substitution on magnetic and dielectric properties of CdCr2S4

The magnetic and dielectric properties of polycrystalline Cd_{1 - x}Fe_xCr₂S₄ (0 ≤ x ≤ 0.9) are investigated. Upon substitution of Cd by Fe, the Curie temperature (T_C) is increased while the saturation magnetization is decreased. A low doping level of Fe increases the permittivity, while a high doping level decreases the permittivity, which is explained by the internal barrier layer capacitor model. Kinks are observed in the temperature-dependent permittivity and loss tangent near T_C for the samples with x= 0.5, 0.7, 0.9, implying the existence of the magnetodielectric effect. Furthermore, with the increase of Fe content, a decrease of anomaly deviation rate induced by internal molecular field is revealed in the permittivity, while an increase is observed for the loss tangent.     

制备工艺对Zn1-xMgxO薄膜结构及光学性能的影响

采用脉冲激光沉积（PLD）方法在单晶Si（100）衬底上沿c轴方向生长单晶Zn_1-xMg_xO薄膜,通过X射线衍射（XRD）、原子力显微镜（AFM）、扫描电镜（SEM）和荧光光谱（PL）研究了膜厚、Mg含量、退火温度及氧气氛等制备工艺对Zn_1-xMg_xO薄膜的结构、形貌和光学性质的影响.实验结果表明,Mg含量x≤0.15时, Zn_{关键词： 1-x}Mg_xO薄膜')" href="#">Zn_1-xMg_xO薄膜 制备工艺 结构 光学性质     

Formation of impurity bands in iodine cation substitutionally doped TiO2 and its effects on photoresponse and photogenerated carriers

First-principles calculations based on the plane-wave pseudopotential (PWP) method were performed to investigate the electronic structure of iodine cation substitutionally doped anatase TiO₂ (referred to as I_sTiO₂). A 2×2×1 anatase supercell, in which one Ti atom was substituted by one iodine atom, was constructed for calculations. The calculated results reveal that iodine dopant contributes part of its 5s states to form one isolated impurity band in band gap and part of its 5p states to form some impurity bands at the bottom of conductive bands. The visible light response of I_sTiO₂ should be the consequence of the excitation between the two types of impurity bands (2.77 eV, about 450 nm). According to the distribution of impurity states, iodine dopant is considered to serve as a recombination center or an efficient trap for photogenerated carriers. This deduction was partly approved by water photosplitting under visible light irradiation.